CXRO EUV Interferometry and Actinic Mask Inspection Publications Database

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Publications in extreme ultraviolet interferometry, EUV Lithography, EUV and soft x-ray optics testing, actinic (EUV) mask inspection, methods in ultra-high accuracy interferometry, coherent short-wavelength optics, techniques for optics in synchrotron radiation beamlines, and more. The list may be sorted, reformatted, and searched using the tools at left.

2013

1) L. Sun, S. Raghunathan, V. Jindal, E. Gullikson, P. Mangat, I. Mochi, K. A. Goldberg, M. P. Benk, O. Kritsun, T. Wallow, D. Civay, and O. Wood, "Application of phase shift focus monitor in EUVL process control," SPIE 8679 86790T, (2013). [LINK] Beamline 11.3.2,6.3.2 DOI 10.1117/12.2011342

2) V. V. Yashchuk, D. J. Merthe, K. A. Goldberg, N. A. Artemiev, R. Celestre, E. E. Domning, M. Kunz, W. R. McKinney, G. Y. Morrison, B. V. Smith, N. Tamura, "Experimental methods for optimal tuning and alignment of bendable mirrors for diffraction-limited soft x-ray focusing," Journal of Physics: Conf. Ser. 425 (152003 ), (2013). [LINK] Beamline 5.3.1

3) K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, "Commissioning an EUV mask microscope for lithography generations reaching 8 nm," SPIE 8679 867919, (2013). [LINK] Beamline 11.3.2 DOI 10.1117/12.2011688

4) G. R. McIntyre, E. E. Gallagher, T. E. Robinson, Smith, A. C., M. Lawliss, J. LeClaire, R. Bozak, R. White, M. Archuletta, "Through-focus EUV multilayer defect repair with nanomachining," SPIE 8679 86791I, (2013). Beamline 11.3.2 DOI 10.1117/12.2014935

5) D. J. Merthe, K. A. Goldberg, V. V. Yashchuk, W. R. McKinney, R. Celestre, I. Mochi, J. MacDougall, G. Y. Morrison, S. B. Rekawa, E. Anderson, B. V. Smith, E. E. Domning, H. Padmore, "In Situ Fine Tuning of Bendable Soft X-ray Mirrors using a Lateral Shearing Interferometer," Nuclear Instruments and Methods in Physics Research A 710 (2013), 82-86 (2013). [LINK] Beamline 5.3.1 DOI 10.1016/j.nima.2012.10.105

6) D. J. Merthe, V. V. Yashchuk, K. A. Goldberg, M. Kunz, N. Tamura, W. R. McKinney, N. A. Artemiev, R. S. Celestre, G. Y. Morrison, E. H. Anderson, B. V. Smith, E. E. Domning, S. B. Rakawa, H. Padmore, "Methodology for optimal in situ alignment and setting of bendable optics for nearly diffraction-limited focusing of soft x-rays," Opt. Eng. 52 (3), 033603-1-13 (2013). [LINK] Beamline 5.3.1 DOI 10.1117/1.OE.52.3.033603

7) Kenneth A. Goldberg, Valeriy V. Yashchuk, Nikolay A. Artemiev, Richard Celestre, Weilun Chao, Eric M. Gullikson, Ian Lacey, Wayne R. McKinney, Daniel Merthe, Howard A. Padmore, "Metrology for the Advancement of X-ray Optics at the ALS," Synchrotron Radiation News 26 (5), 4-12 (2013). [LINK] Beamline 5.3.1

8) Iacopo Mochi, Kenneth A. Goldberg, Markus P. Benk, Patrick P. Naulleau, "Pupil shaping and coherence control in an EUV mask-imaging microscope ," Proc. SPIE 8880 888022, (2013). [LINK] Beamline 11.3.2 DOI 10.1117/12.2026498

9) Markus P. Benk, Kenneth A. Goldberg, Iacopo Mochi, Weilun Chao, Erik H. Anderson, "Increased depth of field through wave-front coding: using an off-zone plate lens with cubic phase modulation in an EUV microscope ," Proc. SPIE 8880 88801R, (2013). [LINK] Beamline 11.3.2 DOI 10.1117/12.2025954

10) Rene A. Claus, Iacopo Mochi, Markus P. Benk, Kenneth A. Goldberg, Andrew R. Neureuther, Patrick P. Naulleau, "Recovering Effective Amplitude and Phase Roughness of EUV Masks," Proc. SPIE 8880 88802B, (2013). [LINK] Beamline 11.3.2 DOI 10.1117/12.2027828

11) Kenneth A. Goldberg, Iacopo Mochi, Markus P. Benk, Chihcheng Lin, Arnaud Allezy, Michael Dickinson, Carl W. Cork, James B. Macdougall, Erik H. Anderson, Weilun Chao, Farhad Salmassi, Eric. M. Gullikson, Daniel Zehm, Vamsi Vytla, William Cork, Jason DePonte, Gino Picchi, Ahmet Pekedis, Takeshi Katayanagi, Michael G. Jones, Elizabeth Martin, Patrick P. Naulleau, and Senajith B. Rekawa, "The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope ," SPIE 8880 88800T, (2013). [LINK] Beamline 11.3.2 DOI 10.1117/12.2026496

12) Kenneth A. Goldberg, "Micron-scale lens array having diffracting structures," U.S. Patent No. 8,569,678, October 29, 2013, [LINK]

2012

13) T.-G. Kim, H.-S. Seo, I.-Y. Kang, C. Y. Jeong, S. Huh, J. Na, S.-S. Kim, C.-U. Jeon, I. Mochi, K. A. Goldberg, "Printability Study of Pattern Defects in the EUV Mask as a Function of hp Nodes," Proc. SPIE 8322 , 83220A (2012). [LINK] Beamline 11.3.2 DOI 10.1117/12.916374

14) P.-Y. Yan, I. Mochi, and K. Goldberg, "EUV Actinic Imaging Tool Aerial Image Evaluation of EUVL Embedded Phase Shift Mask Performance," Proc. SPIE 8322 , 83221P (2012). [LINK] Beamline 11.3.2 DOI 10.1117/12.919710

15) H. J. Kwon, J. Harris-Jones, A. Cordes, M. Satake, Y. Li, I. Mochi, and K. A. Goldberg , "EUV mask multilayer defects and their printability under different multilayer deposition conditions," Proc. SPIE 8322 , 832209 (2012). [LINK] Beamline 11.3.2 DOI 10.1117/12.916374

16) C. Anderson, D. Ashworth, L. M. Baclea-A1, S. Bhattari, R. Chao, R. Claus, P. Denham, K. Goldberg, A. Grenville, G. Jones, R. Miyakawa, K. Murayama, H. Nakagawa, S. Rekawa, J. Stowers and P. Naulleau, "The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm," Proc. SPIE 8322 , 832212 (2012). [LINK] Beamline 12.0.1.2 DOI 10.1117/12.917386

17) K. A. Goldberg, I. Mochi, M. P. Benk, A. P. Allezy, N. S. Smith, C. W. Cork, W. Cork, J. Macdougall, W. L. Chao, E. H. Anderson, P. P. Naulleau, E. Acome, E. Van Every, V. Milanovic, S. B. Rekawa, "Creating an EUV Mask Microscope for Lithography Generations Reaching 8 nm," Precision Engineering and Mechatronics Supporting the Semiconductor Industry , 4-7 (2012). [LINK] Beamline 11.3.2

18) D. J. Merthe, V. V. Yashchuk, K. A. Goldberg, M. Kunz, N. Tamura, W. R. McKinney, N. A. Artemiev, R. S. Celestre, G. Y. Morrison, E. Anderson, B. V. Smith, E. E. Domning, S. B. Rekawa, H. A. Padmore, "Methodology for optimal in situ alignment and setting of bendable optics for diffraction-limited focusing of soft x-rays," Proc. SPIE 8501 850108, (2012). Beamline 5.3.1 DOI 10.1117/12.930023

19) K. Seki, K. Badger, E. Gallagher, T. Konishi, G. McIntyre, "Shedding light on EUV mask inspection (Best Poster Award)," Proc. SPIE 8441 844114, (2012). Beamline 11.3.2 DOI 10.1117/12.976059

20) Wayne R. McKinney, Valeriy V. Yashchuk, Daniel J. Merthe, Nikolay A. Artemiev, Kenneth Goldberg, "Ex situ tuning of bendable x-ray mirrors for optimal beamline performance," Proc. SPIE 8501 850109, (2012). Beamline 5.3.1 DOI 10.1117/12.930156

21) Emily Gallagher, Greg McIntyre, Mark Lawliss, Tod Robinson, Ron Bozak, Roy White, Jeff LeClaire, "EUVL mask repair: expanding options with nanomachining (Third place, Best paper award)," Proc. SPIE 8522 85221L, (2012). Beamline 11.3.2 DOI 10.1117/12.974749

22) V. V. Yashchuk, N. A. Artemiev, K. A. Goldberg, W. R. McKinney, D. J. Merthe, D. L Voronov, H. A. Padmore, "Development of optical metrology for precision characterization, tuning, and alignment of x-ray optics at the ALS,"11th Biennial Conference on High Resolution X-Ray Diffraction and Imaging, XTOP2012 September 15-20. Beamline 5.3.1 ,

23) V. V. Yashchuk, K. A. Goldberg, D. J. Merthe, N. A. Artemiev, R. Celestre, E. E. Domning, W. R. McKinney, G. Y. Morrison, M. Kunz, B. V. Smith, N. Tamura, H. A. Padmore, "Experimental methods for optimal tuning and alignment of bendable mirrors for diffraction-limited soft x-ray focusing," (11th International Conference on Synchrotron Radiation Instrumentation, SRI 2012) Journal of Physics: Conference Series 425 (152003), (2012). [LINK] Beamline 5.3.1 DOI 10.1088/1742-6596/425/15/152003

2011

24) K. A. Goldberg, I. Mochi, S. B. Rekawa, N. S. Smith, J. B. Macdougall, P. P. Naulleau, "An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm," SPIE 7969 , 79691O (2011). [LINK] Beamline 11.3.2 [View Presentation] DOI 10.1117/12.881651

25) I. Mochi, K. A. Goldberg, R. Xie, P.-Y. Yan, K. Yamazoe, "Quantitative evaluation of mask phase defects from through-focus EUV aerial images," SPIE 7969 , 79691X (2011). [LINK] LBNL-4614E Beamline 11.3.2 DOI 10.1117/12.881652

26) S. Huh, I.-Y. Kang, S.-H. Kim, H.-S. Seo, D. Kim, J. Park, S.-S. Kim, H.-K. Cho, K. Goldberg, I. Mochi, T. Shoki, G. Indeerhees, "Printability and inspectability of Defects on the EUV Mask for sub32nm Half Pitch HVM Application," SPIE 7969 796902, (2011). [LINK] LBNL-5075E Beamline 11.3.2 DOI 10.1117/12.879384

27) S. A. George, P. P. Naulleau, E. M. Gullikson, I. Mochi, F. Salmassi, K. A. Goldberg, E. H. Anderson, "Replicated mask surface roughness effects on EUV lithographic patterning and line edge roughness," SPIE 7969 , 79690E (2011). [LINK] LBNL-4813E Beamline 11.3.2, 12.0.1.2 DOI 10.1117/12.881524

28) P. P. Naulleau, I. Mochi, K. A. Goldberg, "Optical modeling of Fresnel zoneplate microscopes," Applied Optics 50 (20), 3678-3684 (2011). [LINK] Beamline 11.3.2 DOI 10.1364/AO.50.003678

29) P. P. Naulleau, C. N. Anderson, L. Baclea-an, P. Denham, S. George, K. A. Goldberg, G. Jones, B. McClinton, R. Miyakawa, S. Rekawa, and N. Smith, "Critical challenges for EUV resist materials," SPIE 7972 797202, 1-10 (2011). [LINK] Beamline 12.0.1.3 DOI 10.1117/12.882955

30) C. N. Anderson, L. Baclea-An, P. E. Denham, S. A. George, K. A. Goldberg, M. S. Jones, N. S. Smith, P. P. Naulleau, T. I. Wallow, W. Montgomery, "The SEMATECH Berkeley MET: extending EUV learning down to 16nm half pitch," SPIE 7969 79690R, 1-6 (2011). [LINK] LBNL-4817E Beamline 12.0.1.3 DOI 10.1117/12.881573

31) P. Naulleau, C. N. Anderson, L. Baclea-an, P. Denham, S. George, K. A. Goldberg, G. Jones, I. Mochi, S. Rekawa, B. McClinton, R. Miyakawa, W. Montgomery, T. Wallow, "Using synchrotron light to accelerate EUV resist and mask materials learning," SPIE 7985 798509, (2011). [LINK] LBNL-3826E Beamline 12.0.1.3 DOI 10.1117/12.885420

