Publications in extreme ultraviolet interferometry, EUV Lithography, EUV optics testing, actinic (EUV) mask inspection, methods in ultra-high accuracy interferometry, coherent short-wavelength optics, techniques for optics in synchrotron radiation beamlines, and more. The list may be sorted, reformatted, and searched using the tools at left.

2008

1) H.-S. Han, W. Cho, K. A. Goldberg, E. M. Gullikson, C.-U. Jeon, S. Wurm, "Determining the critical size of EUV-mask substrate defects,"Proc. SPIE 6921, 62911Y (2008). [LINK] Beamline 11.3.2

2) P. P. Naulleau, C. N. Anderson, J. Chiu, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, S. Huh, G. Jones, B. LaFontaine, A. Ma, D. Niakoula, J. Park, T. Wallow, "Advanced extreme-ultraviolet resist testing using the SEMATECH Berkeley 0.3-NA microfield exposure tool,"Proc. SPIE 6921, 69213N (2008). Beamline 12.0.1.3

3) K. A. Goldberg, S. B. Rekawa, C. D. Kemp, A. Barty, E. H. Anderson, P. Kearney, H. Han, "EUV-mask reflectivity measurements with micron-scale spatial resolution,"Proc. SPIE 6921, 69213U (2008). [LINK] Beamline 11.3.2 [View Presentation]

4) K. A. Goldberg, K. Takase, P. Naulleau, H.-S. Han, A. Barty, H. Kinoshita, K. Hamamoto, "Evaluating EUV-mask pattern imaging with two EUV microscopes,"Proc. SPIE . Beamline 11.3.2 [View Presentation]

5) Kenneth A. Goldberg and Valeriy Yashchuk, "Advanced X-ray Optics Metrology for Nanofocusing and Coherence Preservation,"Synchrotron Radiation News 21 (2), 11-12 (2008). [LINK] [View Presentation]

6) K. A. Goldberg, "A Survey of EUV At-Wavelength Optical Testing,"2008 International Workshop on EUV Lithography , (2008). To be published. Beamline 12.0.1.2, 12.0.1.3 [View Presentation]

7) K. A. Goldberg, "EUV mask inspection: a bright idea? ,"2008 International Workshop on EUV Lithography , (2008). To be published. Beamline 11.3.2 [View Presentation]

8) C. H. Clifford, K. A. Goldberg, I. Mochi, T. Liang, A. R. Neureuther, "Smoothing based model for images of buried EUV multilayer defects near absorber features,"SPIE Photomask (BACUS) 7122-69, (2008). To be published. Beamline 11.3.2

2007

9) P. P. Naulleau, C. N. Anderson, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, B. LaFontaine, and T. Wallow, "Recent results from the Berkeley 0.3-NA EUV microfield exposure tool,"SPIE 6517, 65170V-1-8 (2007). Beamline 12.0.1.3

10) K. A. Goldberg, A. Barty, P. Seidel, K. Edinger, R. Fettig, P. Kearney, H. Han, O. R. Wood II , "EUV and non-EUV inspection of reticle defect repair sites,"Proc. SPIE 6517, 65170C-1-7 (2007). [LINK] Beamline 11.3.2 [View Presentation]

11) H. Han, K. A. Goldberg, A. Barty, E. M. Gullikson, Y. Ikuta, T. Uno, O. R. Wood II, and S. Wurm, "EUV MET printing and actinic imaging analysis on the effects of phase defects on wafer CDs,"Proc. SPIE 6517, 65170B-1-10 (2007). [LINK] Beamline 11.3.2/12.0.1.2

12) P. Naulleau, C. Anderson, K. Dean, P. Denham, K. Goldberg, B. Hoef, D. Niakoula, B. La Fontaine, T. Wallow, "Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool,"Journal of Vacuum Science and Technology B 25 (6), 2132-5 (2007). [LINK] Beamline 12.0.1.2

13) K. A. Goldberg, P. P. Naulleau, A. Barty, S. B. Rekawa, C. D. Kemp, R. F. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, H.-S. Han, "Performance of actinic EUVL mask imaging using a zoneplate microscope ,"Proc. SPIE Photomask (BACUS) 6730, 67305E-1-12 (2007). [LINK] Beamline 11.3.2 [View Presentation]

14) W. Cho, H.-S. Han, K. A. Goldberg, P. A. Kearney, C.-U. Jeon , "Detectability and printability of EUVL-mask blank defects for the 32-nm HP node ,"Proc. SPIE Photomask (BACUS) 6730, 673013-1-9 (2007). [LINK] Beamline 11.3.2

15) K. A. Goldberg, P. Naulleau, A. Barty, S. Rekawa, C. D. Kemp, R. Gunion, F. Salmassi, E. Gullikson, E. Anderson, H.-S. Han, "Benchmarking Mask Imaging with the Actinic Imaging Tool,"EUVL Symposium 2007, Sapporo, Japan October 29, 2007. Beamline 11.3.2 [View Presentation]

16) G. Denbeaux, Y.-J. Fan, A. Antohe, L. Yankulin, R. Garg, O. Wood, F. Goodwin, C.-S. Koay, E. Gullikson, K. Goldberg, E. Anderson, W. Chao, "Actinic microscope for EUV masks using a stand-along source for imaging and contamination studies of EUV masks,"EUVL Symposium 2007, Sapporo, Japan October 31, 2007.

17) G.-S. Yoon, H. Kim, H.-J. Oh, H.-S. Kim, H.-S. Sim, S.-H. Lee, G.-B. Kim, S.-M. Huh, K. A. Goldberg, A. Barty, S.-S. Kim, H.-K. Cho, "Evaluation of EUV Mask Repair Methods in Si-capping & Ru-capping Blanks,"EUVL Symposium 2007, Sapporo, Japan October 31, 2007. Beamline 11.3.2

2006

18) Kenneth Goldberg, "Testing EUV optics with EUV light: If you can measure it, you can make it,"SPIE Newsroom: Optical Design & Engineering , (2006). [LINK] Beamline 12.0.1.2/12.0.1.3

19) K. A. Goldberg, A. Barty, Y. Liu, P. Kearney, Y. Tezuka, T. Terasawa, J. S. Taylor, H.-S. Han, and O. R. Wood II , "Actinic Inspection of EUV Programmed Multilayer Defects and Cross-Comparison Measurements,"Journal of Vacuum Science and Technology B 24 (6), 2824-28 (2006). [LINK] Beamline 11.3.2 [View Presentation]

20) K. A. Goldberg, P. P. Naulleau, "Diffractive optical element for extreme ultraviolet wavefront control," U.S. Patent No. 7,027,226, April 11, 2006, [LINK]

21) P. P. Naulleau, C. Rammeloo, J. P. Cain, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, B. La Fontaine, A. R. Pawloski, C. Larson, G. Wallraff, "Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists,"Proc. SPIE 6151, 289-296 (2006). Beamline 12.0.1.3

22) P. Naulleau, J. Cain, K. Dean, K. A. Goldberg, "Lithographic characterization of low-order aberrations in a 0.3-NA EUV microfield exposure tool,"Proc. SPIE 6151, 822-828 (2006). [LINK] LBNL-60508 Beamline 12.0.1.3

23) K. A. Goldberg, A. Barty, H. Han., S. Wurm, P. Kearney, P. Seidel, O. R. Wood II, B. LaFontaine, T. Liang, C. Holfeld, R. Fettig, Y. Tezuka, T. Terasawa, "Comparison of actinic and non-actinic inspection of programmed defect masks,"EUVL Symposium 2006 October 18, 2006. [LINK] Beamline 11.3.2 [View Presentation]

