Links to download presentations by, or co-authored by, Kenneth Goldberg. Downloads should begin automatically. Note that the files are large, and the PowerPoint files contain animations that only play in presentation mode.
2019 SPIE Advances in Metrology for X-Ray and EUV Optics VIII (Invited)
"Collaborative development of diffraction-limited beamline optical systems at US DOE light sources" [44.3 MB, PPTX]
Report on a DOE-sponsored 4-lab collaboration to develop technologies for wavefront-preserving high-coherent-flux beamlines. LBNL, SLAC, ANL, and BNL teams participated in the development of adaptive mirrors and at-wavelength wavefront sensing.
2019 Energy Sciences Area (ESA) Forum at LBNL
"Make every nanometer count with ALS-U" [28.6 MB, PPTX]
An introductory talk for a forum on the Advanced Light Source Upgrade Project (ALS-U), presented by scientists working on instrumentation development. This presentation describes the historical context of coherent x-ray synchrotron lightsources leading to the ALS and its upgrade.
2018 Synchrotron Radiation Instrumentation (SRI 2018), International Workshop on X-Ray Metrology (IWXM), Hsinchu, Taiwan
"Design of shearing and Hartmann wavefront sensors for diffraction-limited beamlines" [13.4 MB, PPTX]
Exploring design and implementation of at-wavelength wavefront sensing for coherent x-ray beamlines.
2017 Photon Diag (Best Oral Presentation Award)
"Non-invasive Wavefront Sensing & Wavefront Preservation Technologies for ALS-U" [39.1 MB, PPTX]
Discussion of wavefront preserving technologies and wavefront metrics for diffraction-limited short-wavelength optics, and a consideration of non-invasive wavfront sening modes being considered.
2015 EUVL Symposium
"Actinic mask imaging: Taking a SHARP look at next generation photomasks " [13.9 MB, PPTX]
Exploring SHARP's advanced capabilities with measurements showing 22-nm hp mask-scale resolution, advanced coherence control for EUV Source Mask Optimization (SMO), and the first demonstration of EUV anamorphic mask imaging emulation.
2015 SPIE Photomask BACUS
"EUV actinic brightfield mask microscopy for predicting defect aerial images" [56 MB, PPTX]
Looking at numerous mask defects, comparing (1) SHARP Actinic imaging, (2) NXE 3100 Wafer SEMS, and (3) Reticle SEM images.
2015 EIPBN
"Demonstration of 22-nm half-pitch resolution at the SHARP microscope" [13.1 MB, PPTX]
Overview of SHARP's advanced imaging capabilities with a demonstration of pushing the microscope to its physical, real-space imaging resolution limit.
2015 SHARP Promotion
"Why Sharp?" [10.3 MB, PDF]
SHARP fills a gap for forward-looking, 2nd- and 3rd-generation EUVL technologies. (1) Extend beyond 0.33-NA (2) Customize the illumination for SMO and the emulation of FlexRay pupils. (3) Recover defect phase and amplitude information. (4) Anamorphic (4x/8x magnification) imaging later in 2015. (5) Image multilayer-coated "wafer masks," and masks created with experimental mask materials that may not be allowed in fabs.
2015 SPIE Advanced Lithography
"Enhancing Defect Detection with Zernike Phase Contrast in EUV Multilayer Blank Inspection" [1.4 MB, PDF]
Experimental demonstration of enhanced phase-defect detection sensitivity using Zernike phase-contrast lenses in the SHARP EUV mask-imaging microscope.
2015 SPIE Advanced Lithography
"A Method of Image-Based Aberration Metrology for EUVL Tools" [0.8 MB, PDF]
Using aberration-sensitive mask patterns to extract amplitude and phase variations in the SHARP EUV microscope.
2015 SPIE Advanced Lithography
"New Ways of Looking at Masks with the SHARP EUV Microscope" [25 MB, PPTX]
Discussion of forward-looking EUV mask research being conducted on SHARP, including ultra-high resolution, source-mask optimization, phase imaging, sub-reolution assist features (SRAF), telecentricity measurements, anamorphic imaging, and more.
2015 SPIE Advanced Lithography
"Aberration estimation using EUV mask roughness" [1.2 MB, PDF]
A method to extract wavefront aberrations from through-focus aerial image measurements of mask roughness, and examples from the SHARP microscope.
2015 SPIE Advanced Lithography
"Phase measurements of EUV mask defects" [2.1 MB, PDF]
Using a quantitative phase retrieval algorithm based on the Weak Object Transfer Function to characterize EUV mask defects, using the SHARP microscope.
2014 SHARP Promotion
"SHARP: SEMATECH High-NA Actinic Reticle Review Project, December 2014" [13 MB, PPTX]
SHARP's capabilities and specifications for state of the art EUV photomask research
2014 EUVL Symposium
"New Source and Imaging Capabilities of the SHARP EUV Mask Microscope" [24 MB, PPTX]
Advanced imaging capabilities, phase imaging, and the future of SHARP, October 2014.
