GHI3

  1. "Point Diffraction Interferometry at EUV Wavelengths," K. A. Goldberg, R. Beguiristain, J. Bokor, H. Medecki, K. Jackson, and D. T. Attwood, in Extreme Ultraviolet Lithography, F. Zernike and D. T. Attwood (eds.), (Optical Society of America, Washington, D.C. 1994) , 134-41 (1994).
  2. "Progress toward lambda/20 EUV interferometry," K. A. Goldberg, R. Beguiristain, J. Bokor, H. Medecki, D. T. Attwood, K. Jackson, E. Tejnil, G. E. Sommargren, Journal of Vacuum Science and Technology B 13 (6), 2923-7 (1995). DOI 10.1116/1.588280
  3. "At-wavelength testing of optics for EUV," K. A. Goldberg, R. Beguiristain, J. Bokor, H. Medecki, K. Jackson, and D. T. Attwood, G. E. Sommargren, J. P. Spallas, R. Hostetler, Proc. SPIE 2437, 347-54 (1995). DOI 10.1117/12.209172
  4. "Interferometry using undulator sources," R. Beguiristain, K. A. Goldberg, E. Tejnil, Review of Scientific Instruments 67 (9), 3353 (1996). DOI 10.1063/1.1147396
  5. "Phase-Shifting Point Diffraction Interferometer," H. Medecki, E. Tejnil, K. A. Goldberg, and J. Bokor, Optics Letters 21 (19), 1526-8 (1996). DOI 10.1364/OL.21.001526
  6. "Zonal placement errors in zone plate lenses," E. Tejnil, K. A. Goldberg, E. Anderson, and J. Bokor, Extreme Ultraviolet Lithography, G. Kubiak and D. Kania, eds. (Optical Society of America, Washington, D.C., 1996) , pp. 138-142 (1996).
  7. "Phase-shifting point diffraction interferometry for at-wavelength testing of lithographic optics," E. Tejnil, K. A. Goldberg, H. Medecki, R. Beguiristain, J. Bokor, and D. T. Attwood, Extreme Ultraviolet Lithography G. Kubiak and D. Kania, eds. (Optical Society of America, Washington, D.C., 1996) , pp. 118-23 (1996).
  8. "A 3-D numerical study of pinhole diffraction to determine the accuracy of EUV point diffraction interferometry," K. A. Goldberg, E. Tejnil, and J. Bokor, Extreme Ultraviolet Lithography, G. Kubiak and D. Kania, eds. (Trends in Optics and Photonics, Volume 13, Optical Society of America, Washington, D.C., 1996). , pp. 133-137 (1996).
  9. "Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry," K. A. Goldberg, E. Tejnil, S. H. Lee, H. Medecki, D. T. Attwood, K. H. Jackson, and J. Bokor, Proc. SPIE 3048, 264-70 (1997).
  10. "At-wavelength interferometry for EUV lithography," E. Tejnil, K. A. Goldberg, S. H. Lee, H. Medecki, P. J. Batson, P. E. Denham, A. A. MacDowell, and J. Bokor, Journal of Vacuum Science and Technology B 15 (6), 2455-2461 (1997). DOI 10.1116/1.589666
  11. "Extreme Ultraviolet Interferometry," K. A. Goldberg, Doctoral Dissertation, Department of Physics, University of California, Berkeley (1997).
  12. "EUV interferometry: an accuracy standard for diffraction-limited EUV optics," K. A. Goldberg, P. Naulleau, S. Lee, C. Chang, C. Bresloff, P. Denham, P. Batson, D. Attwood, and J. Bokor, The Advanced Light Source Users Meeting 1998
  13. "Point Diffraction Interferometry: An EUV Projection Lithography System Alignment and Qualification Tool," P. Naulleau, K. Goldberg, S. Lee, C. Bresloff, D. Attwood, and J. Bokor, Optical Fabrication and Testing, OSA Technical Digest Series Vol. 12 117-119, (1998).
  14. "Characterization of the accuracy of EUV phase-shifting point diffraction interferometry," P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, C. Bresloff, P. Batson, D. Attwood, and J. Bokor, in Emerging Lithographic Technologies II, Y. Vladimirski, (ed.), Proc. SPIE 3331, 114-23 (1998).
  15. "At-wavelength interferometry of Extreme Ultraviolet Lithographic Optics," S. H. Lee, P. Naulleau, K. A. Goldberg, E. Tejnil, H. Medecki, C. Bresloff, C. Chang, D. T. Attwood, and J. Bokor, AIP Conference Proceedings, (no. 449), (Characterization and Metrology for ULSI Technology, 1998 International Conference, Gaithersburg, MD, USA, 1998.) , pp. 553-7 (1998).
  16. "Phase effects owing to multilayer coatings in a two-mirror extreme-ultraviolet Schwarzschild objective," E. Tejnil, K. A. Goldberg, J. Bokor, Applied Optics 37 (34), 8021-9 (1998). DOI 10.1364/AO.37.008021
  17. "High-accuracy interferometry of EUV lithographic optical systems," K. A. Goldberg, P. Naulleau, S. Lee, C. Bresloff, D. Attwood, and J. Bokor, Journal of Vacuum Science and Technology B 16 (6), 3435-39 (1998). DOI 10.1116/1.590498
  18. "At-wavelength metrologies for extreme ultraviolet lithography," D. Attwood, E. Anderson, P. Batson, R. Beguiristain, J. Bokor, K. Goldberg, E. Gullikson, K. Jackson, K. Nguyen, M. Koike, H. Medecki, S. Mrowka, R. Tackaberry, E. Tejnil, and J. Underwood, Future Electron Devices Journal Vol. 9 (Suppl. 1), 5-14 (1998).
  19. "Testing extreme ultraviolet optical systems at-wavelength with sub-angstrom accuracy," K. A. Goldberg, in Fabrication and Testing of Aspheres, J. S. Taylor, M. Piscotty, and A. Lindquist, (eds.) (Optical Society of America, Washington, D.C., 1999) , (1999).
  20. "EUV scattering and flare of 10x projection cameras," E. M. Gullikson, S. L. Baker, J. E. Bjorkholm, J. Bokor, K. A. Goldberg, J. E. M. Goldsmith, C. Montcalm, P. Naulleau, E. A. Spiller, D. G. Stearns, J. S. Taylor, J. H. Underwood, in Emerging Lithographic Technologies III, Y. Vladimirski, ed., Proc. SPIE 3676, 717-23 (1999). DOI 10.1117/12.351162
  21. "Sub-100-nm lithographic imaging with the EUV 10x Microstepper," J. E. M. Goldsmith, K. W. Berger, D. R. Bozman, G. F. Cardinale, D. R. Folk, C. C. Henderson, D. J. O'Connell, A. K. Ray-Chaudhuri, K. D. Stewart, D. A. Tichenor, H. N. Chapman, R. J. Gaughan, R. M. Hudyma, C. Montcalm, E. A. Spiller, J. S. Taylor, J. D. Williams, K. A. Goldberg, E. M. Gullikson, P. Naulleau, J. L. Cobb, in Emerging Lithographic Technologies III, Y. Vladimirski, ed., Proc. SPIE 3676, 264-71 (1999). DOI 10.1117/12.351097
  22. "Direct comparison of EUV and visible-light interferometries," K. A. Goldberg, P. Naulleau, S. H. Lee, C. Chang, C. Bresloff, R. Gaughan, H. N. Chapman, J. Goldsmith, and J. Bokor, Proc. SPIE 3676, 635-42 (1999). DOI 10.1117/12.351138
  23. "Tunable coherent radiation in the soft x-ray and extreme ultraviolet spectral regions," D. T. Attwood, P. Naulleau, K. A. Goldberg, E. Tejnil, C. Chang, R. Beguiristain, P. Batson, J. Bokor, E. M. Gullikson, M. Koike, H. Medecki, and J. H. Underwood, IEEE Journal of Quantum Electronics 35 (5), 709-20 (1999).
  24. "Recent advances in EUV phase-shifting point diffraction interferometry," P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, P. Batson, D. Attwood, and J. Bokor, Proc. SPIE 3767, 154-63 (1999). DOI 10.1117/12.371113
  25. "Extreme ultraviolet interferometric measurements of diffraction-limited optics," K. A. Goldberg, P. Naulleau, and J. Bokor, Journal of Vacuum Science and Technology B 17 (6), 2982-86 (1999). DOI 10.1116/1.590939
  26. "Interferometric at-wavelength flare characterization of EUV optical systems," P. Naulleau, K. A. Goldberg, E. M. Gullikson, and J. Bokor, Journal of Vacuum Science and Technology B 17 (6), 2987-91 (1999). DOI 10.1116/1.590940
  27. "Dual-domain point diffraction interferometer," P. P. Naulleau and K. A. Goldberg, Applied Optics 38 (16), 3523-33 (1999). DOI 10.1364/AO.38.003523
  28. "Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy," P. P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, D. Attwood, and J. Bokor, Applied Optics 38 (35), 7252-63 (1999). DOI 10.1364/AO.38.007252
  29. "Extreme ultraviolet interferometric measurement and alignment of diffraction-limited optics," K. A. Goldberg, P. Naulleau, J. Bokor, P. Batson, P. Denham, E. Anderson, S. Lee, and C. Chang, The Advanced Light Source Users Meeting
  30. "Interferometric at wavelength flare characterization of EUV optical systems," P. Naulleau, K. Goldberg, E Gullikson, and J. Bokor, The Advanced Light Source Users Meeting
  31. "In Situ alignment system for phase-shifting point-diffraction interferometry," K. Goldberg and P. Naulleau, U.S. Patent No. 6,118,535, September 12, 2000
  32. "Null test Fourier domain alignment technique for phase-shifting point diffraction interferometer," P. Naulleau and K. Goldberg, U.S. Patent No. 6,111,646, August 29, 2000
  33. "Dual domain phase-shifting point diffraction interferometer," P. Naulleau and K. Goldberg, U.S. Patent No. 6,100,978, August 8, 2000
  34. "Extreme ultraviolet alignment and testing of a four mirror aspheric extreme ultraviolet optical system," K. A. Goldberg, P. Naulleau, P. Batson, P. Denham, H. Chapman, and J. Bokor, Journal of Vacuum Science and Technology B 18 (6), 2911-15 (2000). DOI 10.1116/1.1319703
  35. "Extreme ultraviolet carrier-frequency shearing Interferometry of a lithographic four-mirror optical system," P. P. Naulleau, K. A. Goldberg and J. Bokor, Journal of Vacuum Science and Technology B 18 (6), 2939-43 (2000). DOI 10.1116/1.1321290
  36. "Extreme ultraviolet holographic microscopy and its application to extreme ultraviolet mask-blank defect characterization," S. H. Lee, J. Bokor, S. Jeong, and K. Goldberg, Journal of Vacuum Science and Technology B 18 (6), 2935-8 (2000). DOI 10.1116/1.1314382
  37. "EUV Interferometry of a Four-Mirror Ring-Field EUV Optical System," K. A. Goldberg, P. Naulleau, P. J. Batson, P. Denham, J. Bokor, and H. N. Chapman, Proc. SPIE 3997, 867-73 (2000). DOI 10.1117/12.390045
  38. "EUV Engineering Test Stand," D. A. Tichenor, G. D. Kubiak, W. C. Replogle, L. E. Klebanoff, J. B. Wronosky, L. C. Hale, H. N. Chapman, J. S. Taylor, J. A. Folta, C. Montcalm, R. M. Hudyma, K. A. Goldberg, and P. Naulleau , Proc. SPIE 3997, 48-69 (2000). DOI 10.1117/12.390083
  39. "The PS/PDI: a high accuracy development tool for diffraction limited short-wavelength optics," P. Naulleau, K. Goldberg, S. Lee, C. Chang, P. Batson, D. Attwood, and J. Bokor, AIP Conf. Proc. 507, 595 (2000).
  40. "At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems," P. Naulleau, K. Goldberg, E. Gullikson, and J. Bokor, Applied Optics 39 (17), 2941-47 (2000). DOI 10.1364/AO.39.002941
  41. "The EUV phase-shifting point diffraction interferometer," P. Naulleau, K. Goldberg, S. Lee, C. Chang, D. Attwood, and J. Bokor, Synchrotron Radiation Instrumentation: 11th US National Conference, 1999, P. Pianetta, et al.,(eds.) CP521, 66-72 (2000).
