Interferometry • Metrology • Short-Wavelength Optics • and more

Click here for Kenneth A. Goldberg’s Publications Compiled by Google Scholar
Publications Compiled by Academia.edu

Listing only:

    2021

  1. "Binary Amplitude Reflection Gratings for X-ray Shearing and Hartmann Wavefront Sensors," Kenneth A. Goldberg, Antoine Wojdyla, Diane Bryant, Sensors 21 (2), 536 (2021). DOI 10.3390/s21020536 [LINK]
  2. "Pseudo-grayscale halftone gratings for shearing and Hartmann wavefront sensors," Kenneth A. Goldberg, Optics Letters 46 (4), 729-732 (2021). DOI 10.1364/OL.417408 [PDF]
  3. "Binary Amplitude Reflection Gratings for X-ray Shearing and Hartmann Wavefront Sensors," Kenneth A. Goldberg, Antoine Wojdyla, Diane Bryant, Sensors 21 (2), 536 (2021). DOI 10.3390/s21020536 [PDF]

    4. 2020

  4. "Reflective binary amplitude grating for soft x-ray shearing and Hartmann wavefront sensing," Kenneth A. Goldberg, Diane Bryant, Antoine Wojdyla, Michael Helmbrecht, and Eric Gullikson, Optics Letters 45 (17), 4694-4697 (2020). DOI 10.1364/OL.398737 [PDF]

    5. 2018

  5. "Development of wavefront sensors for diffraction-limited light sources," A. Wojdyla, D. Bryant, W. Chao, K. A. Goldberg, et al., 6th DLSR Workshop, Berkeley, USA 29-31 October, 2018
  6. "Optical beamline modelling for ALS-U," A. Wojdyla, K. A. Goldberg, H. Padmore, 6th DLSR Workshop, Berkeley, USA 29-31 October, 2018
  7. "Design of shearing and Hartmann wavefront sensors for diffraction-limited beamlines," A. Wojdyla, D. Bryant, K. A. Goldberg, L. Assoufid, D. Cocco, M. Idir, SRI 2018, Taipei, Taiwan. 10-15 June, 2018
  8. "Wavefront Preserving Mirrors for Free Electron Laser and Diffraction Limited Storage Ring applications," D. Cocco, C. Hardin, D. Morton, M. L. Ng, L. Zhang, T. Imamura, L. Assoufid, D. Bryant, K. Goldberg, A. Wojdyla, G. Dovillaire, L. Huang, M. Idir, SRI 2018, Taipei, Taiwan. 10-15 June, 2018 [PDF]
  9. "Fine alignment of x-ray optics using wavefront sensor measurements," A. Wojdyla, D. Bryant, D. Cocco, G. Dovillaire, T. Warwick, L. Rebuffi, M. Idir, L. Assoufid, K. A. Goldberg, IWXM 2018, Hsinchu, Taiwan
  10. "Design and demonstration of tunable soft x-ray lateral shearing and Hartmann wavefront sensors," Antoine Wojdyla, Diane Bryant, Weilun Chao, Lahsen Assoufid, Daniele Cocco, Mourad Idir, Kenneth A. Goldberg, SPIE 10760 1076003, (2018). DOI 10.1117/12.2321642 [PDF]

    11. 2016

  11. "Optimized mirror shape tuning using beam weightings based on distance, angle of incidence, reflectivity, and power," Kenneth A. Goldberg, Valeriy V. Yashchuk, Review of Scientific Instruments 87 (051805), (2016). DOI 10.1063/1.4950747 [PDF]

    12. 2015

  12. "Modal wavefront reconstruction from its gradient," Iacopo Mochi and Kenneth Goldberg, Applied Optics 54 (12), 3780-5 (2015). DOI 10.1364/AO.54.003780 [PDF]