24) A. Barty, K. A. Goldberg, P. Kearney, S. B. Rekawa, B. LaFontaine, O. Wood II, J. S. Taylor and H.-S. Han, "Multilayer defects nucleated by substrate pits: a comparison of actinic inspection and non-actinic inspection techniques,"SPIE 6349, 63492M (2006). [LINK] Beamline 11.3.2

25) P. Naulleau, E. Anderson, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, Keith Jackson, "Advanced 0.3-NA EUV lithography capabilities at the ALS,"NGL 2005, Tokyo, Japan , (2006). LBNL-60542 Beamline 12.0.1.3 [View Presentation]

2005

26) K. A. Goldberg, M. E. Teyssier, J. A. Liddle, "EUV Focus Sensor: Design and Modeling,"Proc. SPIE 5751, 312-19 (2005). [LINK] LBNL-56808 [View Presentation]

27) P. Naulleau, K. A. Goldberg, E. H. Anderson, J. P. Cain, P. Denham, B. Hoef, K. Jackson, A.-S. Morlens, S. Rekawa, K. Dean, "EUV microexposures at the ALS using the 0.3-NA MET projection optics,"Proc. SPIE 5751, 56-63 (2005). [LINK] LBNL-55630/60936 Beamline 12.0.1.3

28) J. P. Cain, P. Naulleau, C. J. Spanos, "Lithographic measurement of EUV flare in the 0.3-NA micro exposure tool optic at the Advanced Laser Source,"Proc. SPIE 5751, 301-311 (2005). Beamline 12.0.1.3

29) J. P. Cain, P. Naulleau, C. J. Spanos, "Resist-based measurement of the contrast transfer function in a 0.3-NA EUV microfield optic,"Proc. SPIE 5751, 741-48 (2005). Beamline 12.0.1.3

30) J. P. Cain, P. Naulleau, C. J. Spanos, "Critical dimension sensitivity to post-exposure bake temperature variations in EUV photoresists,"Proc. SPIE 5751, 1092-1100 (2005). Beamline 12.0.1.3

31) J. P. Cain, P. Naulleau, C. J. Spanos, "Modeling of EUV photoresists with a resist point spread function,"Proc. SPIE 5751, 1101-1109 (2005). Beamline 12.0.1.3

32) J. P. Cain, G. McIntyre, P. Naulleau, A. Pawloski, B. La Fontaine, O. Wood II, C. J. Spanos, A. R. Neureuther, "Two-wave pattern shift aberration monitor for centrally obscured optical systems,"Proc. SPIE 5751 , 1230-37 (2005). Beamline 12.0.1.3

33) A. Barty, Y. Liu, K. A. Goldberg, E. M. Gullikson, J. S. Taylor, and O. R. Wood II, "Actinic inspection of multilayer coated EUV masks at the ALS,"2005 International Symposium on Extreme Ultraviolet Lithography, San Diego, CA November 7-9, 2005. Beamline 11.3.2

34) Patrick P. Naulleau, "Effect of mask-roughness on printed contact-size variation in extreme-ultraviolet lithography,"Applied Optics 44 (183), 183-89 (2005). Beamline 12.0.1.3

35) K. A. Goldberg, M.E. Teyssier, J.A. Liddle, "EUV Focus Sensor Design Optimization,"Journal of Vacuum Science and Technology B 23 (6), 2885-90 (2005). LBNL-56808 Beamline 12.0.1.3/6.3.2

36) P. Naulleau, K. A. Goldberg, J. P. Cain, E. Anderson, P. Denham, K. Jackson, B. Hoef, S. Baker, E. Spiller, K. Dean, "Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source,"J. Vac. Sci & Technol. B 23 (6), 2840-2843 (2005). [LINK] LBNL-57796 Beamline 12.0.1.3

37) M.D. Shumway, P. Naulleau, K.A. Goldberg, and J. Bokor, "Measuring line roughness through aerial image contrast variation using coherent extreme ultraviolet spatial filtering techniques,"Journal of Vacuum Science and Technology B 23 (6), 2844-2847 (2005). [LINK] Beamline 12.0.1.2

38) F. Salmassi, P.P. Naulleau, E.M. Gullikson, D.L. Olynick, and J.A. Liddle, "EUV Binary Phase Gratings: Fabrication and Application to Diffractive Optics,"Journal of Vacuum Science and Technology B 23 (6), (2005). To be published. Beamline 6.3.2

39) V. Farys, C. Charpin-Nicolle, M. Richard, J.-Y. Robic, V. Muffato, E. Quesnel, S. Postnikov, P. Schiavone, P. Naulleau, "Printabillity of Non-Smoothed Buried Defect in EUVL Mask Blank,"J. Vac. Sci. & Technol. B 23 (6), 2860-2865 (2005). Beamline 12.0.1.3

40) K. A. Goldberg, P. Naulleau, S. Rekawa, P. Denham, J. A. Liddle, E. M. Gullikson, K. Jackson, E. Anderson, J. Taylor, G. Sommargren, H. Chapman, D. Phillion, M. Johnson, A. Barty, R. Soufli, E. Spiller, C. C. Walton, S. Bajt, "Ultra-high-accuracy optical testing: creating diffraction-limited short-wavelength optical systems,"Proc. SPIE 5900, 114-23 (2005). [LINK] LBNL-60541 Beamline 12.0.1.2/12.0.1.3 [View Presentation]

41) G. Denbeaux, E. Garg, A. Barty, Y. Liu, K. Goldberg, O. Wood, "Extreme Ultraviolet Phase Contrast Imaging of Mask Defects,"2005 International Symposium on Extreme Ultraviolet Lithography, San Diego, CA November 7-9. Beamline 11.3.2, 6.3.2

42) P. P. Naulleau, J. P. Cain, K. Dean, and K. A. Goldberg, "Lithographic characterization of low-order aberrations in the Berkeley MET tool,"2005 International Symposium on Extreme Ultraviolet Lithography, San Diego, CA November 7-9. Beamline 12.0.1.3

43) P. P. Naulleau, J. P. Cain, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, B. La Fontaine, A R. Pawloski, C. Larson, and G. Wallraff, "Investigation of the current resolution limits of advanced EUV resists,"2005 International Symposium on Extreme Ultraviolet Lithography, San Diego, CA November 7-9. Beamline 12.0.1.3

44) P. P. Naulleau, J. P. Cain, K. A. Goldberg, "Lithographic characterization of the field dependent astigmatism and alignment stability of a 0.3 numerical aperture extreme ultraviolet microfield optic ,"Journal of Vacuum Science and Technology B 23 (5), 2003-6 (2005). [LINK] Beamline 12.0.1.3

45) K. A. Goldberg, "Method and Apparatus for Inspecting an EUV Mask Blank," U.S. Patent No. 6,963,395, November 8, 2005, [LINK]

46) P. P. Naulleau, J. P. Cain, K. A. Goldberg, "Lithographic characterization of the spherical error in an EUV optic using a programmable pupil fill illuminator,"Applied Optics 45 (9), 1957-1963 (2005). Beamline 12.0.1.3

47) P. P. Naulleau, K. A. Goldberg, J. P. Cain, E. H. Anderson, K. R. Dean, P. Denham, B. Hoef, K. H. Jackson, "Extreme Ultraviolet Lithography Capabilities at the Advanced Light Source Using a 0.3-NA Optic,"IEEE Journal of Quantum Electronics 42 (104), 44-50 (2005). Beamline 12.0.1.3

48) P. Mercère, S. Bucourt, G. Cauchon, D. Douillet, G. Dovillaire, K. A. Goldberg, M. Idir, X. Levecq, T. Moreno, P. P. Naulleau, S. Rekawa, P. Zeitoun, "X-ray beam metrology and x-ray optic alignment by Hartmann wavefront sensing,"Proc. SPIE 5921, 63-72 (2005). Beamline 12.0.1.2