  42. "Phase-shifting point-diffraction interferometry at 193 nm," S. H. Lee, P. Naulleau, K. A. Goldberg, F. Piao, W. Oldham, J. Bokor , Applied Optics 39 (31), (2000). DOI 10.1364/AO.39.005768
  43. "At-wavelength characterization of DUV-radiation-induced damage in fused silica," S. H. Lee, F. Piao, P. Naulleau, K. A. Goldberg, W. Oldham, and J. Bokor, Proc. SPIE 3998, 724-31 (2000). DOI 10.1117/12.386529
  44. "At-wavelength characterization of the extreme ultraviolet Engineering Test Stand Set-2 optic," P. Naulleau, K. A. Goldberg, E. H. Anderson, P. Batson, P. E. Denham, K. H. Jackson, E. M. Gullikson, S. Rekawa, and J. Bokor, Journal of Vacuum Science and Technology B 19 (6), 2396-2400 (2001). DOI 10.1116/1.1421545
  45. "First lithographic results from the extreme ultraviolet Engineering Test Stand," H. N. Chapman, A. K. Ray-Chaudhuri, D. A. Tichenor, W. C. Replogle, R. H. Stulen, G. D. Kubiak, P. D. Rockett, L. E. Klebanoff, D. O'Connell, A. H. Leung, K. L. Jefferson, J. B. Wronosky, J. S. Taylor, L. C. Hale, K. Blaedel, E. A. Spiller, G. E. Sommargren, J. A. Folta, D. W. Sweeney, E. M. Gullikson, P. Naulleau, K. A. Goldberg, J. Bokor, D. T. Attwood, U. Mickan and R. Hanzen, E. Panning, P.-Y. Yan, C. W. Gwyn, and S. H. Lee , Journal of Vacuum Science and Technology B 19 (6), 2389-95 (2001). DOI 10.1116/1.1414017
  46. "Fourier transform method of phase-shift determination," K. A. Goldberg and J. Bokor, Applied Optics 40 (17), 2886-94 (2001). DOI 10.1364/AO.40.002886
  47. "Phase-shifting point diffraction interferometer mask designs," K. A. Goldberg, U.S. Patent No. 6,307,635, October 23, 2001
  48. "Initial Results from the EUV Engineering Test Stand," D. A. Tichenor, A. K. Ray-Chaudhuri, S. H. Lee, H. N. Chapman, W. C. Replogle, K. W. Berger, R. H. Stulen, G. D. Kubiak, L. E. Klebanoff, J. B. Wronosky, D. J. O'Connell, A. H. Leung, K. L. Jefferson, W. P. Ballard, L. C. Hale, K. Blaedel, J. S. Taylor, J. A. Folta, E. Spiller, R. Soufli, G. E. Sommargren, D. W. Sweeney, P. Naulleau, K. A. Goldberg, E. M. Gullikson, J. Bokor, D. T. Attwood, U. Mickan, R. Hanzen, E. Panning, P.-Y. Yan, J. E. Bjorkholm, and C. W. Gwyn, Proc. SPIE 4506, (2001).
  49. "Wave-front measurement errors from restricted concentric subdomains," K. A. Goldberg, K. Geary, Journal of the Optical Society of America A 18 (9), 2146-52 (2001). DOI 10.1364/JOSAA.18.002146
  50. "Tolerancing of diffraction-limited Kirkpatrick-Baez synchrotron beamline optics for extreme-ultraviolet metrology," P. P. Naulleau, K. A. Goldberg, P. J. Batson, S. Jeong, and J. H. Underwood, Applied Optics 40 (22), 3703-3709 (2001). DOI 10.1364/AO.40.003703
  51. "Extreme-ultraviolet lensless Fourier-transform holography," S. H. Lee, P. Naulleau, K. A. Goldberg, C. H. Cho, S. Jeong, J. Bokor, Applied Optics 40 (16), 2655-2661 (2001). DOI 10.1364/AO.40.002655
  52. "Fourier-transform and global contrast interferometer alignment methods," K. A. Goldberg, U.S. Patent No. 6,239,878, May 29, 2001
  53. "Interferometric at-wavelength flare characterization of EUV optical systems," P. Naulleau, K. A. Goldberg, U.S. Patent No. 6,233,056, May 15, 2001
  54. "Phase-shifting point diffraction interferometer grating designs," P. Naulleau, K. A. Goldberg, E. Tejnil, U.S. Patent No. 6,195,169, February 27, 2001
  55. "Adding static printing capabilities to the EUV phase-shifting point diffraction interferometer," P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, and J. Bokor , Proc. SPIE 4343, 639-45 (2001). DOI 10.1117/12.436633
  56. "Extremely fine-pitch printing with a 10x Schwarzschild optic at extreme ultraviolet wavelengths," M. Shumway, S. Lee, C. Cho, P. Naulleau, K. Goldberg, and J. Bokor , Proc. SPIE 4343, 357-62 (2001). DOI 10.1117/12.436690
  57. "System integration and performance of the EUV engineering test stand," D. A. Tichenor, A. K. Ray-Chaudhuri, W. Replogle, C. William, R. H. Stulen, G. D. Kubiak, P. D. Rockett, L. E. Klebanoff, K. J. Jefferson, A. Leung, J. B. Wronosky, L. C. Hale, H. N. Chapman, J. S. Taylor, J. A. Folta, C. Montcalm, R. Soufli, E. A. Spiller, K. L. Blaedel, G. E. Sommargren, D. W. Sweeney, P. Naulleau, K. A. Goldberg, E. M. Gullikson, J. Bokor, P. J. Batson, D. T. Attwood, K. H. Jackson, S. D. Hector,C. Gwyn, P. Yan , Proc. SPIE 4343, 19-37 (2001).
  58. "Static microfield printing at the Advanced Light Source with the ETS Set-2 optic," P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, D. O'Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, Third International Workshop on Extreme Ultraviolet Lithography, Matsue, Japan October 29-31, 2001
  59. "At-wavelength testing of the Set-2 ETS projection optic--a four-mirror ring filed aspheric optical system," K. Goldberg, P. Naulleau, P. Denham, P. Batson, S. Rekawa, B. Hoef, E. Anderson, H. Chapman, and J. Bokor, Third International Workshop on Extreme Ultraviolet Lithography, Matsue, Japan October 29-31, 2001
  60. "The prediction and measurement of flare for the ETS," E. Gullikson, K. Goldberg, P. Naulleau, J. Bjorkholm, H. Chapman, S. Baker, and J. Taylor, Third International Workshop on Extreme Ultraviolet Lithography, Matsue, Japan , (2001).
  61. "VNL Research in Interferometry for EUV Optics," K. A. Goldberg, P. Naulleau, J. Bokor, P. Denham, S. Rekawam, P. Batson, A. Liddle, B. Harteneck, K. Jackson, E. Anderson, D. Attwood, H. Chapman, A. Barty, G. Sommargren, D. Phillion, J. Taylor, D. Sweeney, Presented at the First International EUVL Symposium, Addison, Texas October 15-17, 2002
  62. "Lithographic characterization of the ETS Set-2 optic at the Advanced Light Source static microfield exposure station," P. Naulleau, K. A. Goldberg, E. H. Anderson, P. Batson, J. Bokor, P. Denham, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, S. Baker, H. Chapman, P. Mirkarimi, E. Spiller, C. Walton, D. O'Connell, P.-Y. Yan, and G. Zhang, Presented at the First International EUVL Symposium, Addison, Texas October 15-17, 2002
  63. "Calibration of EUV-2D Photoresist Simulation Parameters for Accurate Predictive Modeling," S. A. Robertson, P. P. Naulleau, D. J. O'Connell, K. R. McDonald, K. A. Goldberg, T. Delano, and R. L. Brainard, Presented at the First International EUVL Symposium, Addison, Texas October 15-17, 2002
  64. "Fourier transform interferometer alignment method," K. A. Goldberg, P. Naulleau, and J. Bokor, Applied Optics 41 (22), 4477-83 (2002). DOI 10.1364/AO.41.004477
  65. "Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic," P. Naulleau, K. A. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, D. O'Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan and G. Zhang, Journal of Vacuum Science and Technology B 20 (6), 2829-33 (2002). DOI 10.1116/1.1524976
  66. "Testing EUV Optics with Visible-Light and EUV Interferometry," K. Goldberg, P. Naulleau, J. Bokor and H. Chapman, Journal of Vacuum Science and Technology B 20 (6), 2834-39 (2002). DOI 10.1116/1.1523401
  67. "Honing the accuracy of extreme ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic," K. A. Goldberg, P. Naulleau, J. Bokor, and H. N. Chapman, Proc. SPIE 4688, 329-337 (2002).
  68. "Static microfield printing at the Advanced Light Source with the ETS Set-2 optic," P. Naulleau, K. A. Goldberg, E. H. Anderson, D. T. Attwood, Jr., P. J. Batson, J. Bokor, P. Denham, E. M. Gullikson, B. Hoef, K. H. Jackson, S. Rekawa, F. Salmassi, K. L. Blaedel, H. N. Chapman, L. C. Hale, R. Soufli, E. A. Spiller, D. W. Sweeney, J. R. Taylor, C. C. Walton, G. F. Cardinale, A. K. Ray-Chaudhuri, A. Fisher, D. J. O'Connell, R. H. Stulen, D. A. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, Proc. SPIE 4688 4688, 64-71 (2002).
  69. "Performance upgrades in the EUV Engineering Test Stand," D. A. Tichenor, W. C. Replogle, S. H. Lee, W. P. Ballard, G. D. Kubiak, L. E. Klebanoff, J. E. M. Goldsmith, J. B. Wronosky, L. C. Hale, H. N. Chapman, J. S. Taylor, K. A. Goldberg, P. Naulleau, Proc. SPIE 4688, 72-86 (2002). DOI 10.1117/12.472328
  70. "Lithographic Evaluation of the EUV Engineering Test Stand," S. H. Lee, D. A. Tichenor, W. P. Ballard, L. J. Bernardez II, J. E. M. Goldsmith, S. J. Hanley, K. L. Jefferson, T. A. Johnson, A. H. Leung, D. J. O'Connell, W. C. Replogle, J. B. Wronosky, K. Blaedel, P. Naulleau, K. A. Goldberg, E. M. Gullikson, H. N. Chapman, S. Wurm, E. Panning, P.-Y. Yan, G. Zhang, J. E. Bjorkholm, G. D. Kubiak, D. W. Sweeney, D. Attwood, and C. W. Gwyn, Proc. SPIE 4688, 266-276 (2002). DOI 10.1117/12.472300
  71. "Graphical user interface for image acquisition and processing," K. A. Goldberg, U.S. Patent No. 6,341,183, January 22, 2002
  72. "Direct measurement of index of refraction in the extreme-ultraviolet wavelength region with a novel interferometer," C. Chang, E. Anderson, P. Naulleau, E. Gullikson, K. Goldberg, D. Attwood , Optics Letters 27 (12), 1028-1030 (2002). DOI 10.1364/OL.27.001028
  73. "VNL Research in Interferometry for EUV Optics," K. A. Goldberg, P. Naulleau, J. Bokor, P. Denham, S. Rekawam, P. Batson, A. Liddle, B. Harteneck, K. Jackson, E. Anderson, D. Attwood, H. Chapman, A. Barty, G. Sommargren, D. Phillion, J. Taylor, D. Sweeney, First International EUVL Symposium, Addison, Texas October 15-17, 2002
  74. "Soft X-Ray Microscopy and EUV Lithography: An Update on Imaging at 20-40 nm Spatial Resolution," D. Attwood, E. Anderson, G. Denbeaux, K. Goldberg, P. Naulleau, G Schneider, AIP Conference Proceedings 641 183, 461-68 (2002). DOI 10.1063/1.1521061
  75. "EUV Interferometry of the 0.3 NA MET Optic," K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, E. H. Anderson, J. A. Liddle, J. Bokor, Proc. SPIE 5037, 69-74 (2003).
  76. "Static EUV microexposures using the ETS set-2 optics," P. P. Naulleau, K. A. Goldberg, E. H. Anderson, J. Bokor, B. D. Harteneck, K. H. Jackson, D. L. Olynick, F. Salmassi, S. L. Baker, P. B. Mirkarimi, E. A. Spiller, C. C. Walton, D. J. O'Connell, P. Yan, G. Zhang, Proc. SPIE 5037, 36-46 (2003). DOI 10.1117/12.490129
  77. "Calibration of EUV-2D photoresist simulation parameters for accurate predictive modeling," S. A. Robertson, P. P. Naulleau, K. A. Goldberg, D. J. OConnell, K. McDonald, S. G. Hansen, T. M. Delano, K. W. Brown, R. L. Brainard, Proc. SPIE 5037, 900-9 (2003).
  78. "Resist evaluation at 50 nm in the EUV using interferometric spatial frequency doubled imaging," M. D. Shumway, P. P. Naulleau, K. A. Goldberg, E. L. Snow, J. Bokor, Proc. SPIE 5037, 910-16 (2003). DOI 10.1117/12.484677
  79. "Hybrid shearing and phase-shifting point diffraction interferometer," K. A. Goldberg and P. P. Naulleau, U.S. Patent No. 6,573,997, June 3, 2003
  80. "System and process learning in a full-field high-power EUVL alpha tool," W. P. Ballard, D. A. Tichenor, D. J. O'Connell, L. J. Bernardez II, R. E. Lafton, R. J. Anderson, A. H. Leung, K. Williams, S. J. Hanley, Y. Perras, K. L. Jefferson, T. L. Porter, D. Knight, P. K. Barr, J. L. Van de Vreugde, R. H. Campiotti, M. D. Zimmerman, T. A. Johnson, L. E. Klebanoff, P. A. Grunow, S. Graham Jr, D. A. Buchenauer, W. C. Replogle, T. G. Smith, J. B. Wronosky, J. R. Darnold, K. L. Blaedel, H. N. Chapman, J. S. Taylor, L. C. Hale, G. E. Sommargren, E. M. Gullikson, P. Naulleau, K. A. Goldberg, S. H. Lee, H. Shields, R. J. St. Pierre, S. Ponti, Proc. SPIE 5037, 47-57 (2003).