    13. 2013

  13. "Methodology for optimal in situ alignment and setting of bendable optics for nearly diffraction-limited focusing of soft x-rays," D. J. Merthe, V. V. Yashchuk, K. A. Goldberg, M. Kunz, N. Tamura, W. R. McKinney, N. A. Artemiev, R. S. Celestre, G. Y. Morrison, E. H. Anderson, B. V. Smith, E. E. Domning, S. B. Rakawa, H. Padmore, Optical Engineering 52 (3), 033603-1-13 (2013). DOI 10.1117/1.OE.52.3.033603 [PDF]
  14. "Experimental methods for optimal tuning and alignment of bendable mirrors for diffraction-limited soft x-ray focusing," V. V. Yashchuk, D. J. Merthe, K. A. Goldberg, N. A. Artemiev, R. Celestre, E. E. Domning, M. Kunz, W. R. McKinney, G. Y. Morrison, B. V. Smith, N. Tamura, Journal of Physics: Conf. Ser. 425 (152003 ), (2013). DOI 10.1088/1742-6596/425/15/152003 [LINK]

    15. 2012

  15. "Development of optical metrology for precision characterization, tuning, and alignment of x-ray optics at the ALS," V. V. Yashchuk, N. A. Artemiev, K. A. Goldberg, W. R. McKinney, D. J. Merthe, D. L Voronov, H. A. Padmore, 11th Biennial Conference on High Resolution X-Ray Diffraction and Imaging, XTOP2012 September 15-20
  16. "Ex situ tuning of bendable x-ray mirrors for optimal beamline performance," Wayne R. McKinney, Valeriy V. Yashchuk, Daniel J. Merthe, Nikolay A. Artemiev, Kenneth Goldberg, Proc. SPIE 8501 850109, (2012). DOI 10.1117/12.930156 [PDF]
  17. "Methodology for optimal in situ alignment and setting of bendable optics for diffraction-limited focusing of soft x-rays," D. J. Merthe, V. V. Yashchuk, K. A. Goldberg, M. Kunz, N. Tamura, W. R. McKinney, N. A. Artemiev, R. S. Celestre, G. Y. Morrison, E. Anderson, B. V. Smith, E. E. Domning, S. B. Rekawa, H. A. Padmore, Proc. SPIE 8501 850108, (2012). DOI 10.1117/12.930023 [PDF]

    18. 2011

  18. "Development of in situ, at-wavelength metrology for soft X-ray nano-focusing," S.Yuan, V. V. Yashchuk, K. A. Goldberg, R. Celestre, W. R. McKinney, G. Y. Morrison, T. Warwick, H. A. Padmore, Nuclear Instruments and Methods in Physics Research A 649, 160-162 (2011). DOI 10.1016/j.nima.2010.10.134 [PDF]
  19. "An experimental apparatus for diffraction-limited soft x-ray nano-focusing," D. J. Merthe, K. A. Goldberg, V. V. Yashchuk, S. Yuan, W. R. McKinney, R. Celestre, I. Mochi, J. Macdougall, G. Y. Morrison, S. B. Rakawa, E. Anderson, B. V. Smith, E. E. Domning, T. Warwick, H. Padmore, Proc. SPIE 8139, 813907 (2011). DOI 10.1117/12.894116 [PDF]

    20. 2010

  20. "EUV Mask Status: Par 13.5," Kenneth A. Goldberg, Invited Presentation, SEMATECH Mask Cleaning Workshop, Monterey, CA September 13, 2010
  21. "Bendable Focusing X-Ray Optics for the ALS and the LCLS/FEL: Design, Metrology, and Performance," V. V. Yashchuk, S. Yuan, S. Baker, J. Bozek, R. Celestre, M. Church, K. A. Goldberg, M. Fernandez-Perea, N. Kelez, M. Kunz, W. R. McKinney, G. Morrison, H. A. Padmore, R. Soufli, N. Tamura, T. Warwick, Workshop on Photon Beamlines & Diagnostics June 29, 2010 LBNL-3559E-Ext-Abs
  22. "Iterative procedure for in-situ optical testing with an incoherent source," R. H. Miyakawa, P. P. Naulleau, Avideh Zakhor, K. A. Goldberg, SPIE 7637, 76361K-1-7 (2010). DOI 10.1117/12.846235 [PDF]
  23. "The SEMATECH Berkeley MET pushing EUV development beyond 22-nm half pitch," P. Naulleau, C. N. Anderson, L.-M. Baclea-an, D. Chan, P. Denham, S. George, K. A. Goldberg, B. H. Hoef, G. Jones, C.-W. Koh, B. M. La Fontaine, B. McClinton, R. Miyakawa, M. W. Montgomery, S. Rekawa, T. I. Wallow, SPIE 7636, 76361J-1-9 (2010). DOI 10.1117/12.848438 [PDF]

