EUV Mask Imaging • EUV Lithography • Interferometry and Metrology • Short-Wavelength Optics • Materials Properties • Microscopy • Coherence • and more

Click here for Kenneth A. Goldberg’s Publications Compiled by Google Scholar

    2016

  1. Y.-D. Chuang, C. Anderson, M. Benk, K. Goldberg, D. Voronov, T. Warwick, V. Yashchuk, and H. A. Padmore, "Multiplexed high resolution soft x-ray RIXS," AIP Conference Proceedings 1741, 050011 (2016). DOI 10.1063/1.4952931 [PDF]
  2. Aamod Shanker, Antoine Wojdyla, Gautam Gunjala, Jonathan Dong, Markus Benk, Andy Neureuther, Kenneth Goldberg, Laura Waller, "Off-axis aberration estimation in an EUV microscope using natural speckle," 2016 Imaging and Applied Optics Congress ITh1F.2, (2016). DOI 10.1364/ISA.2016.ITh1F.2 [PDF]
  3. Markus P. Benk, Antoine Wojdyla, Weilun Chao, Farhad Salmassi, Sharon Oh, Yow-Gwo Wang, Ryan H. Miyakawa, Patrick P. Naulleau, and Kenneth A. Goldberg, "Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope," J. Micro/Nanolith. MEMS MOEMS 15 (3), 033501 (2016). DOI 10.1117/1.JMM.15.3.033501 [PDF]
  4. Zachary Levinson, Erik Verduijn, Obert R. Wood, Pawitter Mangat, Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla, Bruce W. Smith, "Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology," J. Micro/Nanolith. MEMS MOEMS 15 (2), 023508 (2016). DOI 10.1117/1.JMM.15.2.023508 [PDF]
  5. Patrick Naulleau, Christopher N. Anderson, Weilun Chao, Kenneth A. Goldberg, Eric Gullikson, Farhad Salmassi, Antoine Wojdyla, "Ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask," SPIE 9984 99840P, (2016). DOI 10.1117/12.2243321 [PDF]
  6. Kenneth A. Goldberg, Valeriy V. Yashchuk, "Optimized mirror shape tuning using beam weightings based on distance, angle of incidence, reflectivity, and power," Rev. Sci. Instrumen. 87 (051805), (2016). DOI 10.1063/1.4950747 [PDF]
  7. Markus P. Benk, Antoine Wojdyla, Weilun L. Chao, Ryan H. Miyakawa, Patrick P. Naulleau, Kenneth A. Goldberg, "Emulation of anamorphic imaging on the SHARP EUV mask microscope," SPIE 9776 97761J, (2016). DOI 10.1117/12.2219294 [PDF]
  8. Antoine Wojdyla, Markus P. Benk, Kenneth A. Goldberg, "Fourier Ptychography imaging for the study of EUV lithography photomasks," SPIE February 24, 2016
  9. Zac Levinson, Andrew Burbine, Erik A. Verduijn, Obert R. Wood II, Pawitter J. Mangat, Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla, "Image-based pupil plane characterization via principal component analysis for EUVL tools," SPIE 9776 977618, (2016). DOI 10.1117/12.2219745 [PDF]
  10. Antoine Wojdyla, Alexander P. Donoghue, Markus P. Benk, Kenneth A. Goldberg, "Aerial imaging study of the mask-induced line-edge roughness of EUV lithography mask," SPIE 9776 97760H, (2016). DOI 10.1117/12.2219513 [PDF]
  11. 2015

  12. Patrick Naulleau, Christopher Anderson, Weilun Chao, Kenneth Goldberg, Antoine Wojdyla, Suchit Bhattarai, Andrew Neureuther, Frank Goodwin, Mark Neisser, "Enabling EUV Resist Research at the 1x and Smaller Regime," J. Photopolym. Sci. Technol. 28 (6), 777-82 (2015). DOI 10.2494/photopolymer.28.777 [PDF]
  13. Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla, Erik Verduijn, Obert R. Wood III, and Pawitter Mangat, "EUV actinic brightfield mask microscopy for predicting printed defect images," SPIE 9635 963514, (2015). DOI 10.1117/12.2196966 [PDF]
  14. Rene A. Claus, Yow-Gwo Wang, Antoine Wojdyla, Markus P. Benk, Kenneth A. Goldberg, Andrew R. Neureuther, Patrick P. Naulleau, "Examination of phase retrieval algorithms for patterned EUV mask metrology," SPIE 9635 96350F, (2015). DOI 10.1117/12.2197868 [PDF]
  15. Antoine Wojdyla, Alexander Donoghue, Markus P. Benk, Kenneth A. Goldberg, Patrick P. Naulleau, "Using the SHARP EUV Microscope's aerial images to study line edge roughness," 2015 International Symposium on EUV Lithography, Maastricht, The Netherlands October 5, 2015
  16. Markus Benk, Antoine Wojdyla, Kenneth Goldberg, Patrick Naulleau, "Actinic mask imaging: Taking a SHARP look at next generation photomasks," 2015 International Symposium on EUV Lithography, Maastricht, The Netherlands October 7, 2015
  17. Erik Verduijn, Erik Hosler, Pawitter Mangat, Obert Wood, Renzo Capelli, Sascha Perlitz, Krister Magnusson, Markus Weiss, Dirk Hellweg, Vibhu Jindal, Markus P. Benk, Antoine Wojdyla, Kenneth A. Goldberg, "Assessment of AIMS™ EUV and SHARP actinic wavelength mask defect review tools for the evaluation of blank defect printability," 2015 International Symposium on EUV Lithography, Maastricht, The Netherlands October 5, 2015
  18. Patrick P. Naulleau, Christopher N. Anderson, Weilun Chao, Peter Fischer, Kenneth A. Goldberg, Eric M. Gullikson, Ryan Miyakawa, Seong-Sue Kim, Donggun Lee and Jongju Park, "EUV Research at Berkeley Lab: Enabling Technologies and Applications," X-Ray Lasers 2014: Proceedings of the 14th International Conference on X-Ray Lasers (2015). [PDF]
  19. Pawitter Mangat, Erik Verduijn, Obert R. Wood II, Markus P. Benk, Antoine Wojdyla, and Kenneth A. Goldberg, "Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging," SPIE 9658 96580E, (2015). DOI 10.1117/12.2201048 [PDF]
  20. Markus P. Benk, Kenneth A. Goldberg, Antoine Wojdyla, Christopher N. Anderson, Farhad Salmassi, Patrick P. Naulleau, and Michael Kocsis, "Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope," Journal of Vacuum Science and Technology B 33 (6), 06FE01 (2015). DOI 10.1116/1.4929509 [PDF]
  21. Rene A. Claus, Yow-Gwo Wang, Markus Benk, Kenneth A. Goldberg, Patrick P. Naulleau, Andrew R. Neureuther, and Laura Waller, "Partially Coherent Quantitative Phase Retrieval for EUV Lithography," OSA Computational Optical Sensing and Imaging (COSI) 2015 , ITH2A (2015). DOI 10.1364/ISA.2015.ITH2A.4 [PDF]
  22. Mihir Upadhyaya, Vibhu Jindal, Adarsh Basavalingappa, Henry Herbol, Jenah Harris-Jones, Il-Yong Jang, Kenneth A. Goldberg, Iacopo Mochi, Sajan Marokkey, Wolfgang Demmerle, Thomas V. Pistor, Gregory Denbeaux, "Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach," J. Micro/Nanolith. MEMS MOEMS 14 (2), 023505 (2015). DOI 10.1117/1.JMM.14.2.023505 [PDF]
  23. Iacopo Mochi and Kenneth Goldberg, "Modal wavefront reconstruction from its gradient," Applied Optics 54 (12), 3780-5 (2015). DOI 10.1364/AO.54.003780 [PDF]
  24. Mihir Upadhyaya, Adarsh Basavalingappa, Henry Herbol, Gregory Denbeaux, Vibhu Jindal, Jenah Harris-Jones, Il-Yong Jang, Kenneth A. Goldberg, Iacopo Mochi, Sajan Marokkey, Wolfgang Demmerle and Thomas V. Pistor, "Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects," Journal of Vacuum Science and Technology B 33, 021602 (2015). DOI 10.1116/1.4913315 [PDF]
  25. M. P. Benk, R. H. Miyakawa, W. Chao, Y.-G. Wang, A. Wojdyla, D. G. Johnson, A. P. Donoghue, K. A. Goldberg, "Broader view on extreme ultraviolet masks: adding complementary imaging modes to the SHARP microscope," J. Micro/Nanolith. MEMS MOEMS 14 (1), 013507 (2015). DOI 10.1117/1.JMM.14.1.013507 [PDF]
  26. Yow-Gwo Wang, Ryan Miyakawa, Weilun Chao, Markus Benk, Antoine Wojdyla, Alex Donoghue, David Johnson, Kenneth Goldberg, Andy Neureuther, Ted Liang, and Patrick Naulleau, "Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection," SPIE 9422 94221C, (2015). DOI 10.1117/12.2087532 [PDF]
  27. Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla, David G. Johnson, and Alexander P. Donoghue, "New ways of looking at masks with the SHARP EUV microscope," SPIE 9422 94221A, (2015). DOI 10.1117/12.2175553 [PDF]
  28. Zac Levinson, Sudhar Raghunathan, Erik Verduijn, Obert Wood, Pawitter Mangat, Kenneth Goldberg, Markus Benk, Antoine Wojdyla, Vicky Philipsen, Eric Hendrickx, Bruce W. Smith, "A Method of Image-Based Aberration Metrology for EUVL Tools," SPIE 9422 942215, (2015). DOI 10.1117/12.2087177 [PDF]
  29. Yow-Gwo Wang, Antoine Wojdyla, Markus P. Benk, Kenneth A. Goldberg, Andrew R. Neureuther, Patrick P. Naulleau, and Laura Waller, "Phase measurements of EUV mask defects," SPIE 9422 942217, (2015). DOI 10.1117/12.2087195 [PDF]
  30. Rene A. Claus, Antoine Wojdyla, Markus P. Benk, Kenneth A. Goldberg, Andrew R. Neureuther, Patrick P. Naulleau, and Laura Waller, "Aberration estimation using EUV mask roughness," SPIE 9422 942214, (2015). DOI 10.1117/12.2087513 [PDF]
  31. Mihir Upadhyaya, Vibhu Jindal, Adarsh Basavalingappa, Henry Herbol, Jenah Harris-Jones, Il-Yong Jang, Kenneth A. Goldberg, Iacopo Mochi, Sajan Marokkey, Wolfgang Demmerle, Thomas V. Pistor and Gregory Denbeaux, "Evaluating Printability of Buried Native EUV Mask Phase Defects through a Modeling and Simulation Approach," SPIE 9422 94220Q, (2015). DOI 10.1117/12.2175842 [PDF]
  32. Pei-Yang Yan, Guojing Zhang, Eric M. Gullikson, Kenneth A. Goldberg, Markus P. Benk, "Understanding EUV mask blank surface roughness induced LWR and associated roughness requirement," SPIE 9422 94220J, (2015). DOI 10.1117/12.2087041 [PDF]
  33. 2014