32) S. Yuan, K. A. Goldberg, V. V. Yashchuk, R. Celestre, W. R. McKinney, G. Morrison, J. Macdougall, I. Mochi, T. Warwick, "Cross-check of ex-situ and in-situ metrology of a bendable temperature stabilized KB mirror," Nuclear Instruments and Methods in Physics Research A 635 , S58–S63 (2011). [LINK] Beamline 5.3.1 DOI 10.1016/j.nima.2010.09.120

33) K. A. Goldberg, I. Mochi, "Actinic Characterization of EUV Bump-Type Phase Defects," J. Vac. Sci. Technol. B 29 (6), 06F502-1-6 (2011). [LINK] Beamline 11.3.2 DOI 10.1116/1.3653257

34) D. J. Merthe, K. A. Goldberg, V. V. Yashchuk, S. Yuan, R. Celestre, J. Macdougall, W. R. McKinney, I. Mochi, G. Y. Morrison, T. Warwick, H. A. Padmore, "At-wavelength metrology and diffraction-limited focusing of bendable soft x-ray KB mirrors," SPIE 8139 , 813907 (2011). [LINK] Beamline 5.3.1 DOI 10.1117/12.894116

35) W. R. McKinney, K. A. Goldberg, M. R. Howells, D. J. Merthe, S. Yuan, V. V. Yashchuk, "Design optimization of bendable x-ray mirrors," SPIE 8141 , 81410K (2011). [LINK] Beamline 5.3.1 DOI 10.1117/12.894175

36) A. J. R. van den Boogaard, E. Louis, E. Zoethout, K. A. Goldberg, F. Bijkerk, "Characterization of Mo/Si multilayer growth on stepped topographies," J. Vac. Sci. & Technol. B 29 (5), 051803 (2011). [LINK] Beamline 11.3.2 DOI 10.1116/1.3628640

37) H.-J. Kwon, J. Harris-Jones, T. Ranganath, A. Cordes, T. Nakajima, I. Mochi, K. A. Goldberg, Y. Yamaguchi, and H. Kinoshita, "Printability of native blank defects and programmed defects and their stack structures," Proc. SPIE 8166 , 81660H (2011). [LINK] Beamline 11.3.2 DOI 10.1117/12.897165

38) P. P. Naulleau, K. A. Goldberg, E. Gullikson, I. Mochi, B. McClinton, and A. Rastegar, "Accelerating EUV learning with synchrotron light: mask roughness challenges ahead," Proc. SPIE 8166 , 81660F (2011). Beamline 11.3.2/12.0.1.3 [View Presentation] DOI 10.1117/12.900488

39) D. J. Merthe, K. A. Goldberg, V. V. Yashchuk, S. Yuan, W. R. McKinney, R. Celestre, I. Mochi, J. Macdougall, G. Y. Morrison, S. B. Rakawa, E. Anderson, B. V. Smith, E. E. Domning, T. Warwick, H. Padmore, "An experimental apparatus for diffraction-limited soft x-ray nano-focusing," Proc. SPIE 8139 , 813907 (2011). [LINK] Beamline 5.3.1 DOI 10.1117/12.894116

40) W. R. McKinney, V. V. Yashchuk, K. A. Goldberg, M. Howells, N. A. Artemiev, D. J. Merthe, S. Yuan, "Design optimization of bendable x-ray mirrors," Proc. SPIE 8141 , 81410K (2011). [LINK] Beamline 5.3.1 DOI 10.1117/12.894175

41) S.Yuan, V. V. Yashchuk, K. A. Goldberg, R. Celestre, W. R. McKinney, G. Y. Morrison, T. Warwick, H. A. Padmore, "Development of in situ, at-wavelength metrology for soft X-ray nano-focusing," Nucl. Instrum. Meth. A 649 , 160–162 (2011). [LINK] Beamline 5.3.1 DOI 10.1016/j.nima.2010.10.134

2010

42) Kenneth A. Goldberg, "EUV Mask Status: Par 13.5,"Invited Presentation, SEMATECH Mask Cleaning Workshop, Monterey, CA September 13, 2010. Beamline 11.3.2 ,

43) J. F. Magana, M. Chandhok, T. F. Crimmins, F. A. Ghadiali, T. Liang, G. Zhang, "Current status and challenges in EUV reticle defect detection: a case study of using a real product,"BACUS SPIE Photomask 2010 September 15, 2010. Beamline 11.3.2 ,

44) Y-J Fan, L. Yankulin, P. Thomas, C. Mbanaso, A. Antohe, R. Garg, Y. Wang, T. Murray, A. Wüest, F. Goodwin, S. Huh, A. Cordes, P. Naulleau, K. Goldberg, I. Mochi, E. Gullikson, Gregory Denbeaux, "Carbon Contamination Topography Analysis of EUV Masks," SPIE 7636 , 76360G-1-8 (2010). [LINK] LBNL-3406E Beamline 11.3.2, 12.0.1.3

45) S. Huh, L. Ren, D. Chan, S. Wurm, K. Goldberg, I. Mochi, T. Nakajima, M. Kishimoto, B. Ahn, I. Kang, J. Park, K. Cho, S.-I. Han, T. Laursen, "A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection," SPIE 7636 , 76360K-1-7 (2010). [LINK] LBNL-3364E Beamline 11.3.2

46) P. Naulleau, C. N. Anderson, L.-M. Baclea-an, D. Chan, P. Denham, S. George, K. A. Goldberg, B. H. Hoef, G. Jones, C.-W. Koh, B. M. La Fontaine, B. McClinton, R. Miyakawa, M. W. Montgomery, S. Rekawa, T. I. Wallow, "The SEMATECH Berkeley MET pushing EUV development beyond 22-nm half pitch," SPIE 7636 , 76361J-1-9 (2010). [LINK] LBNL-3405E Beamline 12.0.1.3

47) R. H. Miyakawa, P. P. Naulleau, Avideh Zakhor, K. A. Goldberg, "Image-based method for in-situ EUV optical testing with an incoherent source," SPIE 7637 , 76361K-1-7 (2010). [LINK] LBNL-3029E Beamline 12.0.1.3

48) F. Brizuela, S. Carbajo, A. E. Sakdinawat, Y. Wang, D. Alessi, B. M. Luther, W. Chao, Y. Liu, K. A. Goldberg, P. P. Naulleau, E. H. Anderson, D. T. Attwood, Jr., M. C. Marconi, J. J. Rocca, C. S. Menoni, "Improved performance of a table-top actinic full-field microscope with EUV laser illumination,"SPIE February 24, 2010. Beamline 11.3.2 ,

49) I. Mochi, K. A. Goldberg, B. M. LaFontaine, A. Tchikoulaeva, C. Holfeld , "Actinic imaging of native and programmed defects on a full-field mask," SPIE 7636 , 76361A-1-9 (2010). [LINK] LBNL-3329E Beamline 11.3.2 [View Presentation]

50) D. T. Wintz, K. A. Goldberg, I. Mochi, S. Huh, "Photon flux requirements for EUV-reticle imaging microscopy in the 22- and 16-nm nodes," SPIE 7636 , 76362L-1-10 (2010). [LINK] LBNL-3336E Beamline 11.3.2 [View Presentation]

51) Abbas Rastegar, Sean K. Eichenlaub, Arun J. Kadaksham, Byunghoon Lee, Mathiew House, Henry K. Yun, Brian Cha, Kenneth A. Goldberg, Iacopo Mochi, "Particle removal challenges of EUV patterned masks for the sub-22-nm HP node," SPIE 7636 , 76360N-1-11 (2010). [LINK] LBNL-3332E Beamline 11.3.2

52) A. J. R. van den Boogaard, E. Louis, K. A. Goldberg, I. Mochi, F. Bijkerk, "EUV-multilayers on grating-like topographies," SPIE 7636 76362S, 76362S-1-5 (2010). [LINK] LBNL-3367E Beamline 11.3.2 DOI 10.1117/12.846564

53) I.-Y. Kang, H.-S. Seo, B.-S. Ahn, D.-G. Lee, D. Kim, S. Huh, C.-W. Koh, B. Cha, S.-S. Kim, H.-K. Cho, I. Mochi, K. A. Goldberg, "Printability and inspectability study with substrate programmed pit defects at EUV lithography," SPIE 7636 , 76361B-1-9 (2010). [LINK] LBNL-3404E Beamline 11.3.2

54) Y.-J. Fan, L. Yankulin, A. Antohe, P. Thomas, C. Mbanaso, R. Garg, Y. Wang, A. Wüest, F. Goodwin, S. Huh, P. Naulleau, K. Goldberg, I. Mochi, and G. Denbeaux, "Effect of carbon contamination on the printing performance of extreme ultraviolet masks," J. Vac. Sci. Technol. B 28 (2), 321-328 (2010). [LINK] LBNL-3306E Beamline 11.3.2 DOI 10.1116/1.3333434

55) S. Huh, A. Rastegar, F. Goodwin, S. Wurm, K. Goldberg, I. Mochi, T. Nakajima, M. Kishimoto, M. Komakine, "The Study on the Real Defect on EUV Blankmask and Strategy of EUV Mask Inspection," SPIE 7545 7545N, 1-8 (2010). [LINK] Beamline 11.3.2

56) S. A. George, P. P. Naulleau, F. Salmassi, I. Mochi, E. M. Gullikson, K. A. Goldberg, and E. H. Anderson, "Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning," J. Vac. Sci. Technol. B 28 (6), (2010). [LINK] LBNL-3825E Beamline 11.3.2/12.0.1.3 DOI 10.1116/1.3502436

57) I. Mochi, K. A. Goldberg, S. Huh, "Actinic imaging and evaluation of phase structures on EUV lithography masks," J. Vac. Sci. Technol. B 28 (6), C6E11-16 (2010). [LINK] LBNL-4150E Beamline 11.3.2 DOI 10.1116/1.3498756

58) K. A. Goldberg, I. Mochi, "Wavelength-Specific Reflections: A Decade of EUV Actinic Mask Inspection Research," J. Vac. Sci. Technol. B 28 (6), C6E1-10 (2010). [LINK] LBNL-4817E Beamline 11.3.2 DOI 10.1116/1.3498757

59) F. Brizuela, S. Carbajo, A. Sakdinawat, D. Alessi, D. H. Martz, Y. Wang, B. Luther, K. A. Goldberg, I. Mochi, D. T. Attwood, B. La Fontaine, J. J. Rocca, and C. S. Menoni, "Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks," Optics Express 18 (14), 14467-73 (2010). [LINK] Beamline 11.3.2 DOI 10.1364/OE.18.014467

60) V. V. Yashchuk, S. Yuan, S. Baker, J. Bozek, R. Celestre, M. Church, K. A. Goldberg, M. Fernandez-Perea, N. Kelez, M. Kunz, W. R. McKinney, G. Morrison, H. A. Padmore, R. Soufli, N. Tamura, T. Warwick, "Bendable Focusing X-Ray Optics for the ALS and the LCLS/FEL: Design, Metrology, and Performance,"Workshop on Photon Beamlines & Diagnostics June 29, 2010. LBNL-3559E-Ext-Abs Beamline 5.3.1 , LBNL-3559E-Ext-Abs

61) S. Yuan, M. Church, V. V. Yashchuk, K. A. Goldberg, R. S. Celestre, W. R. McKinney, J. Kirschman, G. Morrison, T. Noll, T. Warwick, H. A. Padmore, "Elliptically Bent X-ray Mirrors with Active Temperature Stabilization," X-Ray optics and Instrumentation 2010 (784732), (2010). [LINK] LBNL-3144E Beamline 5.3.1 DOI 10.1155/2010/784732

62) S. Yuan, K. A. Goldberg, V. V. Yashchuk, R. Celestre, I. Mochi, J. Macdougall, G. Y. Morrison, W. R. McKinney, M. Church, and T. Warwick, "At-wavelength optical metrology development at the ALS," SPIE Optical Engineering & Applications 7801 78010D, 1-13 (2010). [LINK] LBNL-3037E Beamline 5.3.1 DOI 10.1117/12.859946

63) D. T. Wintz, K. A. Goldberg, I. Mochi, S. Huh, "Photon flux requirements for extreme ultraviolet reticle imaging in the 22- and 16-nm nodes," J. Micro/Nanolith. MEMS MOEMS 9 (041205), 041205-1-8 (2010). [LINK] LBNL-3336E Beamline 11.3.2 DOI 10.1117/1.3491512