    24. 2009

  24. "Surface Slope Metrology on Deformable Soft X-ray Mirrors," S. Yuan, M. Church , R. Celestre, G. Morrison, W. McKinney, T. Warwick, K. Goldberg, V. Yashchuk, The Tenth International Conference on Synchrotron Radiation Instrumentation, Australia , (2009). [PDF]
  25. "Surface slope metrology and interferometric wave front measurements on deformable soft x-ray mirrors performed in the laboratory and in-situ at-wavelength," S. Yuan, M. Church , R. Celestre, G. Morrison, W. McKinney, T. Warwick, K. Goldberg, V. Yashchuk, AIP Conference Proceedings 1234, The Tenth International Conference on Synchrotron Radiation Instrumentation, Melbourne, Australia , (2009).
  26. "The SEMATECH Berkeley microfield exposure tool: learning at the 22-nm node and beyond," P. P. Naulleau, C. N. Anderson, L.-M. Baclea-an, P. Denham, S. Geroge, K. A. Goldberg, M. Goldstein, B. Hoef, R. Hudyma, G. Jones, C. Koh, B. La Fontaine, B. McClinton, R. Miyakawa, W. Montgomery, J. Roller, T. Wallow, and S. Wurm, SPIE 7271 72710W, 72710W-1-11 (2009). DOI 10.1117/12.814232 [PDF]

    27. 2008

  27. "Lateral shearing interferometry for EUV optical testing," Ryan Miyakawa, Patrick P. Naulleau, and Kenneth Goldberg, EUVL Symposium 2008 September 29, 2008
  28. "EUV Optical Testing," Kenneth A. Goldberg, "EUV Lithography," Ed. Vivek Bakshi, SPIE Press (2008). [LINK]
  29. "A Survey of EUV At-Wavelength Optical Testing," K. A. Goldberg, 2008 International Workshop on EUV Lithography , (2008).
  30. "Advanced X-ray Optics Metrology for Nanofocusing and Coherence Preservation," Kenneth A. Goldberg and Valeriy Yashchuk, Synchrotron Radiation News 21 (2), 11-12 (2008). [PDF]

    31. 2006

  31. "Testing EUV optics with EUV light: If you can measure it, you can make it," Kenneth Goldberg, SPIE Newsroom: Optical Design & Engineering , (2006). [LINK]

    32. 2005

  32. "X-ray beam metrology and x-ray optic alignment by Hartmann wavefront sensing," P. Mercère, S. Bucourt, G.Cauchon, D. Douillet, G. Dovillaire, K. A. Goldberg, M. Idir, X. Levecq, T. Moreno, P. P. Naulleau, S. Rekawa, P. Zeitoun, Proc. SPIE 5921, 63-72 (2005).
  33. "EUV Focus Sensor Design Optimization," K. A. Goldberg, M.E. Teyssier, J.A. Liddle, Journal of Vacuum Science and Technology B 23 (6), 2885-90 (2005). DOI 10.1116/1.2134719 [PDF]
  34. "EUV Focus Sensor: Design and Modeling," K. A. Goldberg, M. E. Teyssier, J. A. Liddle, Proc. SPIE 5751, 312-19 (2005). DOI 10.1117/12.601522 [PDF]

    35. 2004

  35. "At-wavelength Alignment and Testing of the 0.3 NA MET Optic," K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, E. H. Anderson, J. A. Liddle, 3rd International EUVL Symposium, Miyazaki, Japan November 2-4, 2004
  36. "X ray Wavefront Hartmann Sensor," P. Mercère, M. Idir, P. Zeitoun, X. Levecq, G. Dovillaire, S. Bucourt, D. Douillet, K. A. Goldberg, P. P. Naulleau, and S. Rekawa , AIP Conf. Proc. 705 1, 819-822 (2004). [PDF]
  37. "At-Wavelength Alignment and Testing of the 0.3 NA MET Optic," K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, E. H. Anderson and J.A. Liddle, Journal of Vacuum Science and Technology B 22 (6), 2956-61 (2004). DOI 10.1116/1.1815303 [PDF]
  38. "Dual-Domain Lateral Shearing Interferometer," P. P. Naulleau, K. A. Goldberg, U.S. Patent No. 6,707,560, March 16, 2004 [PDF]
  39. "EUV interferometric testing and alignment of the 0.3 NA MET optic," K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, J. A. Liddle, E. H. Anderson, Proc. SPIE 5374, 64-73 (2004). DOI 10.1117/12.546199 [PDF]
  40. "At-wavelength interferometry of high-NA diffraction-limited EUV optics," K. A. Goldberg, P. Naulleau, S. Rekawa, P. Denham, J. A. Liddle, E. Anderson, K. Jackson, J. Bokor, D. Attwood, AIP Conf. Proc. 705 1, 855-860 (2004). [PDF]