  34. Patrick P. Naulleau, Christopher N. Anderson, Erik H. Anderson, Nord Andreson, Weilun Chao, Changhoon Choi, Kenneth A. Goldberg, Eric M. Gullikson, Seong-Sue Kim, Donggun Lee, Ryan Miyakawa, Jongju Park, Seno Rekawa, Farhad Salmassi, "Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source," Optics Express 22 (17), 20144-54 (2014). DOI 10.1364/OE.22.020144 [PDF]
  35. Yow-Gwo Wang, Ryan Miyakawa, Weilun Chao, Kenneth Goldberg, Andy Neureuther, Patrick Naulleau, "Phase-enhanced defect sensitivity for EUV mask inspection," SPIE 9235 92350L, (2014). DOI 10.1117/12.2069291 [PDF]
  36. Patrick Naulleau, Suchit Bhattaria, Rick Chao, Rene Claus, Kenneth Goldberg, Frank Goodwin, Eric Gullikson, Donggun Lee, Andy Neureuther, Jong-Ju Park, "Extreme ultraviolet mask roughness: requirements, characterization, and modeling," SPIE Photomask Japan 9256 92560J, (2014). DOI 10.1117/12.2070303 [PDF]
  37. K. A. Goldberg, M. Benk, A. Wojdyla, I. Mochi, P. Naulleau, "Actinic Mask Imaging: Emulating Current and Future Litho Tools with the SHARP EUV Microscope," SPIE Photomask Japan April 16, 2014
  38. Y.-G. Wang, R. Miyakawa, W. Chao, D. Johnson, A. Donoghue, A. Wojdyla, M. Benk, K. Goldberg, A. Neureuther, and P. Naulleau, "Phase-enhanced Defect Sensitivity for EUV Mask Inspection," EUVL Symposium 2014 October 28, 2014
  39. Markus P. Benk, David G. Johnson, Alexander Donoghue, Antoine Wojdyla, Kenneth A. Goldberg, "Source optimization at the SHARP microscope," EUVL Symposium 2014
  40. A. Wojdyla, M. P. Benk, D. G. Johnson, A. Donoghue, K. A. Goldberg , "Fourier Ptychography Microscopy with the SHARP EUV Microscope for increased imaging resolution based on illumination diversity," EUVL Symposium 2014
  41. Kenneth A. Goldberg, Markus Benk, Antoine Wojdyla, Alex Donoghue, David Johnson, James Macdougall, Weilun Chao, Ryan Miyakawa, Yow-Gwo Wang, and Patrick Naulleau, "New Source and Imaging Capabilities of the SHARP EUV Mask Microscope," EUVL Symposium 2014
  42. Mihir Upadhyaya, Vibhu Jindal, Henry Herbol, Jenah Harris-Jones, Il-Yong Jang, Kenneth A. Goldberg, Iacopo Mochi, Sajan Marokkey, Wolfgang Demmerle, Thomas V. Pistor and Gregory Denbeaux, "Investigating Printability of Native Defects on EUV Mask Blanks through Simulations and Experiments," EUVL Symposium 2014
  43. S. Raghunathan, O. R. Wood II, P. Mangat, E. Verduijn, V. Philipsen, E. Hendrickx, R. Jonckheere, K. A. Goldberg, M. P. Benk, P. Kearney, Z. Levinson and B. W. Smith, "Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images," J. Vac. Sci. Technol. B 32, 06F801 (2014). DOI 10.1116/1.4901876 [PDF]
  44. K. Yamazoe, I. Mochi, and K. A. Goldberg, "Gradient descent algorithm applied to wavefront retrieval from through-focus images by an extreme ultraviolet microscope with partially coherent source," J. Opt. Soc. Am. A 31 (12), B34-43 (2014). DOI 10.1364/JOSAA.31.000B34 [PDF]
  45. M. P. Benk, R. H. Miyakawa, W. Chao, Y.-G. Wang, A. Wojdyla, D. G. Johnson, A. P. Donoghue, K. A. Goldberg, "A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope," SPIE Photomask, 9235 92350K, (2014). DOI 10.1117/12.2065513 [PDF]
  46. Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla, Iacopo Mochi, Senajith B. Rekawa, Arnaud P. Allezy, Michael R. Dickinson, Carl W. Cork, Weilun Chao, Daniel J. Zehm, James B. Macdougall, Patrick P. Naulleau, and Anne Rudack, "Actinic mask imaging: Recent results and future directions from the SHARP EUV Microscope," SPIE 9048, 90480Y (2014). DOI 10.1117/12.2048364 [PDF]
  47. 2013

  48. Markus P. Benk, Iacopo Mochi, C. C. Lin, Kenneth A. Goldberg, "A sharper look at EUV masks," EUVL Symposium 2013, Toyama, Japan , (2013).
  49. Kenneth A. Goldberg, "Micron-scale lens array having diffracting structures," U.S. Patent No. 8,569,678, October 29, 2013 [PDF]
  50. Kenneth A. Goldberg, Iacopo Mochi, Markus P. Benk, Chihcheng Lin, Arnaud Allezy, Michael Dickinson, Carl W. Cork, James B. Macdougall, Erik H. Anderson, Weilun Chao, Farhad Salmassi, Eric. M. Gullikson, Daniel Zehm, Vamsi Vytla, William Cork, Jason DePonte, Gino Picchi, Ahmet Pekedis, Takeshi Katayanagi, Michael G. Jones, Elizabeth Martin, Patrick P. Naulleau, and Senajith B. Rekawa, "The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope ," SPIE 8880 88800T, (2013). DOI 10.1117/12.2026496 [PDF]
  51. Rene A. Claus, Iacopo Mochi, Markus P. Benk, Kenneth A. Goldberg, Andrew R. Neureuther, Patrick P. Naulleau, "Recovering Effective Amplitude and Phase Roughness of EUV Masks," Proc. SPIE 8880 88802B, (2013). DOI 10.1117/12.2027828 [PDF]
  52. Markus P. Benk, Kenneth A. Goldberg, Iacopo Mochi, Weilun Chao, Erik H. Anderson, "Increased depth of field through wave-front coding: using an off-axis zone plate lens with cubic phase modulation in an EUV microscope ," Proc. SPIE 8880 88801R, (2013). DOI 10.1117/12.2025954 [PDF]
  53. Iacopo Mochi, Kenneth A. Goldberg, Markus P. Benk, Patrick P. Naulleau, "Pupil shaping and coherence control in an EUV mask-imaging microscope ," Proc. SPIE 8880 888022, (2013). DOI 10.1117/12.2026498 [PDF]
  54. Kenneth A. Goldberg, Valeriy V. Yashchuk, Nikolay A. Artemiev, Richard Celestre, Weilun Chao, Eric M. Gullikson, Ian Lacey, Wayne R. McKinney, Daniel Merthe, Howard A. Padmore, "Metrology for the Advancement of X-ray Optics at the ALS," Synchrotron Radiation News 26 (5), 4-12 (2013). [PDF]
  55. D. J. Merthe, V. V. Yashchuk, K. A. Goldberg, M. Kunz, N. Tamura, W. R. McKinney, N. A. Artemiev, R. S. Celestre, G. Y. Morrison, E. H. Anderson, B. V. Smith, E. E. Domning, S. B. Rakawa, H. Padmore, "Methodology for optimal in situ alignment and setting of bendable optics for nearly diffraction-limited focusing of soft x-rays," Opt. Eng. 52 (3), 033603-1-13 (2013). DOI 10.1117/1.OE.52.3.033603 [PDF]
  56. V. V. Yashchuk, D. J. Merthe, K. A. Goldberg, N. A. Artemiev, R. Celestre, E. E. Domning, M. Kunz, W. R. McKinney, G. Y. Morrison, B. V. Smith, N. Tamura, "Experimental methods for optimal tuning and alignment of bendable mirrors for diffraction-limited soft x-ray focusing," Journal of Physics: Conf. Ser. 425 (152003 ), (2013). [LINK]
  57. D. J. Merthe, K. A. Goldberg, V. V. Yashchuk, W. R. McKinney, R. Celestre, I. Mochi, J. MacDougall, G. Y. Morrison, S. B. Rekawa, E. Anderson, B. V. Smith, E. E. Domning, H. Padmore, "In Situ Fine Tuning of Bendable Soft X-ray Mirrors using a Lateral Shearing Interferometer," Nuclear Instruments and Methods in Physics Research A 710 (2013), 82-86 (2013). DOI 10.1016/j.nima.2012.10.105 [PDF]
  58. K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, "Commissioning an EUV mask microscope for lithography generations reaching 8 nm," SPIE 8679 867919, (2013). DOI 10.1117/12.2011688 [PDF]
  59. L. Sun, S. Raghunathan, V. Jindal, E. Gullikson, P. Mangat, I. Mochi, K. A. Goldberg, M. P. Benk, O. Kritsun, T. Wallow, D. Civay, and O. Wood, "Application of phase shift focus monitor in EUVL process control," SPIE 8679 86790T, (2013). DOI 10.1117/12.2011342 [PDF]
  60. 2012

  61. V. V. Yashchuk, K. A. Goldberg, D. J. Merthe, N. A. Artemiev, R. Celestre, E. E. Domning, W. R. McKinney, G. Y. Morrison, M. Kunz, B. V. Smith, N. Tamura, H. A. Padmore, "Experimental methods for optimal tuning and alignment of bendable mirrors for diffraction-limited soft x-ray focusing," (11th International Conference on Synchrotron Radiation Instrumentation, SRI 2012) Journal of Physics: Conference Series 425 (152003), (2012). DOI 10.1088/1742-6596/425/15/152003 [PDF]
  62. V. V. Yashchuk, N. A. Artemiev, K. A. Goldberg, W. R. McKinney, D. J. Merthe, D. L Voronov, H. A. Padmore, "Development of optical metrology for precision characterization, tuning, and alignment of x-ray optics at the ALS," 11th Biennial Conference on High Resolution X-Ray Diffraction and Imaging, XTOP2012 September 15-20
  63. Wayne R. McKinney, Valeriy V. Yashchuk, Daniel J. Merthe, Nikolay A. Artemiev, Kenneth Goldberg, "Ex situ tuning of bendable x-ray mirrors for optimal beamline performance," Proc. SPIE 8501 850109, (2012). DOI 10.1117/12.930156 [PDF]
  64. D. J. Merthe, V. V. Yashchuk, K. A. Goldberg, M. Kunz, N. Tamura, W. R. McKinney, N. A. Artemiev, R. S. Celestre, G. Y. Morrison, E. Anderson, B. V. Smith, E. E. Domning, S. B. Rekawa, H. A. Padmore, "Methodology for optimal in situ alignment and setting of bendable optics for diffraction-limited focusing of soft x-rays," Proc. SPIE 8501 850108, (2012). DOI 10.1117/12.930023 [PDF]
  65. K. A. Goldberg, I. Mochi, M. P. Benk, A. P. Allezy, N. S. Smith, C. W. Cork, W. Cork, J. Macdougall, W. L. Chao, E. H. Anderson, P. P. Naulleau, E. Acome, E. Van Every, V. Milanovic, S. B. Rekawa, "Creating an EUV Mask Microscope for Lithography Generations Reaching 8 nm," Precision Engineering and Mechatronics Supporting the Semiconductor Industry , 4-7 (2012). [PDF]
  66. C. Anderson, D. Ashworth, L. M. Baclea-A1, S. Bhattari, R. Chao, R. Claus, P. Denham, K. Goldberg, A. Grenville, G. Jones, R. Miyakawa, K. Murayama, H. Nakagawa, S. Rekawa, J. Stowers and P. Naulleau, "The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm," Proc. SPIE 8322, 832212 (2012). DOI 10.1117/12.917386 [PDF]
  67. H. J. Kwon, J. Harris-Jones, A. Cordes, M. Satake, Y. Li, I. Mochi, and K. A. Goldberg , "EUV mask multilayer defects and their printability under different multilayer deposition conditions," Proc. SPIE 8322, 832209 (2012). DOI 10.1117/12.916374 [PDF]
  68. P.-Y. Yan, I. Mochi, and K. Goldberg, "EUV Actinic Imaging Tool Aerial Image Evaluation of EUVL Embedded Phase Shift Mask Performance," Proc. SPIE 8322, 83221P (2012). DOI 10.1117/12.919710 [PDF]
  69. T.-G. Kim, H.-S. Seo, I.-Y. Kang, C. Y. Jeong, S. Huh, J. Na, S.-S. Kim, C.-U. Jeon, I. Mochi, K. A. Goldberg, "Printability Study of Pattern Defects in the EUV Mask as a Function of hp Nodes," Proc. SPIE 8322, 83220A (2012). DOI 10.1117/12.916374 [PDF]
  70. 2011