  81. "Effects of radiation induced carbon contamination on the performance of an EUV lithographic optic," A. Barty and K. A. Goldberg, Proc. SPIE 5037, 450-59 (2003).
  82. "Lithographic characterization of the printability of programmed EUV substrate defects," P. Naulleau, K. Goldberg, E. Anderson, J. Bokor, E. Gullikson, B. Harteneck, K. Jackson, D. Olynick, F. Salmassi, S. Baker, P. Mirkarimi, E. Spiller, C. Walton, and G. Zhang, Journal of Vacuum Science and Technology B 21 (4), 1286-90 (2003). DOI 10.1116/1.1580839
  83. "Fourier-synthesis custom-coherence illuminator for EUV microfield lithography," P. Naulleau, K. Goldberg, P. Batson, J. Bokor, P. Denham, and S. Rekawa, Applied Optics 42 (5), 820-26 (2003). DOI 10.1364/AO.42.000820
  84. "XUV Hartmann wavefront sensor ," M. Idir, P. Mercère, P. Zeitoun, D. Douillet, X. Levecq, G. Dovillaire, S. Bucourt, K. A. Goldberg, P. P. Naulleau, and S. Rekawa, Eighth Internation Conference on Synchrotron Radiation Instrumentation, August 25-29, 2003, San Francisco, CA , (2003).
  85. "Hartmann wave-front measurement at 13.4 nm with lambdaEUV/120 accuracy," P. Mercère, P. Zeitoun, M. Idir, S. Le Pape, D. Douillet, X. Levecq, G. Dovillaire, S. Bucourt, K. A. Goldberg, P. P. Naulleau, and S. Rekawa, Optics Letters 28 (17), 1534-36 (2003). DOI 10.1364/OL.28.001534
  86. "The effects of radiation induced carbon contamination on the performance of an EUV lithographic optic," A. Barty and K. A. Goldberg, Proc. SPIE 5037, 510-19 (2003). DOI 10.1117/12.499372
  87. "Printing-based performance analysis of the engineering test stand set-2 optic using a synchrotron exposure station with variable sigma," P. Naulleau, K. A. Goldberg, E. H. Anderson, J. Bokor, B. Harteneck, K. Jackson, D. Olynick, F. Salmassi, S. Baker, P. Mirkarimi, E. Spiller, C. Walton, D. O'Connell, P.-Y. Yan, G. Zhang, Journal of Vacuum Science and Technology B 21 (6), 2697-2700 (2003). DOI 10.1116/1.1621669
  88. "Preparations for extreme ultraviolet interferometry of the 0.3 numerical aperture Micro Exposure Tool optic," K. A. Goldberg, P. P. Naulleau, P. E. Denham, S. B. Rekawa, K. H. Jackson, J. A. Liddle, B. Harteneck, E. Gullikson, and E. H. Anderson, Journal of Vacuum Science and Technology B 21 (6), 2706-10 (2003). DOI 10.1116/1.1627809
  89. "New techniques for the measurement of x-ray beam or x-ray optics quality," P. Zeitoun, P. Balcou, S. Bucourt, D. Benredjem, F. Delmotte, G. Dovillaire, D. Douillet, J. Dunn, G. Faivre, M. Fajardo, K. A. Goldberg, M. Idir, S. Hubert, J. Hunter, S. Jacquemot, S. Kazamias, S. le Pape, X. Levecq, C. L. S. Lewis, R. Marmoret, P. Mercère, A. S. Morlens, P. P. Naulleau, C. Remond, J. J. Rocca, S. Sebban, R. F. Smith, M.-F. Ravet, P. Troussel, C. Valentin, and L. Vanbostal, Proc. SPIE 5197, 194-204 (2003).
  90. "High resolution EUV microexposures at the ALS," P. P. Naulleau, K. A. Goldberg, E. Anderson, J. P. Cain, P. Denham, K. Jackson, A.-S. Morlens, S. Rekawa, F. Salmassi, and R. L. Brainard, 3rd International EUVL Symposium, Miyazaki, Japan, November 2-4, 2004
  91. "At-wavelength interferometry of the 0.3 NA MET Optic: measurements, alignment, preparations for imaging," K. A. Goldberg, P. Naulleau, et al., , Third Annual SEMATECH International EUVL Symposium, Antwerp, Belgium November, 2003
  92. "At-wavelength interferometry of high-NA diffraction-limited EUV optics," K. A. Goldberg, P. Naulleau, S. Rekawa, P. Denham, J. A. Liddle, E. Anderson, K. Jackson, J. Bokor, D. Attwood, AIP Conf. Proc. 705 1, 855-860 (2004).
  93. "A synchrotron-based Fourier-synthesis custom-coherence illuminator ," P. Naulleau, K. A. Goldberg, P. Batson, P. Denham, and S. Rekawa, AIP Conf. Proc. 705 1, 792-95 (2004). DOI 10.1063/1.1757915
  94. "EUV interferometric testing and alignment of the 0.3 NA MET optic," K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, J. A. Liddle, E. H. Anderson, Proc. SPIE 5374, 64-73 (2004). DOI 10.1117/12.546199
  95. "EUV resist imaging below 50 nm using coherent spatial filtering techniques," M. D. Shumway, E. L. Snow, K. A. Goldberg, P. Naulleau, H. Cao, M. Chandhok, J. A. Liddle, E. H. Anderson, J. Bokor, Proc. SPIE 5374, 454-59 (2004). DOI 10.1117/12.535666
  96. "Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic," P. Naulleau, K. A. Goldberg, E. H. Anderson, K. Bradley, R. Delano, P. Denham, R. Gunion, B. Harteneck, B. Hoef, H. Huang, K. Jackson, M. G. Jones, D. Kemp, J. A. Liddle, R. Oort, A. Rawlins, S. Rekawa, F. Salmassi, R. Tackaberry, C. Chung, L. Hale, D. Phillion, G. Sommargren, H. Taylor, Proc. SPIE 5374, 881-891 (2004).
  97. "Dual-Domain Lateral Shearing Interferometer," P. P. Naulleau, K. A. Goldberg, U.S. Patent No. 6,707,560, March 16, 2004
  98. "Extreme Ultraviolet Microexposures at the ALS using the 0.3-NA MET Optic," P. Naulleau, K. A. Goldberg, J. P. Cain, E. Anderson, P. Denham, K. Jackson, S. Rekawa, F. Salmassi, G. Zhang, Journal of Vacuum Science and Technology B 22 (6), 2962-65 (2004). DOI 10.1116/1.1802851
  99. "At-Wavelength Alignment and Testing of the 0.3 NA MET Optic," K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, E. H. Anderson and J.A. Liddle, Journal of Vacuum Science and Technology B 22 (6), 2956-61 (2004). DOI 10.1116/1.1815303
  100. "X ray Wavefront Hartmann Sensor," P. Mercère, M. Idir, P. Zeitoun, X. Levecq, G. Dovillaire, S. Bucourt, D. Douillet, K. A. Goldberg, P. P. Naulleau, and S. Rekawa , AIP Conf. Proc. 705 1, 819-822 (2004).
  101. "EUV system optimization and advanced lithography research at Lawrence Berkeley National Laboratory," K. A. Goldberg, P. P. Naulleau, P. E. Denham, S. B. Rekawa, K. H. Jackson, E. H. Anderson, J. A. Liddle, MNC 2004, Osaka, Japan October 26-29, 2004
  102. "At-wavelength Alignment and Testing of the 0.3 NA MET Optic," K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, E. H. Anderson, J. A. Liddle, 3rd International EUVL Symposium, Miyazaki, Japan November 2-4, 2004
  103. "EUV Focus Sensor: Design and Modeling," K. A. Goldberg, M. E. Teyssier, J. A. Liddle, Proc. SPIE 5751, 312-19 (2005). DOI 10.1117/12.601522
  104. "EUV microexposures at the ALS using the 0.3-NA MET projection optics," P. Naulleau, K. A. Goldberg, E. H. Anderson, J. P. Cain, P. Denham, B. Hoef, K. Jackson, A.-S. Morlens, S. Rekawa, K. Dean, Proc. SPIE 5751, 56-63 (2005).
  105. "EUV Focus Sensor Design Optimization," K. A. Goldberg, M.E. Teyssier, J.A. Liddle, Journal of Vacuum Science and Technology B 23 (6), 2885-90 (2005). DOI 10.1116/1.2134719
  106. "Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source," P. Naulleau, K. A. Goldberg, J. P. Cain, E. Anderson, P. Denham, K. Jackson, B. Hoef, S. Baker, E. Spiller, K. Dean, Journal of Vacuum Science and Technology B 23 (6), 2840-2843 (2005). DOI 10.1116/1.2127940
  107. "Measuring line roughness through aerial image contrast variation using coherent extreme ultraviolet spatial filtering techniques," M.D. Shumway, P. Naulleau, K.A. Goldberg, and J. Bokor, Journal of Vacuum Science and Technology B 23 (6), 2844-2847 (2005). DOI 10.1116/1.2134717
  108. "Ultra-high-accuracy optical testing: creating diffraction-limited short-wavelength optical systems," K. A. Goldberg, P. Naulleau, S. Rekawa, P. Denham, J. A. Liddle, E. M. Gullikson, K. Jackson, E. Anderson, J. Taylor, G. Sommargren, H. Chapman, D. Phillion, M. Johnson, A. Barty, R. Soufli, E. Spiller, C. C. Walton, S. Bajt, Proc. SPIE 5900, 114-23 (2005).
  109. "Actinic inspection of multilayer coated EUV masks at the ALS," A. Barty, Y. Liu, K. A. Goldberg, E. M. Gullikson, J. S. Taylor, and O. R. Wood II, 2005 International Symposium on Extreme Ultraviolet Lithography, San Diego, CA November 7-9, 2005
  110. "Extreme Ultraviolet Phase Contrast Imaging of Mask Defects," G. Denbeaux, E. Garg, A. Barty, Y. Liu, K. Goldberg, O. Wood, 2005 International Symposium on Extreme Ultraviolet Lithography, San Diego, CA November 7-9
  111. "Lithographic characterization of low-order aberrations in the Berkeley MET tool," P. P. Naulleau, J. P. Cain, K. Dean, and K. A. Goldberg, 2005 International Symposium on Extreme Ultraviolet Lithography, San Diego, CA November 7-9
  112. "Investigation of the current resolution limits of advanced EUV resists," P. P. Naulleau, J. P. Cain, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, B. La Fontaine, A R. Pawloski, C. Larson, and G. Wallraff, 2005 International Symposium on Extreme Ultraviolet Lithography, San Diego, CA November 7-9
  113. "Lithographic characterization of the field dependent astigmatism and alignment stability of a 0.3 numerical aperture extreme ultraviolet microfield optic ," P. P. Naulleau, J. P. Cain, K. A. Goldberg, Journal of Vacuum Science and Technology B 23 (5), 2003-6 (2005). DOI 10.1116/1.2037647
  114. "Method and Apparatus for Inspecting an EUV Mask Blank," K. A. Goldberg, U.S. Patent No. 6,963,395, November 8, 2005
  115. "Lithographic characterization of the spherical error in an EUV optic using a programmable pupil fill illuminator," P. P. Naulleau, J. P. Cain, K. A. Goldberg, Applied Optics 45 (9), 1957-1963 (2005). DOI 10.1364/AO.45.001957
  116. "Extreme Ultraviolet Lithography Capabilities at the Advanced Light Source Using a 0.3-NA Optic," P. P. Naulleau, K. A. Goldberg, J. P. Cain, E. H. Anderson, K. R. Dean, P. Denham, B. Hoef, K. H. Jackson, IEEE Journal of Quantum Electronics 42 (104), 44-50 (2005). DOI 10.1109/JQE.2005.858450
  117. "X-ray beam metrology and x-ray optic alignment by Hartmann wavefront sensing," P. Mercère, S. Bucourt, G.Cauchon, D. Douillet, G. Dovillaire, K. A. Goldberg, M. Idir, X. Levecq, T. Moreno, P. P. Naulleau, S. Rekawa, P. Zeitoun, Proc. SPIE 5921, 63-72 (2005).
  118. "Performance of EUV photoresists on the ALS micro exposure tool," T. Koehler, R. L. Brainard, P. P. Naulleau, D. Van Steenwinckel, J. H. Lammers, K. A. Goldberg, J. F. Mackevich, P. Trefonas, SPIE 5753, 754-64 (2005).
  119. "Testing EUV optics with EUV light: If you can measure it, you can make it," Kenneth Goldberg, SPIE Newsroom: Optical Design & Engineering , (2006).
  120. "Diffractive optical element for extreme ultraviolet wavefront control," K. A. Goldberg, P. P. Naulleau, U.S. Patent No. 7,027,226, April 11, 2006
  121. "Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists," P. P. Naulleau, C. Rammeloo, J. P. Cain, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, B. La Fontaine, A. R. Pawloski, C. Larson, G. Wallraff, Proc. SPIE 6151, 289-296 (2006).
  122. "Lithographic characterization of low-order aberrations in a 0.3-NA EUV microfield exposure tool," P. Naulleau, J. Cain, K. Dean, K. A. Goldberg, Proc. SPIE 6151, 822-828 (2006).