    41. 2003

  41. "At-wavelength interferometry of the 0.3 NA MET Optic: measurements, alignment, preparations for imaging," K. A. Goldberg, P. Naulleau, et al., , Third Annual SEMATECH International EUVL Symposium, Antwerp, Belgium November, 2003
  42. "New techniques for the measurement of x-ray beam or x-ray optics quality," P. Zeitoun, P. Balcou, S. Bucourt, D. Benredjem, F. Delmotte, G. Dovillaire, D. Douillet, J. Dunn, G. Faivre, M. Fajardo, K. A. Goldberg, M. Idir, S. Hubert, J. Hunter, S. Jacquemot, S. Kazamias, S. le Pape, X. Levecq, C. L. S. Lewis, R. Marmoret, P. Mercère, A. S. Morlens, P. P. Naulleau, C. Remond, J. J. Rocca, S. Sebban, R. F. Smith, M.-F. Ravet, P. Troussel, C. Valentin, and L. Vanbostal, Proc. SPIE 5197, 194-204 (2003). [PDF]
  43. "Preparations for extreme ultraviolet interferometry of the 0.3 numerical aperture Micro Exposure Tool optic," K. A. Goldberg, P. P. Naulleau, P. E. Denham, S. B. Rekawa, K. H. Jackson, J. A. Liddle, B. Harteneck, E. Gullikson, and E. H. Anderson, Journal of Vacuum Science and Technology B 21 (6), 2706-10 (2003). DOI 10.1116/1.1627809 [PDF]
  44. "The effects of radiation induced carbon contamination on the performance of an EUV lithographic optic," A. Barty and K. A. Goldberg, Proc. SPIE 5037, 510-19 (2003). DOI 10.1117/12.499372 [PDF]
  45. "Hartmann wave-front measurement at 13.4 nm with lambdaEUV/120 accuracy," P. Mercère, P. Zeitoun, M. Idir, S. Le Pape, D. Douillet, X. Levecq, G. Dovillaire, S. Bucourt, K. A. Goldberg, P. P. Naulleau, and S. Rekawa, Optics Letters 28 (17), 1534-36 (2003). DOI 10.1364/OL.28.001534 [PDF]
  46. "XUV Hartmann wavefront sensor ," M. Idir, P. Mercère, P. Zeitoun, D. Douillet, X. Levecq, G. Dovillaire, S. Bucourt, K. A. Goldberg, P. P. Naulleau, and S. Rekawa, Eighth Internation Conference on Synchrotron Radiation Instrumentation, August 25-29, 2003, San Francisco, CA , (2003).
  47. "Effects of radiation induced carbon contamination on the performance of an EUV lithographic optic," A. Barty and K. A. Goldberg, Proc. SPIE 5037, 450-59 (2003). [PDF]
  48. "Hybrid shearing and phase-shifting point diffraction interferometer," K. A. Goldberg and P. P. Naulleau, U.S. Patent No. 6,573,997, June 3, 2003 [PDF]
  49. "EUV Interferometry of the 0.3 NA MET Optic," K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, E. H. Anderson, J. A. Liddle, J. Bokor, Proc. SPIE 5037, 69-74 (2003). [PDF]