64) F. Brizuela, S. Carbajo, A. Sakdinawat, Y. Wang, D. Alessi, D. Martz, B. Luther, K. A. Goldberg, D. T. Attwood, B. La Fontaine, J. Rocca, C. Menoni, "Table-top Extreme Ultraviolet Laser Aerial Imaging of Lithographic Masks," in Conference on Laser Electro-Optics: Applications, OSA Technical Digest (CD) (Optical Society of America, 2010) AFA5, (2010). [LINK] Beamline 11.3.2

65) C. S. Menoni, F. Brizuela, S. Carbajo, Y. Wang, D. Alessi, D. H. Martz, B. Luther, M. C. Marconi, J. J. Rocca, A. Sakdinawat, W. Chao, Y. W. Liu, E. H. Anderson, K. A. Goldberg, D. T. Attwood, A. V. Vinogradov, I. A. Artioukov, B. LaFontaine, "Reflection microscope for actinic mask inspection and other progress in soft x-ray laser nano-imaging," X-Ray Lasers 2010, Springer Proceedings in Physics, 2011 136 7, 359-70 (2010). [LINK] DOI 10.1007/978-94-007-1186-0_41

2009

66) F. Brizuela, Y. Wang, C. A. Brewer, F. Pedaci, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, P. Naulleau, P. Wachulak, M. C. Marconi, D. T. Attwood, J. J. Rocca, and C. S. Menoni, "Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination," Optics Letters 34 (3), 271-3 (2009). [LINK] LBNL-1111E Beamline 11.3.2 DOI 10.1364/OL.34.000271

67) K. A. Goldberg, I. Mochi, S. Huh , "Collecting EUV mask images through focus by wavelength tuning," SPIE 7271 72713N, 72713N-1-8 (2009). [LINK] Beamline 11.3.2 [View Presentation] DOI 10.1117/12.824433

68) I. Mochi, K. A. Goldberg, P. Naulleau, S. Huh, "Improving the performance of the Actinic Inspection Tool with an optimized alignment procedure," SPIE 7271 727123, 727123-1-9 (2009). [LINK] Beamline 11.3.2 [View Presentation]

69) C. H. Clifford, S. Wiraatmadja, T. T. Chan, A. R. Neureuther, K. A. Goldberg, I. Mochi, T. Liang, "Comparison of fast 3D simulation and actinic inspection for EUV masks with buried defects," SPIE 7271 72711F, (2009). [LINK] Beamline 11.3.2 DOI 10.1116/1.3244624

70) F. Brizuela, Y. Wang, C. A. Brewer, F. Pedaci, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, P. Naulleau, P. Wachulak, M. C. Marconi, D. T. Attwood, J. J. Rocca, and C. S. Menoni, "Inspection 13.2 nm table-top full-field microscope," SPIE 7271 72713F-1, 72713F-1-7 (2009). [LINK] Beamline 11.3.2 DOI 10.1117/12.814320

71) R. Miyakawa, P. Naulleau, K. Goldberg, "Analysis of systematic errors in lateral shearing interferometry for EUV optical testing," SPIE 7272 72721V, (2009). [LINK] Beamline 12.0.1.3 DOI 10.1117/12.812340

72) S. Huh, P. Kearney, S. Wurm, F. Goodwin, H. Han, K. Goldberg, Iacopo Mochi, Eric Gullikson, "EUV Actinic Defect Inspection and Defect Printability at the Sub-32 nm Half-pitch," SPIE 7470 , 74700Y (2009). [LINK] LBNL-2714E Beamline 11.3.2

73) S. Huh, P. Kearney, S. Wurm, F. Goodwin, K. Goldberg, I. Mochi, E. Gullikson, "Mask Defect Verification Using Actinic Inspection and Defect Mitigation Technology," SPIE 7271 72713J, 72713J-1-9 (2009). [LINK] Beamline 11.3.2

74) Y.-J. Fan, L. Yankulin, A. Antohe, R. Garg, P. Thomas, C. Mbanaso, A. Wuest, F. Goodwin, S. Huh, P. Naulleau, K. Goldberg, I. Mochi, G. Denbeaux , "Carbon Contamination of Extreme Ultraviolet (EUV) Masks and its Effect on Imaging," SPIE 7271 72713U, 72713U-1-9 (2009). [LINK] Beamline 11.3.2

75) P. P. Naulleau, C. N. Anderson, L.-M. Baclea-an, P. Denham, S. Geroge, K. A. Goldberg, M. Goldstein, B. Hoef, R. Hudyma, G. Jones, C. Koh, B. La Fontaine, B. McClinton, R. Miyakawa, W. Montgomery, J. Roller, T. Wallow, and S. Wurm, "The SEMATECH Berkeley microfield exposure tool: learning at the 22-nm node and beyond," SPIE 7271 72710W, 72710W-1-11 (2009). [LINK] LBNL-882E Beamline 12.0.1.3

76) I.
 Mochi,
 K. 
A. 
Goldberg,
 H. 
Han,
 P.
 Naulleau, 
R. 
Myakawa, 
E.
 H. Anderson, 
J. 
Macdougall, "Using aberration test patterns to optimize the performance of EUV aerial imaging microscopes,"J. Vac. Sci. Technol. B . LBNL-2464E Beamline 11.3.2 [View Presentation] , LBNL-2464E

77) K. A. Goldberg, I. Mochi, P. Naulleau, T. Liang, P.-Y. Yang, S. Huh, "EUV pattern defect detection sensitivity based on aerial image linewidth measurements," J. Vac. Sci. Technol. B 27 (6), 2916-21 (2009). [LINK] LBNL-3407E Beamline 11.3.2 [View Presentation]

78) P. Naulleau, C. Anderson, P. Denham, S. George, K. A. Goldberg, B. Hoef, M. G. Jones, C. Koh, B. La Fontaine, W. Montgomery, and T. Wallow, "Pushing EUV lithography development beyond 22-nm half pitch," J. Vac. Sci. Technol. B 27 (6), 2911-15 (2009). [LINK] LBNL-2288E Beamline 12.0.1.3

79) H. Mizuno, G. McIntyre, C.-S. Koay, M. Burkhardt, L. He, J. Hartley, C. Johnson, S. Raghunathan, K. Goldberg, I. Mochi, B. La Fontaine, and O. Wood, "Thorough characterization of a EUV mask," Proc. SPIE 7379 , 73790J-1-11 (2009). Beamline 11.3.2, 12.0.1.2

80) , "Impact of carbon contamination on EUV masks," SPIE Photomask (BACUS) 7488 86, (2009). To be published. Beamline 11.3.2, 12.0.1.3

81) H.-S. Seo, B.-S. Ahn, I.-Y. Kang, D. G. Lee, S. Huh, B. Cha, D Kim, S.-S. Kim, H. K. Cho, and K. A. Goldberg, "Effects of multilayer depositions on the EUV printability and DUV inspectability of substrate pit defects,"2009 EUVL Symposium, Prague, Czech Republic October 2009. Beamline 11.3.2 ,

82) C. H. Clifford, S. Wiraatmadja, T. T. Chan, A. R. Neureuther, K. A. Goldberg, I. Mochi, T. Liang, "Comparison of fast three-dimensional simulation and actinic inspection for extreme ultraviolet masks with buried defects and absorber features," J. Vac. Sci. Technol. B 27 (6), 2888-93 (2009). [LINK] Beamline 11.3.2

83) P. P. Naulleau, C. N. Anderson, L.-M. Baclea-an, P. Denham, S. George, K. A. Goldberg, M. Goldstein, B. Hoef, G. Jones, C. Koh, B. La Fontaine, W. Montgomery, T. Wallow, "Pushing extreme ultraviolet lithography development beyond 22 nm half pitch," J. Vac. Sci. Technol. B 27 (6), 2911-15 (2009). [LINK] Beamline 11.3.2

84) S. Yuan, R. Celestre, W. R. McKinney, G. Morrison, H. A. Padmore, S. B. Rekawa, I. Mochi, T. Warwick, K. Goldberg, V. V. Yashchuk, "At-wavelength and optical metrology of bendable x-ray optics for nanofocusing at the ALS," Frontiers in Optics (FiO), OSA Annual Meeting 2009 FThT2, (2009). [LINK] Beamline 5.3.1

85) S. Yuan, M. Church , R. Celestre, G. Morrison, W. McKinney, T. Warwick, K. Goldberg, V. Yashchuk, , "Surface slope metrology and interferometric wave front measurements on deformable soft x-ray mirrors performed in the laboratory and in-situ at-wavelength," AIP Conference Proceedings 1234, The Tenth International Conference on Synchrotron Radiation Instrumentation, Melbourne, Australia , (2009). LBNL-2048E Abs Beamline 5.3.1

86) S. Yuan, M. Church , R. Celestre, G. Morrison, W. McKinney, T. Warwick, K. Goldberg, V. Yashchuk, "Surface Slope Metrology on Deformable Soft X-ray Mirrors," The Tenth International Conference on Synchrotron Radiation Instrumentation, Australia , (2009). [LINK] LBNL-3610E Beamline 5.3.1

87) K. A. Goldberg, I. Mochi, P. Naulleau, S. George, S. Huh, "Progress in actinic mask imaging: the closest look at lines, defects in phase roughness,"2009 International Symposium on Extreme Ultraviolet Lithography October 2009. LBNL-2845E Abs Beamline 11.3.2 , LBNL-2845E Abs

88) I. Mochi, K. A. Goldberg, B. LaFontaine, O. Wood II, "Actinic imaging of known native defects on a full-field mask,"2009 International Symposium on Extreme Ultraviolet Lithography October 2009. LBNL-3010E Abs Beamline 11.3.2 , LBNL-3010E Abs

89) H. Seo, B. Ahn, I. Kang, D. Lee, D. Kim, S. Kim, H. Cho, S. Huh, B. Cha, K. Goldberg, "Effects of Multilayer Depositions on the EUV Printability and DUV Inspectability of Substrate Pit Defects,"2009 International Symposium on Extreme Ultraviolet Lithography October 2009. Beamline 11.3.2 ,

90) P. Naulleau, C. Anderson, L. Baclea-an, P. Denham, S. George, K. Goldberg, B. Hoef, G. Jones, C. Koh, B. La Fontaine, W. Montgomery, T. Wallow, "Using the 0.3-NA SEMATECH Berkeley MET for Sub-22 nm Half Pitch Development,"2009 International Symposium on Extreme Ultraviolet Lithography, Prague October 2009. Beamline 11.3.2 ,

91) S. Huh, P. Kearney, A. Rastegar, F. Goodwin, S. Wurm, K. Goldberg, I. Mochi, T. Nakajima , M. Kishimoto, M. Komakine, "The Study on the Native Real Defect on EUV Mask Blank Using DUV Blank Inspection Tool and SEMATECH AIT,"2009 International Symposium on Extreme Ultraviolet Lithography, Prague October 2009. Beamline 11.3.2 ,

92) C. H. Clifford, T. T. Chan, A. R. Neureuther, K. A. Goldberg I. Mochi, T. Liang, "Investigation of buried EUV mask defect printability using actinic inspection and fast simulation," SPIE 7488 (74882H), (2009). [LINK] Beamline 11.3.2 DOI 10.1117/12.829716

93) C. S. Menoni, F. Brizuela, Y. Wang, C. A. Brewer, B. M. Luther, F. Pedaci, P. W. Wachulak, M. C. Marconi, J. J. Rocca, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, D. T. Attwood, A. V. Vinogradov, I. A. Artyukov, Y. P. Pershyn, V. Kondratenko, "Advances in full field microscopy with table-top soft x-ray lasers," SPIE 7451 74510I, (2009). [LINK] Beamline 11.3.2 DOI 10.1117/12.826419

94) F. Brizuela, Y. Wang, C. Brewer, F. Pedaci, W. Chao, E. Anderson, Y. Liu, K. Goldberg, P. Naulleau, P. Wachulak, M. Marconi, D. Attwood, J. Rocca, and C. Menoni, "13.2 nm Table-Top Inspection Microscope for Extreme Ultraviolet Lithography Mask Defect Characterization," CLEO/IQEC JFA5, (2009). [LINK] Beamline 11.3.2

2008

95) H.-S. Han, W. Cho, K. A. Goldberg, E. M. Gullikson, C.-U. Jeon, S. Wurm, "Determining the critical size of EUV-mask substrate defects," Proc. SPIE 6921 , 69211Y (2008). [LINK] Beamline 11.3.2

96) P. P. Naulleau, C. N. Anderson, J. Chiu, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, S. Huh, G. Jones, B. LaFontaine, A. Ma, D. Niakoula, J. Park, T. Wallow, "Advanced extreme-ultraviolet resist testing using the SEMATECH Berkeley 0.3-NA microfield exposure tool," Proc. SPIE 6921 , 69213N (2008). [LINK] Beamline 12.0.1.3 DOI 10.1117/12.773833