49) T. Koehler, R. L. Brainard, P. P. Naulleau, D. Van Steenwinckel, J. H. Lammers, K. A. Goldberg, J. F. Mackevich, P. Trefonas, "Performance of EUV photoresists on the ALS micro exposure tool,"SPIE 5753, 754-64 (2005). [LINK] Beamline 12.0.1.2

2004

50) K. A. Goldberg, P. Naulleau, S. Rekawa, P. Denham, J. A. Liddle, E. Anderson, K. Jackson, J. Bokor, D. Attwood, "At-wavelength interferometry of high-NA diffraction-limited EUV optics,"AIP Conf. Proc. 705, 855-860 (2004). [LINK] LBNL-53704 Beamline 12.0.1.3/12.0.1.2

51) P. Naulleau, K. A. Goldberg, P. Batson, P. Denham, and S. Rekawa, "A synchrotron-based Fourier-synthesis custom-coherence illuminator ,"AIP Conf. Proc. 705, 792-95 (2004). LBNL-55667 Beamline 12.0.1.3

52) P. P. Naulleau, K. A. Goldberg, "Dual-Domain Lateral Shearing Interferometer," U.S. Patent No. 6,707,560, March 16, 2004, [LINK] Beamline 12.0.1.2/12.0.1.3

53) P. Naulleau, K. A. Goldberg, J. P. Cain, E. Anderson, P. Denham, K. Jackson, S. Rekawa, F. Salmassi, G. Zhang, "Extreme Ultraviolet Microexposures at the ALS using the 0.3-NA MET Optic,"Journal of Vacuum Science and Technology B 22 (6), 2962-65 (2004). [LINK] LBNL-55630 Beamline 12.0.1.3

54) K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, J. A. Liddle, E. H. Anderson, "EUV interferometric testing and alignment of the 0.3 NA MET optic,"Proc. SPIE 5374, 64-73 (2004). [LINK] Beamline 12.0.1.3

55) M. D. Shumway, E. L. Snow, K. A. Goldberg, P. Naulleau, H. Cao, M. Chandhok, J. A. Liddle, E. H. Anderson, J. Bokor, "EUV resist imaging below 50 nm using coherent spatial filtering techniques,"Proc. SPIE 5374, 454-59 (2004). Beamline 12.0.1.2

56) P. Naulleau, K. A. Goldberg, E. H. Anderson, K. Bradley, R. Delano, P. Denham, R. Gunion, B. Harteneck, B. Hoef, H. Huang, K. Jackson, M. G. Jones, D. Kemp, J. A. Liddle, R. Oort, A. Rawlins, S. Rekawa, F. Salmassi, R. Tackaberry, C. Chung, L. Hale, D. Phillion, G. Sommargren, H. Taylor, "Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic,"Proc. SPIE 5374, 881-891 (2004). Beamline 12.0.1.3

57) K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, E. H. Anderson and J.A. Liddle, "At-Wavelength Alignment and Testing of the 0.3 NA MET Optic,"Journal of Vacuum Science and Technology B 22 (6), 2956-61 (2004). [LINK] LBNL-58422 Beamline 12.0.1.3

58) P. Mercère, M. Idir, P. Zeitoun, X. Levecq, G. Dovillaire, S. Bucourt, D. Douillet, K. A. Goldberg, P. P. Naulleau, and S. Rekawa , "X ray Wavefront Hartmann Sensor,"AIP Conf. Proc. 705, 819-822 (2004). LBNL-58485 Beamline 12.0.1.2

59) A. R. Pawloski, B. La Fontaine, H. J. Levinson, S. Hirscher, S. Schwarzl, K. Lowack, F.-M. Kamm, M. Bender, W.-D. Domke, C. Holfeld, U. Dersch, P. Naulleau, F. Letzkus, J. Butschke, "Comparative study of mask architectures for EUV lithography,"Proc. of SPIE 5567, 762-773 (2004). Beamline 12.0.1.3

60) P. P. Naulleau , "Verification of point-spread-function-based modeling of an extreme-ultraviolet photoresist,"Appled Optics 43 (4), 788-92 (2004). Beamline 12.0.1.3

61) K. A. Goldberg, P. P. Naulleau, P. E. Denham, S. B. Rekawa, K. H. Jackson, E. H. Anderson, J. A. Liddle, "EUV system optimization and advanced lithography research at Lawrence Berkeley National Laboratory,"MNC 2004, Osaka, Japan October 26–29, 2004. Beamline 12.0.1.3/6.3.2

62) K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, E. H. Anderson, J. A. Liddle, "At-wavelength Alignment and Testing of the 0.3 NA MET Optic,"3rd International EUVL Symposium, Miyazaki, Japan November 2–4, 2004. Beamline 12.0.1.3/6.3.2

2003

63) K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, E. H. Anderson, J. A. Liddle, J. Bokor, "EUV Interferometry of the 0.3 NA MET Optic,"Proc. SPIE 5037, 69-74 (2003). [LINK] LBNL-53382 Beamline 12.0.1.3

64) P. P. Naulleau, K. A. Goldberg, E. H. Anderson, J. Bokor, B. D. Harteneck, K. H. Jackson, D. L. Olynick, F. Salmassi, S. L. Baker, P. B. Mirkarimi, E. A. Spiller, C. C. Walton, D. J. O'Connell, P. Yan, G. Zhang, "Static EUV microexposures using the ETS set-2 optics,"Proc. SPIE 5037, 36-46 (2003). LBNL-52479 Beamline 12.0.1.3

65) S. A. Robertson, P. P. Naulleau, K. A. Goldberg, D. J. O'Connell, K. McDonald, S. G. Hansen, T. M. Delano, K. W. Brown, R. L. Brainard, "Calibration of EUV-2D photoresist simulation parameters for accurate predictive modeling,"Proc. SPIE 5037, 900-9 (2003). Beamline 12.0.1.3

66) M. D. Shumway, P. P. Naulleau, K. A. Goldberg, E. L. Snow, J. Bokor, "Resist evaluation at 50 nm in the EUV using interferometric spatial frequency doubled imaging,"Proc. SPIE 5037, 910-16 (2003). Beamline 12.0.1.2

67) P. Naulleau, K. Goldberg, E. Anderson, J. Bokor, E. Gullikson, B. Harteneck, K. Jackson, D. Olynick, F. Salmassi, S. Baker, P. Mirkarimi, E. Spiller, C. Walton, and G. Zhang, "Lithographic characterization of the printability of programmed EUV substrate defects,"Journal of Vacuum Science and Technology B 21 (4), 1286-90 (2003). Beamline 12.0.1.3

68) K. A. Goldberg and P. P. Naulleau, "Hybrid shearing and phase-shifting point diffraction interferometer," U.S. Patent No. 6,573,997, June 3, 2003, [LINK] LBNL-53411 Beamline 12.0.1.2/12.0.1.3

69) W. P. Ballard, D. A. Tichenor, D. J. O'Connell, L. J. Bernardez II, R. E. Lafton, R. J. Anderson, A. H. Leung, K. Williams, S. J. Hanley, Y. Perras, K. L. Jefferson, T. L. Porter, D. Knight, P. K. Barr, J. L. Van de Vreugde, R. H. Campiotti, M. D. Zimmerman, T. A. Johnson, L. E. Klebanoff, P. A. Grunow, S. Graham Jr, D. A. Buchenauer, W. C. Replogle, T. G. Smith, J. B. Wronosky, J. R. Darnold, K. L. Blaedel, H. N. Chapman, J. S. Taylor, L. C. Hale, G. E. Sommargren, E. M. Gullikson, P. Naulleau, K. A. Goldberg, S. H. Lee, H. Shields, R. J. St. Pierre, S. Ponti, "System and process learning in a full-field high-power EUVL alpha tool,"Proc. SPIE 5037, 47-57 (2003). Beamline 12.0.1.3