  71. S.Yuan, V. V. Yashchuk, K. A. Goldberg, R. Celestre, W. R. McKinney, G. Y. Morrison, T. Warwick, H. A. Padmore, "Development of in situ, at-wavelength metrology for soft X-ray nano-focusing," Nucl. Instrum. Meth. A 649, 160-162 (2011). DOI 10.1016/j.nima.2010.10.134 [PDF]
  72. W. R. McKinney, V. V. Yashchuk, K. A. Goldberg, M. Howells, N. A. Artemiev, D. J. Merthe, S. Yuan, "Design optimization of bendable x-ray mirrors," Proc. SPIE 8141, 81410K (2011). DOI 10.1117/12.894175 [PDF]
  73. D. J. Merthe, K. A. Goldberg, V. V. Yashchuk, S. Yuan, W. R. McKinney, R. Celestre, I. Mochi, J. Macdougall, G. Y. Morrison, S. B. Rakawa, E. Anderson, B. V. Smith, E. E. Domning, T. Warwick, H. Padmore, "An experimental apparatus for diffraction-limited soft x-ray nano-focusing," Proc. SPIE 8139, 813907 (2011). DOI 10.1117/12.894116 [PDF]
  74. P. P. Naulleau, K. A. Goldberg, E. Gullikson, I. Mochi, B. McClinton, and A. Rastegar, "Accelerating EUV learning with synchrotron light: mask roughness challenges ahead," Proc. SPIE 8166, 81660F (2011). DOI 10.1117/12.900488 [PDF]
  75. H.-J. Kwon, J. Harris-Jones, T. Ranganath, A. Cordes, T. Nakajima, I. Mochi, K. A. Goldberg, Y. Yamaguchi, and H. Kinoshita, "Printability of native blank defects and programmed defects and their stack structures," Proc. SPIE 8166, 81660H (2011). DOI 10.1117/12.897165 [LINK]
  76. A. J. R. van den Boogaard, E. Louis, E. Zoethout, K. A. Goldberg, F. Bijkerk, "Characterization of Mo/Si multilayer growth on stepped topographies," J. Vac. Sci. & Technol. B 29 (5), 051803 (2011). DOI 10.1116/1.3628640 [PDF]
  77. W. R. McKinney, K. A. Goldberg, M. R. Howells, D. J. Merthe, S. Yuan, V. V. Yashchuk, "Design optimization of bendable x-ray mirrors," SPIE 8141, 81410K (2011). DOI 10.1117/12.894175 [PDF]
  78. S. Yuan, K. A. Goldberg, V. V. Yashchuk, R. Celestre, W. R. McKinney, G. Morrison, J. Macdougall, I. Mochi, T. Warwick, "Cross-check of ex-situ and in-situ metrology of a bendable temperature stabilized KB mirror," Nuclear Instruments and Methods in Physics Research A 635 , S58-S63 (2011). DOI 10.1016/j.nima.2010.09.120 [PDF]
  79. K. A. Goldberg, I. Mochi, "Actinic Characterization of EUV Bump-Type Phase Defects," J. Vac. Sci. Technol. B 29 (6), 06F502-1-6 (2011). DOI 10.1116/1.3653257 [PDF]
  80. P. Naulleau, C. N. Anderson, L. Baclea-an, P. Denham, S. George, K. A. Goldberg, G. Jones, I. Mochi, S. Rekawa, B. McClinton, R. Miyakawa, W. Montgomery, T. Wallow, "Using synchrotron light to accelerate EUV resist and mask materials learning," SPIE 7985 798509, (2011). DOI 10.1117/12.885420 [PDF]
  81. C. N. Anderson, L. Baclea-An, P. E. Denham, S. A. George, K. A. Goldberg, M. S. Jones, N. S. Smith, P. P. Naulleau, T. I. Wallow, W. Montgomery, "The SEMATECH Berkeley MET: extending EUV learning down to 16nm half pitch," SPIE 7969 79690R, 1-6 (2011). DOI 10.1117/12.881573 [PDF]
  82. P. P. Naulleau, C. N. Anderson, L. Baclea-an, P. Denham, S. George, K. A. Goldberg, G. Jones, B. McClinton, R. Miyakawa, S. Rekawa, and N. Smith, "Critical challenges for EUV resist materials," SPIE 7972 797202, 1-10 (2011). DOI 10.1117/12.882955 [PDF]
  83. P. P. Naulleau, I. Mochi, K. A. Goldberg, "Optical modeling of Fresnel zoneplate microscopes," Applied Optics 50 (20), 3678-3684 (2011). DOI 10.1364/AO.50.003678 [PDF]
  84. S. A. George, P. P. Naulleau, E. M. Gullikson, I. Mochi, F. Salmassi, K. A. Goldberg, E. H. Anderson, "Replicated mask surface roughness effects on EUV lithographic patterning and line edge roughness," SPIE 7969, 79690E (2011). DOI 10.1117/12.881524 [PDF]
  85. S. Huh, I.-Y. Kang, S.-H. Kim, H.-S. Seo, D. Kim, J. Park, S.-S. Kim, H.-K. Cho, K. Goldberg, I. Mochi, T. Shoki, G. Indeerhees, "Printability and inspectability of Defects on the EUV Mask for sub32nm Half Pitch HVM Application," SPIE 7969 796902, (2011). DOI 10.1117/12.879384 [PDF]
  86. I. Mochi, K. A. Goldberg, R. Xie, P.-Y. Yan, K. Yamazoe, "Quantitative evaluation of mask phase defects from through-focus EUV aerial images," SPIE 7969, 79691X (2011). DOI 10.1117/12.881652 [PDF]
  87. K. A. Goldberg, I. Mochi, S. B. Rekawa, N. S. Smith, J. B. Macdougall, P. P. Naulleau, "An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm," SPIE 7969, 79691O (2011). DOI 10.1117/12.881651 [PDF]
  88. 2010

  89. C. S. Menoni, F. Brizuela, S. Carbajo, Y. Wang, D. Alessi, D. H. Martz, B. Luther, M. C. Marconi, J. J. Rocca, A. Sakdinawat, W. Chao, Y. W. Liu, E. H. Anderson, K. A. Goldberg, D. T. Attwood, A. V. Vinogradov, I. A. Artioukov, B. LaFontaine, "Reflection microscope for actinic mask inspection and other progress in soft x-ray laser nano-imaging," X-Ray Lasers 2010, Springer Proceedings in Physics, 2011 136 7, 359-70 (2010). DOI 10.1007/978-94-007-1186-0_41 [PDF]
  90. F. Brizuela, S. Carbajo, A. Sakdinawat, Y. Wang, D. Alessi, D. Martz, B. Luther, K. A. Goldberg, D. T. Attwood, B. La Fontaine, J. Rocca, C. Menoni, "Table-top Extreme Ultraviolet Laser Aerial Imaging of Lithographic Masks," in Conference on Laser Electro-Optics: Applications, OSA Technical Digest (CD) (Optical Society of America, 2010) AFA5, (2010). [PDF]
  91. D. T. Wintz, K. A. Goldberg, I. Mochi, S. Huh, "Photon flux requirements for extreme ultraviolet reticle imaging in the 22- and 16-nm nodes," J. Micro/Nanolith. MEMS MOEMS 9 (041205), 041205-1-8 (2010). DOI 10.1117/1.3491512 [PDF]
  92. Kenneth A. Goldberg, "EUV Mask Status: Par 13.5," Invited Presentation, SEMATECH Mask Cleaning Workshop, Monterey, CA September 13, 2010
  93. S. Yuan, K. A. Goldberg, V. V. Yashchuk, R. Celestre, I. Mochi, J. Macdougall, G. Y. Morrison, W. R. McKinney, M. Church, and T. Warwick, "At-wavelength optical metrology development at the ALS," SPIE Optical Engineering & Applications 7801 78010D, 1-13 (2010). DOI 10.1117/12.859946 [PDF]
  94. S. Yuan, M. Church, V. V. Yashchuk, K. A. Goldberg, R. S. Celestre, W. R. McKinney, J. Kirschman, G. Morrison, T. Noll, T. Warwick, H. A. Padmore, "Elliptically Bent X-ray Mirrors with Active Temperature Stabilization," X-Ray optics and Instrumentation 2010 (784732), (2010). DOI 10.1155/2010/784732 [PDF]
  95. V. V. Yashchuk, S. Yuan, S. Baker, J. Bozek, R. Celestre, M. Church, K. A. Goldberg, M. Fernandez-Perea, N. Kelez, M. Kunz, W. R. McKinney, G. Morrison, H. A. Padmore, R. Soufli, N. Tamura, T. Warwick, "Bendable Focusing X-Ray Optics for the ALS and the LCLS/FEL: Design, Metrology, and Performance," Workshop on Photon Beamlines & Diagnostics June 29, 2010 LBNL-3559E-Ext-Abs
  96. F. Brizuela, S. Carbajo, A. Sakdinawat, D. Alessi, D. H. Martz, Y. Wang, B. Luther, K. A. Goldberg, I. Mochi, D. T. Attwood, B. La Fontaine, J. J. Rocca, and C. S. Menoni, "Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks," Optics Express 18 (14), 14467-73 (2010). DOI 10.1364/OE.18.014467 [LINK]
  97. K. A. Goldberg, I. Mochi, "Wavelength-Specific Reflections: A Decade of EUV Actinic Mask Inspection Research," J. Vac. Sci. Technol. B 28 (6), C6E1-10 (2010). DOI 10.1116/1.3498757 [PDF]
  98. I. Mochi, K. A. Goldberg, S. Huh, "Actinic imaging and evaluation of phase structures on EUV lithography masks," J. Vac. Sci. Technol. B 28 (6), C6E11-16 (2010). DOI 10.1116/1.3498756 [PDF]
  99. S. A. George, P. P. Naulleau, F. Salmassi, I. Mochi, E. M. Gullikson, K. A. Goldberg, and E. H. Anderson, "Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning," J. Vac. Sci. Technol. B 28 (6), (2010). DOI 10.1116/1.3502436 [PDF]
  100. S. Huh, A. Rastegar, F. Goodwin, S. Wurm, K. Goldberg, I. Mochi, T. Nakajima, M. Kishimoto, M. Komakine, "The Study on the Real Defect on EUV Blankmask and Strategy of EUV Mask Inspection," SPIE 7545 7545N, 1-8 (2010). [PDF]
  101. Y.-J. Fan, L. Yankulin, A. Antohe, P. Thomas, C. Mbanaso, R. Garg, Y. Wang, A. Wüest, F. Goodwin, S. Huh, P. Naulleau, K. Goldberg, I. Mochi, and G. Denbeaux, "Effect of carbon contamination on the printing performance of extreme ultraviolet masks," J. Vac. Sci. Technol. B 28 (2), 321-328 (2010). DOI 10.1116/1.3333434 [PDF]
  102. I.-Y. Kang, H.-S. Seo, B.-S. Ahn, D.-G. Lee, D. Kim, S. Huh, C.-W. Koh, B. Cha, S.-S. Kim, H.-K. Cho, I. Mochi, K. A. Goldberg, "Printability and inspectability study with substrate programmed pit defects in EUV lithography," SPIE 7636, 76361B (2010). DOI 10.1117/12.847956 [PDF]
  103. A. J. R. van den Boogaard, E. Louis, K. A. Goldberg, I. Mochi, F. Bijkerk, "EUV-multilayers on grating-like topographies," SPIE 7636 76362S, 76362S-1-5 (2010). DOI 10.1117/12.846564 [PDF]
  104. Abbas Rastegar, Sean K. Eichenlaub, Arun J. Kadaksham, Byunghoon Lee, Mathiew House, Henry K. Yun, Brian Cha, Kenneth A. Goldberg, Iacopo Mochi, "Particle removal challenges of EUV patterned masks for the sub-22-nm HP node," SPIE 7636, 76360N (2010). DOI 10.1117/12.847056 [PDF]
  105. D. T. Wintz, K. A. Goldberg, I. Mochi, S. Huh, "Photon flux requirements for EUV-reticle imaging microscopy in the 22- and 16-nm nodes," SPIE 7636, 76362L-1-10 (2010). [PDF]
  106. I. Mochi, K. A. Goldberg, B. M. LaFontaine, A. Tchikoulaeva, C. Holfeld , "Actinic imaging of native and programmed defects on a full-field mask," SPIE 7636, 76361A-1-9 (2010). [PDF]
  107. F. Brizuela, S. Carbajo, A. E. Sakdinawat, Y. Wang, D. Alessi, B. M. Luther, W. Chao, Y. Liu, K. A. Goldberg, P. P. Naulleau, E. H. Anderson, D. T. Attwood, Jr., M. C. Marconi, J. J. Rocca, C. S. Menoni, "Improved performance of a table-top actinic full-field microscope with EUV laser illumination," SPIE February 24, 2010
  108. R. H. Miyakawa, P. P. Naulleau, Avideh Zakhor, K. A. Goldberg, "Image-based method for in-situ EUV optical testing with an incoherent source," SPIE 7637, 76361K-1-7 (2010). [PDF]
  109. P. Naulleau, C. N. Anderson, L.-M. Baclea-an, D. Chan, P. Denham, S. George, K. A. Goldberg, B. H. Hoef, G. Jones, C.-W. Koh, B. M. La Fontaine, B. McClinton, R. Miyakawa, M. W. Montgomery, S. Rekawa, T. I. Wallow, "The SEMATECH Berkeley MET pushing EUV development beyond 22-nm half pitch," SPIE 7636, 76361J-1-9 (2010). [PDF]
  110. S. Huh, L. Ren, D. Chan, S. Wurm, K. Goldberg, I. Mochi, T. Nakajima, M. Kishimoto, B. Ahn, I. Kang, J. Park, K. Cho, S.-I. Han, T. Laursen, "A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection," SPIE 7636, 76360K-1-7 (2010). [PDF]
  111. Y-J Fan, L. Yankulin, P. Thomas, C. Mbanaso, A. Antohe, R. Garg, Y. Wang, T. Murray, A. Wüest, F. Goodwin, S. Huh, A. Cordes, P. Naulleau, K. Goldberg, I. Mochi, E. Gullikson, Gregory Denbeaux, "Carbon Contamination Topography Analysis of EUV Masks," SPIE 7636, 76360G-1-8 (2010). DOI 10.1117/12.846996 [PDF]
  112. 2009