  123. "Actinic Inspection of EUV Programmed Multilayer Defects and Cross-Comparison Measurements," K. A. Goldberg, A. Barty, Y. Liu, P. Kearney, Y. Tezuka, T. Terasawa, J. S. Taylor, H.-S. Han, and O. R. Wood II , Journal of Vacuum Science and Technology B 24 (6), 2824-28 (2006). DOI 10.1116/1.2375085
  124. "Comparison of actinic and non-actinic inspection of programmed defect masks," K. A. Goldberg, A. Barty, H. Han., S. Wurm, P. Kearney, P. Seidel, O. R. Wood II, B. LaFontaine, T. Liang, C. Holfeld, R. Fettig, Y. Tezuka, T. Terasawa, EUVL Symposium 2006 October 18, 2006
  125. "Multilayer defects nucleated by substrate pits: a comparison of actinic inspection and non-actinic inspection techniques," A. Barty, K. A. Goldberg, P. Kearney, S. B. Rekawa, B. LaFontaine, O. Wood II, J. S. Taylor and H.-S. Han, SPIE 6349, 63492M (2006). DOI 10.1117/12.686742
  126. "Advanced 0.3-NA EUV lithography capabilities at the ALS," P. Naulleau, E. Anderson, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, Keith Jackson, NGL 2005, Tokyo, Japan , (2006).
  127. "EUV and non-EUV inspection of reticle defect repair sites," K. A. Goldberg, A. Barty, P. Seidel, K. Edinger, R. Fettig, P. Kearney, H. Han, O. R. Wood II , Proc. SPIE 6517, 65170C-1-7 (2007). DOI 10.1117/12.712202
  128. "EUV MET printing and actinic imaging analysis on the effects of phase defects on wafer CDs," H. Han, K. A. Goldberg, A. Barty, E. M. Gullikson, Y. Ikuta, T. Uno, O. R. Wood II, and S. Wurm, Proc. SPIE 6517, 65170B-1-10 (2007). DOI 10.1117/12.711166
  129. "Recent results from the Berkeley 0.3-NA EUV microfield exposure tool," P. P. Naulleau, C. N. Anderson, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, B. LaFontaine, and T. Wallow, SPIE 6517, 65170V-1-8 (2007). DOI 10.1117/12.713440
  130. "Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool," P. Naulleau, C. Anderson, K. Dean, P. Denham, K. Goldberg, B. Hoef, D. Niakoula, B. La Fontaine, T. Wallow, Journal of Vacuum Science and Technology B 25 (6), 2132-5 (2007). DOI 10.1116/1.2781522
  131. "Performance of actinic EUVL mask imaging using a zoneplate microscope ," K. A. Goldberg, P. P. Naulleau, A. Barty, S. B. Rekawa, C. D. Kemp, R. F. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, H.-S. Han, Proc. SPIE Photomask (BACUS) 6730 67305E, 67305E-1-12 (2007). DOI 10.1117/12.746756
  132. "Detectability and printability of EUVL-mask blank defects for the 32-nm HP node ," W. Cho, H.-S. Han, K. A. Goldberg, P. A. Kearney, C.-U. Jeon , Proc. SPIE Photomask (BACUS) 6730 673013, 673013-1-9 (2007). DOI 10.1117/12.746698
  133. "Benchmarking Mask Imaging with the Actinic Imaging Tool," K. A. Goldberg, P. Naulleau, A. Barty, S. Rekawa, C. D. Kemp, R. Gunion, F. Salmassi, E. Gullikson, E. Anderson, H.-S. Han, EUVL Symposium 2007, Sapporo, Japan October 29, 2007
  134. "Actinic microscope for EUV masks using a stand-along source for imaging and contamination studies of EUV masks," G. Denbeaux, Y.-J. Fan, A. Antohe, L. Yankulin, R. Garg, O. Wood, F. Goodwin, C.-S. Koay, E. Gullikson, K. Goldberg, E. Anderson, W. Chao, EUVL Symposium 2007, Sapporo, Japan October 31, 2007
  135. "Evaluation of EUV Mask Repair Methods in Si-capping & Ru-capping Blanks," G.-S. Yoon, H. Kim, H.-J. Oh, H.-S. Kim, H.-S. Sim, S.-H. Lee, G.-B. Kim, S.-M. Huh, K. A. Goldberg, A. Barty, S.-S. Kim, H.-K. Cho, EUVL Symposium 2007, Sapporo, Japan October 31, 2007
  136. "Determining the critical size of EUV-mask substrate defects," H.-S. Han, W. Cho, K. A. Goldberg, E. M. Gullikson, C.-U. Jeon, S. Wurm, Proc. SPIE 6921, 69211Y (2008). DOI 10.1117/12.772590
  137. "Advanced extreme-ultraviolet resist testing using the SEMATECH Berkeley 0.3-NA microfield exposure tool," P. P. Naulleau, C. N. Anderson, J. Chiu, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, S. Huh, G. Jones, B. LaFontaine, A. Ma, D. Niakoula, J. Park, T. Wallow, Proc. SPIE 6921, 69213N (2008). DOI 10.1117/12.773833
  138. "EUV mask reflectivity measurements with micron-scale spatial resolution," K. A. Goldberg, S. B. Rekawa, C. D. Kemp, A. Barty, E. H. Anderson, P. Kearney, H. Han, Proc. SPIE 6921, 69213U (2008). DOI 10.1117/12.772971
  139. "Evaluating EUV-mask pattern imaging with two EUV microscopes," K. A. Goldberg, K. Takase, P. Naulleau, H.-S. Han, A. Barty, H. Kinoshita, K. Hamamoto, Proc. SPIE
  140. "Advanced X-ray Optics Metrology for Nanofocusing and Coherence Preservation," Kenneth A. Goldberg and Valeriy Yashchuk, Synchrotron Radiation News 21 (2), 11-12 (2008).
  141. "A Survey of EUV At-Wavelength Optical Testing," K. A. Goldberg, 2008 International Workshop on EUV Lithography , (2008).
  142. "EUV mask inspection: a bright idea?," K. A. Goldberg, 2008 International Workshop on EUV Lithography , (2008).
  143. "Benchmarking EUV mask inspection beyond 0.25 NA," K. A. Goldberg, I. Mochi, P. P. Naulleau, H.-S. Han, S. Huh, SPIE Photomask (BACUS) 7122, 71222E-1 (2008). DOI 10.1117/12.801529
  144. "Actinic extreme ultraviolet mask inspection beyond 0.25 numerical aperture," K. A. Goldberg, P. Naulleau, I. Mochi, E. H. Anderson, S. B. Rekawa, C. D. Kemp, and R. F. Gunion, H.-S. Han, S. Huh , Journal of Vacuum Science and Technology B 26 (6), 2220-4 (2008). DOI 10.1116/1.3002490
  145. "Aerial Image Linewidth Measurement Capabilities of the Actinic Inspection Tool," K. A. Goldberg, I. Mochi, P. Naulleau, B. LaFontaine, S. Huh, EUVL Symposium 2008 September 2008
  146. "Achieving Diffraction-limited EUV Aerial Image Microscopy," I. Mochi, K. A. Goldberg, P. Naulleau, S. Huh, EUVL Symposium 2008 September 2008
  147. "Mask Effects on LER," P. Naulleau, K. Goldberg, I. Mochi, G. Zhang, EUVL Symposium 2008 September 2008
  148. "The SEMATECH Berkeley MET: Learning at the 22 nm Node," P. Naulleau, C. Anderson, J. Chiu, P. Denham, S. George, K. Goldberg, B. Hoef, G. Jones, C. Koh, B. La Fontaine, A. Ma, W. Montgomery, J. Park, T. Wallow, S. Wurm, EUVL Symposium 2008 September 2008
  149. "EUV Reticle Contamination and Cleaning," U. Okoroanyanwu, B. LaFontaine, O. Wood, G. Antesberger, C. Holfeld, J. Hendrik Peters, E. Langer, M. Bender, M. Rossiger, S. Trogisch, F. Goodwin, G. Denbeaux, Y. Fan, A. Antohe, L. Yankulin, R. Garg, K. Goldberg, EUVL Symposium 2008 September 2008
  150. "Characterization of EUV Mask Defects: Printability and Repair Process," H. Han, H. Seo, K. Goldberg, H. Kim, B. Ahn, I. Kang, W. Cho, S. Lee, G. Kim, D. Kim, S. Kim, H. Cho, EUVL Symposium 2008 September 2008
  151. "EUV Actinic Defect Inspection and Imaging For the Sub-32 nm Half-pitch," S. Huh, S. Wurm, H. Han, K. Goldberg, I. Mochi, EUVL Symposium 2008 September 2008
  152. "High Resolution 13.2 nm Reflection Microscopy on a Table Top," J. Rocca, F. Brizuela, Y. Wang, C. Brewer, F. Pedaci, B. Luther, W. Chao, Y. Liu, K. Goldberg, P. Naulleau, M. Marconi, E. Anderson, D. Attwood, C. Menoni, EUVL Symposium 2008 September 2008
  153. "EUV Optical Testing," Kenneth A. Goldberg, "EUV Lithography," Ed. Vivek Bakshi, SPIE Press (2008).
  154. "Lateral shearing interferometry for EUV optical testing," Ryan Miyakawa, Patrick P. Naulleau, and Kenneth Goldberg, EUVL Symposium 2008 September 29, 2008
  155. "Comparison of fast 3D simulation and actinic inspection for EUV masks with buried defects," C. H. Clifford, S. Wiraatmadja, T. T. Chan, A. R. Neureuther, K. A. Goldberg, I. Mochi, T. Liang, SPIE 7271 72711F, (2009). DOI 10.1116/1.3244624
  156. "Collecting EUV mask images through focus by wavelength tuning," K. A. Goldberg, I. Mochi, S. Huh , SPIE 7271 72713N, 72713N-1-8 (2009). DOI 10.1117/12.824433
  157. "Improving the performance of the Actinic Inspection Tool with an optimized alignment procedure," I. Mochi, K. A. Goldberg, P. Naulleau, S. Huh, SPIE 7271 727123, 727123-1-9 (2009). DOI 10.1117/12.814261
  158. "Inspection 13.2 nm table-top full-field microscope," F. Brizuela, Y. Wang, C. A. Brewer, F. Pedaci, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, P. Naulleau, P. Wachulak, M. C. Marconi, D. T. Attwood, J. J. Rocca, and C. S. Menoni, SPIE 7271 72713F-1, 72713F-1-7 (2009). DOI 10.1117/12.814320
  159. "Analysis of systematic errors in lateral shearing interferometry for EUV optical testing," R. Miyakawa, P. Naulleau, K. Goldberg, SPIE 7272 72721V, (2009). DOI 10.1117/12.812340
  160. "Mask Defect Verification Using Actinic Inspection and Defect Mitigation Technology," S. Huh, P. Kearney, S. Wurm, F. Goodwin, K. Goldberg, I. Mochi, E. Gullikson, SPIE 7271 72713J, 72713J-1-9 (2009). DOI 10.1117/12.814249
  161. "Carbon Contamination of Extreme Ultraviolet (EUV) Masks and its Effect on Imaging," Y.-J. Fan, L. Yankulin, A. Antohe, R. Garg, P. Thomas, C. Mbanaso, A. Wuest, F. Goodwin, S. Huh, P. Naulleau, K. Goldberg, I. Mochi, G. Denbeaux , SPIE 7271, 72713U (2009). DOI 10.1117/12.814196
  162. "The SEMATECH Berkeley microfield exposure tool: learning at the 22-nm node and beyond," P. P. Naulleau, C. N. Anderson, L.-M. Baclea-an, P. Denham, S. Geroge, K. A. Goldberg, M. Goldstein, B. Hoef, R. Hudyma, G. Jones, C. Koh, B. La Fontaine, B. McClinton, R. Miyakawa, W. Montgomery, J. Roller, T. Wallow, and S. Wurm, SPIE 7271 72710W, 72710W-1-11 (2009). DOI 10.1117/12.814232
  163. "Using aberration test patterns to optimize the performance of EUV aerial imaging microscopes," I.
 Mochi,
 K. 
A. 
Goldberg,
 H. 
Han,
 P.
 Naulleau, 
R. 
Myakawa, 
E.
 H. Anderson, 
J. 
