Kenneth A. Goldberg, Ph.D., Optical Physicist
Center for X-Ray Optics • Lawrence Berkeley National Laboratory
Extreme Ultraviolet Optics • Ultra-High-Accuracy Interferometry • EUV Lithography
EUV 'Actinic' Mask Inspection • Optical System Modeling • Synchrotron Light • Coherence
Ken Goldberg

Email is always the best way to contact Ken.
1-510-495-2261 Office • 1-510-495-2113 Lab
Center For X-Ray Optics • Lawrence Berkeley National Laboratory
Mail Stop 2-400, 1 Cyclotron Road • Berkeley, CA 94720, USA

"Nanomanaging light since 1993."

I am a staff physicist at the Center for X-Ray Optics (CXRO) at Lawrence Berkeley National Laboratory (LBNL). Since 1993 I have been working on issues related to short-wavelength, extreme-ultraviolet (EUV) optical systems, which include the highest quality lenses ever produced. EUV optics are essential elements used at synchrotron beamlines around the world to probe the electronic structure of matter, and they are central to the development of the advanced computer chip fabrication technology known as Extreme Ultraviolet Lithography (EUVL). EUVL is a photo-lithography method now under intense worldwide development that uses 13-nm-wavelength light to print circuit patterns with lines approaching 22-nm wide.

I am now the principal investigator of the EUV Actinic Inspection Tool project. My research is conducted in close collaboration with semiconductor industry sponsors, including SEMATECH and many major computer chip manufacturers and equipment makers. My group provides unique, fundamental research capabilities, including tools and expertise, necessary to ultimately commercialize EUVL.

I work within a diverse and talented group of optical and materials scientists, technicians, engineers, and nanofabrication specialists within LBNL's Materials Sciences Division and at the Advanced Light Source (ALS). Within LBNL, my scientific co-workers include Drs. Iacopo Mochi, Patrick Naulleau, Erik Gullikson, Erik Anderson, David Attwood, and Valeriy Yashchuk.

I am the Chairman of the Advanced Light Source's Users Executive Committee (UEC), on the Program Committee for the annual EIPBN conference and on the Technical Steering Committee of the International Workshop on EUV Lithography. In 2007, Peter Fischer and I were Co-Chairmen of the Advanced Light Source Users' Meeting, where I also co-organized an Advanced X-Ray Optics Metrology Workshop with Valeriy Yashchuk.

Recent Overview Articles

"Performance of actinic EUVL mask imaging using a zoneplate microscope," K. A. Goldberg, et al. SPIE 6730, 67305E, 2007. [PDF]

"Testing EUV optics with EUV light: If you can measure it, you can make it," Kenneth Goldberg, SPIE Newsroom, 2006. [LINK]

"Ultra-high-accuracy optical testing: creating diffraction-limited short-wavelength optical systems," K. A. Goldberg, P. Naulleau, S. Rekawa, et al., Proc. SPIE 5900 114-23 (2005). [PDF]

To learn more about my research, please browse the Overview, and the following pages on Interferometry, Mask Inspection, System Modeling, EUV Lithography, and Experiment Control. For more detailed information, please see my publication list where a number papers are available, view slides from recent public presentations, or contact me at the email address above.


I believe hard work pays off—I think success can be measured as much by what you learn as by what you do. I relish complicated subjects, ethical gray areas, bilingual puns, parking strategy, what pitch to throw on 3-1, John Coltrane, strong Berkeley coffee, and the elegant path of light through the world. Outside of work, and inside too, my camera is always close at hand.