Kenneth A. Goldberg, Ph.D., Optical Physicist
Center for X-Ray Optics • Lawrence Berkeley National Laboratory
Extreme Ultraviolet Optics • Ultra-High-Accuracy Interferometry • EUV Lithography
EUV 'Actinic' Mask Inspection • Optical System Modeling • Synchrotron Light • Coherence
Email is always the best way to contact Ken.
1-510-495-2261 Office • 1-510-495-2113 Lab
Center For X-Ray Optics • Lawrence Berkeley National Laboratory
Mail Stop 2-400, 1 Cyclotron Road • Berkeley, CA 94720, USA
"Nanomanaging light since 1993."
I am a staff physicist at Lawrence Berkeley National Laboratory (LBNL) and the deputy director of the Center for X-Ray Optics (CXRO). Since 1993 I have been working on issues related to short-wavelength, extreme-ultraviolet (EUV) optical systems, which include the highest quality lenses ever produced. EUV optics are essential elements used at synchrotron beamlines around the world to probe the electronic structure of matter, and they are central to the development of the advanced computer chip fabrication technology known as Extreme Ultraviolet Lithography (EUVL). EUVL is a photolithography method now under intense worldwide development; it uses 13-nm-wavelength light to print circuit patterns with lines below 22-nm wide.
I am the principal investigator of the SEMATECH Berkeley EUV Actinic Inspection Tool (AIT), a worldwide-unique zoneplate microscope dedicated to EUV Mask research. Our research is conducted in close collaboration with semiconductor industry sponsors, including SEMATECH and the major computer chip manufacturers and equipment makers. My group provides unique, fundamental research capabilities, including tools and expertise necessary to commercialize EUVL. Drs. Iacopo Mochi, Patrick Naulleau, Erik Anderson, and Eric Gullikson are key scientific collaborators. Senajith Rekawa and Nathan Smith provide engineering and technical support.
I am a co-principal investigator on an LDRD (Laboratory-Directed Research and Development) project to bring ultra-high-accuracy metrology techniques to synchrotron beamlines for X-Ray Optical Metrology for Nanofocusing and Coherence Preservation. I work closely with Drs. Valeriy Yashchuk (co-PI), Sheng (Sam) Yuan and Tony Warwick, and Rich Celestre.
I serve on the Advanced Light Source's Users Executive Committee (UEC), as Past Chair, and was the Chairman of the 2009 Advanced Light Source Users' Meeting, held jointly with the Molecular Foundry. I am the EUV Lithography Section Head for the annual EIPBN conference, I am on the Technical Steering Committee of the International Workshop on EUV Lithography, and am on the Program Committee of the SPIE Optics and Photonics Conference for Advances in Metrology for X-Ray and EUV Optics III. In 2007, Peter Fischer and I were Program-Chairs of the Advanced Light Source Users' Meeting, where I also co-organized an Advanced X-Ray Optics Metrology Workshop with Valeriy Yashchuk.
To learn more about my research, please browse the Overview, and the following pages on Interferometry, Mask Inspection, System Modeling, EUV Lithography, and Experiment Control. A number of papers are available from my Publication List and recent public presentations can be viewed here: Presentations.
"Benchmarking EUV mask inspection beyond 0.25 NA," K. A. Goldberg, et al. SPIE Photomask (BACUS) 7122, 71222E-1, (2008). [PDF]
"Advanced X-ray Optics Metrology for Nanofocusing and Coherence Preservation," K. A. Goldberg & V. Y. Yashchuk, Synchrotron Radiation News, 21(2), 11-12, (2008). [PDF]
"Testing EUV optics with EUV light: If you can measure it, you can make it," Kenneth Goldberg, SPIE Newsroom, 2006. [LINK]
"Ultra-high-accuracy optical testing: creating diffraction-limited short-wavelength optical systems," K. A. Goldberg, P. Naulleau, S. Rekawa, et al., Proc. SPIE 5900 114-23 (2005). [PDF]
I believe hard work pays off—I think success can be measured as much by what you learn as by what you do. I relish complicated subjects, ethical gray areas, bilingual puns, parking strategy, what pitch to throw on 3-1, John Coltrane, strong Berkeley coffee, and the elegant path of light through the world. Outside of work, and inside too, my camera is always close at hand.