Macdougall, J. Vac. Sci. & Technol. B
  164. "EUV pattern defect detection sensitivity based on aerial image linewidth measurements," K. A. Goldberg, I. Mochi, P. Naulleau, T. Liang, P.-Y. Yang, S. Huh, Journal of Vacuum Science and Technology B 27 (6), 2916-21 (2009). DOI 10.1116/1.3244624
  165. "Thorough characterization of a EUV mask," H. Mizuno, G. McIntyre, C.-S. Koay, M. Burkhardt, L. He, J. Hartley, C. Johnson, S. Raghunathan, K. Goldberg, I. Mochi, B. La Fontaine, and O. Wood, Proc. SPIE 7379, 73790J (2009). DOI 10.1117/12.824260
  166. "EUV Actinic Defect Inspection and Defect Printability at the Sub-32 nm Half-pitch," S. Huh, P. Kearney, S. Wurm, F. Goodwin, H. Han, K. Goldberg, Iacopo Mochi, Eric Gullikson, SPIE 7470, 74700Y (2009). DOI 10.1117/12.835196
  167. "Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination," F. Brizuela, Y. Wang, C. A. Brewer, F. Pedaci, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, P. Naulleau, P. Wachulak, M. C. Marconi, D. T. Attwood, J. J. Rocca, and C. S. Menoni, Optics Letters 34 (3), 271-3 (2009). DOI 10.1364/OL.34.000271
  168. "Effects of multilayer depositions on the EUV printability and DUV inspectability of substrate pit defects," H.-S. Seo, B.-S. Ahn, I.-Y. Kang, D. G. Lee, S. Huh, B. Cha, D Kim, S.-S. Kim, H. K. Cho, and K. A. Goldberg, 2009 EUVL Symposium, Prague, Czech Republic October 2009
  169. "Comparison of fast three-dimensional simulation and actinic inspection for extreme ultraviolet masks with buried defects and absorber features," C. H. Clifford, S. Wiraatmadja, T. T. Chan, A. R. Neureuther, K. A. Goldberg, I. Mochi, T. Liang, Journal of Vacuum Science and Technology B 27 (6), 2888-93 (2009). DOI 10.1116/1.3244624
  170. "Pushing extreme ultraviolet lithography development beyond 22 nm half pitch," P. P. Naulleau, C. N. Anderson, L.-M. Baclea-an, P. Denham, S. George, K. A. Goldberg, M. Goldstein, B. Hoef, G. Jones, C. Koh, B. La Fontaine, W. Montgomery, T. Wallow, Journal of Vacuum Science and Technology B 27 (6), 2911-15 (2009). DOI 10.1116/1.3237092
  171. "Impact of carbon contamination on EUV masks," Y.-J. Fan, L. Yankulin, G. P. Denbeaux, A. F. Wüest, F. Goodwin, S. Huh, P. P. Naulleau, K. A. Goldberg, SPIE Photomask (BACUS) September 17
  172. "At-wavelength and optical metrology of bendable x-ray optics for nanofocusing at the ALS," S. Yuan, R. Celestre, W. R. McKinney, G. Morrison, H. A. Padmore, S. B. Rekawa, I. Mochi, T. Warwick, K. Goldberg, V. V. Yashchuk, Frontiers in Optics (FiO), OSA Annual Meeting 2009 FThT2, (2009).
  173. "Surface slope metrology and interferometric wave front measurements on deformable soft x-ray mirrors performed in the laboratory and in-situ at-wavelength," S. Yuan, M. Church , R. Celestre, G. Morrison, W. McKinney, T. Warwick, K. Goldberg, V. Yashchuk, AIP Conference Proceedings 1234, The Tenth International Conference on Synchrotron Radiation Instrumentation, Melbourne, Australia , (2009).
  174. "Surface Slope Metrology on Deformable Soft X-ray Mirrors," S. Yuan, M. Church , R. Celestre, G. Morrison, W. McKinney, T. Warwick, K. Goldberg, V. Yashchuk, The Tenth International Conference on Synchrotron Radiation Instrumentation, Australia , (2009).
  175. "Progress in actinic mask imaging: the closest look at lines, defects in phase roughness," K. A. Goldberg, I. Mochi, P. Naulleau, S. George, S. Huh, 2009 International Symposium on Extreme Ultraviolet Lithography October 2009
  176. "Actinic imaging of known native defects on a full-field mask," I. Mochi, K. A. Goldberg, B. LaFontaine, O. Wood II, 2009 International Symposium on Extreme Ultraviolet Lithography October 2009
  177. "Effects of Multilayer Depositions on the EUV Printability and DUV Inspectability of Substrate Pit Defects," H. Seo, B. Ahn, I. Kang, D. Lee, D. Kim, S. Kim, H. Cho, S. Huh, B. Cha, K. Goldberg, 2009 International Symposium on Extreme Ultraviolet Lithography October 2009
  178. "Using the 0.3-NA SEMATECH Berkeley MET for Sub-22 nm Half Pitch Development," P. Naulleau, C. Anderson, L. Baclea-an, P. Denham, S. George, K. Goldberg, B. Hoef, G. Jones, C. Koh, B. La Fontaine, W. Montgomery, T. Wallow, 2009 International Symposium on Extreme Ultraviolet Lithography, Prague October 2009
  179. "The Study on the Native Real Defect on EUV Mask Blank Using DUV Blank Inspection Tool and SEMATECH AIT," S. Huh, P. Kearney, A. Rastegar, F. Goodwin, S. Wurm, K. Goldberg, I. Mochi, T. Nakajima , M. Kishimoto, M. Komakine, 2009 International Symposium on Extreme Ultraviolet Lithography, Prague October 2009
  180. "Investigation of buried EUV mask defect printability using actinic inspection and fast simulation," C. H. Clifford, T. T. Chan, A. R. Neureuther, K. A. Goldberg I. Mochi, T. Liang, SPIE 7488 74882H, (2009). DOI 10.1117/12.829716
  181. "Advances in full field microscopy with table-top soft x-ray lasers," C. S. Menoni, F. Brizuela, Y. Wang, C. A. Brewer, B. M. Luther, F. Pedaci, P. W. Wachulak, M. C. Marconi, J. J. Rocca, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, D. T. Attwood, A. V. Vinogradov, I. A. Artyukov, Y. P. Pershyn, V. Kondratenko, SPIE 7451 74510I, (2009). DOI 10.1117/12.826419
  182. "13.2 nm Table-Top Inspection Microscope for Extreme Ultraviolet Lithography Mask Defect Characterization," F. Brizuela, Y. Wang, C. Brewer, F. Pedaci, W. Chao, E. Anderson, Y. Liu, K. Goldberg, P. Naulleau, P. Wachulak, M. Marconi, D. Attwood, J. Rocca, and C. Menoni, CLEO/IQEC JFA5, (2009).
  183. "Carbon Contamination Topography Analysis of EUV Masks," Y-J Fan, L. Yankulin, P. Thomas, C. Mbanaso, A. Antohe, R. Garg, Y. Wang, T. Murray, A. Wüest, F. Goodwin, S. Huh, A. Cordes, P. Naulleau, K. Goldberg, I. Mochi, E. Gullikson, Gregory Denbeaux, SPIE 7636, 76360G-1-8 (2010). DOI 10.1117/12.846996
  184. "A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection," S. Huh, L. Ren, D. Chan, S. Wurm, K. Goldberg, I. Mochi, T. Nakajima, M. Kishimoto, B. Ahn, I. Kang, J. Park, K. Cho, S.-I. Han, T. Laursen, SPIE 7636, 76360K-1-7 (2010). DOI 10.1117/12.846922
  185. "The SEMATECH Berkeley MET pushing EUV development beyond 22-nm half pitch," P. Naulleau, C. N. Anderson, L.-M. Baclea-an, D. Chan, P. Denham, S. George, K. A. Goldberg, B. H. Hoef, G. Jones, C.-W. Koh, B. M. La Fontaine, B. McClinton, R. Miyakawa, M. W. Montgomery, S. Rekawa, T. I. Wallow, SPIE 7636, 76361J-1-9 (2010). DOI 10.1117/12.848438
  186. "Iterative procedure for in-situ optical testing with an incoherent source," R. H. Miyakawa, P. P. Naulleau, Avideh Zakhor, K. A. Goldberg, SPIE 7637, 76361K-1-7 (2010). DOI 10.1117/12.846235
  187. "Improved performance of a table-top actinic full-field microscope with EUV laser illumination," F. Brizuela, S. Carbajo, A. E. Sakdinawat, Y. Wang, D. Alessi, B. M. Luther, W. Chao, Y. Liu, K. A. Goldberg, P. P. Naulleau, E. H. Anderson, D. T. Attwood, Jr., M. C. Marconi, J. J. Rocca, C. S. Menoni, SPIE February 24, 2010
  188. "Actinic imaging of native and programmed defects on a full-field mask," I. Mochi, K. A. Goldberg, B. M. LaFontaine, A. Tchikoulaeva, C. Holfeld , SPIE 7636, 76361A-1-9 (2010). DOI 10.1117/12.846670
  189. "Photon flux requirements for EUV-reticle imaging microscopy in the 22- and 16-nm nodes," D. T. Wintz, K. A. Goldberg, I. Mochi, S. Huh, SPIE 7636, 76362L-1-10 (2010). DOI 10.1117/1.3491512
  190. "Particle removal challenges of EUV patterned masks for the sub-22-nm HP node," Abbas Rastegar, Sean K. Eichenlaub, Arun J. Kadaksham, Byunghoon Lee, Mathiew House, Henry K. Yun, Brian Cha, Kenneth A. Goldberg, Iacopo Mochi, SPIE 7636, 76360N (2010). DOI 10.1117/12.847056
  191. "EUV-multilayers on grating-like topographies," A. J. R. van den Boogaard, E. Louis, K. A. Goldberg, I. Mochi, F. Bijkerk, SPIE 7636 76362S, 76362S-1-5 (2010). DOI 10.1117/12.846564
  192. "Printability and inspectability study with substrate programmed pit defects in EUV lithography," I.-Y. Kang, H.-S. Seo, B.-S. Ahn, D.-G. Lee, D. Kim, S. Huh, C.-W. Koh, B. Cha, S.-S. Kim, H.-K. Cho, I. Mochi, K. A. Goldberg, SPIE 7636, 76361B (2010). DOI 10.1117/12.847956
  193. "Effect of carbon contamination on the printing performance of extreme ultraviolet masks," Y.-J. Fan, L. Yankulin, A. Antohe, P. Thomas, C. Mbanaso, R. Garg, Y. Wang, A. Wüest, F. Goodwin, S. Huh, P. Naulleau, K. Goldberg, I. Mochi, and G. Denbeaux, Journal of Vacuum Science and Technology B 28 (2), 321-328 (2010). DOI 10.1116/1.3333434
  194. "Study of Real Defects on EUV Blanks and a Strategy for EUV Mask Inspection," S. Huh, A. Rastegar, F. Goodwin, S. Wurm, K. Goldberg, I. Mochi, T. Nakajima, M. Kishimoto, M. Komakine, SPIE 7545 7545N, 1-8 (2010). DOI 10.1117/12.863559
  195. "Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning," S. A. George, P. P. Naulleau, F. Salmassi, I. Mochi, E. M. Gullikson, K. A. Goldberg, and E. H. Anderson, Journal of Vacuum Science and Technology B 28 (6), (2010). DOI 10.1116/1.3502436
  196. "Actinic imaging and evaluation of phase structures on EUV lithography masks," I. Mochi, K. A. Goldberg, S. Huh, Journal of Vacuum Science and Technology B 28 (6), C6E11-16 (2010). DOI 10.1116/1.3498756
  197. "Wavelength-Specific Reflections: A Decade of EUV Actinic Mask Inspection Research," K. A. Goldberg, I. Mochi, Journal of Vacuum Science and Technology B 28 (6), C6E1-10 (2010). DOI 10.1116/1.3498757
  198. "Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks," F. Brizuela, S. Carbajo, A. Sakdinawat, D. Alessi, D. H. Martz, Y. Wang, B. Luther, K. A. Goldberg, I. Mochi, D. T. Attwood, B. La Fontaine, J. J. Rocca, and C. S. Menoni, Optics Express 18 (14), 14467-73 (2010). DOI 10.1364/OE.18.014467
  199. "Bendable Focusing X-Ray Optics for the ALS and the LCLS/FEL: Design, Metrology, and Performance," V. V. Yashchuk, S. Yuan, S. Baker, J. Bozek, R. Celestre, M. Church, K. A. Goldberg, M. Fernandez-Perea, N. Kelez, M. Kunz, W. R. McKinney, G. Morrison, H. A. Padmore, R. Soufli, N. Tamura, T. Warwick, Workshop on Photon Beamlines & Diagnostics June 29, 2010
  200. "Elliptically Bent X-ray Mirrors with Active Temperature Stabilization," S. Yuan, M. Church, V. V. Yashchuk, K. A. Goldberg, R. S. Celestre, W. R. McKinney, J. Kirschman, G. Morrison, T. Noll, T. Warwick, H. A. Padmore, X-Ray Optics and Instrumentation 2010 (784732), (2010). DOI 10.1155/2010/784732
  201. "At-wavelength optical metrology development at the ALS," S. Yuan, K. A. Goldberg, V. V. Yashchuk, R. Celestre, I. Mochi, J. Macdougall, G. Y. Morrison, W. R. McKinney, M. Church, and T. Warwick, SPIE Optical Engineering & Applications 7801 78010D, 1-13 (2010). DOI 10.1117/12.859946
  202. "EUV Mask Status: Par 13.5," Kenneth A. Goldberg, Invited Presentation, SEMATECH Mask Cleaning Workshop, Monterey, CA September 13, 2010
  203. "Photon flux requirements for extreme ultraviolet reticle imaging in the 22- and 16-nm nodes," D. T. Wintz, K. A. Goldberg, I. Mochi, S. Huh, J. Micro/Nanolith. MEMS MOEMS 9 (041205), 041205-1-8 (2010). DOI 10.1117/1.3491512
  204. "Table-top Extreme Ultraviolet Laser Aerial Imaging of Lithographic Masks," F. Brizuela, S. Carbajo, A. Sakdinawat, Y. Wang, D. Alessi, D. Martz, B. Luther, K. A. Goldberg, D. T. Attwood, B. La Fontaine, J. Rocca, C. Menoni, in Conference on Laser Electro-Optics: Applications, OSA Technical Digest (CD) (Optical Society of America, 2010) AFA5, (2010).
