LBNL Materials Sciences Division Retreat 2004:
CXRO's EUV Research poster


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EUV Lithography Research and Development
Center for X-Ray Optics, Lawrence Berkeley National Laboratory

This poster was prepared for LBNL's Materials Sciences Division Review, Napa, August 25-27, 2004.
Click on the Photo for an overview of the poster.

Ken Goldberg
Patrick Naulleau and Ken Goldberg, August 25, 2004

Title and Test Image

Current Resarch Topics
Multilayer Mirrors, EUV Optical Systems, Lithographic Testing, Optical Properties

EUV Reflectometry
Reflectometer measures multilayer coatings, calibrates photodiodes, and serves as a worldwide reference standard.

EUV Interferometry, Alignment, and Optics Testing
EUV Interferometers use cohernet EUV light to measure atomic-scale aberrations.

EUV Lithographic Imaging
Unique EUV lithographic printing capabilities with resolutions down to 12 nm.

At-Wavelength Inspection of EUV Mask Blanks
Mask inspection station operates at EUV wavelengths, identifying defects with high sensitivity.