Recent and future conferences that I am involved in or organizing.


[SPRING 2017] SPIE Advanced Lithography—Extreme Ultraviolet (EUV) Lithography
26 February – 2 March 2017 • San Jose, California, USA

SPIE Advanced Lithography, the premier conference for the lithography community. For 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry.


[SPRING 2017] PhotonDiag 2017
1 – 3 May, 2017 • SLAC, California, USA

The workshop will cover the progresses and recent achievement in the field of X-ray photon diagnostic and photon transport.


[SUMMER 2017] SPIE Advances in Metrology for X-Ray and EUV Optics VI

6 – 10 August 2017 • San Diego, California, USA

This conference will address the broad issues in the growing and very demanding field of surface me- trology and characterization of optics for EUV/X-Ray synchrotron and FEL radiation and for other EUV/X- Ray applications such as astronomical imaging, solar physics, and lithography. Improving the performance of existing instrumentation and techniques, as well as developing new and novel ones, is critical for the fabrication of high-quality optics to meet current and future requirements for these applications.


[SUMMER 2015] IWXM 2015—International Workshop on X-Ray Optics and Metrology
13 – 16 July, 2015 • Lawrence Berkeley National Laboratory, Berkeley, California, USA

The International Workshop on X-ray Optics and Metrology (IWXM 2015) was held at the Advanced Light Source (ALS) in Berkeley, California, USA as a satellite meeting of SRI 2015.