  113. F. Brizuela, Y. Wang, C. Brewer, F. Pedaci, W. Chao, E. Anderson, Y. Liu, K. Goldberg, P. Naulleau, P. Wachulak, M. Marconi, D. Attwood, J. Rocca, and C. Menoni, "13.2 nm Table-Top Inspection Microscope for Extreme Ultraviolet Lithography Mask Defect Characterization," CLEO/IQEC JFA5, (2009). [PDF]
  114. C. S. Menoni, F. Brizuela, Y. Wang, C. A. Brewer, B. M. Luther, F. Pedaci, P. W. Wachulak, M. C. Marconi, J. J. Rocca, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, D. T. Attwood, A. V. Vinogradov, I. A. Artyukov, Y. P. Pershyn, V. Kondratenko, "Advances in full field microscopy with table-top soft x-ray lasers," SPIE 7451 74510I, (2009). DOI 10.1117/12.826419 [PDF]
  115. C. H. Clifford, T. T. Chan, A. R. Neureuther, K. A. Goldberg I. Mochi, T. Liang, "Investigation of buried EUV mask defect printability using actinic inspection and fast simulation," SPIE 7488 (74882H), (2009). DOI 10.1117/12.829716 [PDF]
  116. S. Huh, P. Kearney, A. Rastegar, F. Goodwin, S. Wurm, K. Goldberg, I. Mochi, T. Nakajima , M. Kishimoto, M. Komakine, "The Study on the Native Real Defect on EUV Mask Blank Using DUV Blank Inspection Tool and SEMATECH AIT," 2009 International Symposium on Extreme Ultraviolet Lithography, Prague October 2009
  117. P. Naulleau, C. Anderson, L. Baclea-an, P. Denham, S. George, K. Goldberg, B. Hoef, G. Jones, C. Koh, B. La Fontaine, W. Montgomery, T. Wallow, "Using the 0.3-NA SEMATECH Berkeley MET for Sub-22 nm Half Pitch Development," 2009 International Symposium on Extreme Ultraviolet Lithography, Prague October 2009
  118. H. Seo, B. Ahn, I. Kang, D. Lee, D. Kim, S. Kim, H. Cho, S. Huh, B. Cha, K. Goldberg, "Effects of Multilayer Depositions on the EUV Printability and DUV Inspectability of Substrate Pit Defects," 2009 International Symposium on Extreme Ultraviolet Lithography October 2009
  119. I. Mochi, K. A. Goldberg, B. LaFontaine, O. Wood II, "Actinic imaging of known native defects on a full-field mask," 2009 International Symposium on Extreme Ultraviolet Lithography October 2009 LBNL-3010E Abs
  120. K. A. Goldberg, I. Mochi, P. Naulleau, S. George, S. Huh, "Progress in actinic mask imaging: the closest look at lines, defects in phase roughness," 2009 International Symposium on Extreme Ultraviolet Lithography October 2009 LBNL-2845E Abs
  121. S. Yuan, M. Church , R. Celestre, G. Morrison, W. McKinney, T. Warwick, K. Goldberg, V. Yashchuk, "Surface Slope Metrology on Deformable Soft X-ray Mirrors," The Tenth International Conference on Synchrotron Radiation Instrumentation, Australia , (2009). [PDF]
  122. S. Yuan, M. Church , R. Celestre, G. Morrison, W. McKinney, T. Warwick, K. Goldberg, V. Yashchuk, "Surface slope metrology and interferometric wave front measurements on deformable soft x-ray mirrors performed in the laboratory and in-situ at-wavelength," AIP Conference Proceedings 1234, The Tenth International Conference on Synchrotron Radiation Instrumentation, Melbourne, Australia , (2009).
  123. S. Yuan, R. Celestre, W. R. McKinney, G. Morrison, H. A. Padmore, S. B. Rekawa, I. Mochi, T. Warwick, K. Goldberg, V. V. Yashchuk, "At-wavelength and optical metrology of bendable x-ray optics for nanofocusing at the ALS," Frontiers in Optics (FiO), OSA Annual Meeting 2009 FThT2, (2009). [PDF]
  124. Y.-J. Fan, L. Yankulin, G. P. Denbeaux, A. F. Wüest, F. Goodwin, S. Huh, P. P. Naulleau, K. A. Goldberg, "Impact of carbon contamination on EUV masks," SPIE Photomask (BACUS) September 17
  125. P. P. Naulleau, C. N. Anderson, L.-M. Baclea-an, P. Denham, S. George, K. A. Goldberg, M. Goldstein, B. Hoef, G. Jones, C. Koh, B. La Fontaine, W. Montgomery, T. Wallow, "Pushing extreme ultraviolet lithography development beyond 22 nm half pitch," J. Vac. Sci. Technol. B 27 (6), 2911-15 (2009). DOI 10.1116/1.3237092 [PDF]
  126. C. H. Clifford, S. Wiraatmadja, T. T. Chan, A. R. Neureuther, K. A. Goldberg, I. Mochi, T. Liang, "Comparison of fast three-dimensional simulation and actinic inspection for extreme ultraviolet masks with buried defects and absorber features," J. Vac. Sci. Technol. B 27 (6), 2888-93 (2009). DOI 10.1116/1.3244624 [PDF]
  127. H.-S. Seo, B.-S. Ahn, I.-Y. Kang, D. G. Lee, S. Huh, B. Cha, D Kim, S.-S. Kim, H. K. Cho, and K. A. Goldberg, "Effects of multilayer depositions on the EUV printability and DUV inspectability of substrate pit defects," 2009 EUVL Symposium, Prague, Czech Republic October 2009
  128. F. Brizuela, Y. Wang, C. A. Brewer, F. Pedaci, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, P. Naulleau, P. Wachulak, M. C. Marconi, D. T. Attwood, J. J. Rocca, and C. S. Menoni, "Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination," Optics Letters 34 (3), 271-3 (2009). DOI 10.1364/OL.34.000271 [PDF]
  129. S. Huh, P. Kearney, S. Wurm, F. Goodwin, H. Han, K. Goldberg, Iacopo Mochi, Eric Gullikson, "EUV Actinic Defect Inspection and Defect Printability at the Sub-32 nm Half-pitch," SPIE 7470, 74700Y (2009). [PDF]
  130. H. Mizuno, G. McIntyre, C.-S. Koay, M. Burkhardt, L. He, J. Hartley, C. Johnson, S. Raghunathan, K. Goldberg, I. Mochi, B. La Fontaine, and O. Wood, "Thorough characterization of a EUV mask," Proc. SPIE 7379, 73790J (2009). [PDF]
  131. K. A. Goldberg, I. Mochi, P. Naulleau, T. Liang, P.-Y. Yang, S. Huh, "EUV pattern defect detection sensitivity based on aerial image linewidth measurements," J. Vac. Sci. Technol. B 27 (6), 2916-21 (2009). [PDF]
  132. I.
 Mochi,
 K. 
A. 
Goldberg,
 H. 
Han,
 P.
 Naulleau, 
R. 
Myakawa, 
E.
 H. Anderson, 
J. 
Macdougall, "Using aberration test patterns to optimize the performance of EUV aerial imaging microscopes," J. Vac. Sci. Technol. B LBNL-2464E
  133. P. P. Naulleau, C. N. Anderson, L.-M. Baclea-an, P. Denham, S. Geroge, K. A. Goldberg, M. Goldstein, B. Hoef, R. Hudyma, G. Jones, C. Koh, B. La Fontaine, B. McClinton, R. Miyakawa, W. Montgomery, J. Roller, T. Wallow, and S. Wurm, "The SEMATECH Berkeley microfield exposure tool: learning at the 22-nm node and beyond," SPIE 7271 72710W, 72710W-1-11 (2009). [PDF]
  134. Y.-J. Fan, L. Yankulin, A. Antohe, R. Garg, P. Thomas, C. Mbanaso, A. Wuest, F. Goodwin, S. Huh, P. Naulleau, K. Goldberg, I. Mochi, G. Denbeaux , "Carbon Contamination of Extreme Ultraviolet (EUV) Masks and its Effect on Imaging," SPIE 7271, 72713U (2009). DOI 10.1117/12.814196 [PDF]
  135. S. Huh, P. Kearney, S. Wurm, F. Goodwin, K. Goldberg, I. Mochi, E. Gullikson, "Mask Defect Verification Using Actinic Inspection and Defect Mitigation Technology," SPIE 7271 72713J, 72713J-1-9 (2009). [PDF]
  136. R. Miyakawa, P. Naulleau, K. Goldberg, "Analysis of systematic errors in lateral shearing interferometry for EUV optical testing," SPIE 7272 72721V, (2009). DOI 10.1117/12.812340 [PDF]
  137. F. Brizuela, Y. Wang, C. A. Brewer, F. Pedaci, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, P. Naulleau, P. Wachulak, M. C. Marconi, D. T. Attwood, J. J. Rocca, and C. S. Menoni, "Inspection 13.2 nm table-top full-field microscope," SPIE 7271 72713F-1, 72713F-1-7 (2009). DOI 10.1117/12.814320 [PDF]
  138. I. Mochi, K. A. Goldberg, P. Naulleau, S. Huh, "Improving the performance of the Actinic Inspection Tool with an optimized alignment procedure," SPIE 7271 727123, 727123-1-9 (2009). [PDF]
  139. K. A. Goldberg, I. Mochi, S. Huh , "Collecting EUV mask images through focus by wavelength tuning," SPIE 7271 72713N, 72713N-1-8 (2009). DOI 10.1117/12.824433 [PDF]
  140. C. H. Clifford, S. Wiraatmadja, T. T. Chan, A. R. Neureuther, K. A. Goldberg, I. Mochi, T. Liang, "Comparison of fast 3D simulation and actinic inspection for EUV masks with buried defects," SPIE 7271 72711F, (2009). DOI 10.1116/1.3244624 [PDF]
  141. 2008

