Recent and future conferences that I am involved in or organizing.
[Fall 2018] 6th Diffraction-Limited Storage Ring (DLSR) Workshop
29-31 October, 2018 • Lawrence Berkeley National Laboratory, Berkeley, California, USA
This is the sixth in a series of workshops addressing the science and technology of building and using the next generation of storage rings, where shrinking electron beam sizes lead to dramatic increases in source brightness and coherent properties. This workshop will focus on opportunities at new and emerging facilities, science enabled by the new optical properties, and the development of accelerator and experimental systems to create and utilize powerful, ultra-bright x-ray beams. This meeting will have special emphasis on soft and tender x-ray technologies. The meeting is currently in the planning phase and invitations have not been sent.
[Winter 2019] SPIE Advanced Lithography—Extreme Ultraviolet (EUV) Lithography X
24 February – 28 February 2019 • San Jose, California, USA
SPIE Advanced Lithography, the premier conference for the lithography community. For over 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry.
[Winter 2018] SPIE Advanced Lithography—Extreme Ultraviolet (EUV) Lithography IX
25 February – 1 March 2018 • San Jose, California, USA
[Winter 2017] SPIE Advanced Lithography—Extreme Ultraviolet (EUV) Lithography VIII
26 February – 2 March 2017 • San Jose, California, USA
[Spring 2017] PhotonDiag 2017
1 – 3 May, 2017 • SLAC, California, USA
The workshop will cover the progresses and recent achievement in the field of X-ray photon diagnostic and photon transport.
[Summer 2017] SPIE Advances in Metrology for X-Ray and EUV Optics VI
6 – 10 August 2017 • San Diego, California, USA
This conference will address the broad issues in the growing and very demanding field of surface me- trology and characterization of optics for EUV/X-Ray synchrotron and FEL radiation and for other EUV/X- Ray applications such as astronomical imaging, solar physics, and lithography. Improving the performance of existing instrumentation and techniques, as well as developing new and novel ones, is critical for the fabrication of high-quality optics to meet current and future requirements for these applications.
[Winter 2016] SPIE Advanced Lithography—Extreme Ultraviolet (EUV) Lithography VII
21 February – 25 February 2016 • San Jose, California, USA
[Summer 2015] IWXM 2015—International Workshop on X-Ray Optics and Metrology
13 – 16 July, 2015 • Lawrence Berkeley National Laboratory, Berkeley, California, USA
The International Workshop on X-ray Optics and Metrology (IWXM 2015) was held at the Advanced Light Source (ALS) in Berkeley, California, USA as a satellite meeting of SRI 2015.