70) A. Barty and K. A. Goldberg, "Effects of radiation induced carbon contamination on the performance of an EUV lithographic optic,"Proc. SPIE 5037, 450-59 (2003). LBNL-53413 Beamline 12.0.1.2

71) P. Naulleau, K. Goldberg, P. Batson, J. Bokor, P. Denham, and S. Rekawa, "A Fourier-synthesis custom-coherence illuminator for EUV microfield lithography,"Applied Optics 42 (5), 820-26 (2003). [LINK] Beamline 12.0.1.3

72) P. P. Naulleau and G. M. Gallatin, "Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization,"Applied Optics 42 (17), 3390-7 (2003). [LINK] Beamline 12.0.1.3

73) C. Chang, P. Naulleau, D. Attwood , "Analysis of Illumination Coherence Properties in Small-Source Systems Such as Synchrotrons,"Applied Optics 42 (14), 2506-12 (2003). [LINK] LBNL-52312 Beamline 12.0.1.2

74) M. Idir, P. Mercére, P. Zeitoun, D. Douillet, X. Levecq, G. Dovillaire, S. Bucourt, K. A. Goldberg, P. P. Naulleau, and S. Rekawa, "XUV Hartmann wavefront sensor ,"Eighth Internation Conference on Synchrotron Radiation Instrumentation, August 25-29, 2003, San Francisco, CA , (2003). Beamline 12.0.1.2

75) P. Mercère, P. Zeitoun, M. Idir, S. Le Pape, D. Douillet, X. Levecq, G. Dovillaire, S. Bucourt, K. A. Goldberg, P. P. Naulleau, and S. Rekawa, "Hartmann wave-front measurement at 13.4 nm with lambdaEUV/120 accuracy,"Optics Letters 28 (17), 1534–36 (2003). [LINK] Beamline 12.0.1.2

76) A. Barty and K. A. Goldberg, "The effects of radiation induced carbon contamination on the performance of an EUV lithographic optic,"Proc. SPIE 5040, 510-19 (2003). Beamline 12.0.1.2

77) K. A. Goldberg, P. P. Naulleau, P. E. Denham, S. B. Rekawa, K. H. Jackson, J. A. Liddle, B. Harteneck, E. Gullikson, and E. H. Anderson, "Preparations for extreme ultraviolet interferometry of the 0.3 numerical aperture Micro Exposure Tool optic,"Journ. Vac. Sci. & Technol. B 21 (6), 2706-10 (2003). [LINK] LBNL-53382 Beamline 12.0.1.3

78) P. P. Naulleau, J. A. Liddle, F. Salmassi, E. H. Anderson, and E. M. Gullikson, "Design, Fabrication, and Characterization of High-Efficiency Extreme-Ultraviolet Diffusers,"Applied Optics 43 (28), 5323-29 (2003).

79) P. P. Naulleau, J. A. Liddle, F. Salmassi, E. H. Anderson, E. M. Gullikson, "Design and fabrication of advanced EUV diffractive elements,"Proc. SPIE 5347, 9-17 (2003).

80) J. A. Liddle, F. Salmassi, P. P. Naulleau, E. M. Gullikson , "Nanoscale topography control for the fabrication of advanced diffractive optics,"J. Vac. Sci. Technol. B 21 (6), 2980-84 (2003).

81) P. Naulleau, K. A. Goldberg, E. H. Anderson, J. Bokor, B. Harteneck, K. Jackson, D. Olynick, F. Salmassi, S. Baker, P. Mirkarimi, E. Spiller, C. Walton, D. O'Connell, P.-Y. Yan, G. Zhang, "Printing-based performance analysis of the engineering test stand set-2 optic using a synchrotron exposure station with variable sigma,"J. Vac. Sci. & Technol. B 21 (6), 2697-2700 (2003). Beamline 12.0.1.3

82) D. J. O'Connell, S. H. Lee, W. P. Ballard, D. A. Tichenor, L. J. Bernardez II, S. J. Hanley, T. A. Johnson, P. K. Barr, A. H. Leung, K. L. Jefferson, W. C. Replogle, J. E. M. Goldsmith, H. N. Chapman, P. P. Naulleau, S. Wurm, E. M. Panning, "Lithographic characterization of improved projection optics in the EUVL engineering test stand,"Proc. SPIE 5037, 83-94 (2003).

83) S. Hun Lee, P. Naulleau, C. Krautschik, M. Chandhok, H. Chapman, D. J. O'Connell, and M. Goldstein , "Lithographic flare measurements of EUV full-field projection optics,"Proc. SPIE 5037, 103-111 (2003).

84) P. Zeitoun, P. Balcou, S. Bucourt, D. Benredjem, F. Delmotte, G. Dovillaire, D. Douillet, J. Dunn, G. Faivre, M. Fajardo, K. A. Goldberg, M. Idir, S. Hubert, J. Hunter, S. Jacquemot, S. Kazamias, S. le Pape, X. Levecq, C. L. S. Lewis, R. Marmoret, P. Mercere, A. S. Morlens, P. P. Naulleau, C. Remond, J. J. Rocca, S. Sebban, R. F. Smith, M.-F. Ravet, P. Troussel, C. Valentin, and L. Vanbostal, "New techniques for the measurement of x-ray beam or x-ray optics quality,"Proc. SPIE 5197, 194-204 (2003). Beamline 12.0.1.2

85) P. P. Naulleau, K. A. Goldberg, E. Anderson, J. P. Cain, P. Denham, K. Jackson, A.-S. Morlens, S. Rekawa, F. Salmassi, and R. L. Brainard, "High resolution EUV microexposures at the ALS,"3rd International EUVL Symposium, Miyazaki, Japan, November 2–4, 2004. Beamline 12.0.1.3/6.3.2

86) K. A. Goldberg, P. Naulleau, et al., , "At-wavelength interferometry of the 0.3 NA MET Optic: measurements, alignment, preparations for imaging," Third Annual SEMATECH International EUVL Symposium, Antwerp, Belgium November, 2003. Beamline 12.0.1.3

2002

87) K. A. Goldberg, P. Naulleau, J. Bokor, P. Denham, S. Rekawam, P. Batson, A. Liddle, B. Harteneck, K. Jackson, E. Anderson, D. Attwood, H. Chapman, A. Barty, G. Sommargren, D. Phillion, J. Taylor, D. Sweeney, "VNL Research in Interferometry for EUV Optics,"Presented at the First International EUVL Symposium, Addison, Texas October 15-17, 2002. LBNL-50292 Beamline 12.0.1.3

88) P. Naulleau, K. A. Goldberg, E. H. Anderson, P. Batson, J. Bokor, P. Denham, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, S. Baker, H. Chapman, P. Mirkarimi, E. Spiller, C. Walton, D. O'Connell, P.-Y. Yan, and G. Zhang, "Lithographic characterization of the ETS Set-2 optic at the Advanced Light Source static microfield exposure station,"Presented at the First International EUVL Symposium, Addison, Texas October 15-17, 2002. LBNL-50289 Beamline 12.0.1.3

89) S. A. Robertson, P. P. Naulleau, D. J. O'Connell, K. R. McDonald, K. A. Goldberg, T. Delano, and R. L. Brainard, "Calibration of EUV-2D Photoresist Simulation Parameters for Accurate Predictive Modeling,"Presented at the First International EUVL Symposium, Addison, Texas October 15-17, 2002. LBNL-50291 Beamline 12.0.1.3