  142. Ryan Miyakawa, Patrick P. Naulleau, and Kenneth Goldberg, "Lateral shearing interferometry for EUV optical testing," EUVL Symposium 2008 September 29, 2008
  143. Kenneth A. Goldberg, "EUV Optical Testing," "EUV Lithography," Ed. Vivek Bakshi, SPIE Press, 205-225 (2008). [LINK]
  144. J. Rocca, F. Brizuela, Y. Wang, C. Brewer, F. Pedaci, B. Luther, W. Chao, Y. Liu, K. Goldberg, P. Naulleau, M. Marconi, E. Anderson, D. Attwood, C. Menoni, "High Resolution 13.2 nm Reflection Microscopy on a Table Top," EUVL Symposium 2008 September 2008
  145. S. Huh, S. Wurm, H. Han, K. Goldberg, I. Mochi, "EUV Actinic Defect Inspection and Imaging For the Sub-32 nm Half-pitch," EUVL Symposium 2008 September 2008
  146. H. Han, H. Seo, K. Goldberg, H. Kim, B. Ahn, I. Kang, W. Cho, S. Lee, G. Kim, D. Kim, S. Kim, H. Cho, "Characterization of EUV Mask Defects: Printability and Repair Process," EUVL Symposium 2008 September 2008
  147. U. Okoroanyanwu, B. LaFontaine, O. Wood, G. Antesberger, C. Holfeld, J. Hendrik Peters, E. Langer, M. Bender, M. Rossiger, S. Trogisch, F. Goodwin, G. Denbeaux, Y. Fan, A. Antohe, L. Yankulin, R. Garg, K. Goldberg, "EUV Reticle Contamination and Cleaning," EUVL Symposium 2008 September 2008
  148. P. Naulleau, C. Anderson, J. Chiu, P. Denham, S. George, K. Goldberg, B. Hoef, G. Jones, C. Koh, B. La Fontaine, A. Ma, W. Montgomery, J. Park, T. Wallow, S. Wurm, "The SEMATECH Berkeley MET: Learning at the 22 nm Node," EUVL Symposium 2008 September 2008
  149. P. Naulleau, K. Goldberg, I. Mochi, G. Zhang, "Mask Effects on LER," EUVL Symposium 2008 September 2008
  150. I. Mochi, K. A. Goldberg, P. Naulleau, S. Huh, "Achieving Diffraction-limited EUV Aerial Image Microscopy," EUVL Symposium 2008 September 2008
  151. K. A. Goldberg, I. Mochi, P. Naulleau, B. LaFontaine, S. Huh, "Aerial Image Linewidth Measurement Capabilities of the Actinic Inspection Tool," EUVL Symposium 2008 September 2008
  152. K. A. Goldberg, P. Naulleau, I. Mochi, E. H. Anderson, S. B. Rekawa, C. D. Kemp, and R. F. Gunion, H.-S. Han, S. Huh , "Actinic extreme ultraviolet mask inspection beyond 0.25 numerical aperture," J. Vac. Sci. Technol. B 26 (6), 2220-4 (2008). [PDF]
  153. K. A. Goldberg, I. Mochi, P. P. Naulleau, H.-S. Han, S. Huh, "Benchmarking EUV mask inspection beyond 0.25 NA," SPIE Photomask (BACUS) 7122, 71222E-1 (2008). [PDF]
  154. K. A. Goldberg, "EUV mask inspection: a bright idea?," 2008 International Workshop on EUV Lithography , (2008).
  155. K. A. Goldberg, "A Survey of EUV At-Wavelength Optical Testing," 2008 International Workshop on EUV Lithography , (2008).
  156. Kenneth A. Goldberg and Valeriy Yashchuk, "Advanced X-ray Optics Metrology for Nanofocusing and Coherence Preservation," Synchrotron Radiation News 21 (2), 11-12 (2008). [PDF]
  157. K. A. Goldberg, K. Takase, P. Naulleau, H.-S. Han, A. Barty, H. Kinoshita, K. Hamamoto, "Evaluating EUV-mask pattern imaging with two EUV microscopes," Proc. SPIE
  158. K. A. Goldberg, S. B. Rekawa, C. D. Kemp, A. Barty, E. H. Anderson, P. Kearney, H. Han, "EUV-mask reflectivity measurements with micron-scale spatial resolution," Proc. SPIE 6921, 69213U (2008). [PDF]
  159. P. P. Naulleau, C. N. Anderson, J. Chiu, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, S. Huh, G. Jones, B. LaFontaine, A. Ma, D. Niakoula, J. Park, T. Wallow, "Advanced extreme-ultraviolet resist testing using the SEMATECH Berkeley 0.3-NA microfield exposure tool," Proc. SPIE 6921, 69213N (2008). DOI 10.1117/12.773833 [PDF]
  160. H.-S. Han, W. Cho, K. A. Goldberg, E. M. Gullikson, C.-U. Jeon, S. Wurm, "Determining the critical size of EUV-mask substrate defects," Proc. SPIE 6921, 69211Y (2008). [PDF]
  161. 2007

  162. G.-S. Yoon, H. Kim, H.-J. Oh, H.-S. Kim, H.-S. Sim, S.-H. Lee, G.-B. Kim, S.-M. Huh, K. A. Goldberg, A. Barty, S.-S. Kim, H.-K. Cho, "Evaluation of EUV Mask Repair Methods in Si-capping & Ru-capping Blanks," EUVL Symposium 2007, Sapporo, Japan October 31, 2007
  163. G. Denbeaux, Y.-J. Fan, A. Antohe, L. Yankulin, R. Garg, O. Wood, F. Goodwin, C.-S. Koay, E. Gullikson, K. Goldberg, E. Anderson, W. Chao, "Actinic microscope for EUV masks using a stand-along source for imaging and contamination studies of EUV masks," EUVL Symposium 2007, Sapporo, Japan October 31, 2007
  164. K. A. Goldberg, P. Naulleau, A. Barty, S. Rekawa, C. D. Kemp, R. Gunion, F. Salmassi, E. Gullikson, E. Anderson, H.-S. Han, "Benchmarking Mask Imaging with the Actinic Imaging Tool," EUVL Symposium 2007, Sapporo, Japan October 29, 2007
  165. W. Cho, H.-S. Han, K. A. Goldberg, P. A. Kearney, C.-U. Jeon , "Detectability and printability of EUVL-mask blank defects for the 32-nm HP node ," Proc. SPIE Photomask (BACUS) 6730 673013, 673013-1-9 (2007). [PDF]
  166. K. A. Goldberg, P. P. Naulleau, A. Barty, S. B. Rekawa, C. D. Kemp, R. F. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, H.-S. Han, "Performance of actinic EUVL mask imaging using a zoneplate microscope ," Proc. SPIE Photomask (BACUS) 6730 67305E, 67305E-1-12 (2007). [PDF]
  167. P. Naulleau, C. Anderson, K. Dean, P. Denham, K. Goldberg, B. Hoef, D. Niakoula, B. La Fontaine, T. Wallow, "Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool," Journal of Vacuum Science and Technology B 25 (6), 2132-5 (2007). [PDF]
  168. P. P. Naulleau, C. N. Anderson, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, B. LaFontaine, and T. Wallow, "Recent results from the Berkeley 0.3-NA EUV microfield exposure tool," SPIE 6517, 65170V-1-8 (2007). DOI 10.1117/12.713440 [PDF]
  169. H. Han, K. A. Goldberg, A. Barty, E. M. Gullikson, Y. Ikuta, T. Uno, O. R. Wood II, and S. Wurm, "EUV MET printing and actinic imaging analysis on the effects of phase defects on wafer CDs," Proc. SPIE 6517, 65170B-1-10 (2007). [LINK]
  170. K. A. Goldberg, A. Barty, P. Seidel, K. Edinger, R. Fettig, P. Kearney, H. Han, O. R. Wood II , "EUV and non-EUV inspection of reticle defect repair sites," Proc. SPIE 6517, 65170C-1-7 (2007). [PDF]
  171. 2006

  172. P. Naulleau, E. Anderson, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, Keith Jackson, "Advanced 0.3-NA EUV lithography capabilities at the ALS," NGL 2005, Tokyo, Japan , (2006).
  173. A. Barty, K. A. Goldberg, P. Kearney, S. B. Rekawa, B. LaFontaine, O. Wood II, J. S. Taylor and H.-S. Han, "Multilayer defects nucleated by substrate pits: a comparison of actinic inspection and non-actinic inspection techniques," SPIE 6349, 63492M (2006). [PDF]
  174. K. A. Goldberg, A. Barty, H. Han., S. Wurm, P. Kearney, P. Seidel, O. R. Wood II, B. LaFontaine, T. Liang, C. Holfeld, R. Fettig, Y. Tezuka, T. Terasawa, "Comparison of actinic and non-actinic inspection of programmed defect masks," EUVL Symposium 2006 October 18, 2006 [LINK]
  175. K. A. Goldberg, A. Barty, Y. Liu, P. Kearney, Y. Tezuka, T. Terasawa, J. S. Taylor, H.-S. Han, and O. R. Wood II , "Actinic Inspection of EUV Programmed Multilayer Defects and Cross-Comparison Measurements," Journal of Vacuum Science and Technology B 24 (6), 2824-28 (2006). [PDF]
  176. P. Naulleau, J. Cain, K. Dean, K. A. Goldberg, "Lithographic characterization of low-order aberrations in a 0.3-NA EUV microfield exposure tool," Proc. SPIE 6151, 822-828 (2006). [PDF]
  177. P. P. Naulleau, C. Rammeloo, J. P. Cain, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, B. La Fontaine, A. R. Pawloski, C. Larson, G. Wallraff, "Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists," Proc. SPIE 6151, 289-296 (2006).
  178. K. A. Goldberg, P. P. Naulleau, "Diffractive optical element for extreme ultraviolet wavefront control," U.S. Patent No. 7,027,226, April 11, 2006 [PDF]
  179. Kenneth Goldberg, "Testing EUV optics with EUV light: If you can measure it, you can make it," SPIE Newsroom: Optical Design & Engineering , (2006). [LINK]
  180. 2005

  181. T. Koehler, R. L. Brainard, P. P. Naulleau, D. Van Steenwinckel, J. H. Lammers, K. A. Goldberg, J. F. Mackevich, P. Trefonas, "Performance of EUV photoresists on the ALS micro exposure tool," SPIE 5753, 754-64 (2005). [LINK]
  182. P. Mercère, S. Bucourt, G.Cauchon, D. Douillet, G. Dovillaire, K. A. Goldberg, M. Idir, X. Levecq, T. Moreno, P. P. Naulleau, S. Rekawa, P. Zeitoun, "X-ray beam metrology and x-ray optic alignment by Hartmann wavefront sensing," Proc. SPIE 5921, 63-72 (2005).
  183. P. P. Naulleau, K. A. Goldberg, J. P. Cain, E. H. Anderson, K. R. Dean, P. Denham, B. Hoef, K. H. Jackson, "Extreme Ultraviolet Lithography Capabilities at the Advanced Light Source Using a 0.3-NA Optic," IEEE Journal of Quantum Electronics 42 (104), 44-50 (2005).
  184. P. P. Naulleau, J. P. Cain, K. A. Goldberg, "Lithographic characterization of the spherical error in an EUV optic using a programmable pupil fill illuminator," Applied Optics 45 (9), 1957-1963 (2005). DOI 10.1364/AO.45.001957 [PDF]
  185. K. A. Goldberg, "Method and Apparatus for Inspecting an EUV Mask Blank," U.S. Patent No. 6,963,395, November 8, 2005 [PDF]
  186. P. P. Naulleau, J. P. Cain, K. A. Goldberg, "Lithographic characterization of the field dependent astigmatism and alignment stability of a 0.3 numerical aperture extreme ultraviolet microfield optic ," Journal of Vacuum Science and Technology B 23 (5), 2003-6 (2005). DOI 10.1116/1.2037647 [PDF]
  187. P. P. Naulleau, J. P. Cain, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, B. La Fontaine, A R. Pawloski, C. Larson, and G. Wallraff, "Investigation of the current resolution limits of advanced EUV resists," 2005 International Symposium on Extreme Ultraviolet Lithography, San Diego, CA November 7-9
  188. P. P. Naulleau, J. P. Cain, K. Dean, and K. A. Goldberg, "Lithographic characterization of low-order aberrations in the Berkeley MET tool," 2005 International Symposium on Extreme Ultraviolet Lithography, San Diego, CA November 7-9
  189. G. Denbeaux, E. Garg, A. Barty, Y. Liu, K. Goldberg, O. Wood, "Extreme Ultraviolet Phase Contrast Imaging of Mask Defects," 2005 International Symposium on Extreme Ultraviolet Lithography, San Diego, CA November 7-9
  190. A. Barty, Y. Liu, K. A. Goldberg, E. M. Gullikson, J. S. Taylor, and O. R. Wood II, "Actinic inspection of multilayer coated EUV masks at the ALS," 2005 International Symposium on Extreme Ultraviolet Lithography, San Diego, CA November 7-9, 2005
  191. K. A. Goldberg, P. Naulleau, S. Rekawa, P. Denham, J. A. Liddle, E. M. Gullikson, K. Jackson, E. Anderson, J. Taylor, G. Sommargren, H. Chapman, D. Phillion, M. Johnson, A. Barty, R. Soufli, E. Spiller, C. C. Walton, S. Bajt, "Ultra-high-accuracy optical testing: creating diffraction-limited short-wavelength optical systems," Proc. SPIE 5900, 114-23 (2005). [PDF]
  192. M.D. Shumway, P. Naulleau, K.A. Goldberg, and J. Bokor, "Measuring line roughness through aerial image contrast variation using coherent extreme ultraviolet spatial filtering techniques," Journal of Vacuum Science and Technology B 23 (6), 2844-2847 (2005). [PDF]
  193. P. Naulleau, K. A. Goldberg, J. P. Cain, E. Anderson, P. Denham, K. Jackson, B. Hoef, S. Baker, E. Spiller, K. Dean, "Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source," J. Vac. Sci & Technol. B 23 (6), 2840-2843 (2005). [PDF]
  194. K. A. Goldberg, M.E. Teyssier, J.A. Liddle, "EUV Focus Sensor Design Optimization," Journal of Vacuum Science and Technology B 23 (6), 2885-90 (2005).
  195. P. Naulleau, K. A. Goldberg, E. H. Anderson, J. P. Cain, P. Denham, B. Hoef, K. Jackson, A.-S. Morlens, S. Rekawa, K. Dean, "EUV microexposures at the ALS using the 0.3-NA MET projection optics," Proc. SPIE 5751, 56-63 (2005). [PDF]
  196. K. A. Goldberg, M. E. Teyssier, J. A. Liddle, "EUV Focus Sensor: Design and Modeling," Proc. SPIE 5751, 312-19 (2005). [PDF]
  197. 2004

