OPTICAL PHYSICIST, Lawrence Berkeley National Laboratory
EUV and X-ray optics, Instrumentation, Microscopy and imaging, Coherence, Optical testing, Diffractive optics, Adaptive optics, Synchrotron radiation, X-Ray Beamlines, EUV lithography, Optical modeling
EDUCATION
- Ph.D. Physics: University of California, Berkeley,
PhD Dissertation: Extreme Ultraviolet Interferometry. Advisors: Jeffrey Bokor, Roger Falcone. - M.A. Physics: University of California, Berkeley
- A.B. Physics and Applied Mathematics: University of California, Berkeley
Honors Thesis: Prepulse energy suppression of ultrashort laser pulses using second harmonic generation in nonlinear media. Advisor: Roger Falcone. - Lowell High School: San Francisco, CA
PROFESSIONAL ROLES at LAWRENCE BERKELEY NATIONAL LABORATORY
- 2022– Photon Sciences Development Group Lead, Advanced Light Source Division
- 2019–22 Diagnostics Lead, Advanced Light Source Division, ALS Upgrade Project
- 2016–19 Beamlines and Optical Systems Lead, ALS Upgrade Project
- 2015– Staff Scientist, Advanced Light Source Division, ALS Upgrade Project
- 2010–15 Deputy Director, Center for X-Ray Optics, Materials Sciences Division
- 1997–2015 Staff Scientist, Center for X-Ray Optics, Materials Sciences Division
PRIMARY PROJECTS at LAWRENCE BERKELEY NATIONAL LABORATORY
- 2022– Lab-Directed R&D, Optimized Protein Crystallography Beamlines for ALS and ALS-U, Co-PI
- 2019–20 Lab-Directed R&D, X-Ray Orbital Angular Momentum, Participating Scientist
- 2016–18 DOE Basic Energy Sciences, Wavefront Preserving Mirrors, co-PI, LBNL Lead
- 2016–18 Lab-Directed R&D, X-Ray Fourier Transform Spectroscopy, Participating Scientist
- 2016–19 Beamlines and Optical Systems Lead for ALS Upgrade Project
- 2011–15 SHARP High-NA Actinic Reticle review Project (SHARP), PI
- 2009–11 Lab-Directed R&D, X-Ray Optical Metrology, MSD/ALS, Co-PI
- 2005–12 EUV Mask Inspection and Imaging, Actinic Inspection Tool (AIT), PI
- 2003–05 EUV Lithography, Microfield Exposure Tool (MET)
- 2001–03 EUV 5x Lithographic Optic Interferometry, 0.3 NA
- 1997–01 EUV 4x Lithographic Optic Interferometry, 0.1 NA
- 1996–00 EUV 10x Lithographic Optic Interferometry, 0.1 NA
- 1993–95 Extreme Ultraviolet (EUV) Optical Testing, 0.1 NA
HONORS AND AWARDS
- 2021 LBNL Director’s Award for Tech Transfer, EUV Lithography
- 2021 Elected Optica Fellow (formerly Optical Society of America, OSA)
- 2021 Elected SPIE Senior Member
- 2017 Best Oral Presentation Award, Photon Diagnostics (PhotonDiag) Meeting, SLAC
- 2013 Best Oral Presentation Award, SPIE Photomask BACUS Meeting
- 2003 R&D 100 Award, “Editor’s Choice” distinction, Extreme Ultraviolet Lithography
- 2003 Federal/Laboratory Consortium for Technology Transfer, recognition for participation in the Extreme Ultraviolet Lithography Tool.
- 1998 Advanced Light Source Halbach Prize for Instrumentation, EUV Interferometry
AT UC BERKELEY
- 1993 Outstanding Graduate Student Instructor, Physics Department
- 1992 Physics Department Citation, Outstanding Graduating Senior
- 1991 McDonald Scholarship, UC Berkeley Physics Department
- 1991 Phi Beta Kappa
- 1987 Chancellor’s Scholarship, UC Berkeley
- 1987 California Alumni Association Scholarship
SELECTED PROFESSIONAL ACTIVITIES
- 2020– SPIE Advanced Lithography and Patterning, Advisory Committee
- 2015–19 SPIE Advanced Lithography, EUV Lithography: Conference Chairman
- 2007–10 Advanced Light Source Users Executive Committee (ALS UEC): 2009 Chairman
- 2007– Kanayama Consulting, Owner. Software for EUV photomask aerial-image processing.