    50. 2002

  50. "VNL Research in Interferometry for EUV Optics," K. A. Goldberg, P. Naulleau, J. Bokor, P. Denham, S. Rekawam, P. Batson, A. Liddle, B. Harteneck, K. Jackson, E. Anderson, D. Attwood, H. Chapman, A. Barty, G. Sommargren, D. Phillion, J. Taylor, D. Sweeney, First International EUVL Symposium, Addison, Texas October 15-17, 2002
  51. "Graphical user interface for image acquisition and processing," K. A. Goldberg, U.S. Patent No. 6,341,183, January 22, 2002 [PDF]
  52. "Honing the accuracy of extreme ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic," K. A. Goldberg, P. Naulleau, J. Bokor, and H. N. Chapman, Proc. SPIE 4688, 329-337 (2002). [PDF]
  53. "Testing EUV Optics with Visible-Light and EUV Interferometry," K. Goldberg, P. Naulleau, J. Bokor and H. Chapman, Journal of Vacuum Science and Technology B 20 (6), 2834-39 (2002). DOI 10.1116/1.1523401 [PDF]
  54. "Fourier transform interferometer alignment method," K. A. Goldberg, P. Naulleau, and J. Bokor, Applied Optics 41 (22), 4477-83 (2002). DOI 10.1364/AO.41.004477 [PDF]
  55. "VNL Research in Interferometry for EUV Optics," K. A. Goldberg, P. Naulleau, J. Bokor, P. Denham, S. Rekawam, P. Batson, A. Liddle, B. Harteneck, K. Jackson, E. Anderson, D. Attwood, H. Chapman, A. Barty, G. Sommargren, D. Phillion, J. Taylor, D. Sweeney, Presented at the First International EUVL Symposium, Addison, Texas October 15-17, 2002 LBNL-50292

    56. 2001

  56. "At-wavelength testing of the Set-2 ETS projection optic--a four-mirror ring filed aspheric optical system," K. Goldberg, P. Naulleau, P. Denham, P. Batson, S. Rekawa, B. Hoef, E. Anderson, H. Chapman, and J. Bokor, Third International Workshop on Extreme Ultraviolet Lithography, Matsue, Japan October 29-31, 2001 LBNL-50935
  57. "Static microfield printing at the Advanced Light Source with the ETS Set-2 optic," P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, D. O'Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, Third International Workshop on Extreme Ultraviolet Lithography, Matsue, Japan October 29-31, 2001 LBNL-51058
  58. "System integration and performance of the EUV engineering test stand," D. A. Tichenor, A. K. Ray-Chaudhuri, W. Replogle, C. William, R. H. Stulen, G. D. Kubiak, P. D. Rockett, L. E. Klebanoff, K. J. Jefferson, A. Leung, J. B. Wronosky, L. C. Hale, H. N. Chapman, J. S. Taylor, J. A. Folta, C. Montcalm, R. Soufli, E. A. Spiller, K. L. Blaedel, G. E. Sommargren, D. W. Sweeney, P. Naulleau, K. A. Goldberg, E. M. Gullikson, J. Bokor, P. J. Batson, D. T. Attwood, K. H. Jackson, S. D. Hector,C. Gwyn, P. Yan , Proc. SPIE 4343, 19-37 (2001).
  59. "Extremely fine-pitch printing with a 10x Schwarzschild optic at extreme ultraviolet wavelengths," M. Shumway, S. Lee, C. Cho, P. Naulleau, K. Goldberg, and J. Bokor , Proc. SPIE 4343, 357-62 (2001). DOI 10.1117/12.436690
  60. "Phase-shifting point diffraction interferometer grating designs," P. Naulleau, K. A. Goldberg, E. Tejnil, U.S. Patent No. 6,195,169, February 27, 2001 [PDF]
  61. "Interferometric at-wavelength flare characterization of EUV optical systems," P. Naulleau, K. A. Goldberg, U.S. Patent No. 6,233,056, May 15, 2001 [PDF]
  62. "Fourier-transform and global contrast interferometer alignment methods," K. A. Goldberg, U.S. Patent No. 6,239,878, May 29, 2001 [PDF]
  63. "Extreme-ultraviolet lensless Fourier-transform holography," S. H. Lee, P. Naulleau, K. A. Goldberg, C. H. Cho, S. Jeong, J. Bokor, Applied Optics 40 (16), 2655-2661 (2001). DOI 10.1364/AO.40.002655 [PDF]
  64. "Tolerancing of diffraction-limited Kirkpatrick-Baez synchrotron beamline optics for extreme-ultraviolet metrology," P. P. Naulleau, K. A. Goldberg, P. J. Batson, S. Jeong, and J. H. Underwood, Applied Optics 40 (22), 3703-3709 (2001). DOI 10.1364/AO.40.003703 [PDF]
  65. "Wave-front measurement errors from restricted concentric subdomains," K. A. Goldberg, K. Geary, Journal of the Optical Society of America A 18 (9), 2146-52 (2001). DOI 10.1364/JOSAA.18.002146 [PDF]
  66. "Phase-shifting point diffraction interferometer mask designs," K. A. Goldberg, U.S. Patent No. 6,307,635, October 23, 2001 [PDF]
  67. "Fourier transform method of phase-shift determination," K. A. Goldberg and J. Bokor, Applied Optics 40 (17), 2886-94 (2001). DOI 10.1364/AO.40.002886 [PDF]
  68. "At-wavelength characterization of the extreme ultraviolet Engineering Test Stand Set-2 optic," P. Naulleau, K. A. Goldberg, E. H. Anderson, P. Batson, P. E. Denham, K. H. Jackson, E. M. Gullikson, S. Rekawa, and J. Bokor, Journal of Vacuum Science and Technology B 19 (6), 2396-2400 (2001). DOI 10.1116/1.1421545 [PDF]