  198. K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, E. H. Anderson, J. A. Liddle, "At-wavelength Alignment and Testing of the 0.3 NA MET Optic," 3rd International EUVL Symposium, Miyazaki, Japan November 2-4, 2004
  199. K. A. Goldberg, P. P. Naulleau, P. E. Denham, S. B. Rekawa, K. H. Jackson, E. H. Anderson, J. A. Liddle, "EUV system optimization and advanced lithography research at Lawrence Berkeley National Laboratory," MNC 2004, Osaka, Japan October 26-29, 2004
  200. P. Mercère, M. Idir, P. Zeitoun, X. Levecq, G. Dovillaire, S. Bucourt, D. Douillet, K. A. Goldberg, P. P. Naulleau, and S. Rekawa , "X ray Wavefront Hartmann Sensor," AIP Conf. Proc. 705 1, 819-822 (2004). [PDF]
  201. K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, E. H. Anderson and J.A. Liddle, "At-Wavelength Alignment and Testing of the 0.3 NA MET Optic," Journal of Vacuum Science and Technology B 22 (6), 2956-61 (2004). [PDF]
  202. P. Naulleau, K. A. Goldberg, J. P. Cain, E. Anderson, P. Denham, K. Jackson, S. Rekawa, F. Salmassi, G. Zhang, "Extreme Ultraviolet Microexposures at the ALS using the 0.3-NA MET Optic," Journal of Vacuum Science and Technology B 22 (6), 2962-65 (2004). [PDF]
  203. P. P. Naulleau, K. A. Goldberg, "Dual-Domain Lateral Shearing Interferometer," U.S. Patent No. 6,707,560, March 16, 2004 [PDF]
  204. P. Naulleau, K. A. Goldberg, E. H. Anderson, K. Bradley, R. Delano, P. Denham, R. Gunion, B. Harteneck, B. Hoef, H. Huang, K. Jackson, M. G. Jones, D. Kemp, J. A. Liddle, R. Oort, A. Rawlins, S. Rekawa, F. Salmassi, R. Tackaberry, C. Chung, L. Hale, D. Phillion, G. Sommargren, H. Taylor, "Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic," Proc. SPIE 5374, 881-891 (2004).
  205. M. D. Shumway, E. L. Snow, K. A. Goldberg, P. Naulleau, H. Cao, M. Chandhok, J. A. Liddle, E. H. Anderson, J. Bokor, "EUV resist imaging below 50 nm using coherent spatial filtering techniques," Proc. SPIE 5374, 454-59 (2004). DOI 10.1117/12.535666 [PDF]
  206. K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, J. A. Liddle, E. H. Anderson, "EUV interferometric testing and alignment of the 0.3 NA MET optic," Proc. SPIE 5374, 64-73 (2004). DOI 10.1117/12.546199 [PDF]
  207. P. Naulleau, K. A. Goldberg, P. Batson, P. Denham, and S. Rekawa, "A synchrotron-based Fourier-synthesis custom-coherence illuminator ," AIP Conf. Proc. 705 1, 792-95 (2004). DOI 10.1063/1.1757915 [PDF]
  208. K. A. Goldberg, P. Naulleau, S. Rekawa, P. Denham, J. A. Liddle, E. Anderson, K. Jackson, J. Bokor, D. Attwood, "At-wavelength interferometry of high-NA diffraction-limited EUV optics," AIP Conf. Proc. 705 1, 855-860 (2004). [PDF]
  209. 2003

  210. K. A. Goldberg, P. Naulleau, et al., , "At-wavelength interferometry of the 0.3 NA MET Optic: measurements, alignment, preparations for imaging," Third Annual SEMATECH International EUVL Symposium, Antwerp, Belgium November, 2003
  211. P. P. Naulleau, K. A. Goldberg, E. Anderson, J. P. Cain, P. Denham, K. Jackson, A.-S. Morlens, S. Rekawa, F. Salmassi, and R. L. Brainard, "High resolution EUV microexposures at the ALS," 3rd International EUVL Symposium, Miyazaki, Japan, November 2-4, 2004
  212. P. Zeitoun, P. Balcou, S. Bucourt, D. Benredjem, F. Delmotte, G. Dovillaire, D. Douillet, J. Dunn, G. Faivre, M. Fajardo, K. A. Goldberg, M. Idir, S. Hubert, J. Hunter, S. Jacquemot, S. Kazamias, S. le Pape, X. Levecq, C. L. S. Lewis, R. Marmoret, P. Mercère, A. S. Morlens, P. P. Naulleau, C. Remond, J. J. Rocca, S. Sebban, R. F. Smith, M.-F. Ravet, P. Troussel, C. Valentin, and L. Vanbostal, "New techniques for the measurement of x-ray beam or x-ray optics quality," Proc. SPIE 5197, 194-204 (2003). [PDF]
  213. K. A. Goldberg, P. P. Naulleau, P. E. Denham, S. B. Rekawa, K. H. Jackson, J. A. Liddle, B. Harteneck, E. Gullikson, and E. H. Anderson, "Preparations for extreme ultraviolet interferometry of the 0.3 numerical aperture Micro Exposure Tool optic," Journ. Vac. Sci. & Technol. B 21 (6), 2706-10 (2003). [PDF]
  214. P. Naulleau, K. A. Goldberg, E. H. Anderson, J. Bokor, B. Harteneck, K. Jackson, D. Olynick, F. Salmassi, S. Baker, P. Mirkarimi, E. Spiller, C. Walton, D. O'Connell, P.-Y. Yan, G. Zhang, "Printing-based performance analysis of the engineering test stand set-2 optic using a synchrotron exposure station with variable sigma," J. Vac. Sci. & Technol. B 21 (6), 2697-2700 (2003). DOI 10.1116/1.1621669 [PDF]
  215. A. Barty and K. A. Goldberg, "The effects of radiation induced carbon contamination on the performance of an EUV lithographic optic," Proc. SPIE 5037, 510-19 (2003). DOI 10.1117/12.499372 [PDF]
  216. P. Mercère, P. Zeitoun, M. Idir, S. Le Pape, D. Douillet, X. Levecq, G. Dovillaire, S. Bucourt, K. A. Goldberg, P. P. Naulleau, and S. Rekawa, "Hartmann wave-front measurement at 13.4 nm with lambdaEUV/120 accuracy," Optics Letters 28 (17), 1534-36 (2003). [PDF]
  217. M. Idir, P. Mercère, P. Zeitoun, D. Douillet, X. Levecq, G. Dovillaire, S. Bucourt, K. A. Goldberg, P. P. Naulleau, and S. Rekawa, "XUV Hartmann wavefront sensor ," Eighth Internation Conference on Synchrotron Radiation Instrumentation, August 25-29, 2003, San Francisco, CA , (2003).
  218. P. Naulleau, K. Goldberg, P. Batson, J. Bokor, P. Denham, and S. Rekawa, "A Fourier-synthesis custom-coherence illuminator for EUV microfield lithography," Applied Optics 42 (5), 820-26 (2003). [PDF]
  219. P. Naulleau, K. Goldberg, E. Anderson, J. Bokor, E. Gullikson, B. Harteneck, K. Jackson, D. Olynick, F. Salmassi, S. Baker, P. Mirkarimi, E. Spiller, C. Walton, and G. Zhang, "Lithographic characterization of the printability of programmed EUV substrate defects," Journal of Vacuum Science and Technology B 21 (4), 1286-90 (2003). DOI 10.1116/1.1580839 [PDF]
  220. A. Barty and K. A. Goldberg, "Effects of radiation induced carbon contamination on the performance of an EUV lithographic optic," Proc. SPIE 5037, 450-59 (2003). [PDF]
  221. W. P. Ballard, D. A. Tichenor, D. J. O'Connell, L. J. Bernardez II, R. E. Lafton, R. J. Anderson, A. H. Leung, K. Williams, S. J. Hanley, Y. Perras, K. L. Jefferson, T. L. Porter, D. Knight, P. K. Barr, J. L. Van de Vreugde, R. H. Campiotti, M. D. Zimmerman, T. A. Johnson, L. E. Klebanoff, P. A. Grunow, S. Graham Jr, D. A. Buchenauer, W. C. Replogle, T. G. Smith, J. B. Wronosky, J. R. Darnold, K. L. Blaedel, H. N. Chapman, J. S. Taylor, L. C. Hale, G. E. Sommargren, E. M. Gullikson, P. Naulleau, K. A. Goldberg, S. H. Lee, H. Shields, R. J. St. Pierre, S. Ponti, "System and process learning in a full-field high-power EUVL alpha tool," Proc. SPIE 5037, 47-57 (2003).
  222. K. A. Goldberg and P. P. Naulleau, "Hybrid shearing and phase-shifting point diffraction interferometer," U.S. Patent No. 6,573,997, June 3, 2003 [PDF]
  223. M. D. Shumway, P. P. Naulleau, K. A. Goldberg, E. L. Snow, J. Bokor, "Resist evaluation at 50 nm in the EUV using interferometric spatial frequency doubled imaging," Proc. SPIE 5037, 910-16 (2003). DOI 10.1117/12.484677 [PDF]
  224. S. A. Robertson, P. P. Naulleau, K. A. Goldberg, D. J. OConnell, K. McDonald, S. G. Hansen, T. M. Delano, K. W. Brown, R. L. Brainard, "Calibration of EUV-2D photoresist simulation parameters for accurate predictive modeling," Proc. SPIE 5037, 900-9 (2003). [PDF]
  225. P. P. Naulleau, K. A. Goldberg, E. H. Anderson, J. Bokor, B. D. Harteneck, K. H. Jackson, D. L. Olynick, F. Salmassi, S. L. Baker, P. B. Mirkarimi, E. A. Spiller, C. C. Walton, D. J. O'Connell, P. Yan, G. Zhang, "Static EUV microexposures using the ETS set-2 optics," Proc. SPIE 5037, 36-46 (2003). DOI 10.1117/12.490129 [PDF]
  226. K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, E. H. Anderson, J. A. Liddle, J. Bokor, "EUV Interferometry of the 0.3 NA MET Optic," Proc. SPIE 5037, 69-74 (2003). [PDF]
  227. 2002