  205. "Reflection microscope for actinic mask inspection and other progress in soft x-ray laser nano-imaging," C. S. Menoni, F. Brizuela, S. Carbajo, Y. Wang, D. Alessi, D. H. Martz, B. Luther, M. C. Marconi, J. J. Rocca, A. Sakdinawat, W. Chao, Y. W. Liu, E. H. Anderson, K. A. Goldberg, D. T. Attwood, A. V. Vinogradov, I. A. Artioukov, B. LaFontaine, X-Ray Lasers 2010, Springer Proceedings in Physics, 2011 136 7, 359-70 (2010). DOI 10.1007/978-94-007-1186-0_41
  206. "An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm," K. A. Goldberg, I. Mochi, S. B. Rekawa, N. S. Smith, J. B. Macdougall, P. P. Naulleau, SPIE 7969, 79691O (2011). DOI 10.1117/12.881651
  207. "Quantitative evaluation of mask phase defects from through-focus EUV aerial images," I. Mochi, K. A. Goldberg, R. Xie, P.-Y. Yan, K. Yamazoe, SPIE 7969, 79691X (2011). DOI 10.1117/12.881652
  208. "Printability and inspectability of Defects on the EUV Mask for sub32nm Half Pitch HVM Application," S. Huh, I.-Y. Kang, S.-H. Kim, H.-S. Seo, D. Kim, J. Park, S.-S. Kim, H.-K. Cho, K. Goldberg, I. Mochi, T. Shoki, G. Indeerhees, SPIE 7969 796902, (2011). DOI 10.1117/12.879384
  209. "Replicated mask surface roughness effects on EUV lithographic patterning and line edge roughness," S. A. George, P. P. Naulleau, E. M. Gullikson, I. Mochi, F. Salmassi, K. A. Goldberg, E. H. Anderson, SPIE 7969, 79690E (2011). DOI 10.1117/12.881524
  210. "Optical modeling of Fresnel zoneplate microscopes," P. P. Naulleau, I. Mochi, K. A. Goldberg, Applied Optics 50 (20), 3678-3684 (2011). DOI 10.1364/AO.50.003678
  211. "Critical challenges for EUV resist materials," P. P. Naulleau, C. N. Anderson, L. Baclea-an, P. Denham, S. George, K. A. Goldberg, G. Jones, B. McClinton, R. Miyakawa, S. Rekawa, and N. Smith, SPIE 7972 797202, 1-10 (2011). DOI 10.1117/12.882955
  212. "The SEMATECH Berkeley MET: extending EUV learning down to 16nm half pitch," C. N. Anderson, L. Baclea-An, P. E. Denham, S. A. George, K. A. Goldberg, M. S. Jones, N. S. Smith, P. P. Naulleau, T. I. Wallow, W. Montgomery, SPIE 7969 79690R, 1-6 (2011). DOI 10.1117/12.881573
  213. "Using synchrotron light to accelerate EUV resist and mask materials learning," P. Naulleau, C. N. Anderson, L. Baclea-an, P. Denham, S. George, K. A. Goldberg, G. Jones, I. Mochi, S. Rekawa, B. McClinton, R. Miyakawa, W. Montgomery, T. Wallow, SPIE 7985 798509, (2011). DOI 10.1117/12.885420
  214. "Actinic Characterization of EUV Bump-Type Phase Defects," K. A. Goldberg, I. Mochi, Journal of Vacuum Science and Technology B 29 (6), 06F502-1-6 (2011). DOI 10.1116/1.3653257
  215. "Cross-check of ex-situ and in-situ metrology of a bendable temperature stabilized KB mirror," S. Yuan, K. A. Goldberg, V. V. Yashchuk, R. Celestre, W. R. McKinney, G. Morrison, J. Macdougall, I. Mochi, T. Warwick, Nuclear Instruments and Methods in Physics Research A 635 , S58-S63 (2011). DOI 10.1016/j.nima.2010.09.120
  216. "Design optimization of bendable x-ray mirrors," W. R. McKinney, K. A. Goldberg, M. R. Howells, D. J. Merthe, S. Yuan, V. V. Yashchuk, SPIE 8141, 81410K (2011). DOI 10.1117/12.894175
  217. "Characterization of Mo/Si multilayer growth on stepped topographies," A. J. R. van den Boogaard, E. Louis, E. Zoethout, K. A. Goldberg, F. Bijkerk, Journal of Vacuum Science and Technology B 29 (5), 051803 (2011). DOI 10.1116/1.3628640
  218. "Printability of native blank defects and programmed defects and their stack structures," H.-J. Kwon, J. Harris-Jones, T. Ranganath, A. Cordes, T. Nakajima, I. Mochi, K. A. Goldberg, Y. Yamaguchi, and H. Kinoshita, Proc. SPIE 8166, 81660H (2011). DOI 10.1117/12.897165
  219. "Accelerating EUV learning with synchrotron light: mask roughness challenges ahead," P. P. Naulleau, K. A. Goldberg, E. Gullikson, I. Mochi, B. McClinton, and A. Rastegar, Proc. SPIE 8166, 81660F (2011). DOI 10.1117/12.900488
  220. "An experimental apparatus for diffraction-limited soft x-ray nano-focusing," D. J. Merthe, K. A. Goldberg, V. V. Yashchuk, S. Yuan, W. R. McKinney, R. Celestre, I. Mochi, J. Macdougall, G. Y. Morrison, S. B. Rakawa, E. Anderson, B. V. Smith, E. E. Domning, T. Warwick, H. Padmore, Proc. SPIE 8139, 813907 (2011). DOI 10.1117/12.894116
  221. "Design optimization of bendable x-ray mirrors," W. R. McKinney, V. V. Yashchuk, K. A. Goldberg, M. Howells, N. A. Artemiev, D. J. Merthe, S. Yuan, Proc. SPIE 8141, 81410K (2011). DOI 10.1117/12.894175
  222. "Development of in situ, at-wavelength metrology for soft X-ray nano-focusing," S.Yuan, V. V. Yashchuk, K. A. Goldberg, R. Celestre, W. R. McKinney, G. Y. Morrison, T. Warwick, H. A. Padmore, Nuclear Instruments and Methods in Physics Research A 649, 160-162 (2011). DOI 10.1016/j.nima.2010.10.134
  223. "Printability Study of Pattern Defects in the EUV Mask as a Function of hp Nodes," T.-G. Kim, H.-S. Seo, I.-Y. Kang, C. Y. Jeong, S. Huh, J. Na, S.-S. Kim, C.-U. Jeon, I. Mochi, K. A. Goldberg, Proc. SPIE 8322, 83220A (2012). DOI 10.1117/12.916374
  224. "EUV Actinic Imaging Tool Aerial Image Evaluation of EUVL Embedded Phase Shift Mask Performance," P.-Y. Yan, I. Mochi, and K. Goldberg, Proc. SPIE 8322, 83221P (2012). DOI 10.1117/12.919710
  225. "EUV mask multilayer defects and their printability under different multilayer deposition conditions," H. J. Kwon, J. Harris-Jones, A. Cordes, M. Satake, Y. Li, I. Mochi, and K. A. Goldberg , Proc. SPIE 8322, 832209 (2012). DOI 10.1117/12.916374
  226. "The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm," C. Anderson, D. Ashworth, L. M. Baclea-A1, S. Bhattari, R. Chao, R. Claus, P. Denham, K. Goldberg, A. Grenville, G. Jones, R. Miyakawa, K. Murayama, H. Nakagawa, S. Rekawa, J. Stowers and P. Naulleau, Proc. SPIE 8322, 832212 (2012). DOI 10.1117/12.917386
  227. "Creating an EUV Mask Microscope for Lithography Generations Reaching 8 nm," K. A. Goldberg, I. Mochi, M. P. Benk, A. P. Allezy, N. S. Smith, C. W. Cork, W. Cork, J. Macdougall, W. L. Chao, E. H. Anderson, P. P. Naulleau, E. Acome, E. Van Every, V. Milanovic, S. B. Rekawa, Precision Engineering and Mechatronics Supporting the Semiconductor Industry , 4-7 (2012).
  228. "Methodology for optimal in situ alignment and setting of bendable optics for diffraction-limited focusing of soft x-rays," D. J. Merthe, V. V. Yashchuk, K. A. Goldberg, M. Kunz, N. Tamura, W. R. McKinney, N. A. Artemiev, R. S. Celestre, G. Y. Morrison, E. Anderson, B. V. Smith, E. E. Domning, S. B. Rekawa, H. A. Padmore, Proc. SPIE 8501 850108, (2012). DOI 10.1117/12.930023
  229. "Ex situ tuning of bendable x-ray mirrors for optimal beamline performance," Wayne R. McKinney, Valeriy V. Yashchuk, Daniel J. Merthe, Nikolay A. Artemiev, Kenneth Goldberg, Proc. SPIE 8501 850109, (2012). DOI 10.1117/12.930156
  230. "Development of optical metrology for precision characterization, tuning, and alignment of x-ray optics at the ALS," V. V. Yashchuk, N. A. Artemiev, K. A. Goldberg, W. R. McKinney, D. J. Merthe, D. L Voronov, H. A. Padmore, 11th Biennial Conference on High Resolution X-Ray Diffraction and Imaging, XTOP2012 September 15-20
  231. "Experimental methods for optimal tuning and alignment of bendable mirrors for diffraction-limited soft x-ray focusing," V. V. Yashchuk, K. A. Goldberg, D. J. Merthe, N. A. Artemiev, R. Celestre, E. E. Domning, W. R. McKinney, G. Y. Morrison, M. Kunz, B. V. Smith, N. Tamura, H. A. Padmore, (11th International Conference on Synchrotron Radiation Instrumentation, SRI 2012) Journal of Physics: Conference Series 425 (152003), (2012). DOI 10.1088/1742-6596/425/15/152003
  232. "Application of phase shift focus monitor in EUVL process control," L. Sun, S. Raghunathan, V. Jindal, E. Gullikson, P. Mangat, I. Mochi, K. A. Goldberg, M. P. Benk, O. Kritsun, T. Wallow, D. Civay, and O. Wood, SPIE 8679 86790T, (2013). DOI 10.1117/12.2011342
  233. "Commissioning an EUV mask microscope for lithography generations reaching 8 nm," K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, SPIE 8679 867919, (2013). DOI 10.1117/12.2011688
  234. "In Situ Fine Tuning of Bendable Soft X-ray Mirrors using a Lateral Shearing Interferometer," D. J. Merthe, K. A. Goldberg, V. V. Yashchuk, W. R. McKinney, R. Celestre, I. Mochi, J. MacDougall, G. Y. Morrison, S. B. Rekawa, E. Anderson, B. V. Smith, E. E. Domning, H. Padmore, Nuclear Instruments and Methods in Physics Research A 710 (2013), 82-86 (2013). DOI 10.1016/j.nima.2012.10.105
  235. "Experimental methods for optimal tuning and alignment of bendable mirrors for diffraction-limited soft x-ray focusing," V. V. Yashchuk, D. J. Merthe, K. A. Goldberg, N. A. Artemiev, R. Celestre, E. E. Domning, M. Kunz, W. R. McKinney, G. Y. Morrison, B. V. Smith, N. Tamura, Journal of Physics: Conf. Ser. 425 (152003 ), (2013). DOI 10.1088/1742-6596/425/15/152003
  236. "Methodology for optimal in situ alignment and setting of bendable optics for nearly diffraction-limited focusing of soft x-rays," D. J. Merthe, V. V. Yashchuk, K. A. Goldberg, M. Kunz, N. Tamura, W. R. McKinney, N. A. Artemiev, R. S. Celestre, G. Y. Morrison, E. H. Anderson, B. V. Smith, E. E. Domning, S. B. Rakawa, H. Padmore, Optical Engineering 52 (3), 033603-1-13 (2013). DOI 10.1117/1.OE.52.3.033603
  237. "Metrology for the Advancement of X-ray Optics at the ALS," Kenneth A. Goldberg, Valeriy V. Yashchuk, Nikolay A. Artemiev, Richard Celestre, Weilun Chao, Eric M. Gullikson, Ian Lacey, Wayne R. McKinney, Daniel Merthe, Howard A. Padmore, Synchrotron Radiation News 26 (5), 4-12 (2013).