90) K. A. Goldberg, P. Naulleau, and J. Bokor, "Fourier-transform interferometer alignment methods,"Applied Optics 41 (22), 4477-83 (2002). [LINK] LBNL-50953 Beamline 12.0.1

91) P. Naulleau, K. A. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, D. O'Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan and G. Zhang, "Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic,"Journal of Vacuum Science and Technology B 20 (6), 2829-33 (2002). [LINK] LBNL-50406 Beamline 12.0.1.3

92) K. Goldberg, P. Naulleau, J. Bokor and H. Chapman, "Testing EUV Optics with Visible-Light and EUV Interferometry,"Journal of Vacuum Science and Technology B 20 (6), 2834-39 (2002). [LINK] LBNL-50290 Beamline 12.0.1.3

93) S. Lee, D. A. Tichenor, P. Naulleau, "Lithographic Aerial Image Contrast Measurement in the EUV Engineering Test Stand,"Journal of Vacuum Science and Technology B 20 (6), 2849-52 (2002). Beamline 12.0.1.3

94) K. A. Goldberg, P. Naulleau, J. Bokor, and H. N. Chapman, "Honing the accuracy of extreme ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic,"Proc. SPIE 4688, 329-337 (2002). [LINK] LBNL-49040 Beamline 12.0.1.3

95) P. Naulleau, K. A. Goldberg, E. H. Anderson, D. T. Attwood, Jr., P. J. Batson, J. Bokor, P. Denham, E. M. Gullikson, B. Hoef, K. H. Jackson, S. Rekawa, F. Salmassi, K. L. Blaedel, H. N. Chapman, L. C. Hale, R. Soufli, E. A. Spiller, D. W. Sweeney, J. R. Taylor, C. C. Walton, G. F. Cardinale, A. K. Ray-Chaudhuri, A. Fisher, D. J. O'Connell, R. H. Stulen, D. A. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, "Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,"Proc. SPIE 4688, 64-71 (2002). [LINK] Beamline 12.0.1.3

96) D. A. Tichenor, W. C. Replogle, S. H. Lee, W. P. Ballard, G. D. Kubiak, L. E. Klebanoff, J. E. M. Goldsmith, J. B. Wronosky, L. C. Hale, H. N. Chapman, J. S. Taylor, K. A. Goldberg, P. Naulleau, "Performance upgrades in the EUV Engineering Test Stand,"Proc. SPIE 4688, 72-86 (2002). LBNL-50200 Beamline 12.0.1.3

97) S. H. Lee, D. A. Tichenor, W. P. Ballard, L. J. Bernardez II, J. E. M. Goldsmith, S. J. Hanley, K. L. Jefferson, T. A. Johnson, A. H. Leung, D. J. O'Connell, W. C. Replogle, J. B. Wronosky, K. Blaedel, P. Naulleau, K. A. Goldberg, E. M. Gullikson, H. N. Chapman, S. Wurm, E. Panning, P.-Y. Yan, G. Zhang, J. E. Bjorkholm, G. D. Kubiak, D. W. Sweeney, D. Attwood, and C. W. Gwyn, "Lithographic Evaluation of the EUV Engineering Test Stand,"Proc. SPIE 4688, 266-276 (2002). LBNL-51097 Beamline 12.0.1.3

98) K. A. Goldberg, "Graphical user interface for image acquisition and processing," U.S. Patent No. 6,341,183, January 22, 2002, [LINK] LBNL/ALS-43829 Beamline 12.0.1.2/12.0.1.3

99) R. A. Bartels, A. Paul, H. Green, H. C. Kapteyn, M. M. Murname, S. Backus, I. P. Christov, Y. Liu, D. Attwood, C. Jacobsen, "Generation of Spatially Coherent Light at Extreme Ultraviolet Wavelengths,"Science 297 , 376-8 (2002). [LINK]

100) C. Chang, E. Anderson, P. Naulleau, E. Gullikson, K. Goldberg, D. Attwood , "Direct measurement of index of refraction in the extreme-ultraviolet wavelength region with a novel interferometer,"Optics Letters 27 (12), 1028-1030 (2002). [LINK] LBNL-49246 Beamline 12.0.1.2

101) D. Attwood, E. Anderson, G. Denbeaux, K. Goldberg, P. Naulleau, G Schneider, "Soft X-Ray Microscopy and EUV Lithography: An Update on Imaging at 20-40 nm Spatial Resolution,"AIP Conference Proceedings 641, 461-68 (2002). Beamline 6.1.2, 6.3.2, 12.0.1.1, 12.0.1.2

102) K. A. Goldberg, P. Naulleau, J. Bokor, P. Denham, S. Rekawam, P. Batson, A. Liddle, B. Harteneck, K. Jackson, E. Anderson, D. Attwood, H. Chapman, A. Barty, G. Sommargren, D. Phillion, J. Taylor, D. Sweeney, "VNL Research in Interferometry for EUV Optics,"First International EUVL Symposium, Addison, Texas October 15-17, 2002. Beamline 12.0.1.3

2001

103) P. Naulleau, K. A. Goldberg, E. H. Anderson, P. Batson, P. E. Denham, K. H. Jackson, E. M. Gullikson, S. Rekawa, and J. Bokor, "At-wavelength characterization of the extreme ultraviolet Engineering Test Stand Set-2 optic,"Journal of Vacuum Science and Technology B 19 (6), 2396-2400 (2001). [LINK] LBNL-49064 Beamline 12.0.1.3

104) H. N. Chapman, A. K. Ray-Chaudhuri, D. A. Tichenor, W. C. Replogle, R. H. Stulen, G. D. Kubiak, P. D. Rockett, L. E. Klebanoff, D. O'Connell, A. H. Leung, K. L. Jefferson, J. B. Wronosky, J. S. Taylor, L. C. Hale, K. Blaedel, E. A. Spiller, G. E. Sommargren, J. A. Folta, D. W. Sweeney, E. M. Gullikson, P. Naulleau, K. A. Goldberg, J. Bokor, D. T. Attwood, U. Mickan and R. Hanzen, E. Panning, P.-Y. Yan, C. W. Gwyn, and S. H. Lee , "First lithographic results from the extreme ultraviolet Engineering Test Stand,"Journal of Vacuum Science and Technology B 19 (6), 2389-95 (2001). [LINK] LBNL/ALS-43735 Beamline 12.0.1.3

105) K. A. Goldberg and J. Bokor, "Fourier-transform method of phase-shift determination,"Applied Optics 40 (17), 2886-94 (2001). [LINK] LBNL-46937 Beamline 12.0.1.2/12.0.1.3

106) K. A. Goldberg, "Phase-shifting point diffraction interferometer mask designs," U.S. Patent No. 6,307,635, October 23, 2001, [LINK] Beamline 12.0.1.2/12.0.1.3

107) Neville Smith , "Science with Soft X Rays,"Physics Today 54 , 29 (2001).