97) K. A. Goldberg, S. B. Rekawa, C. D. Kemp, A. Barty, E. H. Anderson, P. Kearney, H. Han, "EUV-mask reflectivity measurements with micron-scale spatial resolution," Proc. SPIE 6921 , 69213U (2008). [LINK] Beamline 11.3.2 [View Presentation]

98) K. A. Goldberg, K. Takase, P. Naulleau, H.-S. Han, A. Barty, H. Kinoshita, K. Hamamoto, "Evaluating EUV-mask pattern imaging with two EUV microscopes,"Proc. SPIE . Beamline 11.3.2 [View Presentation] ,

99) Kenneth A. Goldberg and Valeriy Yashchuk, "Advanced X-ray Optics Metrology for Nanofocusing and Coherence Preservation," Synchrotron Radiation News 21 (2), 11-12 (2008). [LINK] [View Presentation]

100) K. A. Goldberg, "A Survey of EUV At-Wavelength Optical Testing," 2008 International Workshop on EUV Lithography , (2008). Beamline 12.0.1.2, 12.0.1.3 [View Presentation]

101) K. A. Goldberg, "EUV mask inspection: a bright idea?," 2008 International Workshop on EUV Lithography , (2008). Beamline 11.3.2 [View Presentation]

102) K. A. Goldberg, I. Mochi, P. P. Naulleau, H.-S. Han, S. Huh, "Benchmarking EUV mask inspection beyond 0.25 NA," SPIE Photomask (BACUS) 7122 , 71222E-1 (2008). [LINK] Beamline 11.3.2 [View Presentation]

103) K. A. Goldberg, P. Naulleau, I. Mochi, E. H. Anderson, S. B. Rekawa, C. D. Kemp, and R. F. Gunion, H.-S. Han, S. Huh , "Actinic extreme ultraviolet mask inspection beyond 0.25 numerical aperture," J. Vac. Sci. Technol. B 26 (6), 2220-4 (2008). [LINK] Beamline 11.3.2 [View Presentation]

104) K. A. Goldberg, I. Mochi, P. Naulleau, B. LaFontaine, S. Huh, "Aerial Image Linewidth Measurement Capabilities of the Actinic Inspection Tool,"EUVL Symposium 2008 September 2008. Beamline 11.3.2 [View Presentation] ,

105) I. Mochi, K. A. Goldberg, P. Naulleau, S. Huh, "Achieving Diffraction-limited EUV Aerial Image Microscopy,"EUVL Symposium 2008 September 2008. Beamline 11.3.2 [View Presentation] ,

106) P. Naulleau, K. Goldberg, I. Mochi, G. Zhang, "Mask Effects on LER,"EUVL Symposium 2008 September 2008. Beamline 12.0.1.3, 11.3.2 ,

107) P. Naulleau, C. Anderson, J. Chiu, P. Denham, S. George, K. Goldberg, B. Hoef, G. Jones, C. Koh, B. La Fontaine, A. Ma, W. Montgomery, J. Park, T. Wallow, S. Wurm, "The SEMATECH Berkeley MET: Learning at the 22 nm Node,"EUVL Symposium 2008 September 2008. Beamline 12.0.1.3 ,

108) U. Okoroanyanwu, B. LaFontaine, O. Wood, G. Antesberger, C. Holfeld, J. Hendrik Peters, E. Langer, M. Bender, M. Rossiger, S. Trogisch, F. Goodwin, G. Denbeaux, Y. Fan, A. Antohe, L. Yankulin, R. Garg, K. Goldberg, "EUV Reticle Contamination and Cleaning,"EUVL Symposium 2008 September 2008. Beamline 12.0.1.3, 11.3.2 ,

109) H. Han, H. Seo, K. Goldberg, H. Kim, B. Ahn, I. Kang, W. Cho, S. Lee, G. Kim, D. Kim, S. Kim, H. Cho, "Characterization of EUV Mask Defects: Printability and Repair Process,"EUVL Symposium 2008 September 2008. Beamline 11.3.2 ,

110) S. Huh, S. Wurm, H. Han, K. Goldberg, I. Mochi, "EUV Actinic Defect Inspection and Imaging For the Sub-32 nm Half-pitch,"EUVL Symposium 2008 September 2008. Beamline 11.3.2 ,

111) J. Rocca, F. Brizuela, Y. Wang, C. Brewer, F. Pedaci, B. Luther, W. Chao, Y. Liu, K. Goldberg, P. Naulleau, M. Marconi, E. Anderson, D. Attwood, C. Menoni, "High Resolution 13.2 nm Reflection Microscopy on a Table Top,"EUVL Symposium 2008 September 2008. ,

112) Kenneth A. Goldberg, "EUV Optical Testing," "EUV Lithography," Ed. Vivek Bakshi, SPIE Press, 205-225 (2008). [LINK] Beamline 12.0.1.2/12.0.1.3

113) Ryan Miyakawa, Patrick P. Naulleau, and Kenneth Goldberg, "Lateral shearing interferometry for EUV optical testing,"EUVL Symposium 2008 September 29, 2008. Beamline 12.0.1.3 ,

2007

114) P. P. Naulleau, C. N. Anderson, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, B. LaFontaine, and T. Wallow, "Recent results from the Berkeley 0.3-NA EUV microfield exposure tool," SPIE 6517 , 65170V-1-8 (2007). [LINK] Beamline 12.0.1.3 DOI 10.1117/12.713440

115) K. A. Goldberg, A. Barty, P. Seidel, K. Edinger, R. Fettig, P. Kearney, H. Han, O. R. Wood II , "EUV and non-EUV inspection of reticle defect repair sites," Proc. SPIE 6517 , 65170C-1-7 (2007). [LINK] Beamline 11.3.2 [View Presentation]

116) H. Han, K. A. Goldberg, A. Barty, E. M. Gullikson, Y. Ikuta, T. Uno, O. R. Wood II, and S. Wurm, "EUV MET printing and actinic imaging analysis on the effects of phase defects on wafer CDs," Proc. SPIE 6517 , 65170B-1-10 (2007). [LINK] Beamline 11.3.2/12.0.1.2

117) P. Naulleau, C. Anderson, K. Dean, P. Denham, K. Goldberg, B. Hoef, D. Niakoula, B. La Fontaine, T. Wallow, "Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool," Journal of Vacuum Science and Technology B 25 (6), 2132-5 (2007). [LINK] Beamline 12.0.1.2

118) K. A. Goldberg, P. P. Naulleau, A. Barty, S. B. Rekawa, C. D. Kemp, R. F. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, H.-S. Han, "Performance of actinic EUVL mask imaging using a zoneplate microscope ," Proc. SPIE Photomask (BACUS) 6730 67305E, 67305E-1-12 (2007). [LINK] Beamline 11.3.2 [View Presentation]

119) W. Cho, H.-S. Han, K. A. Goldberg, P. A. Kearney, C.-U. Jeon , "Detectability and printability of EUVL-mask blank defects for the 32-nm HP node ," Proc. SPIE Photomask (BACUS) 6730 673013, 673013-1-9 (2007). [LINK] Beamline 11.3.2

120) K. A. Goldberg, P. Naulleau, A. Barty, S. Rekawa, C. D. Kemp, R. Gunion, F. Salmassi, E. Gullikson, E. Anderson, H.-S. Han, "Benchmarking Mask Imaging with the Actinic Imaging Tool,"EUVL Symposium 2007, Sapporo, Japan October 29, 2007. Beamline 11.3.2 [View Presentation] ,

121) G. Denbeaux, Y.-J. Fan, A. Antohe, L. Yankulin, R. Garg, O. Wood, F. Goodwin, C.-S. Koay, E. Gullikson, K. Goldberg, E. Anderson, W. Chao, "Actinic microscope for EUV masks using a stand-along source for imaging and contamination studies of EUV masks,"EUVL Symposium 2007, Sapporo, Japan October 31, 2007. ,

122) G.-S. Yoon, H. Kim, H.-J. Oh, H.-S. Kim, H.-S. Sim, S.-H. Lee, G.-B. Kim, S.-M. Huh, K. A. Goldberg, A. Barty, S.-S. Kim, H.-K. Cho, "Evaluation of EUV Mask Repair Methods in Si-capping & Ru-capping Blanks,"EUVL Symposium 2007, Sapporo, Japan October 31, 2007. Beamline 11.3.2 ,

2006

123) Kenneth Goldberg, "Testing EUV optics with EUV light: If you can measure it, you can make it," SPIE Newsroom: Optical Design & Engineering , (2006). [LINK] Beamline 12.0.1.2/12.0.1.3

124) K. A. Goldberg, A. Barty, Y. Liu, P. Kearney, Y. Tezuka, T. Terasawa, J. S. Taylor, H.-S. Han, and O. R. Wood II , "Actinic Inspection of EUV Programmed Multilayer Defects and Cross-Comparison Measurements," Journal of Vacuum Science and Technology B 24 (6), 2824-28 (2006). [LINK] Beamline 11.3.2 [View Presentation]

125) K. A. Goldberg, P. P. Naulleau, "Diffractive optical element for extreme ultraviolet wavefront control," U.S. Patent No. 7,027,226, April 11, 2006, [LINK]

126) P. P. Naulleau, C. Rammeloo, J. P. Cain, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, B. La Fontaine, A. R. Pawloski, C. Larson, G. Wallraff, "Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists," Proc. SPIE 6151 , 289-296 (2006). Beamline 12.0.1.3

127) P. Naulleau, J. Cain, K. Dean, K. A. Goldberg, "Lithographic characterization of low-order aberrations in a 0.3-NA EUV microfield exposure tool," Proc. SPIE 6151 , 822-828 (2006). [LINK] LBNL-60508 Beamline 12.0.1.3

128) K. A. Goldberg, A. Barty, H. Han., S. Wurm, P. Kearney, P. Seidel, O. R. Wood II, B. LaFontaine, T. Liang, C. Holfeld, R. Fettig, Y. Tezuka, T. Terasawa, "Comparison of actinic and non-actinic inspection of programmed defect masks,"EUVL Symposium 2006 October 18, 2006. [LINK] Beamline 11.3.2 [View Presentation] ,

129) A. Barty, K. A. Goldberg, P. Kearney, S. B. Rekawa, B. LaFontaine, O. Wood II, J. S. Taylor and H.-S. Han, "Multilayer defects nucleated by substrate pits: a comparison of actinic inspection and non-actinic inspection techniques," SPIE 6349 , 63492M (2006). [LINK] Beamline 11.3.2

130) P. Naulleau, E. Anderson, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, Keith Jackson, "Advanced 0.3-NA EUV lithography capabilities at the ALS," NGL 2005, Tokyo, Japan , (2006). LBNL-60542 Beamline 12.0.1.3 [View Presentation]

2005

131) K. A. Goldberg, M. E. Teyssier, J. A. Liddle, "EUV Focus Sensor: Design and Modeling," Proc. SPIE 5751 , 312-19 (2005). [LINK] LBNL-56808 [View Presentation]

132) P. Naulleau, K. A. Goldberg, E. H. Anderson, J. P. Cain, P. Denham, B. Hoef, K. Jackson, A.-S. Morlens, S. Rekawa, K. Dean, "EUV microexposures at the ALS using the 0.3-NA MET projection optics," Proc. SPIE 5751 , 56-63 (2005). [LINK] LBNL-55630/60936 Beamline 12.0.1.3

133) J. P. Cain, P. Naulleau, C. J. Spanos, "Lithographic measurement of EUV flare in the 0.3-NA micro exposure tool optic at the Advanced Laser Source," Proc. SPIE 5751 , 301-311 (2005). Beamline 12.0.1.3

134) J. P. Cain, P. Naulleau, C. J. Spanos, "Resist-based measurement of the contrast transfer function in a 0.3-NA EUV microfield optic," Proc. SPIE 5751 , 741-48 (2005). Beamline 12.0.1.3

135) J. P. Cain, P. Naulleau, C. J. Spanos, "Critical dimension sensitivity to post-exposure bake temperature variations in EUV photoresists," Proc. SPIE 5751 , 1092-1100 (2005). Beamline 12.0.1.3

136) J. P. Cain, P. Naulleau, C. J. Spanos, "Modeling of EUV photoresists with a resist point spread function," Proc. SPIE 5751 , 1101-1109 (2005). Beamline 12.0.1.3

137) J. P. Cain, G. McIntyre, P. Naulleau, A. Pawloski, B. La Fontaine, O. Wood II, C. J. Spanos, A. R. Neureuther, "Two-wave pattern shift aberration monitor for centrally obscured optical systems," Proc. SPIE 5751 , 1230-37 (2005). Beamline 12.0.1.3