    69. 2000

  69. "At-wavelength characterization of DUV-radiation-induced damage in fused silica," S. H. Lee, F. Piao, P. Naulleau, K. A. Goldberg, W. Oldham, and J. Bokor, Proc. SPIE 3998, 724-31 (2000). DOI 10.1117/12.386529 [PDF]
  70. "Phase-shifting point-diffraction interferometry at 193 nm," S. H. Lee, P. Naulleau, K. A. Goldberg, F. Piao, W. Oldham, J. Bokor , Applied Optics 39 (31), (2000). DOI 10.1364/AO.39.005768 [PDF]
  71. "The EUV phase-shifting point diffraction interferometer," P. Naulleau, K. Goldberg, S. Lee, C. Chang, D. Attwood, and J. Bokor, Synchrotron Radiation Instrumentation: 11th US National Conference, 1999, P. Pianetta, et al.,(eds.) CP521, 66-72 (2000).
  72. "At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems," P. Naulleau, K. Goldberg, E. Gullikson, and J. Bokor, Applied Optics 39 (17), 2941-47 (2000). DOI 10.1364/AO.39.002941 [PDF]
  73. "The PS/PDI: a high accuracy development tool for diffraction limited short-wavelength optics," P. Naulleau, K. Goldberg, S. Lee, C. Chang, P. Batson, D. Attwood, and J. Bokor, AIP Conf. Proc. 507, 595 (2000). [PDF]
  74. "EUV Interferometry of a Four-Mirror Ring-Field EUV Optical System," K. A. Goldberg, P. Naulleau, P. J. Batson, P. Denham, J. Bokor, and H. N. Chapman, Proc. SPIE 3997, 867-73 (2000). DOI 10.1117/12.390045 [PDF]
  75. "Extreme ultraviolet holographic microscopy and its application to extreme ultraviolet mask-blank defect characterization," S. H. Lee, J. Bokor, S. Jeong, and K. Goldberg, Journal of Vacuum Science and Technology B 18 (6), 2935-8 (2000). DOI 10.1116/1.1314382 [PDF]
  76. "Extreme ultraviolet carrier-frequency shearing Interferometry of a lithographic four-mirror optical system," P. P. Naulleau, K. A. Goldberg and J. Bokor, Journal of Vacuum Science and Technology B 18 (6), 2939-43 (2000). DOI 10.1116/1.1321290 [PDF]
  77. "Extreme ultraviolet alignment and testing of a four mirror aspheric extreme ultraviolet optical system," K. A. Goldberg, P. Naulleau, P. Batson, P. Denham, H. Chapman, and J. Bokor, Journal of Vacuum Science and Technology B 18 (6), 2911-15 (2000). DOI 10.1116/1.1319703 [PDF]
  78. "Dual domain phase-shifting point diffraction interferometer," P. Naulleau and K. Goldberg, U.S. Patent No. 6,100,978, August 8, 2000 [PDF]
  79. "Null test Fourier domain alignment technique for phase-shifting point diffraction interferometer," P. Naulleau and K. Goldberg, U.S. Patent No. 6,111,646, August 29, 2000 [PDF]
  80. "In Situ alignment system for phase-shifting point-diffraction interferometry," K. Goldberg and P. Naulleau, U.S. Patent No. 6,118,535, September 12, 2000 [PDF]

