Education
Ph.D. PhysicsUniversity of California, Berkeley
Dissertation: Extreme Ultraviolet Interferometry
1992-97
M.A. PhysicsUniversity of California, Berkeley
1994
A.B. Physics and Applied MathematicsUniversity of California, Berkeley
1987-92
Lowell High SchoolSan Francisco, CA
1987
Employment
Staff Physicist,
Center for X-Ray Optics (CXRO)Lawrence Berkeley National Laboratory (LBNL)
1997-present
Honors
R&D 100 Award"Editor's Choice" distinction, Extreme Ultraviolet Lithography
2003
Federal/Laboratory Consortium for Technology TransferRecognition for participation in the Extreme Ultraviolet Lithography Tool
2003
Outstanding Performance AwardLawrence Berkeley National Laboratory
2002
Outstanding Performance AwardLawrence Berkeley National Laboratory
2000
Outstanding Performance AwardLawrence Berkeley National Laboratory
1999
Halbach Prize for InstrumentationAdvanced Light Source
1998
Outstanding Graduate Student Instructor AwardUC Berkeley Department of Physics
1993
UC Berkeley Physics Department CitationOutstanding Graduating Senior
1992
McDonald ScholarshipUC Berkeley Department of Physics
1991-92
Phi Beta Kappa1991
Chancellor's ScholarshipUC Berkeley
1987-91
California Alumni Association ScholarshipUC Berkeley
1987
Key Publications and Patents (complete list)
EUV Interferometry of the 0.3 NA MET Optic
K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, E. H. Anderson, J. A. Liddle, J. Bokor, Proc. SPIE 5037, 69-74 (2003).
K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, E. H. Anderson, J. A. Liddle, J. Bokor, Proc. SPIE 5037, 69-74 (2003).
Dual-Domain Lateral Shearing Interferometer
P. P. Naulleau, K. A. Goldberg, U.S. Patent No. 6,707,560, March 16, 2004.
P. P. Naulleau, K. A. Goldberg, U.S. Patent No. 6,707,560, March 16, 2004.
Fourier-transform and global contrast interferometer alignment methods
K. A. Goldberg, U.S. Patent No. 6,239,878, May 29, 2001.
K. A. Goldberg, U.S. Patent No. 6,239,878, May 29, 2001.
In Situ alignment system for phase-shifting point-diffraction interferometry
K. Goldberg and P. Naulleau, U.S. Patent No. 6,118,535, September 12, 2000.
K. Goldberg and P. Naulleau, U.S. Patent No. 6,118,535, September 12, 2000.
Fourier-transform interferometer alignment methods
K. A. Goldberg, P. Naulleau, and J. Bokor, Applied Optics 41 (22), 4477-83 (2002).
K. A. Goldberg, P. Naulleau, and J. Bokor, Applied Optics 41 (22), 4477-83 (2002).
Testing EUV Optics with Visible-Light and EUV Interferometry
K. Goldberg, P. Naulleau, J. Bokor and H. Chapman, Journal of Vacuum Science and Technology B 20 (6), 2834-39 (2002).
K. Goldberg, P. Naulleau, J. Bokor and H. Chapman, Journal of Vacuum Science and Technology B 20 (6), 2834-39 (2002).
Fourier-transform method of phase-shift determination
K. A. Goldberg and J. Bokor, Applied Optics 40 (17), 2886-94 (2001).
K. A. Goldberg and J. Bokor, Applied Optics 40 (17), 2886-94 (2001).
Wave-front measurement errors from restricted concentric subdomains
K. A. Goldberg, K. Geary, Journal of the Optical Society of America A 18 (9), 2146-52 (2001).
K. A. Goldberg, K. Geary, Journal of the Optical Society of America A 18 (9), 2146-52 (2001).
A Dual-domain point diffraction interferometer
P. P. Naulleau and K. A. Goldberg, Applied Optics 38 (16), 3523-33 (1999).
P. P. Naulleau and K. A. Goldberg, Applied Optics 38 (16), 3523-33 (1999).
A Phase-Shifting Point Diffraction Interferometer
H. Medecki, E. Tejnil, K. A. Goldberg, and J. Bokor, Optics Letters 21 (19), 1526-8 (1996).
H. Medecki, E. Tejnil, K. A. Goldberg, and J. Bokor, Optics Letters 21 (19), 1526-8 (1996).
Selected Recent Presentations (longer list)
Ultra-high-accuracy optical testing: creating diffraction-limited short-wavelength optical systems
SPIE Optics and Photonics 2005
SPIE Optics and Photonics 2005
2005
Sub-Å-Accuracy Optical Testing for Diffraction-Limited EUV Optics
LBNL Materials Sciences Division, Director's Review
LBNL Materials Sciences Division, Director's Review
2003
Selected Professional Activities
Member, SPIE -- The international society for optical engineers
Member, OSA -- The Optical Society of America
Program Committee/Section Head, "EUV Lithography"
The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN)
The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN)
2001-2006
Program Committee, "Advances in Metrology for X-Ray and EUV Optics"
SPIE Optics and Photonics, San Diego, CA
SPIE Optics and Photonics, San Diego, CA
2005
Session Co-chairman, "EUV Multilayers and Gratings"
SPIE Annual Meeting, Denver, CO
SPIE Annual Meeting, Denver, CO
1999