108) D. A. Tichenor, A. K. Ray-Chaudhuri, S. H. Lee, H. N. Chapman, W. C. Replogle, K. W. Berger, R. H. Stulen, G. D. Kubiak, L. E. Klebanoff, J. B. Wronosky, D. J. O'Connell, A. H. Leung, K. L. Jefferson, W. P. Ballard, L. C. Hale, K. Blaedel, J. S. Taylor, J. A. Folta, E. Spiller, R. Soufli, G. E. Sommargren, D. W. Sweeney, P. Naulleau, K. A. Goldberg, E. M. Gullikson, J. Bokor, D. T. Attwood, U. Mickan, R. Hanzen, E. Panning, P.-Y. Yan, J. E. Bjorkholm, and C. W. Gwyn, "Initial Results from the EUV Engineering Test Stand,"Proc. SPIE 4506, (2001). [LINK] LBNL-50570 Beamline 12.0.1.3

109) K. A. Goldberg, K. Geary, "Wave-front measurement errors from restricted concentric subdomains,"Journal of the Optical Society of America A 18 (9), 2146-52 (2001). [LINK] LBNL-50201 Beamline 12.0.1.2/12.0.1.3

110) P. P. Naulleau, K. A. Goldberg, P. J. Batson, S. Jeong, and J. H. Underwood, "Tolerancing of diffraction-limited Kirkpatrick-Baez synchrotron beamline optics for extreme-ultraviolet metrology,"Applied Optics 40 (22), 3703-3709 (2001). [LINK] LBNL-48607 Beamline 12.0.1.2/12.0.1.3

111) S. H. Lee, P. Naulleau, K. A. Goldberg, C. H. Cho, S. Jeong, J. Bokor, "Extreme-ultraviolet lensless Fourier-transform holography,"Applied Optics 40 (16), 2655-2661 (2001). [LINK] LBNL/ALS-13677 Beamline 12.0.1.2

112) K. A. Goldberg, "Fourier-transform and global contrast interferometer alignment methods," U.S. Patent No. 6,239,878, May 29, 2001, [LINK] Beamline 12.0.1.2/12.0.1.3

113) P. Naulleau, K. A. Goldberg, "Interferometric at-wavelength flare characterization of EUV optical systems," U.S. Patent No. 6,233,056, May 15, 2001, [LINK] Beamline 12.0.1.2/12.0.1.3

114) P. Naulleau, K. A. Goldberg, E. Tejnil, "Phase-shifting point diffraction interferometer grating designs," U.S. Patent No. 6,195,169, February 27, 2001, [LINK] Beamline 12.0.1.2/12.0.1.3

115) P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, and J. Bokor , "Adding static printing capabilities to the EUV phase-shifting point diffraction interferometer,"Proc. SPIE 4343, 639-45 (2001). LBNL-46938 Beamline 12.0.1.3

116) M. Shumway, S. Lee, C. Cho, P. Naulleau, K. Goldberg, and J. Bokor , "Extremely fine-pitch printing with a 10x Schwarzschild optic at extreme ultraviolet wavelengths,"Proc. SPIE 4343, 357-62 (2001). Beamline 12.0.1.2

117) D. A. Tichenor, A. K. Ray-Chaudhuri, W. Replogle, C. William, R. H. Stulen, G. D. Kubiak, P. D. Rockett, L. E. Klebanoff, K. J. Jefferson, A. Leung, J. B. Wronosky, L. C. Hale, H. N. Chapman, J. S. Taylor, J. A. Folta, C. Montcalm, R. Soufli, E. A. Spiller, K. L. Blaedel, G. E. Sommargren, D. W. Sweeney, P. Naulleau, K. A. Goldberg, E. M. Gullikson, J. Bokor, P. J. Batson, D. T. Attwood, K. H. Jackson, S. D. Hector,C. Gwyn, P. Yan , "System integration and performance of the EUV engineering test stand,"Proc. SPIE 4343, 19-37 (2001). LBNL-50208 Beamline 12.0.1.3

118) P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, D. O'Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, "Static microfield printing at the Advanced Light Source with the ETS Set-2 optic,"Third International Workshop on Extreme Ultraviolet Lithography, Matsue, Japan October 29-31, 2001. LBNL-51058 Beamline 12.0.1.3

119) K. Goldberg, P. Naulleau, P. Denham, P. Batson, S. Rekawa, B. Hoef, E. Anderson, H. Chapman, and J. Bokor, "At-wavelength testing of the Set-2 ETS projection optic--a four-mirror ring filed aspheric optical system,"Third International Workshop on Extreme Ultraviolet Lithography, Matsue, Japan October 29-31, 2001. LBNL-50935 Beamline 12.0.1.3

120) D. Tichenor, R. Stulen, W. Replogle, A Leung, G. Kubiak, L. Klebanoff, J. Wronosky, L. Hale, H. Chapman, J. Taylor, and P. Naulleau, "System performance and objectives for the EUV Engineering Test Stand,"Third International Workshop on Extreme Ultraviolet Lithography, Matsue, Japan October 29-31, 2001. Beamline 12.0.1.3

121) E. Gullikson, K. Goldberg, P. Naulleau, J. Bjorkholm, H. Chapman, S. Baker, and J. Taylor, "The prediction and measurement of flare for the ETS,"Third International Workshop on Extreme Ultraviolet Lithography, Matsue, Japan , (2001). Beamline 6.3.2/12.0.1.3

2000

122) P. P. Naulleau, C. H. Cho, E. M. Gullikson, J. Bokor, "Transmission phase gratings for EUV interferometry,"Journal of Synchrotron Radiation 7 (6), 405-10 (2000). Beamline 12.0.1.2/12.0.1.3

123) P. Naulleau, "Phase-shifting point diffraction interferometer focus-aid enhanced mask," U.S. Patent No. 6,151,115, November 21, 2000, [LINK] Beamline 12.0.1.2/12.0.1.3

124) K. Goldberg and P. Naulleau, "In Situ alignment system for phase-shifting point-diffraction interferometry," U.S. Patent No. 6,118,535, September 12, 2000, [LINK] Beamline 12.0.1.2/12.0.1.3

125) P. Naulleau and K. Goldberg, "Null test Fourier domain alignment technique for phase-shifting point diffraction interferometer," U.S. Patent No. 6,111,646, August 29, 2000, [LINK] Beamline 12.0.1.2/12.0.1.3

126) P. Naulleau and K. Goldberg, "Dual domain phase-shifting point diffraction interferometer," U.S. Patent No. 6,100,978, August 8, 2000, [LINK] Beamline 12.0.1.2/12.0.1.3

127) K. A. Goldberg, P. Naulleau, P. Batson, P. Denham, H. Chapman, and J. Bokor, "Extreme ultraviolet alignment and testing of a four mirror aspheric extreme ultraviolet optical system,"Journal of Vacuum Science and Technology B 18 (6), 2911-15 (2000). [LINK] Beamline 12.0.1.3

128) P. P. Naulleau, K. A. Goldberg and J. Bokor, "Extreme ultraviolet carrier-frequency shearing Interferometry of a lithographic four-mirror optical system,"Journal of Vacuum Science and Technology B 18 (6), 2939-43 (2000). [LINK] LBNL-45732 Beamline 12.0.1.3

129) S. H. Lee, J. Bokor, S. Jeong, and K. Goldberg, "Extreme ultraviolet holographic microscopy and its application to extreme ultraviolet mask-blank defect characterization,"Journal of Vacuum Science and Technology B 18 (6), 2935-8 (2000). [LINK] Beamline 12.0.1.2

130) K. A. Goldberg, P. Naulleau, P. J. Batson, P. Denham, J. Bokor, and H. N. Chapman, "EUV Interferometry of a Four-Mirror Ring-Field EUV Optical System,"Proc. SPIE 3997, 867-73 (2000). [LINK] LBNL-45328 Beamline 12.0.1.3

131) D. A. Tichenor, G. D. Kubiak, W. C. Replogle, L. E. Klebanoff, J. B. Wronosky, L. C. Hale, H. N. Chapman, J. S. Taylor, J. A. Folta, C. Montcalm, R. M. Hudyma, K. A. Goldberg, and P. Naulleau , "EUV Engineering Test Stand,"Proc. SPIE 3997, 48-69 (2000). Beamline 12.0.1.3