    81. 1999

  81. "Interferometric at wavelength flare characterization of EUV optical systems," P. Naulleau, K. Goldberg, E Gullikson, and J. Bokor, The Advanced Light Source Users Meeting
  82. "Extreme ultraviolet interferometric measurement and alignment of diffraction-limited optics," K. A. Goldberg, P. Naulleau, J. Bokor, P. Batson, P. Denham, E. Anderson, S. Lee, and C. Chang, The Advanced Light Source Users Meeting
  83. "Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy," P. P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, D. Attwood, and J. Bokor, Applied Optics 38 (35), 7252-63 (1999). DOI 10.1364/AO.38.007252 [PDF]
  84. "Dual-domain point diffraction interferometer," P. P. Naulleau and K. A. Goldberg, Applied Optics 38 (16), 3523-33 (1999). DOI 10.1364/AO.38.003523 [PDF]
  85. "Interferometric at-wavelength flare characterization of EUV optical systems," P. Naulleau, K. A. Goldberg, E. M. Gullikson, and J. Bokor, Journal of Vacuum Science and Technology B 17 (6), 2987-91 (1999). DOI 10.1116/1.590940 [PDF]
  86. "Extreme ultraviolet interferometric measurements of diffraction-limited optics," K. A. Goldberg, P. Naulleau, and J. Bokor, Journal of Vacuum Science and Technology B 17 (6), 2982-86 (1999). DOI 10.1116/1.590939 [PDF]
  87. "Recent advances in EUV phase-shifting point diffraction interferometry," P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, P. Batson, D. Attwood, and J. Bokor, Proc. SPIE 3767, 154-63 (1999). DOI 10.1117/12.371113 [PDF]
  88. "Direct comparison of EUV and visible-light interferometries," K. A. Goldberg, P. Naulleau, S. H. Lee, C. Chang, C. Bresloff, R. Gaughan, H. N. Chapman, J. Goldsmith, and J. Bokor, Proc. SPIE 3676, 635-42 (1999). DOI 10.1117/12.351138 [PDF]
  89. "Testing extreme ultraviolet optical systems at-wavelength with sub-angstrom accuracy," K. A. Goldberg, in Fabrication and Testing of Aspheres, J. S. Taylor, M. Piscotty, and A. Lindquist, (eds.) (Optical Society of America, Washington, D.C., 1999) , (1999). [PDF]

    90. 1998

  90. "At-wavelength metrologies for extreme ultraviolet lithography," D. Attwood, E. Anderson, P. Batson, R. Beguiristain, J. Bokor, K. Goldberg, E. Gullikson, K. Jackson, K. Nguyen, M. Koike, H. Medecki, S. Mrowka, R. Tackaberry, E. Tejnil, and J. Underwood, Future Electron Devices Journal Vol. 9 (Suppl. 1), 5-14 (1998). [PDF]
  91. "High-accuracy interferometry of EUV lithographic optical systems," K. A. Goldberg, P. Naulleau, S. Lee, C. Bresloff, D. Attwood, and J. Bokor, Journal of Vacuum Science and Technology B 16 (6), 3435-39 (1998). DOI 10.1116/1.590498 [PDF]
  92. "Phase effects owing to multilayer coatings in a two-mirror extreme-ultraviolet Schwarzschild objective," E. Tejnil, K. A. Goldberg, J. Bokor, Applied Optics 37 (34), 8021-9 (1998). DOI 10.1364/AO.37.008021 [PDF]
  93. "At-wavelength interferometry of Extreme Ultraviolet Lithographic Optics," S. H. Lee, P. Naulleau, K. A. Goldberg, E. Tejnil, H. Medecki, C. Bresloff, C. Chang, D. T. Attwood, and J. Bokor, AIP Conference Proceedings, (no. 449), (Characterization and Metrology for ULSI Technology, 1998 International Conference, Gaithersburg, MD, USA, 1998.) , pp. 553-7 (1998).
  94. "Characterization of the accuracy of EUV phase-shifting point diffraction interferometry," P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, C. Bresloff, P. Batson, D. Attwood, and J. Bokor, in Emerging Lithographic Technologies II, Y. Vladimirski, (ed.), Proc. SPIE 3331, 114-23 (1998). [PDF]
  95. "Point Diffraction Interferometry: An EUV Projection Lithography System Alignment and Qualification Tool," P. Naulleau, K. Goldberg, S. Lee, C. Bresloff, D. Attwood, and J. Bokor, Optical Fabrication and Testing, OSA Technical Digest Series Vol. 12 117-119, (1998).
  96. "EUV interferometry: an accuracy standard for diffraction-limited EUV optics," K. A. Goldberg, P. Naulleau, S. Lee, C. Chang, C. Bresloff, P. Denham, P. Batson, D. Attwood, and J. Bokor, The Advanced Light Source Users Meeting 1998 LBNL-42336