  238. "Pupil shaping and coherence control in an EUV mask-imaging microscope ," Iacopo Mochi, Kenneth A. Goldberg, Markus P. Benk, Patrick P. Naulleau, Proc. SPIE 8880 888022, (2013). DOI 10.1117/12.2026498
  239. "Increased depth of field through wave-front coding: using an off-axis zone plate lens with cubic phase modulation in an EUV microscope ," Markus P. Benk, Kenneth A. Goldberg, Iacopo Mochi, Weilun Chao, Erik H. Anderson, Proc. SPIE 8880 88801R, (2013). DOI 10.1117/12.2025954
  240. "Recovering Effective Amplitude and Phase Roughness of EUV Masks," Rene A. Claus, Iacopo Mochi, Markus P. Benk, Kenneth A. Goldberg, Andrew R. Neureuther, Patrick P. Naulleau, Proc. SPIE 8880 88802B, (2013). DOI 10.1117/12.2027828
  241. "The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope ," Kenneth A. Goldberg, Iacopo Mochi, Markus P. Benk, Chihcheng Lin, Arnaud Allezy, Michael Dickinson, Carl W. Cork, James B. Macdougall, Erik H. Anderson, Weilun Chao, Farhad Salmassi, Eric. M. Gullikson, Daniel Zehm, Vamsi Vytla, William Cork, Jason DePonte, Gino Picchi, Ahmet Pekedis, Takeshi Katayanagi, Michael G. Jones, Elizabeth Martin, Patrick P. Naulleau, and Senajith B. Rekawa, SPIE 8880 88800T, (2013). DOI 10.1117/12.2026496
  242. "Micron-scale lens array having diffracting structures," Kenneth A. Goldberg, U.S. Patent No. 8,569,678, October 29, 2013
  243. "A sharper look at EUV masks," Markus P. Benk, Iacopo Mochi, C. C. Lin, Kenneth A. Goldberg, EUVL Symposium 2013, Toyama, Japan , (2013).
  244. "Actinic mask imaging: Recent results and future directions from the SHARP EUV Microscope," Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla, Iacopo Mochi, Senajith B. Rekawa, Arnaud P. Allezy, Michael R. Dickinson, Carl W. Cork, Weilun Chao, Daniel J. Zehm, James B. Macdougall, Patrick P. Naulleau, and Anne Rudack, SPIE 9048 90480Y, (2014). DOI 10.1117/12.2048364
  245. "A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope," M. P. Benk, R. H. Miyakawa, W. Chao, Y.-G. Wang, A. Wojdyla, D. G. Johnson, A. P. Donoghue, K. A. Goldberg, SPIE Photomask 9235 92350K, (2014). DOI 10.1117/12.2065513
  246. "Gradient descent algorithm applied to wavefront retrieval from through-focus images by an extreme ultraviolet microscope with partially coherent source," K. Yamazoe, I. Mochi, and K. A. Goldberg, Journal of the Optical Society of America A 31 (12), B34-43 (2014). DOI 10.1364/JOSAA.31.000B34
  247. "Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images," S. Raghunathan, O. R. Wood II, P. Mangat, E. Verduijn, V. Philipsen, E. Hendrickx, R. Jonckheere, K. A. Goldberg, M. P. Benk, P. Kearney, Z. Levinson and B. W. Smith, Journal of Vacuum Science and Technology B 32 (6), 06F801 (2014). DOI 10.1116/1.4901876
  248. "Investigating Printability of Native Defects on EUV Mask Blanks through Simulations and Experiments," Mihir Upadhyaya, Vibhu Jindal, Henry Herbol, Jenah Harris-Jones, Il-Yong Jang, Kenneth A. Goldberg, Iacopo Mochi, Sajan Marokkey, Wolfgang Demmerle, Thomas V. Pistor and Gregory Denbeaux, EUVL Symposium 2014
  249. "New Source and Imaging Capabilities of the SHARP EUV Mask Microscope," Kenneth A. Goldberg, Markus Benk, Antoine Wojdyla, Alex Donoghue, David Johnson, James Macdougall, Weilun Chao, Ryan Miyakawa, Yow-Gwo Wang, and Patrick Naulleau, EUVL Symposium 2014
  250. "Fourier Ptychography Microscopy with the SHARP EUV Microscope for increased imaging resolution based on illumination diversity," A. Wojdyla, M. P. Benk, D. G. Johnson, A. Donoghue, K. A. Goldberg , EUVL Symposium 2014
  251. "Source optimization at the SHARP microscope," Markus P. Benk, David G. Johnson, Alexander Donoghue, Antoine Wojdyla, Kenneth A. Goldberg, EUVL Symposium 2014
  252. "Phase-enhanced Defect Sensitivity for EUV Mask Inspection," Y.-G. Wang, R. Miyakawa, W. Chao, D. Johnson, A. Donoghue, A. Wojdyla, M. Benk, K. Goldberg, A. Neureuther, and P. Naulleau, EUVL Symposium 2014 October 28, 2014
  253. "Actinic Mask Imaging: Emulating Current and Future Litho Tools with the SHARP EUV Microscope," K. A. Goldberg, M. Benk, A. Wojdyla, I. Mochi, P. Naulleau, SPIE Photomask Japan April 16, 2014
  254. "Extreme ultraviolet mask roughness: requirements, characterization, and modeling," Patrick Naulleau, Suchit Bhattaria, Rick Chao, Rene Claus, Kenneth Goldberg, Frank Goodwin, Eric Gullikson, Donggun Lee, Andy Neureuther, Jong-Ju Park, SPIE Photomask Japan 9256 92560J, (2014). DOI 10.1117/12.2070303
  255. "Phase-enhanced defect sensitivity for EUV mask inspection," Yow-Gwo Wang, Ryan Miyakawa, Weilun Chao, Kenneth Goldberg, Andy Neureuther, Patrick Naulleau, SPIE 9235 92350L, (2014). DOI 10.1117/12.2069291
  256. "Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source," Patrick P. Naulleau, Christopher N. Anderson, Erik H. Anderson, Nord Andreson, Weilun Chao, Changhoon Choi, Kenneth A. Goldberg, Eric M. Gullikson, Seong-Sue Kim, Donggun Lee, Ryan Miyakawa, Jongju Park, Seno Rekawa, Farhad Salmassi, Optics Express 22 (17), 20144-54 (2014). DOI 10.1364/OE.22.020144
  257. "Understanding EUV mask blank surface roughness induced LWR and associated roughness requirement," Pei-Yang Yan, Guojing Zhang, Eric M. Gullikson, Kenneth A. Goldberg, Markus P. Benk, SPIE 9422 94220J, (2015). DOI 10.1117/12.2087041
  258. "Evaluating Printability of Buried Native EUV Mask Phase Defects through a Modeling and Simulation Approach," Mihir Upadhyaya, Vibhu Jindal, Adarsh Basavalingappa, Henry Herbol, Jenah Harris-Jones, Il-Yong Jang, Kenneth A. Goldberg, Iacopo Mochi, Sajan Marokkey, Wolfgang Demmerle, Thomas V. Pistor and Gregory Denbeaux, SPIE 9422 94220Q, (2015). DOI 10.1117/12.2175842
  259. "Aberration estimation using EUV mask roughness," Rene A. Claus, Antoine Wojdyla, Markus P. Benk, Kenneth A. Goldberg, Andrew R. Neureuther, Patrick P. Naulleau, and Laura Waller, SPIE 9422 942214, (2015). DOI 10.1117/12.2087513
  260. "Phase measurements of EUV mask defects," Yow-Gwo Wang, Antoine Wojdyla, Markus P. Benk, Kenneth A. Goldberg, Andrew R. Neureuther, Patrick P. Naulleau, and Laura Waller, SPIE 9422 942217, (2015). DOI 10.1117/12.2087195
  261. "A Method of Image-Based Aberration Metrology for EUVL Tools," Zac Levinson, Sudhar Raghunathan, Erik Verduijn, Obert Wood, Pawitter Mangat, Kenneth Goldberg, Markus Benk, Antoine Wojdyla, Vicky Philipsen, Eric Hendrickx, Bruce W. Smith, SPIE 9422 942215, (2015). DOI 10.1117/12.2087177
  262. "New ways of looking at masks with the SHARP EUV microscope," Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla, David G. Johnson, and Alexander P. Donoghue, SPIE 9422 94221A, (2015). DOI 10.1117/12.2175553
  263. "Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection," Yow-Gwo Wang, Ryan Miyakawa, Weilun Chao, Markus Benk, Antoine Wojdyla, Alex Donoghue, David Johnson, Kenneth Goldberg, Andy Neureuther, Ted Liang, and Patrick Naulleau, SPIE 9422 94221C, (2015). DOI 10.1117/12.2087532
  264. "Broader view on extreme ultraviolet masks: adding complementary imaging modes to the SHARP microscope," M. P. Benk, R. H. Miyakawa, W. Chao, Y.-G. Wang, A. Wojdyla, D. G. Johnson, A. P. Donoghue, K. A. Goldberg, J. Micro/Nanolith. MEMS MOEMS 14 (1), 013507 (2015). DOI 10.1117/1.JMM.14.1.013507
  265. "Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects," Mihir Upadhyaya, Adarsh Basavalingappa, Henry Herbol, Gregory Denbeaux, Vibhu Jindal, Jenah Harris-Jones, Il-Yong Jang, Kenneth A. Goldberg, Iacopo Mochi, Sajan Marokkey, Wolfgang Demmerle and Thomas V. Pistor, Journal of Vacuum Science and Technology B 33 (6), 021602 (2015). DOI 10.1116/1.4913315
  266. "Modal wavefront reconstruction from its gradient," Iacopo Mochi and Kenneth Goldberg, Applied Optics 54 (12), 3780-5 (2015). DOI 10.1364/AO.54.003780
  267. "Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach," Mihir Upadhyaya, Vibhu Jindal, Adarsh Basavalingappa, Henry Herbol, Jenah Harris-Jones, Il-Yong Jang, Kenneth A. Goldberg, Iacopo Mochi, Sajan Marokkey, Wolfgang Demmerle, Thomas V. Pistor, Gregory Denbeaux, J. Micro/Nanolith. MEMS MOEMS 14 (2), 023505 (2015). DOI 10.1117/1.JMM.14.2.023505
  268. "Partially Coherent Quantitative Phase Retrieval for EUV Lithography," Rene A. Claus, Yow-Gwo Wang, Markus Benk, Kenneth A. Goldberg, Patrick P. Naulleau, Andrew R. Neureuther, and Laura Waller, OSA Computational Optical Sensing and Imaging (COSI) 2015 , ITH2A (2015). DOI 10.1364/ISA.2015.ITH2A.4
  269. "Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope," Markus P. Benk, Kenneth A. Goldberg, Antoine Wojdyla, Christopher N. Anderson, Farhad Salmassi, Patrick P. Naulleau, and Michael Kocsis, Journal of Vacuum Science and Technology B 33 (6), 06FE01 (2015). DOI 10.1116/1.4929509
  270. "Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging," Pawitter Mangat, Erik Verduijn, Obert R. Wood II, Markus P. Benk, Antoine Wojdyla, and Kenneth A. Goldberg, SPIE 9658 96580E, (2015). DOI 10.1117/12.2201048
  271. "EUV Research at Berkeley Lab: Enabling Technologies and Applications," Patrick P. Naulleau, Christopher N. Anderson, Weilun Chao, Peter Fischer, Kenneth A. Goldberg, Eric M. Gullikson, Ryan Miyakawa, Seong-Sue Kim, Donggun Lee and Jongju Park, X-Ray Lasers 2014: Proceedings of the 14th International Conference on X-Ray Lasers (2015).