138) A. Barty, Y. Liu, K. A. Goldberg, E. M. Gullikson, J. S. Taylor, and O. R. Wood II, "Actinic inspection of multilayer coated EUV masks at the ALS,"2005 International Symposium on Extreme Ultraviolet Lithography, San Diego, CA November 7-9, 2005. Beamline 11.3.2 ,

139) Patrick P. Naulleau, "Effect of mask-roughness on printed contact-size variation in extreme-ultraviolet lithography," Applied Optics 44 (183), 183-89 (2005). Beamline 12.0.1.3

140) K. A. Goldberg, M.E. Teyssier, J.A. Liddle, "EUV Focus Sensor Design Optimization," Journal of Vacuum Science and Technology B 23 (6), 2885-90 (2005). LBNL-56808 Beamline 12.0.1.3/6.3.2

141) P. Naulleau, K. A. Goldberg, J. P. Cain, E. Anderson, P. Denham, K. Jackson, B. Hoef, S. Baker, E. Spiller, K. Dean, "Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source," J. Vac. Sci & Technol. B 23 (6), 2840-2843 (2005). [LINK] LBNL-57796 Beamline 12.0.1.3

142) M.D. Shumway, P. Naulleau, K.A. Goldberg, and J. Bokor, "Measuring line roughness through aerial image contrast variation using coherent extreme ultraviolet spatial filtering techniques," Journal of Vacuum Science and Technology B 23 (6), 2844-2847 (2005). [LINK] Beamline 12.0.1.2

143) F. Salmassi, P.P. Naulleau, E.M. Gullikson, D.L. Olynick, and J.A. Liddle, "EUV Binary Phase Gratings: Fabrication and Application to Diffractive Optics," Journal of Vacuum Science and Technology B 23 (6), (2005). [LINK] Beamline 6.3.2

144) V. Farys, C. Charpin-Nicolle, M. Richard, J.-Y. Robic, V. Muffato, E. Quesnel, S. Postnikov, P. Schiavone, P. Naulleau, "Printabillity of Non-Smoothed Buried Defect in EUVL Mask Blank," J. Vac. Sci. & Technol. B 23 (6), 2860-2865 (2005). Beamline 12.0.1.3

145) K. A. Goldberg, P. Naulleau, S. Rekawa, P. Denham, J. A. Liddle, E. M. Gullikson, K. Jackson, E. Anderson, J. Taylor, G. Sommargren, H. Chapman, D. Phillion, M. Johnson, A. Barty, R. Soufli, E. Spiller, C. C. Walton, S. Bajt, "Ultra-high-accuracy optical testing: creating diffraction-limited short-wavelength optical systems," Proc. SPIE 5900 , 114-23 (2005). [LINK] LBNL-60541 Beamline 12.0.1.2/12.0.1.3 [View Presentation]

146) G. Denbeaux, E. Garg, A. Barty, Y. Liu, K. Goldberg, O. Wood, "Extreme Ultraviolet Phase Contrast Imaging of Mask Defects,"2005 International Symposium on Extreme Ultraviolet Lithography, San Diego, CA November 7-9. Beamline 11.3.2, 6.3.2 ,

147) P. P. Naulleau, J. P. Cain, K. Dean, and K. A. Goldberg, "Lithographic characterization of low-order aberrations in the Berkeley MET tool,"2005 International Symposium on Extreme Ultraviolet Lithography, San Diego, CA November 7-9. Beamline 12.0.1.3 ,

148) P. P. Naulleau, J. P. Cain, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, B. La Fontaine, A R. Pawloski, C. Larson, and G. Wallraff, "Investigation of the current resolution limits of advanced EUV resists,"2005 International Symposium on Extreme Ultraviolet Lithography, San Diego, CA November 7-9. Beamline 12.0.1.3 ,

149) P. P. Naulleau, J. P. Cain, K. A. Goldberg, "Lithographic characterization of the field dependent astigmatism and alignment stability of a 0.3 numerical aperture extreme ultraviolet microfield optic ," Journal of Vacuum Science and Technology B 23 (5), 2003-6 (2005). [LINK] Beamline 12.0.1.3

150) K. A. Goldberg, "Method and Apparatus for Inspecting an EUV Mask Blank," U.S. Patent No. 6,963,395, November 8, 2005, [LINK]

151) P. P. Naulleau, J. P. Cain, K. A. Goldberg, "Lithographic characterization of the spherical error in an EUV optic using a programmable pupil fill illuminator," Applied Optics 45 (9), 1957-1963 (2005). Beamline 12.0.1.3

152) P. P. Naulleau, K. A. Goldberg, J. P. Cain, E. H. Anderson, K. R. Dean, P. Denham, B. Hoef, K. H. Jackson, "Extreme Ultraviolet Lithography Capabilities at the Advanced Light Source Using a 0.3-NA Optic," IEEE Journal of Quantum Electronics 42 (104), 44-50 (2005). Beamline 12.0.1.3

153) P. Mercere, S. Bucourt, G.Cauchon, D. Douillet, G. Dovillaire, K. A. Goldberg, M. Idir, X. Levecq, T. Moreno, P. P. Naulleau, S. Rekawa, P. Zeitoun, "X-ray beam metrology and x-ray optic alignment by Hartmann wavefront sensing," Proc. SPIE 5921 , 63-72 (2005). Beamline 12.0.1.2

154) T. Koehler, R. L. Brainard, P. P. Naulleau, D. Van Steenwinckel, J. H. Lammers, K. A. Goldberg, J. F. Mackevich, P. Trefonas, "Performance of EUV photoresists on the ALS micro exposure tool," SPIE 5753 , 754-64 (2005). [LINK] Beamline 12.0.1.2

2004

155) K. A. Goldberg, P. Naulleau, S. Rekawa, P. Denham, J. A. Liddle, E. Anderson, K. Jackson, J. Bokor, D. Attwood, "At-wavelength interferometry of high-NA diffraction-limited EUV optics," AIP Conf. Proc. 705 1, 855-860 (2004). [LINK] LBNL-53704 Beamline 12.0.1.3/12.0.1.2

156) P. Naulleau, K. A. Goldberg, P. Batson, P. Denham, and S. Rekawa, "A synchrotron-based Fourier-synthesis custom-coherence illuminator ," AIP Conf. Proc. 705 1, 792-95 (2004). [LINK] LBNL-55667 Beamline 12.0.1.3 DOI 10.1063/1.1757915

157) P. P. Naulleau, K. A. Goldberg, "Dual-Domain Lateral Shearing Interferometer," U.S. Patent No. 6,707,560, March 16, 2004, [LINK] Beamline 12.0.1.2/12.0.1.3

158) P. Naulleau, K. A. Goldberg, J. P. Cain, E. Anderson, P. Denham, K. Jackson, S. Rekawa, F. Salmassi, G. Zhang, "Extreme Ultraviolet Microexposures at the ALS using the 0.3-NA MET Optic," Journal of Vacuum Science and Technology B 22 (6), 2962-65 (2004). [LINK] LBNL-55630 Beamline 12.0.1.3

159) K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, J. A. Liddle, E. H. Anderson, "EUV interferometric testing and alignment of the 0.3 NA MET optic," Proc. SPIE 5374 , 64-73 (2004). [LINK] Beamline 12.0.1.3

160) M. D. Shumway, E. L. Snow, K. A. Goldberg, P. Naulleau, H. Cao, M. Chandhok, J. A. Liddle, E. H. Anderson, J. Bokor, "EUV resist imaging below 50 nm using coherent spatial filtering techniques," Proc. SPIE 5374 , 454-59 (2004). Beamline 12.0.1.2

161) P. Naulleau, K. A. Goldberg, E. H. Anderson, K. Bradley, R. Delano, P. Denham, R. Gunion, B. Harteneck, B. Hoef, H. Huang, K. Jackson, M. G. Jones, D. Kemp, J. A. Liddle, R. Oort, A. Rawlins, S. Rekawa, F. Salmassi, R. Tackaberry, C. Chung, L. Hale, D. Phillion, G. Sommargren, H. Taylor, "Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic," Proc. SPIE 5374 , 881-891 (2004). Beamline 12.0.1.3

162) K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, E. H. Anderson and J.A. Liddle, "At-Wavelength Alignment and Testing of the 0.3 NA MET Optic," Journal of Vacuum Science and Technology B 22 (6), 2956-61 (2004). [LINK] LBNL-58422 Beamline 12.0.1.3

163) P. Mercère, M. Idir, P. Zeitoun, X. Levecq, G. Dovillaire, S. Bucourt, D. Douillet, K. A. Goldberg, P. P. Naulleau, and S. Rekawa , "X ray Wavefront Hartmann Sensor," AIP Conf. Proc. 705 1, 819-822 (2004). [LINK] LBNL-58485 Beamline 12.0.1.2

164) A. R. Pawloski, B. La Fontaine, H. J. Levinson, S. Hirscher, S. Schwarzl, K. Lowack, F.-M. Kamm, M. Bender, W.-D. Domke, C. Holfeld, U. Dersch, P. Naulleau, F. Letzkus, J. Butschke, "Comparative study of mask architectures for EUV lithography," Proc. of SPIE 5567 , 762-773 (2004). Beamline 12.0.1.3

165) P. P. Naulleau , "Verification of point-spread-function-based modeling of an extreme-ultraviolet photoresist," Appled Optics 43 (4), 788-92 (2004). Beamline 12.0.1.3

166) K. A. Goldberg, P. P. Naulleau, P. E. Denham, S. B. Rekawa, K. H. Jackson, E. H. Anderson, J. A. Liddle, "EUV system optimization and advanced lithography research at Lawrence Berkeley National Laboratory,"MNC 2004, Osaka, Japan October 26-29, 2004. Beamline 12.0.1.3/6.3.2 ,

167) K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, E. H. Anderson, J. A. Liddle, "At-wavelength Alignment and Testing of the 0.3 NA MET Optic,"3rd International EUVL Symposium, Miyazaki, Japan November 2-4, 2004. Beamline 12.0.1.3/6.3.2 ,

2003

168) K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, E. H. Anderson, J. A. Liddle, J. Bokor, "EUV Interferometry of the 0.3 NA MET Optic," Proc. SPIE 5037 , 69-74 (2003). [LINK] LBNL-53382 Beamline 12.0.1.3

169) P. P. Naulleau, K. A. Goldberg, E. H. Anderson, J. Bokor, B. D. Harteneck, K. H. Jackson, D. L. Olynick, F. Salmassi, S. L. Baker, P. B. Mirkarimi, E. A. Spiller, C. C. Walton, D. J. O'Connell, P. Yan, G. Zhang, "Static EUV microexposures using the ETS set-2 optics," Proc. SPIE 5037 , 36-46 (2003). LBNL-52479 Beamline 12.0.1.3

170) S. A. Robertson, P. P. Naulleau, K. A. Goldberg, D. J. OConnell, K. McDonald, S. G. Hansen, T. M. Delano, K. W. Brown, R. L. Brainard, "Calibration of EUV-2D photoresist simulation parameters for accurate predictive modeling," Proc. SPIE 5037 , 900-9 (2003). [LINK] Beamline 12.0.1.3

171) M. D. Shumway, P. P. Naulleau, K. A. Goldberg, E. L. Snow, J. Bokor, "Resist evaluation at 50 nm in the EUV using interferometric spatial frequency doubled imaging," Proc. SPIE 5037 , 910-16 (2003). Beamline 12.0.1.2

172) P. Naulleau, K. Goldberg, E. Anderson, J. Bokor, E. Gullikson, B. Harteneck, K. Jackson, D. Olynick, F. Salmassi, S. Baker, P. Mirkarimi, E. Spiller, C. Walton, and G. Zhang, "Lithographic characterization of the printability of programmed EUV substrate defects," Journal of Vacuum Science and Technology B 21 (4), 1286-90 (2003). Beamline 12.0.1.3

173) K. A. Goldberg and P. P. Naulleau, "Hybrid shearing and phase-shifting point diffraction interferometer," U.S. Patent No. 6,573,997, June 3, 2003, [LINK] LBNL-53411 Beamline 12.0.1.2/12.0.1.3