132) P. Naulleau, K. Goldberg, S. Lee, C. Chang, P. Batson, D. Attwood, and J. Bokor, "The PS/PDI: a high accuracy development tool for diffraction limited short-wavelength optics,"AIP Conf. Proc. 507 , 595 (2000). [LINK] Beamline 12.0.1.2/12.0.1.3

133) P. Naulleau, K. Goldberg, E. Gullikson, and J. Bokor, "At-wavelength, system-level flare characterization of EUV optical systems,"Applied Optics 39 (17), 2941-47 (2000). [LINK] LBNL-44480 Beamline 12.0.1.2/12.0.1.3

134) C. Chang, P. Naulleau, E. Anderson, and D. Attwood, "Spatial coherence characterization of undulator radiation,"Optics Communications 182 , 25-34 (2000). Beamline 12.0.1.2

135) P. Naulleau, K. Goldberg, S. Lee, C. Chang, D. Attwood, and J. Bokor, "The EUV phase-shifting point diffraction interferometer,"Synchrotron Radiation Instrumentation: 11th US National Conference, 1999, P. Pianetta, et al.,(eds.) CP521, 66-72 (2000). Beamline 12.0.1.2/12.0.1.3

136) S. H. Lee, P. Naulleau, K. A. Goldberg, F. Piao, W. Oldham, J. Bokor , "Phase-shifting point-diffraction interferometry at 193 nm,"Applied Optics 39 (31), (2000). [LINK]

137) S. H. Lee, F. Piao, P. Naulleau, K. A. Goldberg, W. Oldham, and J. Bokor, "At-wavelength characterization of DUV-radiation-induced damage in fused silica,"Proc. SPIE 3998, 724-31 (2000).

138) P. P. Naulleau, P. J. Batson, P. E. Denham, and M. S. Jones , "Miniature self-contained vacuum compatible electronic imaging microscope," U.S. Patent No. 6,327,102, March 7, 2000, [LINK] Beamline 12.0.1.2/12.0.1.3

1999

139) K. A. Goldberg, "Testing extreme ultraviolet optical systems at-wavelength with sub-angstrom accuracy,"in Fabrication and Testing of Aspheres, J. S. Taylor, M. Piscotty, and A. Lindquist, (eds.) (Optical Society of America, Washington, D.C., 1999) , (1999). [LINK] LBNL-42909 Beamline 12.0.1.2/12.0.1.3

140) E. M. Gullikson, S. L. Baker, J. E. Bjorkholm, J. Bokor, K. A. Goldberg, J. E. M. Goldsmith, C. Montcalm, P. Naulleau, E. A. Spiller, D. G. Stearns, J. S. Taylor, J. H. Underwood, "EUV scattering and flare of 10x projection cameras,"in Emerging Lithographic Technologies III, Y. Vladimirski, ed., Proc. SPIE 3676, 717-23 (1999). LBNL-42974 Beamline 6.3.2/12.0.1.2

141) J. E. M. Goldsmith, K. W. Berger, D. R. Bozman, G. F. Cardinale, D. R. Folk, C. C. Henderson, D. J. O'Connell, A. K. Ray-Chaudhuri, K. D. Stewart, D. A. Tichenor, H. N. Chapman, R. J. Gaughan, R. M. Hudyma, C. Montcalm, E. A. Spiller, J. S. Taylor, J. D. Williams, K. A. Goldberg, E. M. Gullikson, P. Naulleau, J. L. Cobb, "Sub-100-nm lithographic imaging with the EUV 10x Microstepper,"in Emerging Lithographic Technologies III, Y. Vladimirski, ed., Proc. SPIE 3676, 264-71 (1999). Beamline 12.0.1.2

142) K. A. Goldberg, P. Naulleau, S. H. Lee, C. Chang, C. Bresloff, R. Gaughan, H. N. Chapman, J. Goldsmith, and J. Bokor, "Direct comparison of EUV and visible-light interferometries,"Proc. SPIE 3676, 635-42 (1999). [LINK] LBNL-42976 Beamline 12.0.1.3

143) D. T. Attwood, P. Naulleau, K. A. Goldberg, E. Tejnil, C. Chang, R. Beguiristain, P. Batson, J. Bokor, E. M. Gullikson, M. Koike, H. Medecki, and J. H. Underwood, "Tunable coherent radiation in the soft x-ray and extreme ultraviolet spectral regions,"IEEE Journal of Quantum Electronics 35 (5), 709-20 (1999). LBNL-42872 Beamline 12.0.1.1/12.0.1.2/12

144) P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, P. Batson, D. Attwood, and J. Bokor, "Recent advances in EUV phase-shifting point diffraction interferometry,"Proc. SPIE 3767, 154-63 (1999). LBNL-43488 Beamline 12.0.1.2

145) K. A. Goldberg, P. Naulleau, and J. Bokor, "Extreme ultraviolet interferometric measurements of diffraction-limited optics,"Journal of Vacuum Science and Technology B 17 (6), 2982-86 (1999). [LINK] LBNL-42695 Beamline 12.0.1.2

146) P. Naulleau, K. A. Goldberg, E. M. Gullikson, and J. Bokor, "Interferometric at-wavelength flare characterization of EUV optical systems,"Journal of Vacuum Science and Technology B 17 (6), 2987-91 (1999). [LINK] LBNL-42727 Beamline 12.0.1.2

147) P. P. Naulleau and K. A. Goldberg, "A Dual-domain point diffraction interferometer,"Applied Optics 38 (16), 3523-33 (1999). LBNL-42167 Beamline 12.0.1.2/12.0.1.3

148) K. A. Goldberg, P. Naulleau, J. Bokor, P. Batson, P. Denham, E. Anderson, S. Lee, and C. Chang, "Extreme ultraviolet interferometric measurement and alignment of diffraction-limited optics,"The Advanced Light Source Users Meeting . Beamline 12.0.1.2

149) P. P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, D. Attwood, and J. Bokor, "Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy,"Applied Optics 38 (35), 7252-63 (1999). LBNL-43179 Beamline 12.0.1.2

150) P. Naulleau, K. Goldberg, E Gullikson, and J. Bokor, "Interferometric at wavelength flare characterization of EUV optical systems,"The Advanced Light Source Users Meeting . Beamline 12.0.1.2

151) David T. Attwood, "Soft X-Rays and Extreme Ultraviolet Radiation : Principles and Applications," Cambridge University Press, ISBN: 0521652146 (1999). [LINK]

1998

152) K. A. Goldberg, P. Naulleau, S. Lee, C. Chang, C. Bresloff, P. Denham, P. Batson, D. Attwood, and J. Bokor, "EUV interferometry: an accuracy standard for diffraction-limited EUV optics,"The Advanced Light Source Users Meeting 1998. LBNL-42336 Beamline 12.0.1.2

153) P. Naulleau, K. Goldberg, S. Lee, C. Bresloff, D. Attwood, and J. Bokor, "Point Diffraction Interferometry: An EUV Projection Lithography System Alignment and Qualification Tool,"Optical Fabrication and Testing, OSA Technical Digest Series Vol. 12, (1998). LBNL-41248 Beamline 9.0.1/12.0.1.2

154) P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, C. Bresloff, P. Batson, D. Attwood, and J. Bokor, "Characterization of the accuracy of EUV phase-shifting point diffraction interferometry,"in Emerging Lithographic Technologies II, Y. Vladimirski, (ed.), Proc. SPIE 3331, 114-23 (1998). [LINK] LBNL-41458 Beamline 12.0.1.2