  272. "Assessment of AIMS™ EUV and SHARP actinic wavelength mask defect review tools for the evaluation of blank defect printability," Erik Verduijn, Erik Hosler, Pawitter Mangat, Obert Wood, Renzo Capelli, Sascha Perlitz, Krister Magnusson, Markus Weiss, Dirk Hellweg, Vibhu Jindal, Markus P. Benk, Antoine Wojdyla, Kenneth A. Goldberg, 2015 International Symposium on EUV Lithography, Maastricht, The Netherlands October 5, 2015
  273. "Actinic mask imaging: Taking a SHARP look at next generation photomasks," Markus Benk, Antoine Wojdyla, Kenneth Goldberg, Patrick Naulleau, 2015 International Symposium on EUV Lithography, Maastricht, The Netherlands October 7, 2015
  274. "Using the SHARP EUV Microscope's aerial images to study line edge roughness," Antoine Wojdyla, Alexander Donoghue, Markus P. Benk, Kenneth A. Goldberg, Patrick P. Naulleau, 2015 International Symposium on EUV Lithography, Maastricht, The Netherlands October 5, 2015
  275. "Examination of phase retrieval algorithms for patterned EUV mask metrology," Rene A. Claus, Yow-Gwo Wang, Antoine Wojdyla, Markus P. Benk, Kenneth A. Goldberg, Andrew R. Neureuther, Patrick P. Naulleau, SPIE 9635 96350F, (2015). DOI 10.1117/12.2197868
  276. "EUV actinic brightfield mask microscopy for predicting printed defect images," Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla, Erik Verduijn, Obert R. Wood III, and Pawitter Mangat, SPIE 9635 963514, (2015). DOI 10.1117/12.2196966
  277. "Enabling EUV Resist Research at the 1x and Smaller Regime," Patrick Naulleau, Christopher Anderson, Weilun Chao, Kenneth Goldberg, Antoine Wojdyla, Suchit Bhattarai, Andrew Neureuther, Frank Goodwin, Mark Neisser, J. Photopolym. Sci. Technol. 28 (6), 777-82 (2015). DOI 10.2494/photopolymer.28.777
  278. "Aerial imaging study of the mask-induced line-width roughness of EUV lithography mask," Antoine Wojdyla, Alexander P. Donoghue, Markus P. Benk, Kenneth A. Goldberg, SPIE 9776 97760H, (2016). DOI 10.1117/12.2219513
  279. "Image-based pupil plane characterization via principal component analysis for EUVL tools," Zac Levinson, Andrew Burbine, Erik A. Verduijn, Obert R. Wood II, Pawitter J. Mangat, Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla, SPIE 9776 977618, (2016). DOI 10.1117/12.2219745
  280. "Fourier Ptychography imaging for the study of EUV lithography photomasks," Antoine Wojdyla, Markus P. Benk, Kenneth A. Goldberg, SPIE February 24, 2016
  281. "Emulation of anamorphic imaging on the SHARP EUV mask microscope," Markus P. Benk, Antoine Wojdyla, Weilun L. Chao, Ryan H. Miyakawa, Patrick P. Naulleau, Kenneth A. Goldberg, SPIE 9776 97761J, (2016). DOI 10.1117/12.2219294
  282. "Optimized mirror shape tuning using beam weightings based on distance, angle of incidence, reflectivity, and power," Kenneth A. Goldberg, Valeriy V. Yashchuk, Review of Scientific Instruments 87 (051805), (2016). DOI 10.1063/1.4950747
  283. "Ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask," Patrick Naulleau, Christopher N. Anderson, Weilun Chao, Kenneth A. Goldberg, Eric Gullikson, Farhad Salmassi, Antoine Wojdyla, SPIE 9984 99840P, (2016). DOI 10.1117/12.2243321
  284. "Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology," Zachary Levinson, Erik Verduijn, Obert R. Wood, Pawitter Mangat, Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla, Bruce W. Smith, J. Micro/Nanolith. MEMS MOEMS 15 (2), 023508 (2016). DOI 10.1117/1.JMM.15.2.023508
  285. "Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope," Markus P. Benk, Antoine Wojdyla, Weilun Chao, Farhad Salmassi, Sharon Oh, Yow-Gwo Wang, Ryan H. Miyakawa, Patrick P. Naulleau, and Kenneth A. Goldberg, J. Micro/Nanolith. MEMS MOEMS 15 (3), 033501 (2016). DOI 10.1117/1.JMM.15.3.033501
  286. "Off-axis aberration estimation in an EUV microscope using natural speckle," Aamod Shanker, Antoine Wojdyla, Gautam Gunjala, Jonathan Dong, Markus Benk, Andy Neureuther, Kenneth Goldberg, Laura Waller, 2016 Imaging and Applied Optics Congress ITh1F.2, (2016). DOI 10.1364/ISA.2016.ITh1F.2
  287. "Multiplexed high resolution soft x-ray RIXS," Y.-D. Chuang, C. Anderson, M. Benk, K. Goldberg, D. Voronov, T. Warwick, V. Yashchuk, and H. A. Padmore, AIP Conference Proceedings 1741, 050011 (2016). DOI 10.1063/1.4952931
  288. "Preface: The 5th International Workshop on X-ray Mirror Design, Fabrication, and Metrology," Lahsen Assoufid, Kenneth Goldberg, Valeriy V. Yashchuk, Review of Scientific Instruments 87 051701, 1-2 (2016). DOI 10.1063/1.4950776
  289. "Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging," Patrick P Naulleau, Markus Benk, Kenneth A Goldberg, Eric M Gullikson, Antoine Wojdyla, Yow-Gwo Wang, Andy Neureuther, Applied Optics 56 (12), 3325-8 (2017). DOI 10.1364/AO.56.003325
  290. "EUV extendibility research at Berkeley Lab," P Naulleau, C Anderson, M Benk, W Chao, K Goldberg, E Gullikson, M Miyakawa, A Wojdyla, IEEE VLSI Technology, Systems and Application (VLSI-TSA) April 24, 2017
  291. "EUV mask roughness can recover litho-tool aberrations," Aamod Shanker, Laura Waller, Antoine Wojdyla, Markus P. Benk, Kenneth A. Goldberg, Patrick P. Naulleau, SPIE 10450 104500S, 106560W (2017). DOI 10.1117/12.2281519
  292. "Taking a SHARP look at mask 3D effects," Markus P. Benk, Weilun Chao;,Ryan Miyakawa, Kenneth Goldberg, Patrick Naulleau, SPIE 10450 104500Y, (2017). DOI 10.1117/12.2281109
  293. "Image-based pupil plane characterization via a space-domain basis," Zac Levinson, Andrew Burbine, Erik Verduijn, Obert Wood, Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla, Bruce W. Smith, J. of Micro/Nanolithography, MEMS, and MOEMS 16 (2), 023509-1-11 (2017). DOI 10.1117/1.JMM.16.2.023509
  294. "Measurement of through-focus EUV pattern shifts using the SHARP actinic microscope," Obert Wood, Yulu Chen, Pawitter Mangat, Kenneth Goldberg, Markus Benk, Bryan Kasprowicz, Henry Kamberian, Jeremy McCord, Thomas Wallow, SPIE 10450 1045008, (2017). DOI 10.1117/12.2280371
  295. "EUV photolithography mask inspection using Fourier ptychography," Antoine Wojdyla, Markus P. Benk, Patrick P. Naulleau, Kenneth A. Goldberg, SPIE 10656 106560W, 106560W (2018). DOI 10.1117/12.2307860
  296. "Design and demonstration of tunable soft x-ray lateral shearing and Hartmann wavefront sensors," Antoine Wojdyla, Diane Bryant, Weilun Chao, Lahsen Assoufid, Daniele Cocco, Mourad Idir, Kenneth A. Goldberg, SPIE 10760 1076003, (2018). DOI 10.1117/12.2321642
  297. "Field-varying aberration recovery in EUV microscopy using mask roughness," Gautam Gunjala, Antoine Wojdyla, Aamod Shanker, Stuart Sherwin, Markus P. Benk, Kenneth A. Goldberg, Patrick P. Naulleau, and Laura Waller, Computational Optical Sensing and Imaging CW2E.2, (2018). DOI 10.1364/COSI.2018.CW2E.2
  298. "Fine alignment of x-ray optics using wavefront sensor measurements," A. Wojdyla, D. Bryant, D. Cocco, G. Dovillaire, T. Warwick, L. Rebuffi, M. Idir, L. Assoufid, K. A. Goldberg, IWXM 2018, Hsinchu, Taiwan
  299. "Wavefront Preserving Mirrors for Free Electron Laser and Diffraction Limited Storage Ring applications," D. Cocco, C. Hardin, D. Morton, M. L. Ng, L. Zhang, T. Imamura, L. Assoufid, D. Bryant, K. Goldberg, A. Wojdyla, G. Dovillaire, L. Huang, M. Idir, SRI 2018, Taipei, Taiwan. 10-15 June, 2018
  300. "Design of shearing and Hartmann wavefront sensors for diffraction-limited beamlines," A. Wojdyla, D. Bryant, K. A. Goldberg, L. Assoufid, D. Cocco, M. Idir, SRI 2018, Taipei, Taiwan. 10-15 June, 2018
  301. "Optical beamline modelling for ALS-U," A. Wojdyla, K. A. Goldberg, H. Padmore, 6th DLSR Workshop, Berkeley, USA 29-31 October, 2018
  302. "Development of wavefront sensors for diffraction-limited light sources," A. Wojdyla, D. Bryant, W. Chao, K. A. Goldberg, et al., 6th DLSR Workshop, Berkeley, USA 29-31 October, 2018
  303. "A New Light for Berkeley Lab--the Advanced Light Source Upgrade," Ashley White, Kenneth Goldberg, Stephen Kevan, Daniela Leitner, David Robin, Christoph Steier & Lynn Yarris, Synchrotron Radiation News 32 (1), 32-36 (2019). DOI 10.1080/08940886.2019.1559608
  304. "Upgrade to the SHARP EUV mask microscope," Markus Benk, Weilun Chao, Ryan Miyakawa, Kenneth Goldberg, Patrick Naulleau, SPIE 10957 109570V, (2019). DOI 10.1117/12.2516387
  305. "Collaborative development of diffraction-limited beamline optical systems at US DOE light sources," Kenneth A. Goldberg, Antoine Wojdyla, Diane Bryant, Weilun Chao, Daniele Cocco, Corey Hardin, Daniel Morton, May Ling Ng, Lance Lee, Lahsen Assoufid, Walan Grizolli, Xianbo Shi, Steve P. Kearney, Michael Wojcik, Yuri Shvyd'ko, Deming Shu, Mourad Idir, Lei Huang, SPIE 11109 111090C, (2019). DOI 10.1117/12.2530817
  306. "Adaptive shape control of wavefront-preserving X-ray mirrors with active cooling and heating," D. Cocco, C. Hardin, D. Morton, L. Lee, M. L. Ng, L. Zhang, L. Assoufid, W. Grizolli, X. Shi, D. A. Walko, G. Cutler, K. A. Goldberg, A. Wojdyla, M. Idir, L. Huang, G. Dovillaire, Optics Express 28 (13), 19242-54 (2020). DOI 10.1364/OE.394310
  307. "Extreme ultraviolet microscope characterization using photomask surface roughness," Gautam Gunjala, Antoine Wojdyla, Stuart Sherwin, Aamod Shanker, Markus P. Benk, Kenneth A. Goldberg, Patrick P. Naulleau, Laura Waller, Scientific Reports 10 (1), 2504-11 (2020). DOI 10.1038/s41598-020-68588-w
  308. "Reflective binary amplitude grating for soft x-ray shearing and Hartmann wavefront sensing," Kenneth A. Goldberg, Diane Bryant, Antoine Wojdyla, Michael Helmbrecht, and Eric Gullikson, Optics Letters 45 (17), 4694-4697 (2020). DOI 10.1364/OL.398737
  309. "Compensation of heat load deformations using adaptive optics for the ALS upgrade: a wave optics study," Manuel Sanchez del Rio, Antoine Wojdyla, Kenneth A. Goldberg, Grant D. Cutler, Daniele Cocco and Howard A. Padmore , Journal of Synchrotron Radiation 27, 1-12 (2020). DOI 10.1107/S1600577520009522
  310. "Experimental verification of high-NA imaging simulations using SHARP," Natalia Davydova, Fei Liu, Markus Benk, Eelco van Setten, Gerardo Bottiglieri, Anton van Oosten, John McNamara, Vincent Wiaux, Joern-Holger Franke, Kenneth Goldberg, DS Nam, Joseph Zekry, Patrick Naulleau, Timon Fliervoet, Rene Carpaij, SPIE 11517 1151714, 1-15 (2020). DOI 10.1117/12.2572846
  311. "Preliminary design of a set of four beamlines for the DLSR upgrade of the advanced light source," Antoine Wojdyla, Henry P. Alvarez, Maxime Bergeret, Albert Sheng, Diane Bryant, Arnaud P. Allezy, Grand D Cutler, Valeriy V. Yashchuk, Alastair A. MacDowell, Kenneth A Goldberg, Manuel Sanchez del Rio, Simon A. Morton, Elaine DiMasi, Howard A. Padmore, SPIE 11493 1, 1149304 (2020). DOI 10.1117/12.2569298
  312. "Compensation of heat deformations by adaptive optics in beamline simulations," Antoine Wojdyla, Manuel Sanchez del Rio, Kenneth A. Goldberg, Grant D. Cutler, Daniele Cocco, SPIE 11493 1, 114930Q (2020). DOI 10.1117/12.2569300
  313. "Binary Amplitude Reflection Gratings for X-ray Shearing and Hartmann Wavefront Sensors," Kenneth A. Goldberg, Antoine Wojdyla, Diane Bryant, Sensors 21 (2), 536 (2021). DOI 10.3390/s21020536
  314. "Pseudo-grayscale halftone gratings for shearing and Hartmann wavefront sensors," Kenneth A. Goldberg, Optics Letters 46 (4), 729-732 (2021). DOI 10.1364/OL.417408
  315. "Simulations of applications using diaboloid mirrors," Manuel Sanchez del Rio, Kenneth A. Goldberg, Valeriy V. Yashchuk, Ian Lacey and Howard A. Padmore, Journal of Synchrotron Radiation 28 (4), 1-9 (2021). DOI 10.1107/S160057752100401X
  316. "Diaboloidal mirrors: algebraic solution and surface shape approximations," Valeriy V. Yashchuk, Kenneth A. Goldberg, Ian Lacey, Wayne R. McKinney, Manuel Sanchez del Rio and Howard A. Padmore, Journal of Synchrotron Radiation 28 (4), 1-10 (2021). DOI 10.1107/S1600577521004860
  317. "Binary Amplitude Reflection Gratings for X-ray Shearing and Hartmann Wavefront Sensors," Kenneth A. Goldberg, Antoine Wojdyla, Diane Bryant, Sensors 21 (2), 536 (2021). DOI 10.3390/s21020536
  318. "Analytic descriptions of parabolic X-ray mirrors," Kenneth A. Goldberg, Journal of Synchrotron Radiation 29 (4), 985-990 (2022). DOI 10.1107/S1600577522004593
  319. "Derivation of closed-form ellipsoidal X-ray mirror shapes from Fermat's Principle," Kenneth A. Goldberg, Journal of Synchrotron Radiation 29 (4), 991-996 (2022). DOI 10.1107/S1600577522005793
  320. "Data-driven modeling and control of an X-ray bimorph adaptive mirror," Gautam Gunjala, Antoine Wojdyla, Kenneth A. Goldberg, Zhi Qiao, Xianbo Shi, Lahsen Assoufid, and Laura Waller, Journal of Synchrotron Radiation 30 (1), (2023). DOI 10.1107/S1600577522011080