174) W. P. Ballard, D. A. Tichenor, D. J. O'Connell, L. J. Bernardez II, R. E. Lafton, R. J. Anderson, A. H. Leung, K. Williams, S. J. Hanley, Y. Perras, K. L. Jefferson, T. L. Porter, D. Knight, P. K. Barr, J. L. Van de Vreugde, R. H. Campiotti, M. D. Zimmerman, T. A. Johnson, L. E. Klebanoff, P. A. Grunow, S. Graham Jr, D. A. Buchenauer, W. C. Replogle, T. G. Smith, J. B. Wronosky, J. R. Darnold, K. L. Blaedel, H. N. Chapman, J. S. Taylor, L. C. Hale, G. E. Sommargren, E. M. Gullikson, P. Naulleau, K. A. Goldberg, S. H. Lee, H. Shields, R. J. St. Pierre, S. Ponti, "System and process learning in a full-field high-power EUVL alpha tool," Proc. SPIE 5037 , 47-57 (2003). Beamline 12.0.1.3

175) A. Barty and K. A. Goldberg, "Effects of radiation induced carbon contamination on the performance of an EUV lithographic optic," Proc. SPIE 5037 , 450-59 (2003). [LINK] LBNL-53413 Beamline 12.0.1.2

176) P. Naulleau, K. Goldberg, P. Batson, J. Bokor, P. Denham, and S. Rekawa, "A Fourier-synthesis custom-coherence illuminator for EUV microfield lithography," Applied Optics 42 (5), 820-26 (2003). [LINK] Beamline 12.0.1.3

177) P. P. Naulleau and G. M. Gallatin, "Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization," Applied Optics 42 (17), 3390-7 (2003). [LINK] Beamline 12.0.1.3

178) C. Chang, P. Naulleau, D. Attwood , "Analysis of Illumination Coherence Properties in Small-Source Systems Such as Synchrotrons," Applied Optics 42 (14), 2506-12 (2003). [LINK] LBNL-52312 Beamline 12.0.1.2

179) M. Idir, P. Mercère, P. Zeitoun, D. Douillet, X. Levecq, G. Dovillaire, S. Bucourt, K. A. Goldberg, P. P. Naulleau, and S. Rekawa, "XUV Hartmann wavefront sensor ," Eighth Internation Conference on Synchrotron Radiation Instrumentation, August 25-29, 2003, San Francisco, CA , (2003). Beamline 12.0.1.2

180) P. Mercère, P. Zeitoun, M. Idir, S. Le Pape, D. Douillet, X. Levecq, G. Dovillaire, S. Bucourt, K. A. Goldberg, P. P. Naulleau, and S. Rekawa, "Hartmann wave-front measurement at 13.4 nm with lambdaEUV/120 accuracy," Optics Letters 28 (17), 1534-36 (2003). [LINK] Beamline 12.0.1.2

181) A. Barty and K. A. Goldberg, "The effects of radiation induced carbon contamination on the performance of an EUV lithographic optic," Proc. SPIE 5040 , 510-19 (2003). Beamline 12.0.1.2

182) K. A. Goldberg, P. P. Naulleau, P. E. Denham, S. B. Rekawa, K. H. Jackson, J. A. Liddle, B. Harteneck, E. Gullikson, and E. H. Anderson, "Preparations for extreme ultraviolet interferometry of the 0.3 numerical aperture Micro Exposure Tool optic," Journ. Vac. Sci. & Technol. B 21 (6), 2706-10 (2003). [LINK] LBNL-53382 Beamline 12.0.1.3

183) P. P. Naulleau, J. A. Liddle, F. Salmassi, E. H. Anderson, and E. M. Gullikson, "Design, Fabrication, and Characterization of High-Efficiency Extreme-Ultraviolet Diffusers," Applied Optics 43 (28), 5323-29 (2003).

184) P. P. Naulleau, J. A. Liddle, F. Salmassi, E. H. Anderson, E. M. Gullikson, "Design and fabrication of advanced EUV diffractive elements," Proc. SPIE 5347 , 9-17 (2003).

185) J. A. Liddle, F. Salmassi, P. P. Naulleau, E. M. Gullikson , "Nanoscale topography control for the fabrication of advanced diffractive optics," J. Vac. Sci. Technol. B 21 (6), 2980-84 (2003).

186) P. Naulleau, K. A. Goldberg, E. H. Anderson, J. Bokor, B. Harteneck, K. Jackson, D. Olynick, F. Salmassi, S. Baker, P. Mirkarimi, E. Spiller, C. Walton, D. O'Connell, P.-Y. Yan, G. Zhang, "Printing-based performance analysis of the engineering test stand set-2 optic using a synchrotron exposure station with variable sigma," J. Vac. Sci. & Technol. B 21 (6), 2697-2700 (2003). Beamline 12.0.1.3

187) D. J. O'Connell, S. H. Lee, W. P. Ballard, D. A. Tichenor, L. J. Bernardez II, S. J. Hanley, T. A. Johnson, P. K. Barr, A. H. Leung, K. L. Jefferson, W. C. Replogle, J. E. M. Goldsmith, H. N. Chapman, P. P. Naulleau, S. Wurm, E. M. Panning, "Lithographic characterization of improved projection optics in the EUVL engineering test stand," Proc. SPIE 5037 , 83-94 (2003).

188) S. Hun Lee, P. Naulleau, C. Krautschik, M. Chandhok, H. Chapman, D. J. O'Connell, and M. Goldstein , "Lithographic flare measurements of EUV full-field projection optics," Proc. SPIE 5037 , 103-111 (2003).

189) P. Zeitoun, P. Balcou, S. Bucourt, D. Benredjem, F. Delmotte, G. Dovillaire, D. Douillet, J. Dunn, G. Faivre, M. Fajardo, K. A. Goldberg, M. Idir, S. Hubert, J. Hunter, S. Jacquemot, S. Kazamias, S. le Pape, X. Levecq, C. L. S. Lewis, R. Marmoret, P. Mercère, A. S. Morlens, P. P. Naulleau, C. Remond, J. J. Rocca, S. Sebban, R. F. Smith, M.-F. Ravet, P. Troussel, C. Valentin, and L. Vanbostal, "New techniques for the measurement of x-ray beam or x-ray optics quality," Proc. SPIE 5197 , 194-204 (2003). [LINK] Beamline 12.0.1.2

190) P. P. Naulleau, K. A. Goldberg, E. Anderson, J. P. Cain, P. Denham, K. Jackson, A.-S. Morlens, S. Rekawa, F. Salmassi, and R. L. Brainard, "High resolution EUV microexposures at the ALS,"3rd International EUVL Symposium, Miyazaki, Japan, November 2-4, 2004. Beamline 12.0.1.3/6.3.2 ,

191) K. A. Goldberg, P. Naulleau, et al., , "At-wavelength interferometry of the 0.3 NA MET Optic: measurements, alignment, preparations for imaging," Third Annual SEMATECH International EUVL Symposium, Antwerp, Belgium November, 2003. Beamline 12.0.1.3 ,

2002

192) K. A. Goldberg, P. Naulleau, J. Bokor, P. Denham, S. Rekawam, P. Batson, A. Liddle, B. Harteneck, K. Jackson, E. Anderson, D. Attwood, H. Chapman, A. Barty, G. Sommargren, D. Phillion, J. Taylor, D. Sweeney, "VNL Research in Interferometry for EUV Optics,"Presented at the First International EUVL Symposium, Addison, Texas October 15-17, 2002. LBNL-50292 Beamline 12.0.1.3 , LBNL-50292

193) P. Naulleau, K. A. Goldberg, E. H. Anderson, P. Batson, J. Bokor, P. Denham, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, S. Baker, H. Chapman, P. Mirkarimi, E. Spiller, C. Walton, D. O'Connell, P.-Y. Yan, and G. Zhang, "Lithographic characterization of the ETS Set-2 optic at the Advanced Light Source static microfield exposure station,"Presented at the First International EUVL Symposium, Addison, Texas October 15-17, 2002. LBNL-50289 Beamline 12.0.1.3 , LBNL-50289

194) S. A. Robertson, P. P. Naulleau, D. J. O'Connell, K. R. McDonald, K. A. Goldberg, T. Delano, and R. L. Brainard, "Calibration of EUV-2D Photoresist Simulation Parameters for Accurate Predictive Modeling,"Presented at the First International EUVL Symposium, Addison, Texas October 15-17, 2002. LBNL-50291 Beamline 12.0.1.3 , LBNL-50291

195) K. A. Goldberg, P. Naulleau, and J. Bokor, "Fourier-transform interferometer alignment methods," Applied Optics 41 (22), 4477-83 (2002). [LINK] LBNL-50953 Beamline 12.0.1

196) P. Naulleau, K. A. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, D. O'Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan and G. Zhang, "Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic," Journal of Vacuum Science and Technology B 20 (6), 2829-33 (2002). [LINK] LBNL-50406 Beamline 12.0.1.3

197) K. Goldberg, P. Naulleau, J. Bokor and H. Chapman, "Testing EUV Optics with Visible-Light and EUV Interferometry," Journal of Vacuum Science and Technology B 20 (6), 2834-39 (2002). [LINK] LBNL-50290 Beamline 12.0.1.3

198) S. Lee, D. A. Tichenor, P. Naulleau, "Lithographic Aerial Image Contrast Measurement in the EUV Engineering Test Stand," Journal of Vacuum Science and Technology B 20 (6), 2849-52 (2002). Beamline 12.0.1.3

199) K. A. Goldberg, P. Naulleau, J. Bokor, and H. N. Chapman, "Honing the accuracy of extreme ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic," Proc. SPIE 4688 , 329-337 (2002). [LINK] LBNL-49040 Beamline 12.0.1.3

200) P. Naulleau, K. A. Goldberg, E. H. Anderson, D. T. Attwood, Jr., P. J. Batson, J. Bokor, P. Denham, E. M. Gullikson, B. Hoef, K. H. Jackson, S. Rekawa, F. Salmassi, K. L. Blaedel, H. N. Chapman, L. C. Hale, R. Soufli, E. A. Spiller, D. W. Sweeney, J. R. Taylor, C. C. Walton, G. F. Cardinale, A. K. Ray-Chaudhuri, A. Fisher, D. J. O'Connell, R. H. Stulen, D. A. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, "Static microfield printing at the Advanced Light Source with the ETS Set-2 optic," Proc. SPIE 4688 4688, 64-71 (2002). [LINK] Beamline 12.0.1.3

201) D. A. Tichenor, W. C. Replogle, S. H. Lee, W. P. Ballard, G. D. Kubiak, L. E. Klebanoff, J. E. M. Goldsmith, J. B. Wronosky, L. C. Hale, H. N. Chapman, J. S. Taylor, K. A. Goldberg, P. Naulleau, "Performance upgrades in the EUV Engineering Test Stand," Proc. SPIE 4688 , 72-86 (2002). LBNL-50200 Beamline 12.0.1.3

202) S. H. Lee, D. A. Tichenor, W. P. Ballard, L. J. Bernardez II, J. E. M. Goldsmith, S. J. Hanley, K. L. Jefferson, T. A. Johnson, A. H. Leung, D. J. O'Connell, W. C. Replogle, J. B. Wronosky, K. Blaedel, P. Naulleau, K. A. Goldberg, E. M. Gullikson, H. N. Chapman, S. Wurm, E. Panning, P.-Y. Yan, G. Zhang, J. E. Bjorkholm, G. D. Kubiak, D. W. Sweeney, D. Attwood, and C. W. Gwyn, "Lithographic Evaluation of the EUV Engineering Test Stand," Proc. SPIE 4688 , 266-276 (2002). LBNL-51097 Beamline 12.0.1.3

203) K. A. Goldberg, "Graphical user interface for image acquisition and processing," U.S. Patent No. 6,341,183, January 22, 2002, [LINK] LBNL/ALS-43829 Beamline 12.0.1.2/12.0.1.3

204) R. A. Bartels, A. Paul, H. Green, H. C. Kapteyn, M. M. Murname, S. Backus, I. P. Christov, Y. Liu, D. Attwood, C. Jacobsen, "Generation of Spatially Coherent Light at Extreme Ultraviolet Wavelengths," Science 297 , 376-8 (2002). [LINK]

205) C. Chang, E. Anderson, P. Naulleau, E. Gullikson, K. Goldberg, D. Attwood , "Direct measurement of index of refraction in the extreme-ultraviolet wavelength region with a novel interferometer," Optics Letters 27 (12), 1028-1030 (2002). [LINK] LBNL-49246 Beamline 12.0.1.2

206) D. Attwood, E. Anderson, G. Denbeaux, K. Goldberg, P. Naulleau, G Schneider, "Soft X-Ray Microscopy and EUV Lithography: An Update on Imaging at 20-40 nm Spatial Resolution," AIP Conference Proceedings 641 183, 461-68 (2002). Beamline 6.1.2, 6.3.2, 12.0.1.1, 12.0.1.2

