I am a staff physicist at the Center for X-Ray Optics (CXRO) at Lawrence Berkeley National Laboratory (LBNL). Since 1993 I have been working on issues related to short-wavelength, extreme-ultraviolet (EUV) optical systems, which include the highest quality lenses ever produced.

My work is conducted in close collaboration with semiconductor industry sponsors, including SEMATECH and the EUV LLC, and in cooperation with scientists at LBNL, and other national laboratories, including Lawrence Livermore and Sandia National Laboratories. I work within a diverse and talented group of optical and materials scientists, technicians, engineers, and nanofabrication specialists within LBNL's Materials Sciences Division and at the Advanced Light Source (ALS).

I serve on the Program Committee for the annual EIPBN conference and on the Advanced Light Source's Users Executive Committee (UEC). In 2007, Peter Fischer and I are Co-Chairmen of the Advanced Light Source Users' Meeting 2007, October 4-6, 2007. I am also co-organizing an Advanced X-Ray Optics Metrology Workshop with Valeriy Yashchuk on October 5th, 2007.

To learn more about my research, please browse the Overview, and the following pages on Interferometry, Mask Inspection, System Modeling, EUV Lithography, and Experiment Control. For more detailed information, please see my publication list where a number papers are available, view slides from recent public presentations, or contact me at the email address above.