    97. 1997

  97. "Extreme Ultraviolet Interferometry," K. A. Goldberg, Doctoral Dissertation, Department of Physics, University of California, Berkeley (1997). [LINK]
  98. "At-wavelength interferometry for EUV lithography," E. Tejnil, K. A. Goldberg, S. H. Lee, H. Medecki, P. J. Batson, P. E. Denham, A. A. MacDowell, and J. Bokor, Journal of Vacuum Science and Technology B 15 (6), 2455-2461 (1997). DOI 10.1116/1.589666 [PDF]
  99. "Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry," K. A. Goldberg, E. Tejnil, S. H. Lee, H. Medecki, D. T. Attwood, K. H. Jackson, and J. Bokor, Proc. SPIE 3048, 264-70 (1997). [PDF]

    100. 1996

  100. "A 3-D numerical study of pinhole diffraction to determine the accuracy of EUV point diffraction interferometry," K. A. Goldberg, E. Tejnil, and J. Bokor, Extreme Ultraviolet Lithography, G. Kubiak and D. Kania, eds. (Trends in Optics and Photonics, Volume 13, Optical Society of America, Washington, D.C., 1996). , pp. 133-137 (1996). [PDF]
  101. "Phase-shifting point diffraction interferometry for at-wavelength testing of lithographic optics," E. Tejnil, K. A. Goldberg, H. Medecki, R. Beguiristain, J. Bokor, and D. T. Attwood, Extreme Ultraviolet Lithography G. Kubiak and D. Kania, eds. (Optical Society of America, Washington, D.C., 1996) , pp. 118-23 (1996). [PDF]
  102. "Phase-Shifting Point Diffraction Interferometer," H. Medecki, E. Tejnil, K. A. Goldberg, and J. Bokor, Optics Letters 21 (19), 1526-8 (1996). DOI 10.1364/OL.21.001526 [PDF]
  103. "Interferometry using undulator sources," R. Beguiristain, K. A. Goldberg, E. Tejnil, Review of Scientific Instruments 67 (9), 3353 (1996). DOI 10.1063/1.1147396 [PDF]

    104. 1995

  104. "At-wavelength testing of optics for EUV," K. A. Goldberg, R. Beguiristain, J. Bokor, H. Medecki, K. Jackson, and D. T. Attwood, G. E. Sommargren, J. P. Spallas, R. Hostetler, Proc. SPIE 2437, 347-54 (1995). DOI 10.1117/12.209172 [PDF]
  105. "Progress toward lambda/20 EUV interferometry," K. A. Goldberg, R. Beguiristain, J. Bokor, H. Medecki, D. T. Attwood, K. Jackson, E. Tejnil, G. E. Sommargren, Journal of Vacuum Science and Technology B 13 (6), 2923-7 (1995). DOI 10.1116/1.588280 [PDF]

    106. 1994

  106. "Point Diffraction Interferometry at EUV Wavelengths," K. A. Goldberg, R. Beguiristain, J. Bokor, H. Medecki, K. Jackson, and D. T. Attwood, in Extreme Ultraviolet Lithography, F. Zernike and D. T. Attwood (eds.), (Optical Society of America, Washington, D.C. 1994) , 134-41 (1994).