207) K. A. Goldberg, P. Naulleau, J. Bokor, P. Denham, S. Rekawam, P. Batson, A. Liddle, B. Harteneck, K. Jackson, E. Anderson, D. Attwood, H. Chapman, A. Barty, G. Sommargren, D. Phillion, J. Taylor, D. Sweeney, "VNL Research in Interferometry for EUV Optics,"First International EUVL Symposium, Addison, Texas October 15-17, 2002. Beamline 12.0.1.3 ,

2001

208) P. Naulleau, K. A. Goldberg, E. H. Anderson, P. Batson, P. E. Denham, K. H. Jackson, E. M. Gullikson, S. Rekawa, and J. Bokor, "At-wavelength characterization of the extreme ultraviolet Engineering Test Stand Set-2 optic," Journal of Vacuum Science and Technology B 19 (6), 2396-2400 (2001). [LINK] LBNL-49064 Beamline 12.0.1.3

209) H. N. Chapman, A. K. Ray-Chaudhuri, D. A. Tichenor, W. C. Replogle, R. H. Stulen, G. D. Kubiak, P. D. Rockett, L. E. Klebanoff, D. O'Connell, A. H. Leung, K. L. Jefferson, J. B. Wronosky, J. S. Taylor, L. C. Hale, K. Blaedel, E. A. Spiller, G. E. Sommargren, J. A. Folta, D. W. Sweeney, E. M. Gullikson, P. Naulleau, K. A. Goldberg, J. Bokor, D. T. Attwood, U. Mickan and R. Hanzen, E. Panning, P.-Y. Yan, C. W. Gwyn, and S. H. Lee , "First lithographic results from the extreme ultraviolet Engineering Test Stand," Journal of Vacuum Science and Technology B 19 (6), 2389-95 (2001). [LINK] LBNL/ALS-43735 Beamline 12.0.1.3

210) K. A. Goldberg and J. Bokor, "Fourier-transform method of phase-shift determination," Applied Optics 40 (17), 2886-94 (2001). [LINK] LBNL-46937 Beamline 12.0.1.2/12.0.1.3

211) K. A. Goldberg, "Phase-shifting point diffraction interferometer mask designs," U.S. Patent No. 6,307,635, October 23, 2001, [LINK] Beamline 12.0.1.2/12.0.1.3

212) Neville Smith , "Science with Soft X Rays," Physics Today 54 , 29 (2001).

213) D. A. Tichenor, A. K. Ray-Chaudhuri, S. H. Lee, H. N. Chapman, W. C. Replogle, K. W. Berger, R. H. Stulen, G. D. Kubiak, L. E. Klebanoff, J. B. Wronosky, D. J. O'Connell, A. H. Leung, K. L. Jefferson, W. P. Ballard, L. C. Hale, K. Blaedel, J. S. Taylor, J. A. Folta, E. Spiller, R. Soufli, G. E. Sommargren, D. W. Sweeney, P. Naulleau, K. A. Goldberg, E. M. Gullikson, J. Bokor, D. T. Attwood, U. Mickan, R. Hanzen, E. Panning, P.-Y. Yan, J. E. Bjorkholm, and C. W. Gwyn, "Initial Results from the EUV Engineering Test Stand," Proc. SPIE 4506 , (2001). [LINK] LBNL-50570 Beamline 12.0.1.3

214) K. A. Goldberg, K. Geary, "Wave-front measurement errors from restricted concentric subdomains," Journal of the Optical Society of America A 18 (9), 2146-52 (2001). [LINK] LBNL-50201 Beamline 12.0.1.2/12.0.1.3

215) P. P. Naulleau, K. A. Goldberg, P. J. Batson, S. Jeong, and J. H. Underwood, "Tolerancing of diffraction-limited Kirkpatrick-Baez synchrotron beamline optics for extreme-ultraviolet metrology," Applied Optics 40 (22), 3703-3709 (2001). [LINK] LBNL-48607 Beamline 12.0.1.2/12.0.1.3

216) S. H. Lee, P. Naulleau, K. A. Goldberg, C. H. Cho, S. Jeong, J. Bokor, "Extreme-ultraviolet lensless Fourier-transform holography," Applied Optics 40 (16), 2655-2661 (2001). [LINK] LBNL/ALS-13677 Beamline 12.0.1.2

217) K. A. Goldberg, "Fourier-transform and global contrast interferometer alignment methods," U.S. Patent No. 6,239,878, May 29, 2001, [LINK] Beamline 12.0.1.2/12.0.1.3

218) P. Naulleau, K. A. Goldberg, "Interferometric at-wavelength flare characterization of EUV optical systems," U.S. Patent No. 6,233,056, May 15, 2001, [LINK] Beamline 12.0.1.2/12.0.1.3

219) P. Naulleau, K. A. Goldberg, E. Tejnil, "Phase-shifting point diffraction interferometer grating designs," U.S. Patent No. 6,195,169, February 27, 2001, [LINK] Beamline 12.0.1.2/12.0.1.3

220) P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, and J. Bokor , "Adding static printing capabilities to the EUV phase-shifting point diffraction interferometer," Proc. SPIE 4343 , 639-45 (2001). [LINK] LBNL-46938 Beamline 12.0.1.3

221) M. Shumway, S. Lee, C. Cho, P. Naulleau, K. Goldberg, and J. Bokor , "Extremely fine-pitch printing with a 10x Schwarzschild optic at extreme ultraviolet wavelengths," Proc. SPIE 4343 , 357-62 (2001). Beamline 12.0.1.2

222) D. A. Tichenor, A. K. Ray-Chaudhuri, W. Replogle, C. William, R. H. Stulen, G. D. Kubiak, P. D. Rockett, L. E. Klebanoff, K. J. Jefferson, A. Leung, J. B. Wronosky, L. C. Hale, H. N. Chapman, J. S. Taylor, J. A. Folta, C. Montcalm, R. Soufli, E. A. Spiller, K. L. Blaedel, G. E. Sommargren, D. W. Sweeney, P. Naulleau, K. A. Goldberg, E. M. Gullikson, J. Bokor, P. J. Batson, D. T. Attwood, K. H. Jackson, S. D. Hector,C. Gwyn, P. Yan , "System integration and performance of the EUV engineering test stand," Proc. SPIE 4343 , 19-37 (2001). LBNL-50208 Beamline 12.0.1.3

223) P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, D. O'Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, "Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,"Third International Workshop on Extreme Ultraviolet Lithography, Matsue, Japan October 29-31, 2001. LBNL-51058 Beamline 12.0.1.3 , LBNL-51058

224) K. Goldberg, P. Naulleau, P. Denham, P. Batson, S. Rekawa, B. Hoef, E. Anderson, H. Chapman, and J. Bokor, "At-wavelength testing of the Set-2 ETS projection optic--a four-mirror ring filed aspheric optical system,"Third International Workshop on Extreme Ultraviolet Lithography, Matsue, Japan October 29-31, 2001. LBNL-50935 Beamline 12.0.1.3 , LBNL-50935

225) D. Tichenor, R. Stulen, W. Replogle, A Leung, G. Kubiak, L. Klebanoff, J. Wronosky, L. Hale, H. Chapman, J. Taylor, and P. Naulleau, "System performance and objectives for the EUV Engineering Test Stand,"Third International Workshop on Extreme Ultraviolet Lithography, Matsue, Japan October 29-31, 2001. Beamline 12.0.1.3 ,

226) E. Gullikson, K. Goldberg, P. Naulleau, J. Bjorkholm, H. Chapman, S. Baker, and J. Taylor, "The prediction and measurement of flare for the ETS," Third International Workshop on Extreme Ultraviolet Lithography, Matsue, Japan , (2001). Beamline 6.3.2/12.0.1.3

2000

227) P. P. Naulleau, C. H. Cho, E. M. Gullikson, J. Bokor, "Transmission phase gratings for EUV interferometry," Journal of Synchrotron Radiation \ (6), 405-10 (2000). Beamline 12.0.1.2/12.0.1.3

228) P. Naulleau, "Phase-shifting point diffraction interferometer focus-aid enhanced mask," U.S. Patent No. 6,151,115, November 21, 2000, [LINK] Beamline 12.0.1.2/12.0.1.3

229) K. Goldberg and P. Naulleau, "In Situ alignment system for phase-shifting point-diffraction interferometry," U.S. Patent No. 6,118,535, September 12, 2000, [LINK] Beamline 12.0.1.2/12.0.1.3

230) P. Naulleau and K. Goldberg, "Null test Fourier domain alignment technique for phase-shifting point diffraction interferometer," U.S. Patent No. 6,111,646, August 29, 2000, [LINK] Beamline 12.0.1.2/12.0.1.3

231) P. Naulleau and K. Goldberg, "Dual domain phase-shifting point diffraction interferometer," U.S. Patent No. 6,100,978, August 8, 2000, [LINK] Beamline 12.0.1.2/12.0.1.3

232) K. A. Goldberg, P. Naulleau, P. Batson, P. Denham, H. Chapman, and J. Bokor, "Extreme ultraviolet alignment and testing of a four mirror aspheric extreme ultraviolet optical system," Journal of Vacuum Science and Technology B 18 (6), 2911-15 (2000). [LINK] Beamline 12.0.1.3

233) P. P. Naulleau, K. A. Goldberg and J. Bokor, "Extreme ultraviolet carrier-frequency shearing Interferometry of a lithographic four-mirror optical system," Journal of Vacuum Science and Technology B 18 (6), 2939-43 (2000). [LINK] LBNL-45732 Beamline 12.0.1.3

234) S. H. Lee, J. Bokor, S. Jeong, and K. Goldberg, "Extreme ultraviolet holographic microscopy and its application to extreme ultraviolet mask-blank defect characterization," Journal of Vacuum Science and Technology B 18 (6), 2935-8 (2000). [LINK] Beamline 12.0.1.2

235) K. A. Goldberg, P. Naulleau, P. J. Batson, P. Denham, J. Bokor, and H. N. Chapman, "EUV Interferometry of a Four-Mirror Ring-Field EUV Optical System," Proc. SPIE 3997 , 867-73 (2000). [LINK] LBNL-45328 Beamline 12.0.1.3

236) D. A. Tichenor, G. D. Kubiak, W. C. Replogle, L. E. Klebanoff, J. B. Wronosky, L. C. Hale, H. N. Chapman, J. S. Taylor, J. A. Folta, C. Montcalm, R. M. Hudyma, K. A. Goldberg, and P. Naulleau , "EUV Engineering Test Stand," Proc. SPIE 3997 , 48-69 (2000). Beamline 12.0.1.3

237) P. Naulleau, K. Goldberg, S. Lee, C. Chang, P. Batson, D. Attwood, and J. Bokor, "The PS/PDI: a high accuracy development tool for diffraction limited short-wavelength optics," AIP Conf. Proc. 507 , 595 (2000). [LINK] Beamline 12.0.1.2/12.0.1.3

238) P. Naulleau, K. Goldberg, E. Gullikson, and J. Bokor, "At-wavelength, system-level flare characterization of EUV optical systems," Applied Optics 39 (17), 2941-47 (2000). [LINK] LBNL-44480 Beamline 12.0.1.2/12.0.1.3

239) C. Chang, P. Naulleau, E. Anderson, and D. Attwood, "Spatial coherence characterization of undulator radiation," Optics Communications 182 , 25-34 (2000). [LINK] Beamline 12.0.1.2

240) P. Naulleau, K. Goldberg, S. Lee, C. Chang, D. Attwood, and J. Bokor, "The EUV phase-shifting point diffraction interferometer," Synchrotron Radiation Instrumentation: 11th US National Conference, 1999, P. Pianetta, et al.,(eds.) CP521 , 66-72 (2000). Beamline 12.0.1.2/12.0.1.3

241) S. H. Lee, P. Naulleau, K. A. Goldberg, F. Piao, W. Oldham, J. Bokor , "Phase-shifting point-diffraction interferometry at 193 nm," Applied Optics 39 (31), (2000). [LINK]

242) S. H. Lee, F. Piao, P. Naulleau, K. A. Goldberg, W. Oldham, and J. Bokor, "At-wavelength characterization of DUV-radiation-induced damage in fused silica," Proc. SPIE 3998 , 724-31 (2000).