155) S. H. Lee, P. Naulleau, K. A. Goldberg, E. Tejnil, H. Medecki, C. Bresloff, C. Chang, D. T. Attwood, and J. Bokor, "At-wavelength interferometry of Extreme Ultraviolet Lithographic Optics,"AIP Conference Proceedings, (no. 449), (Characterization and Metrology for ULSI Technology, 1998 International Conference, Gaithersburg, MD, USA, 1998.) , pp. 553-7 (1998). LBNL-41556/41114? Beamline 12.0.1.2

156) E. Tejnil, K. A. Goldberg, J. Bokor, "Phase effects owing to multilayer coatings in a two-mirror extreme-ultraviolet Schwarzschild objective,"Applied Optics 37 (34), 8021-9 (1998). [LINK] LBNL-41357 Beamline 12.0.1.2

157) K. A. Goldberg, P. Naulleau, S. Lee, C. Bresloff, D. Attwood, and J. Bokor, "High-accuracy interferometry of EUV lithographic optical systems,"Journal of Vacuum Science and Technology B 16 (6), 3435-39 (1998). [LINK] LBNL-41270 Beamline 12.0.1.2

158) D. Attwood, E. Anderson, P. Batson, R. Beguiristain, J. Bokor, K. Goldberg, E. Gullikson, K. Jackson, K. Nguyen, M. Koike, H. Medecki, S. Mrowka, R. Tackaberry, E. Tejnil, and J. Underwood, "At-wavelength metrologies for extreme ultraviolet lithography,"Future Electron Devices Journal Vol. 9 (Suppl. 1), 5-14 (1998). Beamline 12.0.1/6.3/11.3.2

159) M. Altarelli, F. Schlachter, and J. Cross, "Making Ultrabright X-rays,"Scientific American 279 (6), 66-73 (1998).

160) H. Medecki, "Phase-shifting point diffraction interferometer," U.S. Patent No. 5,835,217, November 10, 1998, [LINK] Beamline 9.0.1/12.0.1.2

1997

161) A. Robinson, "New At-Wavelength Interferometer Tests EUV Optics,"Synchrotron Radiation News 10 (4), 10-12 (1997). Beamline 12.0.1.2/12.0.1.3

162) K. A. Goldberg, E. Tejnil, S. H. Lee, H. Medecki, D. T. Attwood, K. H. Jackson, and J. Bokor, "Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry,"Proc. SPIE 3048, 264-70 (1997). [LINK] Beamline 12.0.1.2

163) E. Tejnil, K. A. Goldberg, S. H. Lee, H. Medecki, P. J. Batson, P. E. Denham, A. A. MacDowell, and J. Bokor, "At-wavelength interferometry for EUV lithography,"Journal of Vacuum Science and Technology B 15 (6), 2455-2461 (1997). [LINK] LBNL-40044 Beamline 12.0.1.2

164) H. R. Beguiristain VII , "Thermal distortion effects on beam line optical design for high flux synchrotron radiation," Doctoral Dissertation, Department of Nuclear Engineering, University of California, Berkeley (1997). Beamline 9.0.1/12.0.1.2

165) E. Tejnil , "Characterization of extreme ultraviolet imaging systems," Doctoral Dissertation, Department of Electrical Engineering and Computer Science, University of California, Berkeley (1997). Beamline 9.0.1/12.0.1.2

166) K. A. Goldberg, "Extreme Ultraviolet Interferometry," Doctoral Dissertation, Department of Physics, University of California, Berkeley (1997). [LINK] LBNL-41283 Beamline 9.0.1/12.0.1.2

1996

167) A. K. Ray-Chaudhuri, K. D. Krenz, R. P. Nissen, S. J. Haney, C. H. Fields, W. C. Sweatt, A. A. MacDowell, "(from Sandia National Laboratory) Initial results from an extreme ultraviolet interferometer operating with a compact laser plasma source,"Journal of Vacuum Science and Technology B 14 (6), 3964-68 (1996). [LINK]

168) R. Beguiristain, K. A. Goldberg, E. Tejnil, "Interferometry using undulator sources,"Rev. Sci. Instrumen. 67 (9), 3353 (1996). [LINK] Beamline 9.0.1/12.0.1.2

169) R. Beguiristain, J. H. Underwood, M. Koike, P. Batson, H. Medecki, S. Rekawa, K. Jackson, and D. Attwood, "Characterization of thermal distortion effects on beamline optics for EUV interferometry and soft x-ray microscopy,"Rev. Sci. Instrumen. 67 (9), 1-9 (1996). Beamline 12.0

170) H. Medecki, E. Tejnil, K. A. Goldberg, and J. Bokor, "A Phase-Shifting Point Diffraction Interferometer,"Optics Letters 21 (19), 1526-8 (1996). [LINK] LBNL-39047 Beamline 12.0.1.2

171) E. Tejnil, K. A. Goldberg, E. Anderson, and J. Bokor, "Zonal placement errors in zone plate lenses,"Extreme Ultraviolet Lithography, G. Kubiak and D. Kania, eds. (Optical Society of America, Washington, D.C., 1996) , pp. 138-142 (1996). LBNL-39045 Beamline 9.0.1

172) E. Tejnil, K. A. Goldberg, H. Medecki, R. Beguiristain, J. Bokor, and D. T. Attwood, "Phase-shifting point diffraction interferometry for at-wavelength testing of lithographic optics,"Extreme Ultraviolet Lithography G. Kubiak and D. Kania, eds. (Optical Society of America, Washington, D.C., 1996) , pp. 118-23 (1996). LBNL-38999 Beamline 12.0.1.2

173) K. A. Goldberg, E. Tejnil, and J. Bokor, "A 3-D numerical study of pinhole diffraction to determine the accuracy of EUV point diffraction interferometry,"Extreme Ultraviolet Lithography G. Kubiak and D. Kania, eds. (Optical Society of America, Washington, D.C., 1996) , pp. 133-137 (1996). [LINK] LBNL-38157 Beamline 12.0.1.2/12.0.1.3

1995

174) K. A. Goldberg, R. Beguiristain, J. Bokor, H. Medecki, D. T. Attwood, K. Jackson, E. Tejnil, G. E. Sommargren, "Progress toward lambda/20 EUV interferometry,"Journal of Vacuum Science and Technology B 13 (6), 2923-7 (1995). [LINK] LBNL-37947 Beamline 9.0.1/12.0.1.2

175) K. A. Goldberg, R. Beguiristain, J. Bokor, H. Medecki, K. Jackson, and D. T. Attwood, G. E. Sommargren, J. P. Spallas, R. Hostetler, "At-wavelength testing of optics for EUV,"Proc. SPIE 2437, 347-54 (1995). Beamline 9.0.1/12.0.1.2

1994

176) K. A. Goldberg, R. Beguiristain, J. Bokor, H. Medecki, K. Jackson, and D. T. Attwood, "Point Diffraction Interferometry at EUV Wavelengths,"in Extreme Ultraviolet Lithography, F. Zernike and D. T. Attwood (eds.), (Optical Society of America, Washington, D.C. 1994) , 134-41 (1994). LBNL-36998 Beamline 9.0.1/12.0.1.2

1993

177) D. Attwood, G. Sommargren, R. Beguiristain, K. Nguyen, J. Bokor, N. Ceglio, K. Jackson, J. Underwood, "Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography,"Applied Optics 32 (34), 7022-31 (1993). Beamline 9.0.1/12.0.1.2/12.0.1.3

The database was last updated on: 2004-01-06 09:50:51

CXRO's EUV Interferometry Publications Database is maintained by Ken Goldberg. This site is designed in HTML and PHP (v. 4.3.2) using a MySQL database (v. 3.23.55); it is running on an Apache Web Server on Mac OS X 10.4. Database web design, programming, and implementation by Ken Goldberg, 2003-8.