  228. D. Attwood, E. Anderson, G. Denbeaux, K. Goldberg, P. Naulleau, G Schneider, "Soft X-Ray Microscopy and EUV Lithography: An Update on Imaging at 20-40 nm Spatial Resolution," AIP Conference Proceedings 641 183, 461-68 (2002). DOI 10.1063/1.1521061 [PDF]
  229. K. A. Goldberg, P. Naulleau, J. Bokor, P. Denham, S. Rekawam, P. Batson, A. Liddle, B. Harteneck, K. Jackson, E. Anderson, D. Attwood, H. Chapman, A. Barty, G. Sommargren, D. Phillion, J. Taylor, D. Sweeney, "VNL Research in Interferometry for EUV Optics," First International EUVL Symposium, Addison, Texas October 15-17, 2002
  230. C. Chang, E. Anderson, P. Naulleau, E. Gullikson, K. Goldberg, D. Attwood , "Direct measurement of index of refraction in the extreme-ultraviolet wavelength region with a novel interferometer," Optics Letters 27 (12), 1028-1030 (2002). [PDF]
  231. K. A. Goldberg, "Graphical user interface for image acquisition and processing," U.S. Patent No. 6,341,183, January 22, 2002 [PDF]
  232. S. H. Lee, D. A. Tichenor, W. P. Ballard, L. J. Bernardez II, J. E. M. Goldsmith, S. J. Hanley, K. L. Jefferson, T. A. Johnson, A. H. Leung, D. J. O'Connell, W. C. Replogle, J. B. Wronosky, K. Blaedel, P. Naulleau, K. A. Goldberg, E. M. Gullikson, H. N. Chapman, S. Wurm, E. Panning, P.-Y. Yan, G. Zhang, J. E. Bjorkholm, G. D. Kubiak, D. W. Sweeney, D. Attwood, and C. W. Gwyn, "Lithographic Evaluation of the EUV Engineering Test Stand," Proc. SPIE 4688, 266-276 (2002). DOI 10.1117/12.472300 [PDF]
  233. D. A. Tichenor, W. C. Replogle, S. H. Lee, W. P. Ballard, G. D. Kubiak, L. E. Klebanoff, J. E. M. Goldsmith, J. B. Wronosky, L. C. Hale, H. N. Chapman, J. S. Taylor, K. A. Goldberg, P. Naulleau, "Performance upgrades in the EUV Engineering Test Stand," Proc. SPIE 4688, 72-86 (2002). DOI 10.1117/12.472328 [PDF]
  234. P. Naulleau, K. A. Goldberg, E. H. Anderson, D. T. Attwood, Jr., P. J. Batson, J. Bokor, P. Denham, E. M. Gullikson, B. Hoef, K. H. Jackson, S. Rekawa, F. Salmassi, K. L. Blaedel, H. N. Chapman, L. C. Hale, R. Soufli, E. A. Spiller, D. W. Sweeney, J. R. Taylor, C. C. Walton, G. F. Cardinale, A. K. Ray-Chaudhuri, A. Fisher, D. J. O'Connell, R. H. Stulen, D. A. Tichenor, C. W. Gwyn, P. Yan, G. Zhang, "Static microfield printing at the Advanced Light Source with the ETS Set-2 optic," Proc. SPIE 4688 4688, 64-71 (2002). [PDF]
  235. K. A. Goldberg, P. Naulleau, J. Bokor, and H. N. Chapman, "Honing the accuracy of extreme ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic," Proc. SPIE 4688, 329-337 (2002). [PDF]
  236. K. Goldberg, P. Naulleau, J. Bokor and H. Chapman, "Testing EUV Optics with Visible-Light and EUV Interferometry," Journal of Vacuum Science and Technology B 20 (6), 2834-39 (2002). [PDF]
  237. P. Naulleau, K. A. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, D. O'Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan and G. Zhang, "Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic," Journal of Vacuum Science and Technology B 20 (6), 2829-33 (2002). [PDF]
  238. K. A. Goldberg, P. Naulleau, and J. Bokor, "Fourier-transform interferometer alignment methods," Applied Optics 41 (22), 4477-83 (2002). [PDF]
  239. S. A. Robertson, P. P. Naulleau, D. J. O'Connell, K. R. McDonald, K. A. Goldberg, T. Delano, and R. L. Brainard, "Calibration of EUV-2D Photoresist Simulation Parameters for Accurate Predictive Modeling," Presented at the First International EUVL Symposium, Addison, Texas October 15-17, 2002 LBNL-50291
  240. P. Naulleau, K. A. Goldberg, E. H. Anderson, P. Batson, J. Bokor, P. Denham, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, S. Baker, H. Chapman, P. Mirkarimi, E. Spiller, C. Walton, D. O'Connell, P.-Y. Yan, and G. Zhang, "Lithographic characterization of the ETS Set-2 optic at the Advanced Light Source static microfield exposure station," Presented at the First International EUVL Symposium, Addison, Texas October 15-17, 2002 LBNL-50289
  241. K. A. Goldberg, P. Naulleau, J. Bokor, P. Denham, S. Rekawam, P. Batson, A. Liddle, B. Harteneck, K. Jackson, E. Anderson, D. Attwood, H. Chapman, A. Barty, G. Sommargren, D. Phillion, J. Taylor, D. Sweeney, "VNL Research in Interferometry for EUV Optics," Presented at the First International EUVL Symposium, Addison, Texas October 15-17, 2002 LBNL-50292
  242. 2001

  243. E. Gullikson, K. Goldberg, P. Naulleau, J. Bjorkholm, H. Chapman, S. Baker, and J. Taylor, "The prediction and measurement of flare for the ETS," Third International Workshop on Extreme Ultraviolet Lithography, Matsue, Japan , (2001).
  244. K. Goldberg, P. Naulleau, P. Denham, P. Batson, S. Rekawa, B. Hoef, E. Anderson, H. Chapman, and J. Bokor, "At-wavelength testing of the Set-2 ETS projection optic--a four-mirror ring filed aspheric optical system," Third International Workshop on Extreme Ultraviolet Lithography, Matsue, Japan October 29-31, 2001 LBNL-50935
  245. P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D. Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Chaudhuri, A. Fisher, D. O'Connell, R. Stulen, D. Tichenor, C. Gwyn, P. Yan, G. Zhang, "Static microfield printing at the Advanced Light Source with the ETS Set-2 optic," Third International Workshop on Extreme Ultraviolet Lithography, Matsue, Japan October 29-31, 2001 LBNL-51058
  246. D. A. Tichenor, A. K. Ray-Chaudhuri, W. Replogle, C. William, R. H. Stulen, G. D. Kubiak, P. D. Rockett, L. E. Klebanoff, K. J. Jefferson, A. Leung, J. B. Wronosky, L. C. Hale, H. N. Chapman, J. S. Taylor, J. A. Folta, C. Montcalm, R. Soufli, E. A. Spiller, K. L. Blaedel, G. E. Sommargren, D. W. Sweeney, P. Naulleau, K. A. Goldberg, E. M. Gullikson, J. Bokor, P. J. Batson, D. T. Attwood, K. H. Jackson, S. D. Hector,C. Gwyn, P. Yan , "System integration and performance of the EUV engineering test stand," Proc. SPIE 4343, 19-37 (2001).
  247. M. Shumway, S. Lee, C. Cho, P. Naulleau, K. Goldberg, and J. Bokor , "Extremely fine-pitch printing with a 10x Schwarzschild optic at extreme ultraviolet wavelengths," Proc. SPIE 4343, 357-62 (2001).
  248. P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, and J. Bokor , "Adding static printing capabilities to the EUV phase-shifting point diffraction interferometer," Proc. SPIE 4343, 639-45 (2001). [PDF]
  249. P. Naulleau, K. A. Goldberg, E. Tejnil, "Phase-shifting point diffraction interferometer grating designs," U.S. Patent No. 6,195,169, February 27, 2001 [PDF]
  250. P. Naulleau, K. A. Goldberg, "Interferometric at-wavelength flare characterization of EUV optical systems," U.S. Patent No. 6,233,056, May 15, 2001 [PDF]
  251. K. A. Goldberg, "Fourier-transform and global contrast interferometer alignment methods," U.S. Patent No. 6,239,878, May 29, 2001 [PDF]
  252. S. H. Lee, P. Naulleau, K. A. Goldberg, C. H. Cho, S. Jeong, J. Bokor, "Extreme-ultraviolet lensless Fourier-transform holography," Applied Optics 40 (16), 2655-2661 (2001). [PDF]
  253. P. P. Naulleau, K. A. Goldberg, P. J. Batson, S. Jeong, and J. H. Underwood, "Tolerancing of diffraction-limited Kirkpatrick-Baez synchrotron beamline optics for extreme-ultraviolet metrology," Applied Optics 40 (22), 3703-3709 (2001). [PDF]
  254. K. A. Goldberg, K. Geary, "Wave-front measurement errors from restricted concentric subdomains," Journal of the Optical Society of America A 18 (9), 2146-52 (2001). [PDF]
  255. D. A. Tichenor, A. K. Ray-Chaudhuri, S. H. Lee, H. N. Chapman, W. C. Replogle, K. W. Berger, R. H. Stulen, G. D. Kubiak, L. E. Klebanoff, J. B. Wronosky, D. J. O'Connell, A. H. Leung, K. L. Jefferson, W. P. Ballard, L. C. Hale, K. Blaedel, J. S. Taylor, J. A. Folta, E. Spiller, R. Soufli, G. E. Sommargren, D. W. Sweeney, P. Naulleau, K. A. Goldberg, E. M. Gullikson, J. Bokor, D. T. Attwood, U. Mickan, R. Hanzen, E. Panning, P.-Y. Yan, J. E. Bjorkholm, and C. W. Gwyn, "Initial Results from the EUV Engineering Test Stand," Proc. SPIE 4506, (2001). [PDF]
  256. K. A. Goldberg, "Phase-shifting point diffraction interferometer mask designs," U.S. Patent No. 6,307,635, October 23, 2001 [PDF]
  257. K. A. Goldberg and J. Bokor, "Fourier-transform method of phase-shift determination," Applied Optics 40 (17), 2886-94 (2001). [PDF]
  258. H. N. Chapman, A. K. Ray-Chaudhuri, D. A. Tichenor, W. C. Replogle, R. H. Stulen, G. D. Kubiak, P. D. Rockett, L. E. Klebanoff, D. O'Connell, A. H. Leung, K. L. Jefferson, J. B. Wronosky, J. S. Taylor, L. C. Hale, K. Blaedel, E. A. Spiller, G. E. Sommargren, J. A. Folta, D. W. Sweeney, E. M. Gullikson, P. Naulleau, K. A. Goldberg, J. Bokor, D. T. Attwood, U. Mickan and R. Hanzen, E. Panning, P.-Y. Yan, C. W. Gwyn, and S. H. Lee , "First lithographic results from the extreme ultraviolet Engineering Test Stand," Journal of Vacuum Science and Technology B 19 (6), 2389-95 (2001). [PDF]
  259. P. Naulleau, K. A. Goldberg, E. H. Anderson, P. Batson, P. E. Denham, K. H. Jackson, E. M. Gullikson, S. Rekawa, and J. Bokor, "At-wavelength characterization of the extreme ultraviolet Engineering Test Stand Set-2 optic," Journal of Vacuum Science and Technology B 19 (6), 2396-2400 (2001). [PDF]
  260. 2000