243) P. P. Naulleau, P. J. Batson, P. E. Denham, and M. S. Jones , "Miniature self-contained vacuum compatible electronic imaging microscope," U.S. Patent No. 6,327,102, March 7, 2000, [LINK] Beamline 12.0.1.2/12.0.1.3

1999

244) K. A. Goldberg, "Testing extreme ultraviolet optical systems at-wavelength with sub-angstrom accuracy," in Fabrication and Testing of Aspheres, J. S. Taylor, M. Piscotty, and A. Lindquist, (eds.) (Optical Society of America, Washington, D.C., 1999) , (1999). [LINK] LBNL-42909 Beamline 12.0.1.2/12.0.1.3

245) E. M. Gullikson, S. L. Baker, J. E. Bjorkholm, J. Bokor, K. A. Goldberg, J. E. M. Goldsmith, C. Montcalm, P. Naulleau, E. A. Spiller, D. G. Stearns, J. S. Taylor, J. H. Underwood, "EUV scattering and flare of 10x projection cameras," in Emerging Lithographic Technologies III, Y. Vladimirski, ed., Proc. SPIE 3676 , 717-23 (1999). LBNL-42974 Beamline 6.3.2/12.0.1.2

246) J. E. M. Goldsmith, K. W. Berger, D. R. Bozman, G. F. Cardinale, D. R. Folk, C. C. Henderson, D. J. O'Connell, A. K. Ray-Chaudhuri, K. D. Stewart, D. A. Tichenor, H. N. Chapman, R. J. Gaughan, R. M. Hudyma, C. Montcalm, E. A. Spiller, J. S. Taylor, J. D. Williams, K. A. Goldberg, E. M. Gullikson, P. Naulleau, J. L. Cobb, "Sub-100-nm lithographic imaging with the EUV 10x Microstepper," in Emerging Lithographic Technologies III, Y. Vladimirski, ed., Proc. SPIE 3676 , 264-71 (1999). Beamline 12.0.1.2

247) K. A. Goldberg, P. Naulleau, S. H. Lee, C. Chang, C. Bresloff, R. Gaughan, H. N. Chapman, J. Goldsmith, and J. Bokor, "Direct comparison of EUV and visible-light interferometries," Proc. SPIE 3676 , 635-42 (1999). [LINK] LBNL-42976 Beamline 12.0.1.3

248) D. T. Attwood, P. Naulleau, K. A. Goldberg, E. Tejnil, C. Chang, R. Beguiristain, P. Batson, J. Bokor, E. M. Gullikson, M. Koike, H. Medecki, and J. H. Underwood, "Tunable coherent radiation in the soft x-ray and extreme ultraviolet spectral regions," IEEE Journal of Quantum Electronics 35 (5), 709-20 (1999). LBNL-42872 Beamline 12.0.1.1/12.0.1.2/12

249) P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, P. Batson, D. Attwood, and J. Bokor, "Recent advances in EUV phase-shifting point diffraction interferometry," Proc. SPIE 3767 , 154-63 (1999). LBNL-43488 Beamline 12.0.1.2

250) K. A. Goldberg, P. Naulleau, and J. Bokor, "Extreme ultraviolet interferometric measurements of diffraction-limited optics," Journal of Vacuum Science and Technology B 17 (6), 2982-86 (1999). [LINK] LBNL-42695 Beamline 12.0.1.2

251) P. Naulleau, K. A. Goldberg, E. M. Gullikson, and J. Bokor, "Interferometric at-wavelength flare characterization of EUV optical systems," Journal of Vacuum Science and Technology B 17 (6), 2987-91 (1999). [LINK] LBNL-42727 Beamline 12.0.1.2

252) P. P. Naulleau and K. A. Goldberg, "A Dual-domain point diffraction interferometer," Applied Optics 38 (16), 3523-33 (1999). [LINK] LBNL-42167 Beamline 12.0.1.2/12.0.1.3

253) K. A. Goldberg, P. Naulleau, J. Bokor, P. Batson, P. Denham, E. Anderson, S. Lee, and C. Chang, "Extreme ultraviolet interferometric measurement and alignment of diffraction-limited optics,"The Advanced Light Source Users Meeting . Beamline 12.0.1.2 ,

254) P. P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, D. Attwood, and J. Bokor, "Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy," Applied Optics 38 (35), 7252-63 (1999). LBNL-43179 Beamline 12.0.1.2

255) P. Naulleau, K. Goldberg, E Gullikson, and J. Bokor, "Interferometric at wavelength flare characterization of EUV optical systems,"The Advanced Light Source Users Meeting . Beamline 12.0.1.2 ,

256) David T. Attwood, "Soft X-Rays and Extreme Ultraviolet Radiation : Principles and Applications," Cambridge University Press, ISBN: 0521652146 (1999). [LINK]

1998

257) K. A. Goldberg, P. Naulleau, S. Lee, C. Chang, C. Bresloff, P. Denham, P. Batson, D. Attwood, and J. Bokor, "EUV interferometry: an accuracy standard for diffraction-limited EUV optics,"The Advanced Light Source Users Meeting 1998. LBNL-42336 Beamline 12.0.1.2 , LBNL-42336

258) P. Naulleau, K. Goldberg, S. Lee, C. Bresloff, D. Attwood, and J. Bokor, "Point Diffraction Interferometry: An EUV Projection Lithography System Alignment and Qualification Tool," Optical Fabrication and Testing, OSA Technical Digest Series Vol. 12 117-119, (1998). LBNL-41248 Beamline 9.0.1/12.0.1.2

259) P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, C. Bresloff, P. Batson, D. Attwood, and J. Bokor, "Characterization of the accuracy of EUV phase-shifting point diffraction interferometry," in Emerging Lithographic Technologies II, Y. Vladimirski, (ed.), Proc. SPIE 3331 , 114-23 (1998). [LINK] LBNL-41458 Beamline 12.0.1.2

260) S. H. Lee, P. Naulleau, K. A. Goldberg, E. Tejnil, H. Medecki, C. Bresloff, C. Chang, D. T. Attwood, and J. Bokor, "At-wavelength interferometry of Extreme Ultraviolet Lithographic Optics," AIP Conference Proceedings, (no. 449), (Characterization and Metrology for ULSI Technology, 1998 International Conference, Gaithersburg, MD, USA, 1998.) , pp. 553-7 (1998). LBNL-41556/41114 Beamline 12.0.1.2

261) E. Tejnil, K. A. Goldberg, J. Bokor, "Phase effects owing to multilayer coatings in a two-mirror extreme-ultraviolet Schwarzschild objective," Applied Optics 37 (34), 8021-9 (1998). [LINK] LBNL-41357 Beamline 12.0.1.2

262) K. A. Goldberg, P. Naulleau, S. Lee, C. Bresloff, D. Attwood, and J. Bokor, "High-accuracy interferometry of EUV lithographic optical systems," Journal of Vacuum Science and Technology B 16 (6), 3435-39 (1998). [LINK] LBNL-41270 Beamline 12.0.1.2

263) D. Attwood, E. Anderson, P. Batson, R. Beguiristain, J. Bokor, K. Goldberg, E. Gullikson, K. Jackson, K. Nguyen, M. Koike, H. Medecki, S. Mrowka, R. Tackaberry, E. Tejnil, and J. Underwood, "At-wavelength metrologies for extreme ultraviolet lithography," Future Electron Devices Journal Vol. 9 (Suppl. 1), 5-14 (1998). [LINK] Beamline 12.0.1/6.3/11.3.2

264) M. Altarelli, F. Schlachter, and J. Cross, "Making Ultrabright X-rays," Scientific American 279 (6), 66-73 (1998).

265) H. Medecki, "Phase-shifting point diffraction interferometer," U.S. Patent No. 5,835,217, November 10, 1998, [LINK] Beamline 9.0.1/12.0.1.2

1997

266) A. Robinson, "New At-Wavelength Interferometer Tests EUV Optics," Synchrotron Radiation News 10 (4), 10-12 (1997). Beamline 12.0.1.2/12.0.1.3

267) K. A. Goldberg, E. Tejnil, S. H. Lee, H. Medecki, D. T. Attwood, K. H. Jackson, and J. Bokor, "Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry," Proc. SPIE 3048 , 264-70 (1997). [LINK] Beamline 12.0.1.2

268) E. Tejnil, K. A. Goldberg, S. H. Lee, H. Medecki, P. J. Batson, P. E. Denham, A. A. MacDowell, and J. Bokor, "At-wavelength interferometry for EUV lithography," Journal of Vacuum Science and Technology B 15 (6), 2455-2461 (1997). [LINK] LBNL-40044 Beamline 12.0.1.2

269) H. R. Beguiristain VII , "Thermal distortion effects on beam line optical design for high flux synchrotron radiation," Doctoral Dissertation, Department of Nuclear Engineering, University of California, Berkeley (1997). Beamline 9.0.1/12.0.1.2

270) E. Tejnil , "Characterization of extreme ultraviolet imaging systems," Doctoral Dissertation, Department of Electrical Engineering and Computer Science, University of California, Berkeley (1997). Beamline 9.0.1/12.0.1.2

271) K. A. Goldberg, "Extreme Ultraviolet Interferometry," Doctoral Dissertation, Department of Physics, University of California, Berkeley (1997). [LINK] LBNL-41283 Beamline 9.0.1/12.0.1.2

1996

272) A. K. Ray-Chaudhuri, K. D. Krenz, R. P. Nissen, S. J. Haney, C. H. Fields, W. C. Sweatt, A. A. MacDowell, "(from Sandia National Laboratory) Initial results from an extreme ultraviolet interferometer operating with a compact laser plasma source," Journal of Vacuum Science and Technology B 14 (6), 3964-68 (1996). [LINK]

273) R. Beguiristain, K. A. Goldberg, E. Tejnil, "Interferometry using undulator sources," Rev. Sci. Instrumen. 67 (9), 3353 (1996). [LINK] Beamline 9.0.1/12.0.1.2

274) R. Beguiristain, J. H. Underwood, M. Koike, P. Batson, H. Medecki, S. Rekawa, K. Jackson, and D. Attwood, "Characterization of thermal distortion effects on beamline optics for EUV interferometry and soft x-ray microscopy," Rev. Sci. Instrumen. 67 (9), 1-9 (1996). Beamline 12.0

275) H. Medecki, E. Tejnil, K. A. Goldberg, and J. Bokor, "A Phase-Shifting Point Diffraction Interferometer," Optics Letters 21 (19), 1526-8 (1996). [LINK] LBNL-39047 Beamline 12.0.1.2

276) E. Tejnil, K. A. Goldberg, E. Anderson, and J. Bokor, "Zonal placement errors in zone plate lenses," Extreme Ultraviolet Lithography, G. Kubiak and D. Kania, eds. (Optical Society of America, Washington, D.C., 1996) , pp. 138-142 (1996). LBNL-39045 Beamline 9.0.1

277) E. Tejnil, K. A. Goldberg, H. Medecki, R. Beguiristain, J. Bokor, and D. T. Attwood, "Phase-shifting point diffraction interferometry for at-wavelength testing of lithographic optics," Extreme Ultraviolet Lithography G. Kubiak and D. Kania, eds. (Optical Society of America, Washington, D.C., 1996) , pp. 118-23 (1996). LBNL-38999 Beamline 12.0.1.2

278) K. A. Goldberg, E. Tejnil, and J. Bokor, "A 3-D numerical study of pinhole diffraction to determine the accuracy of EUV point diffraction interferometry," Extreme Ultraviolet Lithography G. Kubiak and D. Kania, eds. (Optical Society of America, Washington, D.C., 1996) , pp. 133-137 (1996). [LINK] LBNL-38157 Beamline 12.0.1.2/12.0.1.3

1995

279) K. A. Goldberg, R. Beguiristain, J. Bokor, H. Medecki, D. T. Attwood, K. Jackson, E. Tejnil, G. E. Sommargren, "Progress toward lambda/20 EUV interferometry," Journal of Vacuum Science and Technology B 13 (6), 2923-7 (1995). [LINK] LBNL-37947 Beamline 9.0.1/12.0.1.2

280) K. A. Goldberg, R. Beguiristain, J. Bokor, H. Medecki, K. Jackson, and D. T. Attwood, G. E. Sommargren, J. P. Spallas, R. Hostetler, "At-wavelength testing of optics for EUV," Proc. SPIE 2437 , 347-54 (1995). Beamline 9.0.1/12.0.1.2

1994

281) K. A. Goldberg, R. Beguiristain, J. Bokor, H. Medecki, K. Jackson, and D. T. Attwood, "Point Diffraction Interferometry at EUV Wavelengths," in Extreme Ultraviolet Lithography, F. Zernike and D. T. Attwood (eds.), (Optical Society of America, Washington, D.C. 1994) , 134-41 (1994). LBNL-36998 Beamline 9.0.1/12.0.1.2

1993

282) D. Attwood, G. Sommargren, R. Beguiristain, K. Nguyen, J. Bokor, N. Ceglio, K. Jackson, J. Underwood, "Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography," Applied Optics 32 (34), 7022-31 (1993). [LINK] Beamline 9.0.1/12.0.1.2/12.0.1.3 DOI 123

The database was last updated on: 2004-01-06 09:50:51

 

CXRO's EUV Publications Database is maintained by Ken Goldberg.
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