2014 SPIE Photomask BACUS
"A broader view on EUV-masks" [15.7 MB, PPTX]
Advanced microscopy techniques for EUV photomasks, now available in the SHARP EUV microscope
2014 Photomask Japan (PMJ)
"Actinic Mask Imaging: Emulating Current and Future Litho Tools with the SHARP EUV Microscope" [45 MB, PPTX]
An overview of SHARP's research and capabilities in early 2014 with an emphasis on imaging and coherence engineering, April 2014.
2014 SPIE Advanced Lithography
"Actinic mask imaging: Recent results and future directions from the SHARP EUV Microscope" [30 MB, PPTX]
An overview of SHARP's research and capabilities from 2013 with examples of imaging at different NA values, coherent control, and tool properties, February 2014.
2013 SPIE Photomask BACUS (Best Oral Presentation Award)
"The SEMATECH high-NA actinic reticle review project, an EUV mask-imaging microscope" [32 MB, PDF]
SHARP imaging of mask defects and substrate roughness, tool capabilities, and coherence control demonstrations, September 2013.
2013 Synchrotron Radiation Instrumentation (SRI 2013)
"Fourier Synthesis Illuminator for EUV mask inspection tool" [23.5 MB, PPTX]
Description and demonstration of the SHARP Fourier-synthesis illuminator for coherence control and uniformity.
2013 SPIE Advanced Lithography
"Commissioning an EUV Mask Microscope for Lithography generations Reaching 8 nm" [44 MB, PDF]
Introduction to the SHARP EUV mask microscope, and early demonstration of its capabilities, February 2013.
2012 ASPE--American Society for Precision Engineering
"Creating an EUV Mask Microscope for Lithography generations Reaching 8 nm" [44 MB, PDF]
The design and building of SHARP, with an emphasis on precision engineering, August 2012.
2011 ALS Users' Meeting LUXOR Workshop
"At-wavelength Metrology for Nanofocusing" [22.4 MB, PPTX]
Consideration of at-wavelength interferometry tools used to enable diffraction-limited performance on beamline optics. Experience is derived from decades of work in this area, and a recent LDRD on this topic.
2011 EUVL Workshop
"Developing a New State of the Art EUV Mask Imaging Research Tool at Berkeley" [18.1 MB, PPTX]
A discussion of the value of at-wavelength EUV microscopy for photomask imaging, based on work conducted with the SEMATECH-funded AIT at LBNL, and a proposal for a new tool, then called AIT5, which later became the SHARP microscope.
2011 SPIE Advanced Lithography
"An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm" [19 MB, PDF]
The early conceptial design for an advanced EUV Mask microscope targeting EUVL generations down to almost 6 nm, with data from its predecessor, the AIT, February 2011.
2010 SRI--Synchrotron Radiation Instrumentation
"At-wavelength Interferometric KB Mirror Alignment and Optimization" [22 MB, PPTX]
The development and exploration of in-situ wavefront testing and alignment for the creation of diffraction-limited beamline optics.
2009 EUVL Workshop
"Wavelength-Specific Reflections: A Decade of EUV Mask Inspection Research" [22.9 MB, PPT]
An historical retrospective of different at-wavelength, EUV mask inspection and imaging projections covering 1995 to 2009.
2008 SPIE Photomask BACUS
"Benchmarking EUV Mask Inspection Beyond 0.25 NA" [13 MB, PPT]
Dramatic improvements and demonstration of the quality of EUV mask imaging with the AIT.
2005 SPIE Optics for EUV, X-Ray, and Gamma-Ray Astronomy II
"Ultra-high-accuracy optical testing: creating diffraction-limited short-wavelength optical systems" [10 MB, PPT]
An overview of EUV interferometry methods and results from numerous optics created for EUV lithography research.
2003 EUVL Symposium
"At-Wavelength Interferometry of the 0.3-NA MET Optic" [5 MB, PPT]
EUV interferometric testing and alignment of the MET, with comparison to visible-light interferometry.
2003 SEMATECH Resist Advisory Group
"EUV MET Progress Report: At-wavelength interferometry, alignment, preparations for imaging" [6.5 MB, PPT]
Report on the implementation of a 0.3-NA EUV microfield exposure tool at LBNL's Advanced Light Source. I describe the use of at-wavelength, EUV interferometry for system alignment, achieving diffraction-limited performance.
2003 LBNL Material Sciences Division Retreat
"Sub-Å-accuracy Optical Testing for Diffraction-Limited EUV Optics" [5.4 MB, PDF]
A brief retrospective of EUV interferometry and optics testing at LBNL. A series of lenses, with increasing resolution and quality have been studied for the advancement of EUV Lithography.