  261. S. H. Lee, F. Piao, P. Naulleau, K. A. Goldberg, W. Oldham, and J. Bokor, "At-wavelength characterization of DUV-radiation-induced damage in fused silica," Proc. SPIE 3998, 724-31 (2000). DOI 10.1117/12.386529 [PDF]
  262. S. H. Lee, P. Naulleau, K. A. Goldberg, F. Piao, W. Oldham, J. Bokor , "Phase-shifting point-diffraction interferometry at 193 nm," Applied Optics 39 (31), (2000). [PDF]
  263. P. Naulleau, K. Goldberg, S. Lee, C. Chang, D. Attwood, and J. Bokor, "The EUV phase-shifting point diffraction interferometer," Synchrotron Radiation Instrumentation: 11th US National Conference, 1999, P. Pianetta, et al.,(eds.) CP521, 66-72 (2000).
  264. P. Naulleau, K. Goldberg, E. Gullikson, and J. Bokor, "At-wavelength, system-level flare characterization of EUV optical systems," Applied Optics 39 (17), 2941-47 (2000). [PDF]
  265. P. Naulleau, K. Goldberg, S. Lee, C. Chang, P. Batson, D. Attwood, and J. Bokor, "The PS/PDI: a high accuracy development tool for diffraction limited short-wavelength optics," AIP Conf. Proc. 507, 595 (2000). [PDF]
  266. D. A. Tichenor, G. D. Kubiak, W. C. Replogle, L. E. Klebanoff, J. B. Wronosky, L. C. Hale, H. N. Chapman, J. S. Taylor, J. A. Folta, C. Montcalm, R. M. Hudyma, K. A. Goldberg, and P. Naulleau , "EUV Engineering Test Stand," Proc. SPIE 3997, 48-69 (2000). DOI 10.1117/12.390083 [PDF]
  267. K. A. Goldberg, P. Naulleau, P. J. Batson, P. Denham, J. Bokor, and H. N. Chapman, "EUV Interferometry of a Four-Mirror Ring-Field EUV Optical System," Proc. SPIE 3997, 867-73 (2000). [PDF]
  268. S. H. Lee, J. Bokor, S. Jeong, and K. Goldberg, "Extreme ultraviolet holographic microscopy and its application to extreme ultraviolet mask-blank defect characterization," Journal of Vacuum Science and Technology B 18 (6), 2935-8 (2000). [PDF]
  269. P. P. Naulleau, K. A. Goldberg and J. Bokor, "Extreme ultraviolet carrier-frequency shearing Interferometry of a lithographic four-mirror optical system," Journal of Vacuum Science and Technology B 18 (6), 2939-43 (2000). [PDF]
  270. K. A. Goldberg, P. Naulleau, P. Batson, P. Denham, H. Chapman, and J. Bokor, "Extreme ultraviolet alignment and testing of a four mirror aspheric extreme ultraviolet optical system," Journal of Vacuum Science and Technology B 18 (6), 2911-15 (2000). [PDF]
  271. P. Naulleau and K. Goldberg, "Dual domain phase-shifting point diffraction interferometer," U.S. Patent No. 6,100,978, August 8, 2000 [PDF]
  272. P. Naulleau and K. Goldberg, "Null test Fourier domain alignment technique for phase-shifting point diffraction interferometer," U.S. Patent No. 6,111,646, August 29, 2000 [PDF]
  273. K. Goldberg and P. Naulleau, "In Situ alignment system for phase-shifting point-diffraction interferometry," U.S. Patent No. 6,118,535, September 12, 2000 [PDF]
  274. 1999

  275. P. Naulleau, K. Goldberg, E Gullikson, and J. Bokor, "Interferometric at wavelength flare characterization of EUV optical systems," The Advanced Light Source Users Meeting
  276. K. A. Goldberg, P. Naulleau, J. Bokor, P. Batson, P. Denham, E. Anderson, S. Lee, and C. Chang, "Extreme ultraviolet interferometric measurement and alignment of diffraction-limited optics," The Advanced Light Source Users Meeting
  277. P. P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, D. Attwood, and J. Bokor, "Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy," Applied Optics 38 (35), 7252-63 (1999). DOI 10.1364/AO.38.007252 [PDF]
  278. P. P. Naulleau and K. A. Goldberg, "A Dual-domain point diffraction interferometer," Applied Optics 38 (16), 3523-33 (1999). [PDF]
  279. P. Naulleau, K. A. Goldberg, E. M. Gullikson, and J. Bokor, "Interferometric at-wavelength flare characterization of EUV optical systems," Journal of Vacuum Science and Technology B 17 (6), 2987-91 (1999). [PDF]
  280. K. A. Goldberg, P. Naulleau, and J. Bokor, "Extreme ultraviolet interferometric measurements of diffraction-limited optics," Journal of Vacuum Science and Technology B 17 (6), 2982-86 (1999). [PDF]
  281. P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, P. Batson, D. Attwood, and J. Bokor, "Recent advances in EUV phase-shifting point diffraction interferometry," Proc. SPIE 3767, 154-63 (1999). DOI 10.1117/12.371113 [PDF]
  282. D. T. Attwood, P. Naulleau, K. A. Goldberg, E. Tejnil, C. Chang, R. Beguiristain, P. Batson, J. Bokor, E. M. Gullikson, M. Koike, H. Medecki, and J. H. Underwood, "Tunable coherent radiation in the soft x-ray and extreme ultraviolet spectral regions," IEEE Journal of Quantum Electronics 35 (5), 709-20 (1999). [PDF]
  283. K. A. Goldberg, P. Naulleau, S. H. Lee, C. Chang, C. Bresloff, R. Gaughan, H. N. Chapman, J. Goldsmith, and J. Bokor, "Direct comparison of EUV and visible-light interferometries," Proc. SPIE 3676, 635-42 (1999). DOI 10.1117/12.351138 [PDF]
  284. J. E. M. Goldsmith, K. W. Berger, D. R. Bozman, G. F. Cardinale, D. R. Folk, C. C. Henderson, D. J. O'Connell, A. K. Ray-Chaudhuri, K. D. Stewart, D. A. Tichenor, H. N. Chapman, R. J. Gaughan, R. M. Hudyma, C. Montcalm, E. A. Spiller, J. S. Taylor, J. D. Williams, K. A. Goldberg, E. M. Gullikson, P. Naulleau, J. L. Cobb, "Sub-100-nm lithographic imaging with the EUV 10x Microstepper," in Emerging Lithographic Technologies III, Y. Vladimirski, ed., Proc. SPIE 3676, 264-71 (1999). DOI 10.1117/12.351097 [PDF]
  285. E. M. Gullikson, S. L. Baker, J. E. Bjorkholm, J. Bokor, K. A. Goldberg, J. E. M. Goldsmith, C. Montcalm, P. Naulleau, E. A. Spiller, D. G. Stearns, J. S. Taylor, J. H. Underwood, "EUV scattering and flare of 10x projection cameras," in Emerging Lithographic Technologies III, Y. Vladimirski, ed., Proc. SPIE 3676, 717-23 (1999). DOI 10.1117/12.351162 [PDF]
  286. K. A. Goldberg, "Testing extreme ultraviolet optical systems at-wavelength with sub-angstrom accuracy," in Fabrication and Testing of Aspheres, J. S. Taylor, M. Piscotty, and A. Lindquist, (eds.) (Optical Society of America, Washington, D.C., 1999) , (1999). [PDF]
  287. 1998

  288. D. Attwood, E. Anderson, P. Batson, R. Beguiristain, J. Bokor, K. Goldberg, E. Gullikson, K. Jackson, K. Nguyen, M. Koike, H. Medecki, S. Mrowka, R. Tackaberry, E. Tejnil, and J. Underwood, "At-wavelength metrologies for extreme ultraviolet lithography," Future Electron Devices Journal Vol. 9 (Suppl. 1), 5-14 (1998). [PDF]
  289. K. A. Goldberg, P. Naulleau, S. Lee, C. Bresloff, D. Attwood, and J. Bokor, "High-accuracy interferometry of EUV lithographic optical systems," Journal of Vacuum Science and Technology B 16 (6), 3435-39 (1998). [PDF]
  290. E. Tejnil, K. A. Goldberg, J. Bokor, "Phase effects owing to multilayer coatings in a two-mirror extreme-ultraviolet Schwarzschild objective," Applied Optics 37 (34), 8021-9 (1998). [PDF]
  291. S. H. Lee, P. Naulleau, K. A. Goldberg, E. Tejnil, H. Medecki, C. Bresloff, C. Chang, D. T. Attwood, and J. Bokor, "At-wavelength interferometry of Extreme Ultraviolet Lithographic Optics," AIP Conference Proceedings, (no. 449), (Characterization and Metrology for ULSI Technology, 1998 International Conference, Gaithersburg, MD, USA, 1998.) , pp. 553-7 (1998).
  292. P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, C. Bresloff, P. Batson, D. Attwood, and J. Bokor, "Characterization of the accuracy of EUV phase-shifting point diffraction interferometry," in Emerging Lithographic Technologies II, Y. Vladimirski, (ed.), Proc. SPIE 3331, 114-23 (1998). [PDF]
  293. P. Naulleau, K. Goldberg, S. Lee, C. Bresloff, D. Attwood, and J. Bokor, "Point Diffraction Interferometry: An EUV Projection Lithography System Alignment and Qualification Tool," Optical Fabrication and Testing, OSA Technical Digest Series Vol. 12 117-119, (1998).
  294. K. A. Goldberg, P. Naulleau, S. Lee, C. Chang, C. Bresloff, P. Denham, P. Batson, D. Attwood, and J. Bokor, "EUV interferometry: an accuracy standard for diffraction-limited EUV optics," The Advanced Light Source Users Meeting 1998 LBNL-42336
  295. 1997

  296. K. A. Goldberg, "Extreme Ultraviolet Interferometry," Doctoral Dissertation, Department of Physics, University of California, Berkeley (1997). [LINK]
  297. E. Tejnil, K. A. Goldberg, S. H. Lee, H. Medecki, P. J. Batson, P. E. Denham, A. A. MacDowell, and J. Bokor, "At-wavelength interferometry for EUV lithography," Journal of Vacuum Science and Technology B 15 (6), 2455-2461 (1997). [PDF]
  298. K. A. Goldberg, E. Tejnil, S. H. Lee, H. Medecki, D. T. Attwood, K. H. Jackson, and J. Bokor, "Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry," Proc. SPIE 3048, 264-70 (1997). [PDF]
  299. 1996

  300. K. A. Goldberg, E. Tejnil, and J. Bokor, "A 3-D numerical study of pinhole diffraction to determine the accuracy of EUV point diffraction interferometry," Extreme Ultraviolet Lithography G. Kubiak and D. Kania, eds. (Optical Society of America, Washington, D.C., 1996) , pp. 133-137 (1996). [PDF]
  301. E. Tejnil, K. A. Goldberg, H. Medecki, R. Beguiristain, J. Bokor, and D. T. Attwood, "Phase-shifting point diffraction interferometry for at-wavelength testing of lithographic optics," Extreme Ultraviolet Lithography G. Kubiak and D. Kania, eds. (Optical Society of America, Washington, D.C., 1996) , pp. 118-23 (1996). [PDF]
  302. E. Tejnil, K. A. Goldberg, E. Anderson, and J. Bokor, "Zonal placement errors in zone plate lenses," Extreme Ultraviolet Lithography, G. Kubiak and D. Kania, eds. (Optical Society of America, Washington, D.C., 1996) , pp. 138-142 (1996).
  303. H. Medecki, E. Tejnil, K. A. Goldberg, and J. Bokor, "A Phase-Shifting Point Diffraction Interferometer," Optics Letters 21 (19), 1526-8 (1996). [PDF]
  304. R. Beguiristain, K. A. Goldberg, E. Tejnil, "Interferometry using undulator sources," Rev. Sci. Instrumen. 67 (9), 3353 (1996). [PDF]
  305. 1995

  306. K. A. Goldberg, R. Beguiristain, J. Bokor, H. Medecki, K. Jackson, and D. T. Attwood, G. E. Sommargren, J. P. Spallas, R. Hostetler, "At-wavelength testing of optics for EUV," Proc. SPIE 2437, 347-54 (1995).
  307. K. A. Goldberg, R. Beguiristain, J. Bokor, H. Medecki, D. T. Attwood, K. Jackson, E. Tejnil, G. E. Sommargren, "Progress toward lambda/20 EUV interferometry," Journal of Vacuum Science and Technology B 13 (6), 2923-7 (1995). [PDF]
  308. 1994

  309. K. A. Goldberg, R. Beguiristain, J. Bokor, H. Medecki, K. Jackson, and D. T. Attwood, "Point Diffraction Interferometry at EUV Wavelengths," in Extreme Ultraviolet Lithography, F. Zernike and D. T. Attwood (eds.), (Optical Society of America, Washington, D.C. 1994) , 134-41 (1994).
All photos ©Kenneth A. Goldberg 2003-16.